专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US09188881B2 Lithographic apparatus and method for reducing stray radiation 有权
标题翻译：用于减少杂散辐射的平版印刷设备和方法
公开(公告)号：US09188881B2
公开(公告)日：2015-11-17
申请号：US13376761
申请日：2010-05-04
申请人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Antonie Hendrik Verweij
发明人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Antonie Hendrik Verweij
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/70941 , G03F7/70066 , G03F7/70075 , G03F7/70283
摘要： A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.
摘要翻译：光刻设备包括用于提供极紫外辐射束的照明系统，用于通过辐射束控制图案形成装置的照明的掩模装置，用于支撑图案形成装置的支撑件，所述图案形成装置被配置成赋予辐射束的图案，用于保持基板的基板台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。掩模装置包括掩模刀片，该掩模刀片包括被配置为限定图案形成装置上的照明区域的边界的掩模边缘。遮蔽刀片被配置为反射入射在掩蔽刀片上的极紫外辐射，使得反射辐射的至少一部分不被投影系统捕获。

22. 发明授权

US08680493B2 Radiation conduit for radiation source 有权
标题翻译：辐射源辐射管
公开(公告)号：US08680493B2
公开(公告)日：2014-03-25
申请号：US13489096
申请日：2012-06-05
申请人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
发明人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
IPC分类号： G01J3/10
CPC分类号： G03F7/70575 , G03F7/70033 , G03F7/70891 , G21K1/02 , G21K1/067 , H05G2/003 , H05G2/008
摘要： A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
摘要翻译：辐射源包括被配置为将燃料输送到等离子体发射位置用于由激光束蒸发以形成等离子体的燃料供应器，以及收集器，其被配置为收集由等离子体发射的EUV辐射并将EUV辐射引向中间焦点。集电体包括衍射光栅，其被配置为衍射由等离子体发射的红外辐射。辐射源包括位于收集器和中间焦点之间的辐射导管。辐射导管包括通过向内渐缩的主体连接到出口孔的入口孔。辐射导管包括内部部分和外部部分，内部部分比外部部分更接近中间焦点。内部部分被配置成将入射的衍射红外辐射反射到外部。

23. 发明申请

US20120147346A1 Lithographic Apparatus and Method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20120147346A1
公开(公告)日：2012-06-14
申请号：US13279770
申请日：2011-10-24
申请人： Jan Bernard Plechelmus VAN SCHOOT , Igor Petrus Maria Bouchoms , Antonius Johannes Josephus VAN DIJSSELDONK , Markus Franciscus Antonius Eurlings
发明人： Jan Bernard Plechelmus VAN SCHOOT , Igor Petrus Maria Bouchoms , Antonius Johannes Josephus VAN DIJSSELDONK , Markus Franciscus Antonius Eurlings
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/70558 , G03B27/54 , G03B27/58 , G03F7/709
摘要： A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate.
摘要翻译：一种光刻设备，包括产生辐射束的源，支撑图案形成装置的支撑结构，用于保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。所述光刻设备还包括：振动测量装置，被配置为在所述目标部分的曝光期间测量所述图案形成装置和所述基板之间的相对振动。控制装置调节辐射束的功率，以补偿所测量的相对振动对投射到衬底上的图案的影响。

24. 发明申请

US20090174877A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20090174877A1
公开(公告)日：2009-07-09
申请号：US12406222
申请日：2009-03-18
申请人： Heine Melle MULDER , Markus Franciscus Antonius Eurlings
发明人： Heine Melle MULDER , Markus Franciscus Antonius Eurlings
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.
摘要翻译：光刻投影系统具有具有偏振构件的照明系统。多个引导元件将入射光束的不同子束反射到可调节的，可独立控制的方向。通过重新引导光学元件，可以在其横截面中产生光束的所需偏振空间强度分布。

25. 发明授权

US07525642B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07525642B2
公开(公告)日：2009-04-28
申请号：US11359765
申请日：2006-02-23
申请人： Heine Melle Mulder , Markus Franciscus Antonius Eurlings
发明人： Heine Melle Mulder , Markus Franciscus Antonius Eurlings
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.
摘要翻译：光刻投影系统具有具有偏振构件的照明系统。多个引导元件将入射光束的不同子束反射到可调节的，可独立控制的方向。通过重新引导光学元件，可以在其横截面中产生光束的所需偏振空间强度分布。

