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21. 发明申请

US20090091817A1 HIGH SPEED PHASE SCRAMBLING OF A COHERENT BEAM USING PLASMA 有权
标题翻译：使用等离子体的相干光束的高速相位扫描
公开(公告)号：US20090091817A1
公开(公告)日：2009-04-09
申请号：US11868933
申请日：2007-10-08
申请人： Dean Jennings , Bruce E. Adams , Timothy N. Thomas , Stephen Moffatt
发明人： Dean Jennings , Bruce E. Adams , Timothy N. Thomas , Stephen Moffatt
IPC分类号： G02B26/08 , B23K26/00
CPC分类号： H01L21/67115
摘要： A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.
摘要翻译：激光束以非常高的频率被调制，以在热处理期间在衬底表面处理区域上产生均匀的辐射通量密度。通过使激光束通过等离子体来实现光束调制，其引起激光束内的相位随机化。该方法可以用于需要强烈均匀照明的任何应用，例如脉冲激光退火，烧蚀和晶片步进照明。

22. 发明申请

US20090084986A1 Multiple band pass filtering for pyrometry in laser based annealing systems 有权
标题翻译：在激光基退火系统中进行高频测量的多带通滤波
公开(公告)号：US20090084986A1
公开(公告)日：2009-04-02
申请号：US12283615
申请日：2008-09-12
申请人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
发明人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
IPC分类号： G01J5/00 , G21G1/00
CPC分类号： G02B5/281 , G01J5/06 , H01S5/005 , H01S5/4012
摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.
摘要翻译：热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路波长，第二光路位于光束投影光学器件和高温计之间。该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。

23. 发明授权

US07438468B2 Multiple band pass filtering for pyrometry in laser based annealing systems 有权
标题翻译：在激光基退火系统中进行高频测量的多带通滤波
公开(公告)号：US07438468B2
公开(公告)日：2008-10-21
申请号：US11195380
申请日：2005-08-02
申请人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
发明人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
IPC分类号： G01J5/02
CPC分类号： G02B5/281 , G01J5/06 , H01S5/005 , H01S5/4012
摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.
摘要翻译：热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路波长，第二光路位于光束投影光学器件和高温计之间。该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。

24. 发明申请

US20080121626A1 DYNAMIC SURFACE ANNEALING USING ADDRESSABLE LASER ARRAY WITH PYROMETRY FEEDBACK 有权
标题翻译：使用可寻址激光阵列的动态表面退火与波形反馈
公开(公告)号：US20080121626A1
公开(公告)日：2008-05-29
申请号：US11469684
申请日：2006-09-01
申请人： Timothy N. Thomas , Dean Jennings , Bruce E. Adams , Abhilash J. Mayur
发明人： Timothy N. Thomas , Dean Jennings , Bruce E. Adams , Abhilash J. Mayur
IPC分类号： B23K26/42 , B23K26/04
CPC分类号： F27B17/0025 , B23K26/03 , B23K26/032 , B23K26/034 , B23K26/0665 , B23K26/0738 , H01L21/67115
摘要： Apparatus for dynamic surface annealing of a semiconductor wafer includes a source of laser radiation emitting at a laser wavelength and comprising an array of lasers arranged in rows and columns, the optical power of each the laser being individual adjustable and optics for focusing the radiation from the array of lasers into a narrow line beam in a workpiece plane corresponding to a workpiece surface, whereby the optics images respective columns of the laser array onto respective sections of the narrow line beam. A pyrometer sensor is provided that is sensitive to a pyrometer wavelength. An optical element in an optical path of the optics is tuned to divert radiation emanating from the workpiece plane to the pyrometry sensor. As a result, the optics images each of the respective section of the narrow line beam onto a corresponding portion of the pyrometer sensor. The apparatus further includes a controller responsive to the pyrometry sensor and coupled to adjust individual optical outputs of respective columns of the laser array in accordance with outputs of corresponding portions of the pyrometry sensor.
摘要翻译：用于半导体晶片的动态表面退火的装置包括以激光波长发射的激光辐射源，并且包括排列成行和列的激光阵列，每个激光器的光功率是单独调节的，并且用于将来自激光器阵列在对应于工件表面的工件平面中变成窄线束，由此光学器件将激光阵列的相应列映射到窄线束的相应部分上。提供对高温计波长敏感的高温计传感器。调整光学器件的光路中的光学元件以将从工件平面发出的辐射转移到高温测量传感器。结果，光学器件将窄线束的各个部分的每一个图像映射到高温计传感器的相应部分上。该装置还包括响应于高温测量传感器并耦合以根据高温测量传感器的对应部分的输出调节激光器阵列的各列的各个光学输出的控制器。

