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21. 发明授权

US08632948B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US08632948B2
公开(公告)日：2014-01-21
申请号：US12570923
申请日：2009-09-30
申请人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
发明人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
IPC分类号： G03F7/039 , G03F7/30 , C08F20/20
CPC分类号： G03F7/091
摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
摘要翻译：本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团，在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。本发明还涉及用于对抗反射涂层进行成像的方法。

22. 发明授权

US07553905B2 Anti-reflective coatings 失效
标题翻译：防反射涂层
公开(公告)号：US07553905B2
公开(公告)日：2009-06-30
申请号：US11262639
申请日：2005-10-31
申请人： David J. Abdallah , Jian Yin , Mark O. Neisser
发明人： David J. Abdallah , Jian Yin , Mark O. Neisser
IPC分类号： G03F7/11 , C08K5/07
CPC分类号： C08F8/30 , C08F212/08 , C08F220/18 , C09D133/06 , G03F7/091 , Y10S438/952 , C08L2666/04 , C08F216/08 , C08F2220/281
摘要： Novel self-crosslinking polymers are provided and which are useful in antireflective coatings to reduce outgassing.
摘要翻译：提供了新颖的自交联聚合物，并且其可用于减反射涂料以减少除气。

23. 发明授权

US5213704A Process for making a compliant thermally conductive compound 失效
标题翻译：制备柔性导热性化合物的方法
公开(公告)号：US5213704A
公开(公告)日：1993-05-25
申请号：US760045
申请日：1991-09-13
申请人： Herbert R. Anderson, Jr. , Richard B. Booth , Lawrence D. David , Mark O. Neisser , Harbans S. Sachdev , Mark A. Takacs
发明人： Herbert R. Anderson, Jr. , Richard B. Booth , Lawrence D. David , Mark O. Neisser , Harbans S. Sachdev , Mark A. Takacs
IPC分类号： C09K5/08
CPC分类号： C09K5/08
摘要： A process for making a compliant thermally conductive, preferably dielectric, compound that enhances the power dissipation capability of high-powered electrical components such as bipolar VLSI semiconductor chips. The compound has chemically stable thermal conduction and viscosity properties; is not subject to phase separation during use and may be applied in small gaps to maximize thermal conduction. The compound preferably comprises a liquid carrier having thermal filler particles dispersed therein and a coupling agent having a functionality which is reactive with the calcined surface of the thermal filler particles, and a functionality having preferential wetting of the thermal filler particles over self-condensation. Additional additives such as fumed silica and polyisobutylene enhance the phase stability and resistance to thermo-mechanical shear force degradation of the thermally conductive compound encountered during functional usage, e.g., fluctuating power cycles.
摘要翻译：制造兼容导热的，优选介电的化合物的方法，其增强诸如双极型VLSI半导体芯片的大功率电气部件的功率耗散能力。该化合物具有化学稳定的热传导和粘度特性; 在使用过程中不会进行相分离，可以以小的间隙施加，以使热传导最大化。该化合物优选包括其中分散有热填料颗粒的液体载体和具有与热填料颗粒的煅烧表面反应的官能团的偶联剂，以及具有自缩合优先润湿热填料颗粒的官能团。另外的添加剂如热解二氧化硅和聚异丁烯增强了在功能使用期间遇到的导热化合物的热 - 机械剪切力降解的相稳定性和抗性，例如波动的功率循环。

24. 发明授权

US4663186A Screenable paste for use as a barrier layer on a substrate during maskless cladding 失效
标题翻译：可屏蔽浆料，用于在无掩模包层期间用作衬底上的阻挡层
公开(公告)号：US4663186A
公开(公告)日：1987-05-05
申请号：US855263
申请日：1986-04-24
申请人： Richard F. Indyk , Francisco J. Lamelas , Mark O. Neisser
发明人： Richard F. Indyk , Francisco J. Lamelas , Mark O. Neisser
IPC分类号： H01L23/12 , H01L21/48 , H01L23/498 , H05K3/02 , H05K3/04 , H05K3/14 , H05K3/16 , H05K3/24 , H05K3/28 , B05D3/12 , B05D5/12
CPC分类号： H05K3/048 , H01L21/4867 , H01L23/49883 , H01L2924/0002 , H05K3/143 , Y10T29/49155
摘要： Disclosed is a screening paste for covering a selected portion of a metallurgical pattern on a substrate while leaving other metallurgy uncovered. The paste is free of polymers and consists, in one example, of 75-80% of a ceramic particulate (such as alumina), 2-8% amorphous fumed silica and 15-20% of linear alcohol. The linear alcohol serves as a vehicle to deliver the solid particles in the paste. In use, after covering the selected portion of the metallurgical pattern with the paste, the alcohol content therein is expelled by subjecting to vacuum treatment at room temperature or heating to a low temperature below about 275.degree. C. thereby obtaining an inert, dry and crack-free protective coating. Upon evaporation of a new metal layer onto the substrate and removal of the protective coating and new metal layer from everywhere except the uncovered metallurgy, the metallurgical pattern is selectively coated with the new metal.
摘要翻译：公开了一种用于覆盖基材上的冶金图案的选定部分同时留下未被覆盖的其它冶金的筛选浆料。该浆料不含聚合物，在一个实例中包含75-80％的陶瓷颗粒（例如氧化铝），2-8％无定形热解法二氧化硅和15-20％直链醇。线性醇作为将固体颗粒输送到糊料中的载体。在使用中，在用糊料覆盖冶金图案的选定部分之后，通过在室温下进行真空处理或加热到低于约275℃的低温来排出其中的醇含量，从而获得惰性，干燥和裂纹 - 免保护涂层。当将新的金属层蒸发到基底上并从除了未覆盖的冶金之外的任何地方去除保护涂层和新的金属层时，冶金图案被选择性地涂覆有新的金属。

