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21. 发明授权

US06483639B2 Optical system for integrated circuit fabrication 失效
标题翻译：用于集成电路制造的光学系统
公开(公告)号：US06483639B2
公开(公告)日：2002-11-19
申请号：US09194536
申请日：1998-11-25
申请人： Akira Fujinoki , Hiroyuki Nishimura
发明人： Akira Fujinoki , Hiroyuki Nishimura
IPC分类号： G02B600
CPC分类号： G03F7/70575 , G03F7/701 , G03F7/70225 , G03F7/70241
摘要： An optical system for integrated circuit fabrication comprises optical members made of synthetic quartz glass and fluorite, wherein: an optical member disposed in a position through which laser light is transmitted at a high light energy density, is made of single crystal fluorite; and an optical member in a position through which laser light is transmitted at a low light energy density, is made of synthetic quartz glass containing approximately such a hydrogen molecule concentration as can be doped under atmospheric pressure.
摘要翻译：用于集成电路制造的光学系统包括由合成石英玻璃和萤石制成的光学构件，其中：设置在激光以高光能密度透射的位置的光学构件由单晶萤石制成; 并且在低光能密度下透射激光的位置的光学构件由包含大气压下可掺杂的氢分子浓度的合成石英玻璃制成。

22. 发明授权

US08394731B2 Composite woven fabric and printed wiring board 有权
标题翻译：复合机织布和印刷线路板
公开(公告)号：US08394731B2
公开(公告)日：2013-03-12
申请号：US12447653
申请日：2007-11-07
申请人： Akira Sato , Akira Fujinoki , Hiroyuki Nishimura , Tsukasa Sakaguchi
发明人： Akira Sato , Akira Fujinoki , Hiroyuki Nishimura , Tsukasa Sakaguchi
IPC分类号： D03D15/00
CPC分类号： H05K1/0366 , D02G3/04 , D02G3/18 , D03D1/0082 , D03D1/0088 , D03D15/00 , D03D15/0011 , D03D15/0016 , D03D15/0027 , D10B2101/06 , D10B2201/00 , D10B2321/02 , D10B2321/021 , D10B2321/022 , D10B2321/121 , H05K1/024 , H05K2201/0158 , H05K2201/0278 , H05K2201/029 , Y10T442/30 , Y10T442/313 , Y10T442/3138 , Y10T442/3976
摘要： Disclosed is a printed wiring board which attains aims of printed wiring boards required for realizing high-speed, high-frequency semiconductor devices, namely a printed wiring board having low dielectric constant, low dielectric loss tangent and low linear expansion coefficient. Also disclosed is a composite woven fabric suitably used as a base material for such a printed wiring board. Specifically disclosed is a composite woven fabric containing quartz glass fibers and polyolefin fibers, in which the ratio of the quartz glass fibers to the composite woven fabric is set at 10 vol % or more and 90 vol % or less. It is preferred that the quartz glass fibers each have a filament diameter of 3 μm or more and 16 μm or less, and the composite woven fabric has a thickness of 200 μm or less.
摘要翻译：公开了实现高速，高频半导体器件所需的印刷线路板的目的的印刷线路板，即具有低介电常数，低介电损耗角正切和低线膨胀系数的印刷线路板。还公开了适合用作这种印刷线路板的基材的复合机织织物。具体公开了含有石英玻璃纤维和聚烯烃纤维的复合机织织物，其中石英玻璃纤维与复合机织织物的比率设定在10体积％以上且90体积％以下。优选石英玻璃纤维的长丝直径为3μm以上且16μm以下，复合织物的厚度为200μm以下。

23. 发明授权

US07288775B2 Synthetic quartz glass optical material for YAG laser with higher harmonic 有权
标题翻译：用于具有较高谐波的YAG激光器的合成石英玻璃光学材料
公开(公告)号：US07288775B2
公开(公告)日：2007-10-30
申请号：US10523323
申请日：2003-07-19
申请人： Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
发明人： Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
IPC分类号： C03C3/06 , H01S3/17
CPC分类号： C03C4/0085 , C03C3/06 , C03C2201/21 , C03C2201/23
摘要： It is an object of the present invention to provide synthetic quartz glass optical materials suitable for use in YAG of higher order harmonics. The damage threshold value in J/cm2 (energy density at which cracks occur generated by irradiation) is to be considered when synthetic quartz glass material is irradiated with YAG laser of third or higher order harmonics with single pulses or continuously. Regarding a synthetic quartz glass optical material in use for the optical parts constituting the prism and lens used in a laser beam machine, this invention provides a synthetic quartz glass material suitably used for the YAG laser with the third or higher order of harmonic, choosing the following conditions: OH group concentration is in the range of ≧1 to ≦300 ppm; contained hydrogen molecule concentration is in the range of ≧2×1018 to ≦2×1019 molecules/cm3; transmittance of ultraviolet rays at 245 nm of wavelength is 99.9% or more; and the fictive temperature is in the range of ≧880 to ≦990° C.
摘要翻译：本发明的目的是提供适用于较高次谐波的YAG的合成石英玻璃光学材料。当合成石英玻璃材料用单个脉冲的三次或更高次谐波的YAG激光照射时，考虑J / cm 2的损伤阈值（通过照射产生裂纹的能量密度）或连续。关于构成用于激光束机的棱镜和透镜的光学部件的合成石英玻璃光学材料，本发明提供了适用于具有第三或更高次谐波的YAG激光器的合成石英玻璃材料，选择以下条件：OH基浓度在> = 1〜<= 300ppm的范围内; 含有氢分子浓度在> = 2×10 18〜2×10 9分子/ cm 3的范围内。波长245nm处紫外线的透过率为99.9％以上; 并且假想温度在> = 880至<= 990℃的范围内。

