专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明申请

US20080038456A1 Method of covering clear aperture of optic during deposition of glue protection layer 审中-公开
标题翻译：在胶保护层沉积期间覆盖光学透明孔的方法
公开(公告)号：US20080038456A1
公开(公告)日：2008-02-14
申请号：US11826197
申请日：2007-07-12
申请人： Matthew Lipson
发明人： Matthew Lipson
IPC分类号： B05D5/06
CPC分类号： B05D1/322
摘要： A system and method that can be used to cover a portion (e.g., a clear aperture) of an optical element (e.g., a lens) during coating of another portion (e.g., a circumferential portion) of the optical element. This can be done to protect the clear aperture during coating of an adhesive protection layer proximate a circumferential edge of the lens without damaging or altering the clear aperture. The method can include the following steps. An optical element is held so that a first portion of the optical element is covered and a second portion of the optical element is exposed. A first coating is provided on the second portion of the optical element. The optical element is released from being held. A second coating is provided on the optical element. The first and second coatings are removed from the second portion of the optical element.
摘要翻译：一种可用于在光学元件的另一部分（例如，圆周部分）的涂覆期间覆盖光学元件（例如，透镜）的部分（例如，透明孔径）的系统和方法。这可以在粘合剂保护层在透镜的周缘边缘附近的涂覆期间保护透明孔径而不损坏或改变透明孔径。该方法可以包括以下步骤。保持光学元件使得光学元件的第一部分被覆盖，并且光学元件的第二部分被暴露。第一涂层设置在光学元件的第二部分上。光学元件被释放而不被保持。在光学元件上设置第二涂层。从光学元件的第二部分去除第一和第二涂层。

22. 发明授权

US06574174B1 Optical data storage system with multiple layer media 失效
标题翻译：具有多层介质的光数据存储系统
公开(公告)号：US06574174B1
公开(公告)日：2003-06-03
申请号：US09549075
申请日：2000-04-15
申请人： James R. Amble , Lambrerrtus Hesselink , Tokyuki Honda , Mark E. McDonald , Michael V. Morelli , Andrew J. Daiber , Herman A. Ferrier , Sanjoy Ghose , Thomas A. Kridl , Matthew Lipson , Shunichi Nishimura , Sergei Sochava , LeRoy A. Volz
发明人： James R. Amble , Lambrerrtus Hesselink , Tokyuki Honda , Mark E. McDonald , Michael V. Morelli , Andrew J. Daiber , Herman A. Ferrier , Sanjoy Ghose , Thomas A. Kridl , Matthew Lipson , Shunichi Nishimura , Sergei Sochava , LeRoy A. Volz
IPC分类号： G11B700
CPC分类号： G11B7/0065 , G11B7/007 , G11B7/0938 , G11B7/24 , G11B7/2433 , G11B7/245 , G11B7/246 , G11B7/2472 , G11B7/252 , G11B7/2595 , G11B2007/0013
摘要： An optical information storage system using optical storage media including multiple data layers or stacks wherein each of the multiple data stacks has a storage density comparable to a conventional single layer optical disk. The optical data storage system comprises an optical medium having a single dedicated servo layer and multiple data stacks which each contain an embedded servo format, a servo laser beam positioned to maintain a first focus point on the dedicated servo reference layer, a read-write laser beam positioned to maintain a second focus point on one of the data stacks, a first, dedicated servo system which provides focus and tracking error correction according to error signals generated from the dedicated servo layer, and a second, embedded servo system which provides focus and tracking error correction according to error signals generated from the data stacks. The dedicated servo layer, in different embodiments of the invention, may be positioned either below or above the data stacks in the optical medium, or interposed between data stacks. The data stacks may comprise discrete physical data layers or “virtual” data layers defined by a format hologram. The servo and read-write lasers may differ in wavelength and/or polarization.
摘要翻译：一种使用包括多个数据层或堆叠的光学存储介质的光学信息存储系统，其中多个数据堆栈中的每一个具有与常规单层光盘相当的存储密度。光学数据存储系统包括具有单个专用伺服层的光学介质和各自包含嵌入式伺服格式的多个数据堆栈，定位成将第一焦点保持在专用伺服参考层上的伺服激光束，读写激光器光束定位成在数据堆叠之一上保持第二焦点，第一专用伺服系统，其根据从专用伺服层产生的误差信号提供聚焦和跟踪误差校正;以及第二嵌入式伺服系统，其提供焦点和根据从数据堆产生的误差信号进行跟踪误差校正。在本发明的不同实施例中的专用伺服层可以位于光学介质中的数据堆的下方或上方，或者位于数据堆之间。数据堆可以包括由格式全息图定义的离散物理数据层或“虚拟”数据层。伺服和读写激光器的波长和/或极化可能不同。

