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    • 28. 发明授权
    • Schiff base surfactants
    • 席夫碱表面活性剂
    • US4491538A
    • 1985-01-01
    • US435131
    • 1982-10-18
    • David R. McCoy
    • David R. McCoy
    • B01F17/00B01F17/16B01F17/42C08G12/00C08G12/06C09K8/584C11D1/00
    • C08G12/06B01F17/0042C08G12/00C09K8/584C11D1/008Y10S516/05
    • A novel group of surface active agents is revealed. These surface active agents are the condensation product of an aldehyde or ketone of from 9 to 20 carbon atoms with a polyoxyalkyleneamine which is an amine terminated block copolymer of oxyethylene and oxypropylene groups.The Schiff bases of the present invention are characterized by the general formula: ##STR1## In this general formula, R.sub.1 and R.sub.2 can either be hydrogen or an alkyl radical such that the sum of carbon atoms in the radical R.sub.1 --C--R.sub.2 is from 9 to 20.R.sub.3 is a radical which may be an alkyl of from 1 to 4 carbon atoms.R.sub.3 is in the alternative the radicalH.sub.2 N[CH(CH.sub.3)CH.sub.2 ]--[OCH(CH.sub.3)CH.sub.2 ].sub.y --or ##STR2## In these formulae, y has an average value of from 1 to 3 and and x has an average value of from 4 to 60 such that the amount of polyoxyethylene in the Schiff base is greater than or equal to 40 wt. %.
    • 揭示了一组新的表面活性剂。 这些表面活性剂是9-20个碳原子的醛或酮与作为胺基封端的氧乙烯和氧丙烯基的嵌段共聚物的聚氧亚烷基胺的缩合产物。 本发明的席夫碱的特征在于以下通式:在该通式中,R 1和R 2可以是氢或烷基,使得基团R 1 -C C-R 2中的碳原子的总和来自 R 3是可以是1至4个碳原子的烷基的基团。 R3代表性为H2N [CH(CH3)CH2] - [OCH(CH3)CH2] y-或在这些式中,y具有1至3的平均值,x具有平均值 为4至60,使得席夫碱中的聚氧乙烯的量大于或等于40wt。 %。