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21. 发明授权

US07857672B2 Flow control device for improving pressure resistance and hull vibration 有权
标题翻译：用于提高耐压性和船体振动的流量控制装置
公开(公告)号：US07857672B2
公开(公告)日：2010-12-28
申请号：US12439501
申请日：2007-09-03
申请人： Chun Beom Hong , Joon Hwan Bae , Ki Hyun Kim , Sung Mok Ahn , Seung Myun Hwangbo
发明人： Chun Beom Hong , Joon Hwan Bae , Ki Hyun Kim , Sung Mok Ahn , Seung Myun Hwangbo
IPC分类号： B63H1/18
CPC分类号： B63B39/005 , B63H5/16
摘要： A flow control mechanism, for improving pressure resistance and hull vibration, includes a lower fin and an upper fin. The lower fin is disposed between a second station and a fourth station in a length direction of a ship and between 10% and 20% of a design draft from a bottom of the ship in a height direction of the ship, the lower fin being inclined at an angle of 20 to 40 degrees with respect to a design draught (or base) line. The upper fin is disposed between the second station and the fourth station in the length direction of the ship and between 30% and 60% of the design draft from the bottom of the ship in the height direction of the ship, the upper fin being inclined at an angle of 10 to 30 degrees with respect to the design draught (or base) line. Further, an additional fin is disposed between a first station and a third station in the length direction of the ship and between 5% and 20% of the design draft from the bottom of the ship in the height direction of the ship, the additional fin being inclined at an angle of 10 to 40 degrees with respect to the design draught (or base) line.
摘要翻译：用于改善耐压和船体振动的流量控制机构包括下翅片和上翅片。下鳍在船的长度方向上设置在第二站和第四站之间，并且在船的高度方向上从船的底部设计为设计吃水的10％至20％，下翅倾斜相对于设计吃水（或基）线为20至40度的角度。上鳍在船的长度方向上位于第二站和第四站之间，并且在船的高度方向上从船底部的设计吃水深度的30％至60％之间，上鳍倾斜相对于设计吃水（或基）线为10至30度的角度。此外，在船的长度方向上在第一站和第三站之间设置附加的翅片，并且在船的高度方向上从船底部的设计吃水深度的5％至20％之间，附加翅片相对于设计吃水（或基底）线倾斜10到40度的角度。

22. 发明申请

US20100290143A1 Color filter and apparatus and method of manufacturing the same 审中-公开
标题翻译：滤色器及其制造方法
公开(公告)号：US20100290143A1
公开(公告)日：2010-11-18
申请号：US12662478
申请日：2010-04-20
申请人： Jeong Gil Kim , Young Tae Cho , Suk Won Lee , Sin Kwon , Ki Hyun Kim , Jung Woo Seo
发明人： Jeong Gil Kim , Young Tae Cho , Suk Won Lee , Sin Kwon , Ki Hyun Kim , Jung Woo Seo
IPC分类号： G02B5/22 , B05D5/06 , B05C1/08 , G02B1/04
CPC分类号： G02B5/201 , B05C1/0834 , G02B5/223
摘要： Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed.
摘要翻译：本文公开了具有黑矩阵的滤色器及其制造方法。该方法可以包括将有机膜施加到基底上，通过用具有突起和凹陷的模具对有机膜施加压力，在有机膜上形成图案，并通过向有机膜的图案施加墨来形成黑色矩阵。黑色矩阵的形成可以通过卷绕方法来实现。通过在施加到基板上的有机膜上进行印刷和印刷，容易地形成黑色矩阵。通过印刷和印刷，黑色矩阵可以具有纳米级的细线宽度。此外，由于通过卷绕方法形成黑色矩阵，所以可以降低材料成本，并且可以以相对高的速度制造滤色器。

23. 发明申请

US20100282162A1 Roll-to-roll patterning apparatus and patterning system having the same 有权
标题翻译：卷对卷图案装置和具有该图案的图案形成系统
公开(公告)号：US20100282162A1
公开(公告)日：2010-11-11
申请号：US12662677
申请日：2010-04-28
申请人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
发明人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
IPC分类号： B05C9/08 , B05C1/08
CPC分类号： B65H23/038 , B05C5/0241 , B05D1/40 , B05D3/067 , B65H2301/5114 , B65H2301/5126 , B65H2404/15212
摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
摘要翻译：本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。图案辊可以包括具有第一图案的外周表面。多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