23. 发明授权

US06512606B1 Optical storage media and method for optical data storage via local changes in reflectivity of a format grating 有权
标题翻译：用于光学数据存储的光存储介质和方法，通过格式光栅的反射率的局部变化
公开(公告)号：US06512606B1
公开(公告)日：2003-01-28
申请号：US09364324
申请日：1999-07-29
申请人： Matthew Lipson , Sergei Sochava , Lambertus Hesselink , Brian H. Cumpston , Robert R. MeLeod , Charles D. Claude
发明人： Matthew Lipson , Sergei Sochava , Lambertus Hesselink , Brian H. Cumpston , Robert R. MeLeod , Charles D. Claude
IPC分类号： G03H118
CPC分类号： B82Y10/00 , C01P2004/64 , C09C1/56 , G03F7/001 , G03H2001/0264 , G03H2001/303 , G11B7/00455 , G11B7/0052 , G11B7/0065 , G11B7/24 , G11B7/26
摘要： An optical data storage system and method comprising a photopolymer medium having generally a polymerizable monomer, an active binder, a first, hologram recording polymerization initiator, and a second, data writing polymerization initiator. The monomer is preferably a cationic ring-opening monomer. The hologram recording polymerization initiator preferably comprises a sensitizer and photoacid generator which initiate a first polymerization in the medium which defines a format hologram. The format hologram recording is carried out via interference of a signal and reference beam, with the sensitizer being specific for the wavelength(s) of the signal and reference beams. The hologram recording polymerization is only partial and does not consume all of the monomer present in the photopolymer medium. A second stage, a data writing polymerization initiator, specific to a data writing beam, locally advances polymerization at selected data storage locations to alter the previously recorded format hologram, resulting in optical data storage as localized alterations in the format hologram.
摘要翻译：一种光学数据存储系统和方法，其包括通常具有可聚合单体的光聚合物介质，活性粘合剂，第一全息记录聚合引发剂和第二数据书写聚合引发剂。单体优选为阳离子开环单体。全息记录聚合引发剂优选包括敏化剂和光致酸产生剂，其在介质中引发第一次聚合，其定义格式全息图。格式全息图记录通过信号和参考光束的干涉进行，敏化剂特定于信号和参考光束的波长。全息记录聚合仅仅是部分的，并且不消耗光聚合物介质中存在的所有单体。第二阶段，特定于数据写入光束的数据写入聚合引发器在选定的数据存储位置局部地前进聚合以改变先前记录的格式全息图，导致光学数据存储为格式全息图中的局部改变。

24. 发明授权

US09330912B2 Lithographic apparatus, fluid combining unit and device manufacturing method 有权
标题翻译：光刻设备，流体组合单元和器件制造方法
公开(公告)号：US09330912B2
公开(公告)日：2016-05-03
申请号：US13238941
申请日：2011-09-21
申请人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
发明人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
IPC分类号： G03B27/52 , G03B27/42 , H01L21/027 , G03F7/20
CPC分类号： H01L21/0274 , G03F7/70341
摘要： A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译：公开了一种用于调节浸没式光刻设备中浸没液的折射率的系统。将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。此外，流体可以被调节和处理以保持光学特性。

25. 发明申请

US20130308116A1 ELECTROSTATIC CLAMP, LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP 有权
标题翻译：静电夹，光刻胶及其制造方法
公开(公告)号：US20130308116A1
公开(公告)日：2013-11-21
申请号：US13991089
申请日：2011-09-21
申请人： Peter Richard Helmus , Matthew Lipson , Ronald A. Wilklow , James Kennon , Kennard White , Wilbur Jordan Reichmann, II
发明人： Peter Richard Helmus , Matthew Lipson , Ronald A. Wilklow , James Kennon , Kennard White , Wilbur Jordan Reichmann, II
IPC分类号： G03F7/20 , H02N13/00
CPC分类号： G03F7/70708 , G03F7/70691 , H01L21/6833 , H02N13/00
摘要： An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
摘要翻译：用于光刻设备的静电夹具包括毛刺和由绝缘体和/或相邻毛边之间的介电材料包围的电极。在一个实施例中，两层或更多层电介质材料设置在相邻的孔之间并且围绕设置在相邻的孔之间的电极。静电夹可用于将物体夹持在光刻设备中的物体支撑件上。

26. 发明授权

US08045135B2 Lithographic apparatus with a fluid combining unit and related device manufacturing method 有权
标题翻译：具有流体组合单元和相关器件制造方法的平版印刷设备
公开(公告)号：US08045135B2
公开(公告)日：2011-10-25
申请号：US11603255
申请日：2006-11-22
申请人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
发明人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： H01L21/0274 , G03F7/70341
摘要： A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译：公开了一种用于调节浸没式光刻设备中浸没液的折射率的系统。将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。此外，流体可以被调节和处理以保持光学特性。

