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21. 发明申请

US20140190581A1 RAW MATERIAL GAS SUPPLY APPARATUS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT 有权
标题翻译：用于半导体制造设备的原料气供应装置
公开(公告)号：US20140190581A1
公开(公告)日：2014-07-10
申请号：US14150263
申请日：2014-01-08
申请人： FUJIKIN INCORPORATED
发明人： Masaaki Nagase , Atsushi Hidaka , Kaoru Hirata , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/448
CPC分类号： C23C16/448 , C23C16/4485 , C23C16/45561 , C23C16/52 , Y10T137/86485
摘要： A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.
摘要翻译：原料气体供给装置包括液体原料气体供给源，储存液体原料的源罐，将来自液体原料的含有液体原料蒸汽的原料气体从原料罐供给到处理室的气体分配通路，安装在所述气体通路的上游侧的自动压力调节器，其中，所述自动压力调节器使所述原料气体的供给压力保持在设定值，所述供给气体切换阀安装在所述气体通路的下游侧，打开和关闭气体通道，设置在阀的入口侧或出口侧中的至少一个上的孔，其中孔口调节原料气体的流速，恒温加热装置加热源罐，气体通道，阀门和孔口达到设定温度。

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