24. 发明授权

US09880345B2 Lighting module 有权
公开(公告)号：US09880345B2
公开(公告)日：2018-01-30
申请号：US14232741
申请日：2012-07-25
申请人： Ki Hyun Kim , Eun Hwa Kim , Ji Hyoung Maeng
发明人： Ki Hyun Kim , Eun Hwa Kim , Ji Hyoung Maeng
IPC分类号： F21V8/00 , F21V15/01 , F21S8/06 , F21V7/00 , F21V11/14 , F21V13/02 , F21V13/10 , F21S4/20 , F21Y101/00 , F21Y103/10 , F21Y115/10
CPC分类号： G02B6/0051 , F21S4/20 , F21S8/06 , F21V7/0008 , F21V7/0016 , F21V7/0033 , F21V7/04 , F21V7/043 , F21V11/14 , F21V13/02 , F21V13/10 , F21V15/01 , F21Y2101/00 , F21Y2103/10 , F21Y2113/00 , F21Y2113/10 , F21Y2115/10 , G02B6/0031 , G02B6/005 , G02B6/0055 , G02B6/0096
摘要： A lighting module may be provided that includes: a first and a second light source units which are disposed to face each other; a first case in which the first light source unit is disposed; a second case in which the second light source unit is disposed; a first plate of which one side is connected to the first case, of which the other side is connected to the second case and which includes a first hole through which light emitted from the first and the second light source units passes; a second plate which is disposed to face the first plate and includes a second hole through which the light emitted from the first and the second light source units passes; and a first and a second optical sheets which are disposed on the first and the second plates.

25. 发明授权

US08878208B2 Illuminating device 有权
标题翻译：照明装置
公开(公告)号：US08878208B2
公开(公告)日：2014-11-04
申请号：US13765987
申请日：2013-02-13
申请人： Ki Hyun Kim , Eun Hwa Kim
发明人： Ki Hyun Kim , Eun Hwa Kim
IPC分类号： H01L33/58 , H01L25/07 , H01L25/075
CPC分类号： H01L33/58 , H01L25/0753 , H01L2924/0002 , H01L2924/00
摘要： An illuminating device that may include a substrate; a first light emitting chip which is disposed on the substrate; a second light emitting chip which is spaced apart from the first light emitting chip and is disposed on the substrate; a first lens which includes a first cylindrical side having a height greater than the thickness of the first light emitting chip and includes a first spherical or hemispherical curved surface formed on the first side, and which surrounds the first light emitting chip; and a second lens which includes a second cylindrical side having a height greater than the thickness of the second light emitting chip and includes a second spherical or hemispherical curved surface formed on the second side, and which surrounds the second light emitting chip, wherein at least a portion of the first side contacts with at least a portion of the second side.
摘要翻译：可以包括基板的照明装置; 设置在基板上的第一发光芯片; 第二发光芯片，与第一发光芯片间隔开并设置在基板上; 第一透镜，其包括具有大于第一发光芯片的厚度的高度的第一圆柱形侧面，并且包括形成在第一侧上并围绕第一发光芯片的第一球形或半球形曲面; 以及第二透镜，其包括具有大于所述第二发光芯片的厚度的高度的第二圆柱形侧面，并且包括形成在所述第二侧上并且围绕所述第二发光芯片的第二球形或半球形曲面，其中至少第一侧的一部分与第二侧的至少一部分接触。

26. 发明申请

US20140218964A1 LIGHTING MODULE 有权
标题翻译：照明模块
公开(公告)号：US20140218964A1
公开(公告)日：2014-08-07
申请号：US14232741
申请日：2012-07-25
申请人： Ki Hyun Kim , Eun Hwa Kim , Ji Hyoung Maeng
发明人： Ki Hyun Kim , Eun Hwa Kim , Ji Hyoung Maeng
IPC分类号： F21V8/00
CPC分类号： G02B6/0051 , F21S4/20 , F21S8/06 , F21V7/0008 , F21V7/0016 , F21V7/0033 , F21V7/04 , F21V7/043 , F21V11/14 , F21V13/02 , F21V13/10 , F21V15/01 , F21Y2101/00 , F21Y2103/10 , F21Y2113/00 , F21Y2113/10 , F21Y2115/10 , G02B6/0031 , G02B6/005 , G02B6/0055 , G02B6/0096
摘要： A lighting module may be provided that includes: a first and a second light source units which are disposed to face each other; a first case in which the first light source unit is disposed; a second case in which the second light source unit is disposed; a first plate of which one side is connected to the first case, of which the other side is connected to the second case and which includes a first hole through which light emitted from the first and the second light source units passes; a second plate which is disposed to face the first plate and includes a second hole through which the light emitted from the first and the second light source units passes; and a first and a second optical sheets which are disposed on the first and the second plates.
摘要翻译：可以提供照明模块，其包括：第一和第二光源单元，其被设置为彼此面对; 设置有第一光源单元的第一情况; 设置第二光源单元的第二种情况; 第一板，其一侧连接到第一壳体，另一侧连接到第二壳体，并且包括第一孔，从第一和第二光源单元发射的光通过该第一孔; 第二板，其设置成面对所述第一板并且包括第二孔，从所述第一孔和所述第二光源单元发射的光通过所述第二孔; 以及设置在第一和第二板上的第一和第二光学片。