25. 发明授权

US07717617B2 Multiple band pass filtering for pyrometry in laser based annealing systems 有权
标题翻译：在激光基退火系统中进行高频测量的多带通滤波
公开(公告)号：US07717617B2
公开(公告)日：2010-05-18
申请号：US12283615
申请日：2008-09-12
申请人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
发明人： Bruce E. Adams , Dean Jennings , Aaron M. Hunter , Abhilash J. Mayur , Vijay Parihar , Timothy N. Thomas
IPC分类号： G01N3/28 , G01J5/08 , H01L21/477
CPC分类号： G02B5/281 , G01J5/06 , H01S5/005 , H01S5/4012
摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.
摘要翻译：热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路波长，第二光路位于光束投影光学器件和高温计之间。该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。

26. 发明授权

US07795816B2 High speed phase scrambling of a coherent beam using plasma 有权
标题翻译：使用等离子体的相干光束的高速相位扰乱
公开(公告)号：US07795816B2
公开(公告)日：2010-09-14
申请号：US11868933
申请日：2007-10-08
申请人： Dean Jennings , Bruce E. Adams , Timothy N. Thomas , Stephen Moffatt
发明人： Dean Jennings , Bruce E. Adams , Timothy N. Thomas , Stephen Moffatt
IPC分类号： H05B31/26
CPC分类号： H01L21/67115
摘要： A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.
摘要翻译：激光束以非常高的频率被调制，以在热处理期间在衬底表面处理区域上产生均匀的辐射通量密度。通过使激光束通过等离子体来实现光束调制，其引起激光束内的相位随机化。该方法可以用于需要强烈均匀照明的任何应用，例如脉冲激光退火，烧蚀和晶片步进照明。

27. 发明授权

US07494272B2 Dynamic surface annealing using addressable laser array with pyrometry feedback 有权
标题翻译：使用具有高温测量反馈的可寻址激光器阵列进行动态表面退火
公开(公告)号：US07494272B2
公开(公告)日：2009-02-24
申请号：US11469684
申请日：2006-09-01
申请人： Timothy N. Thomas , Dean Jennings , Bruce E. Adams , Abhilash J. Mayur
发明人： Timothy N. Thomas , Dean Jennings , Bruce E. Adams , Abhilash J. Mayur
IPC分类号： G01N3/28 , G01J5/08 , H01L21/477
CPC分类号： F27B17/0025 , B23K26/03 , B23K26/032 , B23K26/034 , B23K26/0665 , B23K26/0738 , H01L21/67115
摘要： Apparatus for dynamic surface annealing of a semiconductor wafer includes a source of laser radiation emitting at a laser wavelength and comprising an array of lasers arranged in rows and columns, the optical power of each the laser being individual adjustable and optics for focusing the radiation from the array of lasers into a narrow line beam in a workpiece plane corresponding to a workpiece surface, whereby the optics images respective columns of the laser array onto respective sections of the narrow line beam. A pyrometer sensor is provided that is sensitive to a pyrometer wavelength. An optical element in an optical path of the optics is tuned to divert radiation emanating from the workpiece plane to the pyrometry sensor. As a result, the optics images each of the respective section of the narrow line beam onto a corresponding portion of the pyrometer sensor. The apparatus further includes a controller responsive to the pyrometry sensor and coupled to adjust individual optical outputs of respective columns of the laser array in accordance with outputs of corresponding portions of the pyrometry sensor.
摘要翻译：用于半导体晶片的动态表面退火的装置包括以激光波长发射的激光辐射源，并且包括排列成行和列的激光阵列，每个激光器的光功率是单独调节的，并且用于将来自激光器阵列在对应于工件表面的工件平面中变成窄线束，由此光学器件将激光阵列的相应列映射到窄线束的相应部分上。提供对高温计波长敏感的高温计传感器。调整光学器件的光路中的光学元件以将从工件平面发出的辐射转移到高温测量传感器。结果，光学器件将窄线束的各个部分的每一个图像映射到高温计传感器的相应部分上。该装置还包括响应于高温测量传感器并耦合以根据高温测量传感器的对应部分的输出调节激光器阵列的各列的各个光学输出的控制器。