27. 发明授权

US07894040B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07894040B2
公开(公告)日：2011-02-22
申请号：US10957751
申请日：2004-10-05
申请人： Matthew Lipson , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
发明人： Matthew Lipson , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
摘要翻译：提供了一种光刻设备，其中通过突出通过碱金属卤化物的水溶液进行曝光，该溶液与待暴露的基板接触。

28. 发明申请

US20100128242A1 Bonding Silicon Silicon Carbide to Glass Ceramics 失效
标题翻译：将硅碳化硅结合到玻璃陶瓷
公开(公告)号：US20100128242A1
公开(公告)日：2010-05-27
申请号：US12700049
申请日：2010-02-04
申请人： Matthew Lipson , Robert D. Harned , Geoffrey O'Connor , Timothy O'Neil
发明人： Matthew Lipson , Robert D. Harned , Geoffrey O'Connor , Timothy O'Neil
IPC分类号： B05D5/10 , G03B27/58
CPC分类号： H01L21/68757 , G03F7/707 , Y10T156/10 , Y10T156/1089 , Y10T428/24744
摘要： A wafer chuck for use in a lithographic apparatus, which includes a low-thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and a bonding layer comprising silicate having a strength of at least about 5 megapascals, the bonding layer attaching the silicon silicon carbide layer to the substrate is described. Also, a method of forming a wafer chuck for use in a lithographic apparatus, which includes coating a portion of one or both of a low-thermal expansion glass ceramic substrate and a silicon silicon carbide layer with a bonding solution, and contacting the substrate and the silicon silicon carbide layer to bond the substrate and the silicon silicon carbide layer together is described.
摘要翻译：一种用于光刻设备的晶片卡盘，其包括低热膨胀玻璃陶瓷基板，硅碳化硅层和包括具有至少约5兆帕的强度的硅酸盐的粘合层，所述粘合层将硅硅描述了到基底的碳化物层。另外，一种形成用于光刻设备的晶片卡盘的方法，其包括用粘合溶液涂覆低热膨胀玻璃陶瓷基板和硅碳化硅中的一个或两个的一部分，并使基板和描述了将基板和硅碳化硅层结合在一起的硅碳化硅层。

29. 发明授权

US07678458B2 Bonding silicon silicon carbide to glass ceramics 失效
标题翻译：将硅碳化硅粘合到玻璃陶瓷上
公开(公告)号：US07678458B2
公开(公告)日：2010-03-16
申请号：US11626747
申请日：2007-01-24
申请人： Matthew Lipson , Robert D. Harned , Geoffrey O'Connor , Timothy O'Neil
发明人： Matthew Lipson , Robert D. Harned , Geoffrey O'Connor , Timothy O'Neil
IPC分类号： G21K5/00 , B32B3/20 , B32B17/06 , B32B15/00 , B32B13/04 , B32B9/04 , B32B9/00
CPC分类号： H01L21/68757 , G03F7/707 , Y10T156/10 , Y10T156/1089 , Y10T428/24744
摘要： A wafer chuck for use in a lithographic apparatus, which includes a low-thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and a bonding layer comprising silicate having a strength of at least about 5 megapascals, the bonding layer attaching the silicon silicon carbide layer to the substrate is described. Also, a method of forming a wafer chuck for use in a lithographic apparatus, which includes coating a portion of one or both of a low-thermal expansion glass ceramic substrate and a silicon silicon carbide layer with a bonding solution, and contacting the substrate and the silicon silicon carbide layer to bond the substrate and the silicon silicon carbide layer together is described.
摘要翻译：一种用于光刻设备的晶片卡盘，其包括低热膨胀玻璃陶瓷基板，硅碳化硅层和包括具有至少约5兆帕的强度的硅酸盐的粘合层，所述粘合层将硅硅描述了到基底的碳化物层。另外，一种形成用于光刻设备的晶片卡盘的方法，其包括用粘合溶液涂覆低热膨胀玻璃陶瓷基板和硅碳化硅中的一个或两个的一部分，并使基板和描述了将基板和硅碳化硅层结合在一起的硅碳化硅层。

30. 发明申请

US20080117392A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080117392A1
公开(公告)日：2008-05-22
申请号：US11603255
申请日：2006-11-22
申请人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
发明人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： Lithographic Apparatus and Device Manufacturing Method A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译：平版印刷设备和设备制造方法公开了一种用于调节浸没式光刻设备中浸没液体的折射率的系统。将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。此外，流体可以被调节和处理以保持光学特性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式