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21. 发明申请

US20140007413A1 PLASMA CONFINEMENT STRUCTURES IN PLASMA PROCESSING SYSTEMS AND METHODS THEREOF 有权
标题翻译：等离子体处理系统中的等离子体配合结构及其方法
公开(公告)号：US20140007413A1
公开(公告)日：2014-01-09
申请号：US14022111
申请日：2013-09-09
申请人： Eric Hudson , Andreas Fischer
发明人： Eric Hudson , Andreas Fischer
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： C23C16/00 , C23F1/00 , H01J37/32082 , H01J37/32623
摘要： A method for manufacturing a plasma processing system is provided. The method includes providing a movable plasma-facing structure configured to surround a plasma that is generated during processing of a substrate. The method also includes disposing a movable electrically conductive structure outside of the movable plasma-facing structure, wherein both structures configured to be deployed and retracted as a single unit to facilitate handling of the substrate. The movable electrically conductive structure is radio frequency (RF) grounded during the plasma processing. During processing, the RF current from the plasmas flows to the movable electrically conductive structure through the movable plasma-facing structure during the plasma processing. The method further includes coupling a set of conductive straps to the movable electrically conductive structure. The set of conductive straps accommodates the movable electrically conductive structure when it is deployed and retracted while providing the RF current a low impedance path to ground.
摘要翻译：提供了一种制造等离子体处理系统的方法。该方法包括提供构造成围绕在衬底的处理期间产生的等离子体的可移动等离子体面向结构。该方法还包括将可移动导电结构设置在可移动等离子体面向结构的外部，其中两个结构构造成作为单个单元展开和缩回以便于处理基板。可移动导电结构是在等离子体处理期间接地的射频（RF）。在处理期间，来自等离子体的RF电流在等离子体处理期间通过可移动等离子体面向结构流动到可移动导电结构。该方法还包括将一组导电带耦合到可移动导电结构。一组导电带在展开和缩回时容纳可移动的导电结构，同时为RF电流提供一个低阻抗地线路径。

22. 发明申请

US20130292856A1 METHOD FOR THE WAFER-LEVEL INTEGRATION OF SHAPE MEMORY ALLOY WIRES 有权
标题翻译：用于形状记忆合金线的水平集成的方法
公开(公告)号：US20130292856A1
公开(公告)日：2013-11-07
申请号：US13885257
申请日：2011-11-22
申请人： Stefan Braun , Frank Niklaus , Andreas Fischer , Henrik Gradin
发明人： Stefan Braun , Frank Niklaus , Andreas Fischer , Henrik Gradin
IPC分类号： H01L23/00
CPC分类号： H01L24/85 , B23K20/007 , C22C19/03 , H01L24/05 , H01L24/45 , H01L24/48 , H01L24/78 , H01L24/94 , H01L2224/04042 , H01L2224/05571 , H01L2224/05599 , H01L2224/45 , H01L2224/45015 , H01L2224/45139 , H01L2224/45155 , H01L2224/4813 , H01L2224/48453 , H01L2224/48463 , H01L2224/78301 , H01L2224/85045 , H01L2224/85099 , H01L2224/85205 , H01L2224/85345 , H01L2224/85375 , H01L2224/85385 , H01L2224/85399 , H01L2224/858 , H01L2224/85855 , H01L2224/85899 , H01L2924/00011 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01015 , H01L2924/01023 , H01L2924/01033 , H01L2924/10253 , H01L2924/14 , H01L2924/1461 , H01L2224/45099 , H01L2924/00 , H01L2224/05552 , H01L2924/01049 , H01L2924/00015 , H01L2924/20753 , H01L2924/01022
摘要： The present invention relates to a method to attach a shape memory alloy wire to a substrate, where the wire is mechanically attached into a 3D structure on the substrate. The present invention also relates to a device comprising a shape memory alloy wire attached to a substrate, where the wire is mechanically attached into a 3D structure on the substrate.
摘要翻译：本发明涉及一种将形状记忆合金线附着到基底上的方法，其中线被机械连接到基底上的3D结构中。本发明还涉及一种装置，其包括附接到基底的形状记忆合金丝，其中线被机械地附接到基底上的3D结构中。

23. 发明授权

US08500953B2 Edge ring assembly with dielectric spacer ring 有权
标题翻译：边缘环组件与介质隔离环
公开(公告)号：US08500953B2
公开(公告)日：2013-08-06
申请号：US12415114
申请日：2009-03-31
申请人： Jeremy Chang , Andreas Fischer , Babak Kadkhodayan
发明人： Jeremy Chang , Andreas Fischer , Babak Kadkhodayan
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01L21/467 , H01J37/32623 , Y10T29/4973
摘要： An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.
摘要翻译：边缘环组件围绕等离子体蚀刻室中的衬底支撑表面。边缘环组件包括边缘环和介电隔离环。围绕基板支撑表面并且沿着径向方向被边缘环包围的介电间隔环构造成使边缘环与基板绝缘。边缘环组件围绕衬底支撑表面的结合可以降低聚合物在衬底的下侧和沿着衬底边缘的聚集，并增加衬底的等离子体蚀刻均匀性。