28. 发明授权

US08288683B2 Fast axis beam profile shaping for high power laser diode based annealing system 有权
标题翻译：基于高功率激光二极管的退火系统的快轴光束轮廓成形
公开(公告)号：US08288683B2
公开(公告)日：2012-10-16
申请号：US12291002
申请日：2008-11-04
申请人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
发明人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
IPC分类号： B23K26/00
CPC分类号： B23K26/0738 , B23K26/0613 , B23K26/0676 , H01L21/268 , H01L29/7833 , Y10T117/1016
摘要： A dynamic surface anneal apparatus for annealing a semiconductor workpiece has a workpiece support for supporting a workpiece, an optical source and scanning apparatus for scanning the optical source and the workpiece support relative to one another along a fast axis. The optical source includes an array of laser emitters arranged generally in successive rows of the emitters, the rows being transverse to the fast axis. Plural collimating lenslets overlie respective ones of the rows of emitters and provide collimation along the fast axis. The selected lenslets have one or a succession of optical deflection angles corresponding to beam deflections along the fast axis for respective rows of emitters. Optics focus light from the array of laser emitters onto a surface of the workpiece to form a succession of line beams transverse to the fast axis spaced along the fast axis in accordance with the succession of deflection angles.
摘要翻译：用于退火半导体工件的动态表面退火装置具有用于支撑工件的工件支撑件，用于沿着快轴相对于彼此扫描光源和工件支撑件的光源和扫描装置。光源包括大致以发射器的连续行布置的激光发射器的阵列，该列横向于快轴。多个准直的小透镜叠加在发射器排中的相应行上，并沿着快轴提供准直。所选择的小透镜具有对应于沿着快轴的光束偏转的相应行发射器的一个或一系列光学偏转角。将来自激光发射器阵列的光聚焦到工件的表面上，以根据偏转角的顺序形成一系列沿着快轴间隔开的快轴的线束。

29. 发明授权

US07674999B2 Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system 有权
标题翻译：基于高功率激光二极管的退火系统的准直小透镜的快轴光束轮廓成形
公开(公告)号：US07674999B2
公开(公告)日：2010-03-09
申请号：US11508781
申请日：2006-08-23
申请人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
发明人： Dean Jennings , Abhilash J. Mayur , Timothy N. Thomas , Vijay Parihar , Vedapuram S. Achutharaman , Randhir P. S. Thakur
IPC分类号： H01L21/324 , H01L21/477
CPC分类号： B23K26/0738 , B23K26/0613 , B23K26/0676 , H01L21/268 , H01L29/7833 , Y10T117/1016
摘要： A dynamic surface anneal apparatus for annealing a semiconductor workpiece has a workpiece support for supporting a workpiece, an optical source and scanning apparatus for scanning the optical source and the workpiece support relative to one another along a fast axis. The optical source includes an array of laser emitters arranged generally in successive rows of the emitters, the rows being transverse to the fast axis. Plural collimating lenslets overlie respective ones of the rows of emitters and provide collimation along the fast axis. The selected lenslets have one or a succession of optical deflection angles corresponding to beam deflections along the fast axis for respective rows of emitters. Optics focus light from the array of laser emitters onto a surface of the workpiece to form a succession of line beams transverse to the fast axis spaced along the fast axis in accordance with the succession of deflection angles.
摘要翻译：用于退火半导体工件的动态表面退火装置具有用于支撑工件的工件支撑件，用于沿着快轴相对于彼此扫描光源和工件支撑件的光源和扫描装置。光源包括大致以发射器的连续行布置的激光发射器的阵列，该列横向于快轴。多个准直的小透镜叠加在发射器排中的相应行上，并沿着快轴提供准直。所选择的小透镜具有对应于沿着快轴的光束偏转的相应行发射器的一个或一系列光学偏转角。将来自激光发射器阵列的光聚焦到工件的表面上，以根据偏转角的顺序形成一系列沿着快轴间隔开的快轴的线束。

30. 发明授权

US07910499B2 Autofocus for high power laser diode based annealing system 有权
标题翻译：基于大功率激光二极管的退火系统的自动对焦
公开(公告)号：US07910499B2
公开(公告)日：2011-03-22
申请号：US11198660
申请日：2005-08-05
申请人： Dean Jennings , Timothy N. Thomas
发明人： Dean Jennings , Timothy N. Thomas
IPC分类号： H01L21/00
CPC分类号： H01L21/67115
摘要： Apparatus for thermally processing a substrate includes a source of laser radiation comprising a plurality diode lasers arranged along a slow axis, optics directing the laser radiation from the source to the substrate, and an array of photodetectors arranged along a fast axis perpendicular to the slow axis and receiving portions of the laser radiation reflected from the substrate through the optics.
摘要翻译：用于热处理衬底的设备包括激光辐射源，其包括沿着慢轴布置的多个二极管激光器，将激光辐射从源极引导到衬底的光学器件，以及沿着垂直于慢轴的快轴布置的光电检测器阵列以及接收通过光学器件从衬底反射的激光辐射的部分。

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