26. 发明授权

US07015491B2 Lithographic apparatus, device manufacturing method and device manufactured thereby, control system 有权
标题翻译：光刻设备，设备制造方法和由此制造的设备，控制系统
公开(公告)号：US07015491B2
公开(公告)日：2006-03-21
申请号：US10680413
申请日：2003-10-08
申请人： Markus Franciscus Antonius Eurlings , Noud Jan Gilissen
发明人： Markus Franciscus Antonius Eurlings , Noud Jan Gilissen
IPC分类号： G03B27/54
CPC分类号： G03F7/70116 , G03F7/70141 , G03F7/702 , G03F7/70291
摘要： A lithographic projection system has an illumination system. A plurality of directing elements direct different sub-beams of an incident beam into predetermined directions. By using re-directing optics any desired angular intensity distribution of the beam can be produced. The illumination system includes a setting device that includes a reflector plate that supports reflectors. The reflectors are resiliently supported on the reflector plate. At least one aperture in the reflector plate is associated with each reflector. A setting plate includes at least one pin associated with each reflector. The pins of the setting plate are insertable into the apertures of the reflector plate. Each pin or pins engages its associated reflector to control the orientation of the associated reflector by rotation about two axes substantially perpendicular to the optical axis of the associated reflector.
摘要翻译：光刻投影系统具有照明系统。多个引导元件将入射光束的不同子光束引导到预定方向。通过使用重新引导光学元件，可以产生光束的所需的角度强度分布。照明系统包括设置装置，其包括支撑反射器的反射板。反射器弹性地支撑在反射板上。反射板中的至少一个孔与每个反射器相关联。设置板包括与每个反射器相关联的至少一个销。安装板的销可插入反光板的孔中。每个销或销接合其相关联的反射器以通过围绕基本上垂直于相关联的反射器的光轴的两个轴线旋转来控制相关联的反射器的取向。

27. 发明授权

US06741329B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06741329B2
公开(公告)日：2004-05-25
申请号：US10235854
申请日：2002-09-06
申请人： Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra , Noud Jan Gilissen , Markus Franciscus Antonius Eurlings
发明人： Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra , Noud Jan Gilissen , Markus Franciscus Antonius Eurlings
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70083 , G03F7/70358 , G03F7/70558
摘要： An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.
摘要翻译：照明强度调节装置包括设置在投影光束中的多个叶片，以便投射横过照明场的半阴影。叶片可以选择性地旋转以增加它们垂直于投影光束的宽度，以控制均匀性。

28. 发明授权

US08937706B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08937706B2
公开(公告)日：2015-01-20
申请号：US11729960
申请日：2007-03-30
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译：装置制造方法包括使用照明系统来调节辐射束。调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。该方法还包括以其横截面中的图案图案化辐射束以形成图案化的辐射束，并将图案化的辐射束投影到基板的目标部分上。

29. 发明授权

US08587766B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08587766B2
公开(公告)日：2013-11-19
申请号：US12406222
申请日：2009-03-18
申请人： Heine Melle Mulder , Markus Franciscus Antonius Eurlings
发明人： Heine Melle Mulder , Markus Franciscus Antonius Eurlings
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.

30. 发明申请

US20130001442A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
标题翻译：辐射源和光刻设备
公开(公告)号：US20130001442A1
公开(公告)日：2013-01-03
申请号：US13489096
申请日：2012-06-05
申请人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
发明人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
IPC分类号： G21K5/04 , G21K5/10
CPC分类号： G03F7/70575 , G03F7/70033 , G03F7/70891 , G21K1/02 , G21K1/067 , H05G2/003 , H05G2/008
摘要： A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
摘要翻译：辐射源包括被配置为将燃料输送到等离子体发射位置用于由激光束蒸发以形成等离子体的燃料供应器，以及收集器，其被配置为收集由等离子体发射的EUV辐射并将EUV辐射引向中间焦点。集电体包括衍射光栅，其被配置为衍射由等离子体发射的红外辐射。辐射源包括位于收集器和中间焦点之间的辐射导管。辐射导管包括通过向内渐缩的主体连接到出口孔的入口孔。辐射导管包括内部部分和外部部分，内部部分比外部部分更接近中间焦点。内部部分被配置成将入射的衍射红外辐射反射到外部。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式