24. 外观设计

USD675687S1 Stationary bicycle 有权
公开(公告)号：USD675687S1
公开(公告)日：2013-02-05
申请号：US29402870
申请日：2011-09-28
申请人： Andreas Fischer
设计人： Andreas Fischer

25. 发明申请

US20130012078A1 METHOD FOR PLUGGING A HOLE AND A PLUGGED HOLE 有权
标题翻译：用于插入孔和插入孔的方法
公开(公告)号：US20130012078A1
公开(公告)日：2013-01-10
申请号：US13511486
申请日：2010-12-17
申请人： Andreas Fischer , Göran Stemme , Frank Niklaus , Niklas Roxhed
发明人： Andreas Fischer , Göran Stemme , Frank Niklaus , Niklas Roxhed
IPC分类号： B81C1/00 , H01R13/02
CPC分类号： B81C1/00293 , B01L3/502707 , B01L2300/042 , B81B2201/058 , B81B2203/0315 , B81C2201/019 , B81C2203/0145 , Y10T29/49117 , Y10T29/49151 , Y10T29/49153 , Y10T29/49826 , Y10T29/49885
摘要： A method for at least partially inserting a plug into a hole, said method comprising the steps of a) providing a at least one substrate with at least one hole wherein said at least one hole has a largest dimension of from 1 μm to 300 μm, b) providing a piece of material, wherein said piece of material has a larger dimension than said at least one hole, c) pressing said piece of material against the hole with a tool so that a plug is formed, wherein at least a part of said piece of material is pressed into said hole, d) removing the tool from the piece of material. There is further disclosed a plugged hole manufactured with the method. One advantage of an embodiment is that an industrially available wire bonding technology can be used to seal various cavities. The existing wire bonding technology makes the plugging fast and cheap.
摘要翻译：一种用于至少部分地将插头插入孔中的方法，所述方法包括以下步骤：a）提供具有至少一个孔的至少一个基底，其中所述至少一个孔具有1μm至300μm的最大尺寸， b）提供一块材料，其中所述材料片具有比所述至少一个孔更大的尺寸，c）用工具将所述材料件压靠在孔上，从而形成插塞，其中至少部分所述材料被压入所述孔中，d）从所述材料上移除所述工具。还公开了一种使用该方法制造的堵塞孔。一个实施例的一个优点是可以使用工业上可用的引线接合技术来密封各种空腔。现有的导线接合技术使堵塞快速便宜。

26. 发明授权

US08262847B2 Plasma-enhanced substrate processing method and apparatus 有权
标题翻译：等离子体增强的基板处理方法和装置
公开(公告)号：US08262847B2
公开(公告)日：2012-09-11
申请号：US11618583
申请日：2006-12-29
申请人： Rajinder Dhindsa , Hudson Eric , Alexei Marakhtanov , Andreas Fischer
发明人： Rajinder Dhindsa , Hudson Eric , Alexei Marakhtanov , Andreas Fischer
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： H01J37/32165 , H01J37/32091
摘要： A method and apparatus for processing a substrate in a capacitively-coupled plasma processing system having a plasma processing chamber and at least an upper electrode and a lower electrode. The substrate is disposed on the lower electrode during plasma processing. The method includes providing at least a first RF signal, which has a first RF frequency, to the lower electrode. The first RF signal couples with a plasma in the plasma processing chamber, thereby inducing an induced RF signal on the upper electrode. The method also includes providing a second RF signal to the upper electrode. The second RF signal also has the first RF frequency. A phase of the second RF signal is offset from a phase of the first RF signal by a value that is less than 10%. The method further includes processing the substrate while the second RF signal is provided to the upper electrode.
摘要翻译：一种用于在具有等离子体处理室和至少上电极和下电极的电容耦合等离子体处理系统中处理衬底的方法和装置。在等离子体处理期间，衬底设置在下电极上。该方法包括向下电极提供至少具有第一RF频率的第一RF信号。第一RF信号与等离子体处理室中的等离子体耦合，从而在上电极上感应感应RF信号。该方法还包括向上电极提供第二RF信号。第二RF信号也具有第一RF频率。第二RF信号的相位偏离第一RF信号的相位小于10％的值。该方法还包括在将第二RF信号提供给上电极的同时处理衬底。

