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21. 发明授权

US09743797B2 Portable coffee brewing device 有权
公开(公告)号：US09743797B2
公开(公告)日：2017-08-29
申请号：US15246598
申请日：2016-08-25
申请人： Brett C. Richardson
发明人： Brett C. Richardson
IPC分类号： A47J31/00 , A47J31/06 , A47J31/46 , A23F5/26 , A47J31/52 , A47J31/057
CPC分类号： A47J31/005 , A23F5/26 , A47J31/0576 , A47J31/0626
摘要： A portable coffee brewing device includes a lid pivotally connected to an upper end of the container by a hinge and button. A heating element housing and an electrical component housing is connected to a lower end of the container. A drain is positioned in a bottom wall of the container and is fluidly connected to a heating element positioned within the heating element housing. The heating element is controlled by electrical components positioned in the electrical components housing. A drip tube is fluidly connected to the heating element and the lid. A single serve coffee holding device is positioned below the lid. When the container is filled with fluid and the heating element is powered, heated fluid is forced up the drip tube through the passageway in the lid and into the coffee grounds holding device in a continuous cycle. The device is connectable to an external power source.

22. 发明授权

US09743796B2 Portable coffee brewing device 有权
公开(公告)号：US09743796B2
公开(公告)日：2017-08-29
申请号：US14585317
申请日：2014-12-30
申请人： Brett C. Richardson
发明人： Brett C. Richardson
IPC分类号： A47J31/00 , A47J31/06 , A47J31/46 , A23F5/26 , A47J31/52 , A47J31/057
CPC分类号： A47J31/005 , A47J31/0576 , A47J31/0626
摘要： A portable coffee brewing device includes a lid pivotally connected to an upper end of the container by a hinge and button. A heating element housing and an electrical component housing is connected to a lower end of the container. A drain is positioned in a bottom wall of the container and is fluidly connected to a heating element positioned within the heating element housing. The heating element is controlled by electrical components positioned in the electrical components housing. A drip tube is fluidly connected to the heating element and the lid. A single serve coffee holding device is positioned below the lid. When the container is filled with fluid and the heating element is powered, heated fluid is forced up the drip tube through the passageway in the lid and into the coffee grounds holding device in a continuous cycle. The device is connectable to an external power source.

23. 发明申请

US20150182059A1 PORTABLE COFFEE BREWING DEVICE 审中-公开
标题翻译：便携式咖啡烘焙设备
公开(公告)号：US20150182059A1
公开(公告)日：2015-07-02
申请号：US14585317
申请日：2014-12-30
申请人： Brett C. Richardson
发明人： Brett C. Richardson
IPC分类号： A47J31/00 , A47J31/06 , A47J31/46
CPC分类号： A47J31/005 , A47J31/0576 , A47J31/0626
摘要： A portable coffee brewing device includes a lid pivotally connected to an upper end of the container by a hinge and button. A heating element housing and an electrical component housing is connected to a lower end of the container. A drain is positioned in a bottom wall of the container and is fluidly connected to a heating element positioned within the heating element housing. The heating element is controlled by electrical components positioned in the electrical components housing. A drip tube is fluidly connected to the heating element and the lid. A single serve coffee holding device is positioned below the lid. When the container is filled with fluid and the heating element is powered, heated fluid is forced up the drip tube through the passageway in the lid and into the coffee grounds holding device in a continuous cycle. The device is connectable to an external power source.
摘要翻译：便携式咖啡冲泡装置包括通过铰链和按钮枢转地连接到容器的上端的盖子。加热元件壳体和电气部件壳体连接到容器的下端。排水管定位在容器的底壁中，并且流体地连接到位于加热元件壳体内的加热元件。加热元件由位于电气部件壳体中的电气部件控制。滴管与加热元件和盖子流体连接。单一咖啡保持装置位于盖的下方。当容器充满流体并且加热元件被供电时，加热的流体被迫通过盖子中的通道并且连续循环进入咖啡渣保持装置中。该设备可连接到外部电源。