25. 发明授权

US08524441B2 Silicon-based antireflective coating compositions 失效
标题翻译：硅系抗反射涂料组合物
公开(公告)号：US08524441B2
公开(公告)日：2013-09-03
申请号：US12449735
申请日：2008-02-25
申请人： Ruzhi Zhang , WooKyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neisser , Ralph R. Dammel , Ari Karkkainen
发明人： Ruzhi Zhang , WooKyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neisser , Ralph R. Dammel , Ari Karkkainen
IPC分类号： C09D183/04
CPC分类号： C08G77/045 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3124
摘要： A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.
摘要翻译：包含具有至少一个Si-OH基团和至少一个Si-OR基团的硅氧烷聚合物的聚合物，其中R是任选具有反应性官能团的缩合稳定基团，其中所述硅氧烷聚合物在置于溶剂中时具有重量提供了通过GPC测量的在40℃下老化1周后的平均分子量增加小于或等于50％。

26. 发明申请

US20120108067A1 Edge Bead Remover For Coatings 审中-公开
标题翻译：用于涂料的边缘珠去除剂
公开(公告)号：US20120108067A1
公开(公告)日：2012-05-03
申请号：US12915950
申请日：2010-10-29
申请人： Mark O. Neisser , Srinivasan Chakrapani , Munirathna Padmanaban , Ralph R. Dammel
发明人： Mark O. Neisser , Srinivasan Chakrapani , Munirathna Padmanaban , Ralph R. Dammel
IPC分类号： H01L21/311 , G03F7/42
CPC分类号： G03F7/168 , C11D3/373 , C11D3/3765 , C11D3/43 , C11D7/5022 , C11D11/0047 , G03F7/2041
摘要： The invention relates to an edge bead remover composition for an organic film disposed on a substrate surface, comprising an organic solvent and at least one polymer having a contact angle with water greater than 70°. The invention also relates to a process for using the composition as an edge bead remover for an organic film.
摘要翻译：本发明涉及一种用于有机膜的边缘珠粒去除组合物，其用于设置在基材表面上，包括有机溶剂和至少一种与水的接触角大于70°的聚合物。本发明还涉及使用该组合物作为有机膜的边缘珠去除剂的方法。

27. 发明申请

US20110104613A1 Antireflective Composition for Photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射组合物
公开(公告)号：US20110104613A1
公开(公告)日：2011-05-05
申请号：US12609222
申请日：2009-10-30
申请人： Huirong Yao , Guanyang Lin , Mark O. Neisser
发明人： Huirong Yao , Guanyang Lin , Mark O. Neisser
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： C09D167/02 , C08G63/16 , G03F7/091
摘要： The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, X is a linking moiety selected from a nonaromatic (A) moiety, aromatic (P) moiety and mixture thereof, R′ is a group of structure (2), R″ is independently selected from hydrogen, a moiety of structure (2), Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbylene linking moiety, and, Y′ is independently a (C1-C20) hydrocarbylene linking moiety, where structure (2) is where R1 and R2 are independently selected from H and C1-C4alkyl and L is an organic hydrocarbyl group. The invention further relates to a process for imaging the antireflective coating composition.
摘要翻译：本发明涉及一种用于光致抗蚀剂层的抗反射涂料组合物，其包含聚合物，交联剂和酸产生剂，其中聚合物包含至少一个结构单元1，其中X是选自非芳族（A）部分，芳族（P）部分及其混合物，R'是结构（2）的基团，R“独立地选自氢，结构（2）的部分，Z和W-OH，其中Z是（C1 -C 20）烃基部分，W是（C 1 -C 20）亚烃基连接部分，Y'独立地是（C 1 -C 20）亚烃基连接部分，其中结构（2）是其中R 1和R 2独立地选自H和 C1-C4烷基，L是有机烃基。本发明还涉及一种用于对抗反射涂料组合物进行成像的方法。