27. 发明申请

US20110251287A1 HCI POLYMORPHS OF 3-((2-(DIMETHYLAMINO)METHYL (CYCLOHEX-1-YL))PHENOL 审中-公开
标题翻译： 3 - （（2-（二甲基氨基）甲基（环己基-1-基））苯酚的聚合物
公开(公告)号：US20110251287A1
公开(公告)日：2011-10-13
申请号：US13165331
申请日：2011-06-21
申请人： Michael GRUSS , Andreas Fischer , Markus Kegel , Wolfgang Hell , Markus Von Raumer , Joerg Berghausen , Susan Margaret Paul
发明人： Michael GRUSS , Andreas Fischer , Markus Kegel , Wolfgang Hell , Markus Von Raumer , Joerg Berghausen , Susan Margaret Paul
IPC分类号： A61K31/137 , A61P29/00 , C07C213/10 , C07C215/64 , C07C213/08
CPC分类号： C07C215/66 , C07B2200/13 , C07C213/10 , C07C215/64 , C07C2601/14
摘要： A crystalline salt of 3-[2-(dimethylamino)methyl(cyclohex-1-yl)]phenol and hydrogen chloride, preferably in a 1:1 composition, including various crystalline forms of this salt, processes for preparing the various crystalline forms of this salt, pharmaceutical compositions containing the various crystalline forms of this salt, and the use of this salt as a pharmacologically active agent in a pharmaceutical composition to treat or inhibit pain or other disorders or disease states.
摘要翻译： 3- [2-（二甲基氨基）甲基（环己-1-基）]苯酚和氯化氢的结晶盐，优选以1:1的组成，包括该盐的各种结晶形式，制备各种结晶形式的该盐，含有该盐的各种结晶形式的药物组合物，以及该盐作为药物活性剂在药物组合物中用于治疗或抑制疼痛或其它疾病或疾病状态。

28. 发明授权

US07976998B2 Apparatus for the deionization of cooling media for fuel cells 失效
标题翻译：用于燃料电池冷却介质去离子的装置
公开(公告)号：US07976998B2
公开(公告)日：2011-07-12
申请号：US11802476
申请日：2007-05-23
申请人： Claudius Kormann , Andreas Fischer
发明人： Claudius Kormann , Andreas Fischer
IPC分类号： H01M8/04
CPC分类号： H01M8/04029
摘要： The present invention relates to a process for the deionization of a cooling medium in a fuel cell (11) circulating in a cooling circuit (20), in which the cooling medium is subjected to at least intermittent, but preferably continuous, electrochemical deionization. To this end, at least one electrode deionization cell (23) , through which a diluate stream (27) serving as cooling medium and a concentrate stream (28) flow, is arranged in the cooling circuit. The concentrate stream (28) may be part of a secondary cooling circuit.
摘要翻译：本发明涉及在冷却回路（20）中循环的燃料电池（11）中的冷却介质去离子的方法，其中冷却介质经历至少间歇但优选连续的电化学去离子。为此，在冷却回路中设置至少一个电极去离子电池（23），作为冷却介质的稀释流（27）和浓缩物流（28）流过该电极去离子电池。浓缩物流（28）可以是二次冷却回路的一部分。

29. 发明授权

US07976673B2 RF pulsing of a narrow gap capacitively coupled reactor 有权
标题翻译：窄间隙电容耦合反应器的RF脉冲
公开(公告)号：US07976673B2
公开(公告)日：2011-07-12
申请号：US10431030
申请日：2003-05-06
申请人： Peter Loewenhardt , Mukund Srinivasan , Andreas Fischer
发明人： Peter Loewenhardt , Mukund Srinivasan , Andreas Fischer
IPC分类号： H01L21/00 , C23F1/00
CPC分类号： H01J37/32137 , H01J37/32082 , H01J37/32165
摘要： An apparatus for providing a plasma etch of a layer over a wafer is provided. A capacitively coupled process chamber is provided. A gas source is provided. A first and a second electrode are provided within the process chamber. A first radio frequency power source is electrically connected to at least one of the first and second electrodes, where the first radio frequency power source provides radio frequency power. A second radio frequency power source is electrically connected to at least one of the first and second electrodes. A first modulation control is connected to the first radio frequency power source, to provide a controlled modulation of the first radio frequency power source.
摘要翻译：提供了一种用于在晶片上提供层的等离子体蚀刻的设备。提供了一种电容耦合处理室。提供气源。第一和第二电极设置在处理室内。第一射频电源电连接到第一和第二电极中的至少一个，其中第一射频电源提供射频功率。第二射频电源电连接到第一和第二电极中的至少一个。第一调制控制连接到第一射频电源，以提供对第一射频电源的受控调制。

30. 发明申请

US20110147228A1 PROCESS FOR THE ANODIC DEHYDRODIMERIZATION OF SUBSTITUTED PHENOLS 有权
标题翻译：取代苯酚的阳离子脱氢方法
公开(公告)号：US20110147228A1
公开(公告)日：2011-06-23
申请号：US13059548
申请日：2009-08-28
申请人： Andreas Fischer , Itamar Michael Malkowsky , Florian Stecker , Siegfried Waldvogel , Axel Kirste
发明人： Andreas Fischer , Itamar Michael Malkowsky , Florian Stecker , Siegfried Waldvogel , Axel Kirste
IPC分类号： C25B3/10
CPC分类号： C25B3/10 , C25B3/02
摘要： The invention relates to a process for preparing biaryl alcohols, in which anodic dehydrodimerization of substituted phenols is carried out in the presence of partially fluorinated and/or periluorinated mediators and a supporting electrolyte at a graphite electrode.
摘要翻译：本发明涉及一种制备联芳基醇的方法，其中取代酚的阳极脱氢二聚化在部分氟化和/或过氧化介质和支持电解质存在下在石墨电极上进行。

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