24. 发明授权

US5961724A Techniques for reducing particulate contamination on a substrate during processing 失效
标题翻译：在加工过程中减少基材上的颗粒污染的技术
公开(公告)号：US5961724A
公开(公告)日：1999-10-05
申请号：US52522
申请日：1998-03-30
申请人： Farro Kaveh , Brett C. Richardson
发明人： Farro Kaveh , Brett C. Richardson
IPC分类号： H01L21/00 , C23G16/00
CPC分类号： H01L21/67017 , Y10S156/916
摘要： A substrate processing system configured for processing a substrate utilizing source gas released from at least one gas jet into a substrate processing chamber of the substrate processing system. The substrate processing system includes a first gas port configured to introduce the gas jet into the substrate processing chamber and a directional blocking wall protruding above a plane formed by the opening of the first gas port. The directional blocking wall is disposed closer to a first portion of a circumference of the first gas port than a second portion of the circumference. The first portion of the circumference is configured to be disposed toward a given portion of the substrate processing chamber when the gas distribution plate is positioned within the substrate processing chamber such that the directional blocking wall is disposed between the gas jet and the given portion of the substrate processing chamber, thereby preferentially reducing the entrainment of the gas from the given portion of the substrate processing chamber into the gas jet when the gas jet is released into the substrate processing chamber.
摘要翻译：一种衬底处理系统，被配置为使用从至少一个气体射流释放到衬底处理系统的衬底处理室中的源气体来处理衬底。基板处理系统包括：第一气体端口，被配置为将气体射流引入基板处理室;以及方向阻挡壁，其突出在由第一气体端口的开口形成的平面上方。所述方向阻挡壁比所述圆周的第二部分更靠近所述第一气体端口的圆周的第一部分设置。圆周的第一部分构造成当气体分配板位于基板处理室内时朝向基板处理室的给定部分设置，使得方向阻挡壁设置在气体射流和给定部分之间从而当气体射流被释放到衬底处理室中时，优先地将气体从衬底处理室的给定部分夹带到气体射流中。

25. 发明授权

US5916454A Methods and apparatus for reducing byproduct particle generation in a plasma processing chamber 失效
标题翻译：用于减少等离子体处理室中的副产物颗粒产生的方法和装置
公开(公告)号：US5916454A
公开(公告)日：1999-06-29
申请号：US705974
申请日：1996-08-30
申请人： Brett C. Richardson , Merrill D. Crapse , Philip Tuley
发明人： Brett C. Richardson , Merrill D. Crapse , Philip Tuley
IPC分类号： H01J37/32 , H05H1/00
CPC分类号： H01J37/32458 , H01J37/321 , H01J2237/022
摘要： A method for increasing mean time between cleans (MTBC) for a plasma processing chamber configured for running a process. The method includes specifying a minimum roughness specification for a finish of a surface of a chamber interior part configured for use within the plasma processing chamber. The minimum roughness specification is selected to promote adhesion of byproduct particles produced by the process to the surface. The method further includes specifying a maximum roughness specification for a finish of a surface of a chamber interior part. The maximum roughness specification is selected to facilitate ease of cleaning of the byproduct particles using a wet clean process. The method also includes having the chamber interior part manufactured in accordance with the minimum roughness specification and the maximum roughness specification.
摘要翻译：一种用于增加用于运行过程的等离子体处理室的清洁之间的平均时间（MTBC）的方法。该方法包括指定配置用于等离子体处理室内的室内部件的表面的最终粗糙度规格。选择最小粗糙度规格以促进由该方法产生的副产物颗粒与表面的粘附。该方法还包括规定室内部件的表面的光洁度的最大粗糙度规格。选择最大粗糙度规格以便于使用湿清洁工艺容易地清除副产物颗粒。该方法还包括具有根据最小粗糙度规格和最大粗糙度规格制造的室内部分。

26. 发明授权

US5758680A Method and apparatus for pressure control in vacuum processors 失效
公开(公告)号：US5758680A
公开(公告)日：1998-06-02
申请号：US627712
申请日：1996-03-29
申请人： Farro Frank Kaveh , Michael S. Barnes , Brett C. Richardson , Christopher H. Olson
发明人： Farro Frank Kaveh , Michael S. Barnes , Brett C. Richardson , Christopher H. Olson
IPC分类号： G05D16/20 , F17D1/16 , F16K17/34 , F17D1/18
CPC分类号： G05D16/2013 , Y10S438/909 , Y10T137/0396 , Y10T137/2572 , Y10T137/7761
摘要： A method and apparatus is disclosed for controlling the pressure of reaction chamber in wafer processing equipment. The disclosed apparatus and method uses a ballast port for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve which is located between the reaction chamber and turbo pump. The disclosed apparatus and method further introduces process gases at higher rate than set point levels to reduce the transition time or stabilization time required when raising the pressure in the reaction chamber.

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