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    • 23. 发明授权
    • Semiconductor testing using electrically conductive adhesives
    • 使用导电胶的半导体测试
    • US06288559B1
    • 2001-09-11
    • US09050820
    • 1998-03-30
    • William E. BernierMichael A. GaynesWayne J. HowellMark V. PiersonAjit K. TrivediCharles G. Woychik
    • William E. BernierMichael A. GaynesWayne J. HowellMark V. PiersonAjit K. TrivediCharles G. Woychik
    • G01R3102
    • G01R31/2886H01L2224/45144H01L2224/81385H01L2224/83101H05K3/321H01L2924/00
    • A method and device for testing and burning-in semiconductor circuits. The method and device permit the entire wafer to be tested by temporarily attaching the wafer to a test substrate using electrically conductive adhesive (ECA). The ECA conforms to deviations from co-planarity of the contact points of both the wafer and test substrate while providing a quality electrical connection at each point. ECA material can be deposited on either the wafer contacts or the substrate pads. In addition, the ECA may be deposited on C4 bumps or tin-capped lead bases. Variations in the method and device include filling vias of a non-conductive interposer with ECA. The electrical connection may be enhanced by forming conductive dendrites on test pads while the ECA is deposited on the wafer contacts. To further enhance the electrical connection, the ECA material can be plasma etched to remove some of its polymer matrix and to expose the electrically conductive particles on one side and then plating with palladium. After the palladium-plated ECA is brought into contact with aluminum pads, palladium-coated aluminum pads, or even C4 solder bumps, conductive dendrites are formed on the palladium-treated ECA bumps.
    • 一种用于测试和燃烧半导体电路的方法和装置。 该方法和装置允许通过使用导电粘合剂(ECA)将晶片临时附接到测试基板来测试整个晶片。 ECA符合晶片和测试基板的接触点的共平面偏差,同时在每个点提供质量电连接。 ECA材料可以沉积在晶片触点或衬底焊盘上。 此外,ECA可以沉积在C4凸点或锡盖铅基上。 该方法和装置的变化包括用ECA填充非导电插入件的通孔。 可以通过在测试焊盘上形成导电枝晶而增加电连接,同时将ECA沉积在晶片触点上。 为了进一步增强电连接,可以对ECA材料进行等离子体蚀刻以除去其一些聚合物基质并使一面上的导电颗粒暴露,然后用钯镀覆。 在镀钯的ECA与铝焊盘,钯涂覆的铝焊盘或甚至C4焊料凸块接触之后,在钯处理的ECA凸块上形成导电枝晶。