24. 发明授权

US06689705B2 Synthetic quartz glass optical material and optical member 有权
标题翻译：合成石英玻璃光学材料和光学元件
公开(公告)号：US06689705B2
公开(公告)日：2004-02-10
申请号：US10048309
申请日：2002-01-29
申请人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
发明人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
IPC分类号： C03C306
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/32 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/21 , C03C2203/54 , Y02P40/57
摘要： An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5×1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2×10−5 or lower.
摘要翻译：本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。上述问题由OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×10 16分子/ cm 2的F2准分子激光的合成石英玻璃光学材料解决， 3>以下，最大和最小氟浓度在20mol ppm内的差异，以及最大和最小折射率之间的差异为2×10 -5或更低。

25. 发明授权

US06266978B1 Method for producing synthetic quartz glass for use in ArF excimer laser lithography 失效
标题翻译：用于ArF准分子激光光刻的合成石英玻璃的制造方法
公开(公告)号：US06266978B1
公开(公告)日：2001-07-31
申请号：US09392427
申请日：1999-09-09
申请人： Takayuki Oshima , Akira Fujinoki , Hiroyuki Nishimura , Yasuyuki Yaginuma
发明人： Takayuki Oshima , Akira Fujinoki , Hiroyuki Nishimura , Yasuyuki Yaginuma
IPC分类号： C03B3200
CPC分类号： C03C23/0025 , C03C3/06 , C03C23/002 , C03C2201/50
摘要： A simple method for producing a synthetic quartz glass having excellent homogeneity and high transmittance, which is useful as an optical material in producing steppers equipped with an ArF excimer laser as a radiation source. A method for producing a synthetic quartz glass for use in ArF excimer laser lithography, which comprises irradiating a highly homogeneous synthetic quartz glass containing less than 60 ppb of Na with ultraviolet radiation having a maximum wavelength of 260 nm for not less than the duration expressed by the equation: Y=(80X−1880)/Z wherein X represents an Na concentration (ppb), Y represents the duration of irradiation (hours), and Z represents the illuminance of an ultraviolet radiation on an irradiated surface (mW/cm2).
摘要翻译：用于制造具有优异的均匀性和高透射率的合成石英玻璃的简单方法，其可用作制备装备有ArF准分子激光器作为辐射源的步进机中的光学材料。一种用于制造用于ArF准分子激光光刻的合成石英玻璃的方法，其包括：将含有小于60ppb的Na的高度均匀的合成石英玻璃与最大波长为260nm的紫外线辐射照射不少于由方程式：其中X表示Na浓度（ppb），Y表示照射持续时间（小时），Z表示照射表面上的紫外线照射的照度（mW / cm 2）。

26. 发明申请

US20060059948A1 Method for producing synthetic quartz glass and synthetic quartz glass article 有权
标题翻译：生产合成石英玻璃和合成石英玻璃制品的方法
公开(公告)号：US20060059948A1
公开(公告)日：2006-03-23
申请号：US10535935
申请日：2003-11-28
申请人： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
发明人： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
IPC分类号： C03C25/64
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
摘要： First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
摘要翻译：首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形，特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外吸收率和排放率，对防止碱金属的扩散具有极高的效果。该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是烘烤，从而形成致密的玻璃体。

27. 发明授权

US07093465B2 Method for heat treating synthetic quartz glass for optical use 有权
标题翻译：光学用合成石英玻璃热处理方法
公开(公告)号：US07093465B2
公开(公告)日：2006-08-22
申请号：US10297451
申请日：2001-05-31
申请人： Tetsuji Ueda , Hiroyuki Nishimura , Akira Fujinoki
发明人： Tetsuji Ueda , Hiroyuki Nishimura , Akira Fujinoki
IPC分类号： C03C15/00
CPC分类号： C03C23/007 , C03B19/1453 , C03B32/00 , C03B2201/03 , Y10S65/90
摘要： An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide and a synthetic quartz glass for optical use.The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiO2 powder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.
摘要翻译：本发明的目的是克服现有技术的问题，提供热处理方法以及能够以更高的效率对具有较高均匀性的光学用合成石英玻璃进行热处理的热处理装置和更高的纯度。本发明的另一个目的是提供一种用于光学用途的合成石英玻璃。上述问题是通过在加热炉中对作为热处理对象的平坦圆筒形合成石英玻璃体进行热处理的方法来解决的，该方法是用于热处理用于光学用途的合成石英玻璃的方法，包括制备容器的石英玻璃，并且具有平坦的圆柱形空间用于在其中设置物体合成石英玻璃体，将两个或更多个目标合成石英玻璃体彼此平行地放置在容器中，用SiO 2填充空间，粉末，将容器置于加热炉内并关闭盖子，并对容器进行热处理。

