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    • 23. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US07502098B2
    • 2009-03-10
    • US11845650
    • 2007-08-27
    • Keiji Yoshimura
    • Keiji Yoshimura
    • G03B27/52G03B27/42
    • G03B27/52G03F7/70783
    • With respect to each of a plurality of shots on a substrate, a line or surface is calculated which approximates a plurality of positions of the surface of the substrate detected by a detector with respect to a plurality of places, and the difference between the position of the surface detected by the detector and the position of the line or surface in the direction of the optical axis of a projection optical system is calculated with respect to each of the plurality of places. With respect to each of the plurality of places, the differences are averaged over the plurality of shots to determine an offset value.
    • 关于基板上的多个拍摄中的每一个,计算出近似由检测器相对于多个位置检测的基板的表面的多个位置的线或表面,以及 相对于多个位置中的每一个计算由检测器检测的表面和投影光学系统的光轴方向上的线或表面的位置。 对于多个位置中的每一个,在多个拍摄中对差异进行平均以确定偏移值。
    • 26. 发明授权
    • Exposure method and apparatus
    • 曝光方法和装置
    • US06383940B1
    • 2002-05-07
    • US09342540
    • 1999-06-29
    • Keiji Yoshimura
    • Keiji Yoshimura
    • H01L21302
    • G03F7/70125G03F7/70075G03F7/70208G03F7/70358G03F7/70466G03F7/70483
    • A method of exposing a substrate to a pattern of a reticle by synchronously scanning the reticle and the substrate in a direction relative to a slit-shaped illumination area which is formed on the reticle. The method includes steps of providing a reticle on which first and second patterns are formed along the direction, with a space therebetween, exposing a substrate to the first and second patterns of the reticle under different exposure conditions in one scanning process and changing over the exposure conditions when the illumination area exists in the space on the reticle during the one scanning process.
    • 通过沿着与掩模版上形成的狭缝形状的照明区域相对的方向同步扫描掩模版和基板,将基板曝光于标线图案的方法。 该方法包括以下步骤:提供沿其方向形成有第一和第二图案的掩模版及其间的空间,在一个扫描过程中在不同的曝光条件下将基板暴露于标线片的第一和第二图案,并且改变曝光 在一次扫描过程中照明区域存在于掩模版上的空间中的条件。
    • 27. 发明授权
    • Exposure apparatus and method of manufacturing a device using the same
    • 曝光装置及其制造方法
    • US5898477A
    • 1999-04-27
    • US782297
    • 1997-01-15
    • Keiji YoshimuraKunitaka OzawaHiroshi KurosawaNoriyasu Hasegawa
    • Keiji YoshimuraKunitaka OzawaHiroshi KurosawaNoriyasu Hasegawa
    • G03F7/20H01L21/027G03B27/42G03B27/32
    • G03F7/70358G03F7/70058G03F7/70558
    • An exposure apparatus includes a mask scanning device for scanning a mask on which a pattern is formed, a projection optical system for projecting the pattern on the mask onto a wafer, a wafer scanning device for scanning the wafer, onto which the pattern is projected by the projection optical system, an illuminating device for illuminating the mask in an illumination area narrower than the pattern by synchronously scanning the mask and the wafer relative to each other, using the mask scanning device and the wafer scanning device, so as to expose and transfer the pattern on the wafer, a detection device for detecting information regarding exposure before exposing and transferring the pattern onto the wafer by the illuminating device and for producing detection results, and a display for displaying exposure information obtained from the detection results. Also disclosed are methods of manufacturing semiconductor devices, for example, using such an exposure apparatus.
    • 曝光装置包括用于扫描其上形成有图案的掩模的掩模扫描装置,用于将掩模上的图案投影到晶片上的投影光学系统,用于扫描晶片的晶片扫描装置,其上突出有图案的晶片扫描装置 投影光学系统,使用掩模扫描装置和晶片扫描装置通过使掩模和晶片相对于彼此同步扫描而在比图案窄的照明区域中照亮掩模的照明装置,以便曝光和转印 晶片上的图案,用于检测关于在通过照明装置曝光并将图案转印到晶片上并且用于产生检测结果之前的曝光的信息的检测装置,以及用于显示从检测结果获得的曝光信息的显示器。 还公开了制造半导体器件的方法,例如使用这种曝光装置。