27. 发明申请

US20140034907A1 NANOWIRE SENSOR HAVING NANOWIRE OF NETWORK STRUCTURE 有权
标题翻译：具有网络结构纳米的纳米传感器
公开(公告)号：US20140034907A1
公开(公告)日：2014-02-06
申请号：US14111727
申请日：2012-03-19
申请人： Jeong Soo Lee , Yoon Ha Jeong , Tai Uk Rim , Chang Ki Baek , Sung Ho Kim , Ki Hyun Kim
发明人： Jeong Soo Lee , Yoon Ha Jeong , Tai Uk Rim , Chang Ki Baek , Sung Ho Kim , Ki Hyun Kim
IPC分类号： H01L29/775 , H01L29/66
CPC分类号： H01L29/775 , B82Y40/00 , G01N27/06 , G01N27/3278 , G01N33/48707 , H01L29/66477
摘要： A nanowire sensor having a nanowire in a network structure includes: source and drain electrodes formed over a substrate; a nanowire formed between the source and drain electrodes and having a network structure in which patterns of intersections are repeated; and a detection material fixed to the nanowire and selectively reacting with a target material introduced from outside.
摘要翻译：具有网络结构中的纳米线的纳米线传感器包括：形成在衬底上的源极和漏极; 在源极和漏极之间形成的纳米线，并且具有重复相交图案的网络结构; 以及固定在纳米线上并与从外部导入的靶材料选择性反应的检测材料。

28. 发明授权

US08596509B2 High speed and fine substrate alignment apparatus in roll to roll system 有权
标题翻译：卷对卷系统中高速精细的基板对准装置
公开(公告)号：US08596509B2
公开(公告)日：2013-12-03
申请号：US12461061
申请日：2009-07-30
申请人： Dong Min Kim , Sin Kwon , Young Tae Cho , Jung Woo Seo , Ki Keon Yeom , Ki Hyun Kim
发明人： Dong Min Kim , Sin Kwon , Young Tae Cho , Jung Woo Seo , Ki Keon Yeom , Ki Hyun Kim
IPC分类号： B65H23/038 , B65H23/192 , B65H27/00
CPC分类号： B65H23/26 , B65H2301/511 , B65H2555/14
摘要： Disclosed is a substrate alignment apparatus capable of performing coarse and fine alignments of a substrate in a progressing route to remove or reduce an alignment error between the substrate and a pattern roll. The coarse alignment may be performed by moving a frame using a stage when the alignment error is relatively large, and the fine alignment may be performed by moving subsidiary rollers of a roller unit relative to a main roller of a roller unit when the alignment error is relatively small. An example substrate alignment apparatus may include a frame and a roller unit rotatably fixed to the frame to support a substrate, wherein the roller unit includes a main roller, and at least one subsidiary roller fixed to the main roller such that the at least one subsidiary roller can move relative to the main roller to align the substrate.
摘要翻译：公开了一种基板对准装置，其能够在进行中的路线中执行基板的粗略和精细对准以去除或减小基板和图案辊之间的对准误差。当对准误差相对较大时，可以通过使用阶段移动框架来执行粗略对准，并且当对准误差为对准误差时，可以通过相对于辊单元的主辊移动辊单元的辅助辊来执行精细对准比较小示例性基板对准装置可以包括框架和滚子单元，其可旋转地固定到框架以支撑基板，其中滚子单元包括主辊，以及至少一个辅助辊，其固定到主辊，使得至少一个附属辊可以相对于主辊移动以对准衬底。

29. 发明申请

US20130126746A1 ARRAY OF VIRTUAL FRISCH-GRID DETECTORS WITH COMMON CATHODE AND REDUCED LENGTH OF SHIELDING ELECTRODES 有权
标题翻译：具有通用阴极的虚拟自动检测器阵列和屏蔽电极长度减小的阵列
公开(公告)号：US20130126746A1
公开(公告)日：2013-05-23
申请号：US13695899
申请日：2011-05-02
申请人： Aleksey E. Bolotnikov , Ge Yang , Giuseppe Camarda , Yonggang Cui , Anwar Hossain , Ki Hyun Kim , Ralph B. James
发明人： Aleksey E. Bolotnikov , Ge Yang , Giuseppe Camarda , Yonggang Cui , Anwar Hossain , Ki Hyun Kim , Ralph B. James
IPC分类号： G01T1/24
CPC分类号： G01T1/241 , G01T1/247 , G01T1/2928 , H01L31/115
摘要： A novel radiation detector system is disclosed that solves the electron trapping problem by optimizing shielding of the individual virtual Frisch-grid detectors in an array configuration.
摘要翻译：公开了一种新颖的辐射探测器系统，其通过优化阵列配置中的各个虚拟棱镜检测器的屏蔽来解决电子俘获问题。

30. 发明授权

US08424487B2 Roll-to-roll patterning apparatus and patterning system having the same 有权
标题翻译：卷对卷图案装置和具有该图案的图案形成系统
公开(公告)号：US08424487B2
公开(公告)日：2013-04-23
申请号：US12662677
申请日：2010-04-28
申请人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
发明人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
IPC分类号： B05C11/00 , B05C1/00 , B05C1/06
CPC分类号： B65H23/038 , B05C5/0241 , B05D1/40 , B05D3/067 , B65H2301/5114 , B65H2301/5126 , B65H2404/15212
摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
摘要翻译：本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。图案辊可以包括具有第一图案的外周表面。多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

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