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    • 21. 发明授权
    • Projector and method of manufacturing a light modulation device
    • 投影仪及制造光调制装置的方法
    • US06375329B1
    • 2002-04-23
    • US09202133
    • 1998-12-08
    • Osamu YokoyamaTatsuya ShimodaSatoru Miyashita
    • Osamu YokoyamaTatsuya ShimodaSatoru Miyashita
    • G03B2100
    • G09F19/22G02B26/02G02B26/0858H04N5/7458
    • There is provided a method of manufacturing a light modulation device that does not produce scattered reflection comprising: a step of forming a release layer whereby a release layer that produces separation in response to irradiation with incoming light is formed on a heat-resistant substrate having the capability of withstanding heat; a step of forming a piezoelectric layer whereby a piezoelectric layer is formed on the release layer; a patterning step whereby an electrode pattern is formed in respect of the piezoelectric layer and mirror elements are formed at each pixel; a connection step of electrically connecting the active element substrate wherein active elementary elements are provided for each pixel and the piezoelectric layer laminated on the heat-resistant substrate such that the active elements correspond to mirror elements; and an irradiating separation step whereby separation is produced in the release layer by irradiating the release layer with irradiating light from the side of the heat-resistant substrate.
    • 提供一种制造不产生散射反射的光调制装置的方法,包括:形成剥离层的步骤,由此在具有所述剥离层的耐热基板上形成响应于入射光的照射而产生分离的剥离层 耐热能力; 形成压电层的步骤,由此在剥离层上形成压电层; 形成相对于压电体层的电极图案和反射镜元件的图案形成步骤, 电连接有源元件基板的连接步骤,其中为每个像素提供有源元件和层压在耐热基板上的压电层,使得有源元件对应于反射镜元件; 以及照射分离步骤,其中通过从耐热基材侧照射光来照射剥离层,在剥离层中产生分离。
    • 22. 发明授权
    • Methods for fabricating distributed reflection multi-layer film mirrors
    • 分布反射多层膜镜的制作方法
    • US06337222B1
    • 2002-01-08
    • US09402986
    • 1999-10-14
    • Tatsuya ShimodaTakeo KanekoSatoru Miyashita
    • Tatsuya ShimodaTakeo KanekoSatoru Miyashita
    • H01L2100
    • G02B5/0833G02B5/0825H01S5/18361
    • In a method for fabricating distributed reflection multi-layered film mirrors consisting of a plurality of laminated thin films having a different refractive index, the thin films are formed using a liquid phase film formation method. The liquid phase film formation method includes a step of applying thin film materials forming the thin films, and a step of drying the applied the thin film materials. The liquid phase film formation method utilizes an ink jet method. Thin films can be formed in fine patterns with ease and in a short amount of time. Laminated layers with high reliability can be obtained in very fine patterns. The reflection properties such as film thickness and reflectance of distributed reflection multi-layered film mirrors can be controlled with ease.
    • 在由多个具有不同折射率的层叠薄膜构成​​的分布反射多层膜反射镜的制造方法中,使用液相成膜法形成薄膜。 液相膜形成方法包括施加形成薄膜的薄膜材料的步骤以及施加薄膜材料的步骤。 液相成膜法利用喷墨法。 薄膜可以在短时间内容易地形成为精细图案。 可以以非常精细的图案获得具有高可靠性的层压层。 可以容易地控制分布式反射多层膜反射镜的膜厚度和反射率等反射特性。
    • 23. 发明授权
    • Piezoelectric thin film, method for producing the same, and ink jet
recording head using the thin film
    • 压电薄膜,其制造方法和使用该薄膜的喷墨记录头
    • US6140746A
    • 2000-10-31
    • US626973
    • 1996-04-03
    • Satoru MiyashitaMasakazu ShinozukaKouji SumiMasami MuraiTetsushi Takahashi
    • Satoru MiyashitaMasakazu ShinozukaKouji SumiMasami MuraiTetsushi Takahashi
    • B41J2/14H01L41/187H01L41/22H01L41/24H01L41/29H01L41/318H01L41/08
    • H01L41/1876B41J2/14233H01L41/318
    • A piezoelectric thin film which has good properties, for example, a high dielectric constant and a high piezoelectric strain constant is disclosed. A method for producing a piezoelectric film, which causes no crack during annealing, is also disclosed. The piezoelectric thin film has a thickness in the range of from 0.5 to 20 .mu.m, comprises crystal grains having an average grain diameter of 0.005 to 0.2 .mu.m, and is free from any multilayer structure in its cross section. The process for producing a piezoelectric thin film comprises that steps of: coating a substrate with a sol composition comprising a sol, of a metal component for constituting a piezoelectric film, and a polymer compound and then drying the coating to form a film; pre-sintering the film to form a porous thin film of gel comprising an amorphous metal oxide; pre-annealing the porous thin film of gel to bring the film to a film formed of a crystalline metal oxide; repeating the above steps at least once to form a laminated film formed of a crystalline metal oxide; and annealing the laminated film to grow crystal grains of perovskite type in the film into a larger size.
    • 公开了具有良好性能的压电薄膜,例如高介电常数和高压电应变常数。 还公开了一种在退火过程中不产生裂纹的压电膜的制造方法。 压电薄膜的厚度在0.5〜20μm的范围内,具有平均粒径为0.005〜0.2μm的晶粒,并且在其截面中不含任何多层结构。 制造压电薄膜的方法包括以下步骤:用包含溶胶,用于构成压电膜的金属组分的溶胶组合物和高分子化合物涂覆基材,然后干燥该涂层以形成膜; 预先烧结该膜以形成包含非晶金属氧化物的多孔凝胶薄膜; 对凝胶的多孔薄膜进行预退火,使膜成为由结晶金属氧化物形成的膜; 重复上述步骤至少一次以形成由结晶金属氧化物形成的叠层膜; 并且对层压膜进行退火以使膜中的钙钛矿型的晶粒成为较大的尺寸。