28. 发明授权

US07816071B2 Process of imaging a photoresist with multiple antireflective coatings 失效
标题翻译：用多个抗反射涂层成像光致抗蚀剂的工艺
公开(公告)号：US07816071B2
公开(公告)日：2010-10-19
申请号：US11338462
申请日：2006-01-24
申请人： David J. Abdallah , Mark O. Neisser , Ralph R. Dammel , Georg Pawlowski , John Biafore , Andrew R. Romano
发明人： David J. Abdallah , Mark O. Neisser , Ralph R. Dammel , Georg Pawlowski , John Biafore , Andrew R. Romano
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , Y10S430/151
摘要： A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.
摘要翻译：一种用于对光致抗蚀剂进行成像的方法，包括以下步骤：a）在衬底上形成多层有机抗反射涂层的叠层; b）在多层有机抗反射涂层的堆叠的上层上形成光致抗蚀剂的涂层; c）用曝光设备成像曝光光致抗蚀剂; 和d）用显影剂显影涂层。

29. 发明授权

US5283104A Via paste compositions and use thereof to form conductive vias in circuitized ceramic substrates 失效
标题翻译：通过糊剂组合物及其在电路化陶瓷衬底中形成导电通孔的用途
公开(公告)号：US5283104A
公开(公告)日：1994-02-01
申请号：US672272
申请日：1991-03-20
申请人： Farid Y. Aoude , Emanuel I. Cooper , Peter R. Duncombe , Shaji Farooq , Edward A. Giess , Young-Ho Kim , Sarah H. Knickerbocker , Friedel Muller-Landau , Mark O. Neisser , Jae M. Park , Robert R. Shaw , Robert A. Rita , Thomas M. Shaw , Rao Vallabhaneni , Jon A. Van Hise , George F. Walker , Jungihl Kim , James M. Brownlow, deceased
发明人： Farid Y. Aoude , Emanuel I. Cooper , Peter R. Duncombe , Shaji Farooq , Edward A. Giess , Young-Ho Kim , Sarah H. Knickerbocker , Friedel Muller-Landau , Mark O. Neisser , Jae M. Park , Robert R. Shaw , Robert A. Rita , Thomas M. Shaw , Rao Vallabhaneni , Jon A. Van Hise , George F. Walker , Jungihl Kim , James M. Brownlow, deceased
IPC分类号： H01B1/16 , H01L21/48 , H01L23/498 , H05K1/03 , H05K1/09 , H05K3/46 , B32B9/00
CPC分类号： H05K1/092 , H01B1/16 , H01L21/486 , H01L21/4867 , H01L23/49883 , H01L2924/0002 , H01L2924/09701 , H05K1/0306 , H05K3/4611 , H05K3/4629 , Y10S428/901 , Y10T29/49147 , Y10T29/49165 , Y10T428/12472 , Y10T428/12556 , Y10T428/12604 , Y10T428/12611 , Y10T428/24322 , Y10T428/24802 , Y10T428/25 , Y10T428/251 , Y10T428/252 , Y10T428/2982 , Y10T428/2991
摘要： Improved via-filling compositions for producing conductive vias in circuitized ceramic substrates, particularly multilayer substrates, without cracking and/or loss of hermetic sealing. The via-filling compositions comprise pastes containing a mixture of (a) ceramic and/or glass spheres of substantially- uniform diameter between about 0.5 and 6 .mu.m, (b) conductive metal particles or spheres having a maximum dimension or diameter between about 1/3 and 1/4 of the diameter of the ceramic and/or glass spheres, and (c) a binder vehicle. The formed conductive via bodies comprise a uniform conductive skeletal network of sintered metal particles densely packed within a uniform matrix of the co-sintered ceramic and/or glass spheres, which matrix is hermetically fused and integrated with ceramic layers forming the wall of the via in the ceramic circuit substrate.
摘要翻译：用于在电路化陶瓷衬底，特别是多层衬底中产生导电通孔的改进的通孔填充组合物，不会破裂和/或失去气密密封。通孔填充组合物包含含有（a）在约0.5和6（my）m之间的基本均匀直径的陶瓷和/或玻璃球的混合物的浆料，（b）具有最大尺寸或直径在约为陶瓷和/或玻璃球直径的1/3和1/4，和（c）粘合剂载体。形成的导电通孔体包括致密地包裹在共烧结陶瓷和/或玻璃球的均匀基质内的烧结金属颗粒的均匀导电骨架网络，该基质被气密地融合并与形成通孔壁的陶瓷层成一体陶瓷电路基板。

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