会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 22. 发明申请
    • CONTROL GATE DRIVER FOR USE WITH SPLIT GATE MEMORY CELLS
    • 控制门驱动器用于分离栅格存储器单元
    • US20150371711A1
    • 2015-12-24
    • US14310585
    • 2014-06-20
    • Jon S. ChoyAnirban Roy
    • Jon S. ChoyAnirban Roy
    • G11C16/24G11C16/34G11C16/12G11C16/26G11C16/22
    • G11C16/24G11C16/12G11C16/225G11C16/26G11C16/3445G11C16/3459
    • A circuit for driving a control gate of a split-gate nonvolatile memory cell may include a switched current source; a first transistor having a current electrode coupled to the switched current source and a control electrode coupled to a voltage source; a second transistor having a current electrode coupled to a second node of the switched current source, and a control electrode coupled to a third voltage source; a third transistor having a control electrode coupled to the second transistor, a current electrode coupled to the first transistor and a fourth switched voltage source; and a fourth transistor having a current electrode coupled to the first switched voltage source, a control electrode coupled to the switched current source, and a second current electrode coupled to the second transistor at a driver voltage node, wherein a voltage level at the driver voltage node is operable to drive the control gate.
    • 用于驱动分闸器非易失性存储单元的控制栅极的电路可以包括开关电流源; 第一晶体管,其具有耦合到所述开关电流源的电流电极和耦合到电压源的控制电极; 第二晶体管,其具有耦合到所述开关电流源的第二节点的电流电极,以及耦合到第三电压源的控制电极; 第三晶体管,其具有耦合到所述第二晶体管的控制电极,耦合到所述第一晶体管的电流电极和第四开关电压源; 以及第四晶体管,其具有耦合到所述第一开关电压源的电流电极,耦合到所述开关电流源的控制电极和在驱动器电压节点处耦合到所述第二晶体管的第二电流电极,其中所述驱动器电压 节点可操作以驱动控制门。
    • 23. 发明申请
    • GLUCOSE SENSOR SIGNAL PURITY ANALYSIS
    • 葡萄糖传感器信号纯度分析
    • US20120108932A1
    • 2012-05-03
    • US12914963
    • 2010-10-28
    • Anirban Roy
    • Anirban Roy
    • A61B5/145
    • A61B5/7221A61B5/14532A61B5/14865A61B5/4839A61B5/6849A61B5/7203A61M5/1723G01N33/48
    • Disclosed are methods, apparatuses, etc. for glucose sensor signal purity analysis. In certain example embodiments, a series of samples of at least one sensor signal that is responsive to a blood glucose level of a patient may be obtained. Based at least partly on the series of samples, at least one metric may be determined to characterize one or more non-physiological anomalies of a representation of the blood glucose level of the patient by the at least one sensor signal. A reliability of the at least one sensor signal to represent the blood glucose level of the patient may be assessed based at least partly on the at least one metric. Other example embodiments are disclosed herein.
    • 公开了葡萄糖传感器信号纯度分析的方法,装置等。 在某些示例性实施例中,可以获得响应于患者的血糖水平的至少一个传感器信号的一系列样本。 至少部分地基于所述一系列样本,可以确定至少一个度量来表征由所述至少一个传感器信号表示所述患者的血糖水平的一个或多个非生理异常。 可以至少部分地基于至少一个度量来评估用于表示患者的血糖水平的至少一个传感器信号的可靠性。 本文公开了其它示例性实施例。
    • 24. 发明申请
    • CLOSED-LOOP GLUCOSE CONTROL STARTUP
    • 闭环葡萄糖控制启动
    • US20110208155A1
    • 2011-08-25
    • US12709437
    • 2010-02-19
    • Cesar C. PalermAnirban Roy
    • Cesar C. PalermAnirban Roy
    • A61M31/00
    • G06F19/3456G06F19/00
    • Disclosed are methods, systems, etc. for closed-loop glucose control startup. In certain example embodiments, a request for entry of an automatic mode of operation of a glucose monitoring and insulin delivery system for a patient may be detected. An entry of the automatic mode of operation may be controlled based, at least in part, on a detected rate of change of blood glucose concentration of the patient. In certain other example embodiments, initiation of a continual phase of an automatic mode of operation may be controlled based, at least in part, on a time since a most recent manual delivery of a bolus, on a detected rate of change of blood glucose concentration, on a targeted fixed set point, a combination thereof, and so forth.
    • 公开了用于闭环葡萄糖控制启动的方法,系统等。 在某些示例性实施例中,可以检测到用于输入用于患者的葡萄糖监测和胰岛素递送系统的自动操作模式的请求。 可以至少部分地基于检测到的患者血糖浓度的变化率来控制自动操作模式的输入。 在某些其它示例性实施例中,可以至少部分地基于最近一次手动递送大剂量的时间,基于检测到的血糖浓度的变化率来控制自动操作模式的连续相的启动 ,在目标固定设定点上,其组合等。
    • 30. 发明授权
    • Flash EEPROM and EPROM arrays with select transistors within the bit
line pitch
    • US5557124A
    • 1996-09-17
    • US212176
    • 1994-03-11
    • Anirban RoyReza Kazerounian
    • Anirban RoyReza Kazerounian
    • G11C16/04H01L21/8247H01L27/115H01L29/788
    • H01L27/11521G11C16/0491H01L27/115
    • Flash EEPROM array and EPROM arrays are described. The EEPROM array has EEPROM areas with arrays of EEPROM transistors, at least one control area per EEPROM area and columns of a first polysilicon layer traversing the EEPROM and control areas. The columns are divided into even and odd columns. Each control area is divided into upper, middle and lower areas and each control area includes the following: a) within the middle area, cross-lines of the first polysilicon extending from each even to the next odd column; b) four rows of a second polysilicon layer, laid down after the columns and cross-lines of the first polysilicon layer within the control areas are removed; and c) isolating oxide elements laid down prior to the first polysilicon layer and self-aligned to it before it is removed. The isolating oxide elements are located under every odd column in the upper area, under each column in the middle area, under each odd column in one row of the lower area and under each even column in the other row of the lower area. Bit line select and erase select rows are in the upper and middle areas, respectively, and two column select rows are in the lower area. Erase select transistors are formed at the intersections of the removed cross-lines with the erase select row of second polysilicon, bit line select transistors are formed at the intersections of removed even columns with the bit line select row of second polysilicon, and column select transistors are formed at intersections of the column select rows of second polysilicon with the removed columns wherever no isolating oxide elements exist. The EPROM array has a similar structure but does not include the erase select transistors. The select transistors are n-channel transistors each formed of a) a channel, b) two diffusion bit lines bordering the channel and aligned to a first, subsequently removed, polysilicon layer and c) a second polysilicon layer extending between and over the two diffusion bit lines.