28. 发明授权

US06508084B1 Method for producing optical quartz glass for excimer lasers and vertical-type heating furnace 失效
标题翻译：用于准分子激光器和立式加热炉的光学石英玻璃的制造方法
公开(公告)号：US06508084B1
公开(公告)日：2003-01-21
申请号：US09527655
申请日：2000-03-17
申请人： Toru Yokota , Hiroyuki Nishimura , Akira Fujinoki
发明人： Toru Yokota , Hiroyuki Nishimura , Akira Fujinoki
IPC分类号： C03B37018
CPC分类号： C03B19/1453 , C03B2201/21 , C03B2201/23 , Y02P40/57 , Y10S65/08 , Y10S65/90
摘要： A method for producing an optical quartz glass for use in excimer lasers, comprising a step of forming a porous silica preform by depositing silica in a soot-like form formed by flame hydrolysis of a high-purity volatile silicon compound, followed by a step of vitrifying said porous silica preform into transparent glass in an atmosphere containing water vapor and hydrogen, and a vertical type heating furnace for carrying out the production method therein.
摘要翻译：一种用于准分子激光器的光学石英玻璃的制造方法，其特征在于，包括以高纯度挥发性硅化合物的火焰水解形成的烟灰状沉积二氧化硅，形成多孔二氧化硅预成型体的工序，在含有水蒸气和氢气的气氛中将所述多孔二氧化硅预制件玻璃化成透明玻璃，以及在其中进行制造方法的立式加热炉。

29. 发明授权

US06480518B1 Synthetic quartz glass member for use in ArF excimer laser lithography 有权
标题翻译：用于ArF准分子激光光刻的合成石英玻璃构件
公开(公告)号：US06480518B1
公开(公告)日：2002-11-12
申请号：US09517888
申请日：2000-03-03
申请人： Akira Fujinoki , Takayuki Oshima , Hiroyuki Nishimura , Yasuyuki Yaginuma
发明人： Akira Fujinoki , Takayuki Oshima , Hiroyuki Nishimura , Yasuyuki Yaginuma
IPC分类号： H01S322
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/21 , C03C4/0085 , C03C23/002 , C03C2201/21 , C03C2201/50 , C03C2203/42 , C03C2203/50
摘要： A synthetic glass member for use in excimer laser lithography, having superior homogeneity, high transmittance for ArF excimer laser beams and an excellent resistance against lasers is made from high purity synthetic quartz glass, and it is characterized in that layered structures, striae in three directions and internal strains are thermally and mechanically removed, the distribution of refractive index (&Dgr;n) in a plane orthogonal to the optical axis is up to about 1×10−6, the distribution of refractive index (&Dgr;n) in a plane parallel to the optical axis is up to about 5×10−6, the birefringence is up to about 2 nm/cm, the hydrogen molecule concentration is at least about 2×1017 molecules/cm3, and the internal transmittance is at least about 99.8% at a wavelength of 193.4 nm.
摘要翻译：用于准分子激光光刻的合成玻璃构件，具有优异的均匀性，对ArF准分子激光束的高透射率和优异的抗激光性能由高纯度合成石英玻璃制成，其特征在于层状结构，沿三个方向并且内部应变被热和机械去除，在与光轴正交的平面中折射率（DELTAn）的分布高达约1×10 -6，平行于光轴的平面中的折射率分布（DELTAn）为高达约5×10 -6，双折射高达约2nm / cm，氢分子浓度为至少约2×10 17分子/ cm 3，内部透射率在193.4nm波长处为至少约99.8％。

30. 发明申请

US20100251770A1 Process for producing silica glass product 审中-公开
公开(公告)号：US20100251770A1
公开(公告)日：2010-10-07
申请号：US12802846
申请日：2010-06-15
申请人： Hiroyuki Watanabe , Akira Fujinoki , Takayuki Imaizumi , Kazuhisa Hayakawa , Shingo Niinobe
发明人： Hiroyuki Watanabe , Akira Fujinoki , Takayuki Imaizumi , Kazuhisa Hayakawa , Shingo Niinobe
IPC分类号： C03B8/00
CPC分类号： C03B20/00 , C03B19/06 , C03B19/066
摘要： A process for producing a transparent or opaque silica glass product including mixing a silica fine powder and a cellulose derivative and injection molding the mixture, followed by degreasing treatment and baking treatment, which is characterized in that the cellulose derivative is a cellulose derivative which causes reversible thermal gelation in an aqueous solution of at least one member selected from methyl cellulose, hydroxypropylmethyl cellulose and hydroxyethylmethyl cellulose; in producing a transparent silica glass product, the cellulose derivative is added in water heated at a gelation temperature thereof or higher, and after cooling, the formed aqueous solution is kneaded with the silica fine powder; and in producing an opaque silica glass product, the cellulose derivative is added in a silica slurry containing a silica powder and heated at a gelation temperature of the cellulose derivative or higher.

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