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21. 发明申请

US20060182220A1 Efficient measurement of diffuse X-ray reflections 有权
标题翻译：扩散X射线反射的有效测量
公开(公告)号：US20060182220A1
公开(公告)日：2006-08-17
申请号：US11396719
申请日：2006-04-04
申请人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
发明人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
IPC分类号： G01N23/20
CPC分类号： G01N23/203 , G01B15/02
摘要： A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.
摘要翻译：一种用于检查具有表面层的样品的方法。该方法包括在准直的X射线束照射样品时获取样品的第一反射光谱，并且处理第一反射光谱以测量样品的漫反射特性。在用X射线的会聚束照射样品的同时获取样品的第二反射光谱。使用漫反射特性分析第二反射光谱，以确定样品的表面层的特性。

22. 发明授权

US06907108B2 Dual-wavelength x-ray monochromator 有权
标题翻译：双波长x射线单色仪
公开(公告)号：US06907108B2
公开(公告)日：2005-06-14
申请号：US10761023
申请日：2004-01-20
申请人： Boris Yokhin , Isaac Mazor , Amos Gvirtzman
发明人： Boris Yokhin , Isaac Mazor , Amos Gvirtzman
IPC分类号： G01N23/20 , G21K1/06
CPC分类号： G01N23/20
摘要： A method for testing a surface includes finding respective first and second critical angles for total external reflection of radiation from an area of the surface at first and second wavelengths. The first and second critical angles are compared to determine an orientation of a tangent to the surface in the area.
摘要翻译：用于测试表面的方法包括：在第一和第二波长处，从表面的区域发现用于辐射的全部外部反射的相应的第一和第二临界角。比较第一和第二临界角以确定该区域中与表面相切的取向。

23. 发明授权

US06389102B2 X-ray array detector 有权
标题翻译： X射线阵列检测器
公开(公告)号：US06389102B2
公开(公告)日：2002-05-14
申请号：US09409046
申请日：1999-09-29
申请人： Isaac Mazor , Amos Gvirtzman , Boris Yokhin , Ami Dovrat
发明人： Isaac Mazor , Amos Gvirtzman , Boris Yokhin , Ami Dovrat
IPC分类号： G21K106
CPC分类号： G01N23/20 , G01T1/247
摘要： Apparatus for X-ray analysis of a sample includes an X-ray source, which irradiates the sample, and an X-ray detector device, which receives X-rays from the sample responsive to the irradiation. The device includes an array of radiation-sensitive detectors, which generate electrical signals responsive to radiation photons incident thereon. Processing circuitry of the device includes a plurality of signal processing channels, each coupled to process the signals from a respective one of the detectors so as to generate an output dependent upon a rate of incidence of the photons on the respective detector and upon a distribution of the energy of the incident photons.
摘要翻译：用于样品的X射线分析的装置包括照射样品的X射线源和响应于照射而从样品接收X射线的X射线检测器装置。该装置包括辐射敏感检测器阵列，其产生响应于入射在其上的辐射光子的电信号。该设备的处理电路包括多个信号处理通道，每个信号处理通道被耦合以处理来自相应检测器之一的信号，以产生取决于相应检测器上的光子的入射速率的输出，事件光子的能量。

24. 发明授权

US6108398A X-ray microfluorescence analyzer 失效
标题翻译： X射线荧光分析仪
公开(公告)号：US6108398A
公开(公告)日：2000-08-22
申请号：US114789
申请日：1998-07-13
申请人： Isaac Mazor , Amos Gvirtzman , Boris Yokhin
发明人： Isaac Mazor , Amos Gvirtzman , Boris Yokhin
IPC分类号： G01N23/223
CPC分类号： G01N23/223 , G01N2223/076
摘要： An x-ray fluorescent analyzer and method for analyzing a sample, including an x-ray beam generator, which generates an x-ray beam incident at a spot on the sample, and creates a plurality of fluorescent x-ray photons. There are a plurality of semiconducting detectors arrayed around the spot so as to capture the fluorescent x-ray photons and in response produce a plurality of electrical pulses suitable for analysis of the sample.
摘要翻译：一种用于分析样品的X射线荧光分析仪和方法，该样品包括x射线束发生器，其产生入射在样品上的点处的X射线束，并且产生多个荧光X射线光子。阵列周围存在多个半导体检测器，以捕获荧光X射线光子，并且响应产生适于分析样品的多个电脉冲。

25. 发明授权

US06512814B2 X-ray reflectometer 有权
公开(公告)号：US06512814B2
公开(公告)日：2003-01-28
申请号：US09833902
申请日：2001-04-12
申请人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
发明人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
IPC分类号： G01T136
CPC分类号： G01T1/36
摘要： Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

26. 发明授权

US06895071B2 XRR detector readout processing 有权
标题翻译： XRR检测器读出处理
公开(公告)号：US06895071B2
公开(公告)日：2005-05-17
申请号：US10635365
申请日：2003-08-06
申请人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
发明人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
IPC分类号： G01B15/02 , G01N23/20 , G01N23/223 , G01T1/36
CPC分类号： G01T1/36
摘要： Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.
摘要翻译：反射仪装置包括：辐射源，其适于在相对于样品表面的一定范围的角度范围内辐射样品;以及检测器组件，其定位成在角度范围内接收从样品反射的辐射，并产生响应于此的信号。快门可调节地定位以拦截辐射，快门具有阻挡位置，其中阻挡在角度范围的下部的辐射，从而允许反射的辐射基本上仅在其中的较高部分范围和清晰的位置，其中该范围的下部的辐射基本上没有阻塞地达到阵列。

27. 发明授权

US06639968B2 X-ray reflectometer 有权
公开(公告)号：US06639968B2
公开(公告)日：2003-10-28
申请号：US10300504
申请日：2002-11-20
申请人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
发明人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
IPC分类号： G01N2320
CPC分类号： G01T1/36
摘要： Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

28. 发明申请

US20120140889A1 FAST MEASUREMENT OF X-RAY DIFFRACTION FROM TILTED LAYERS 有权
标题翻译：从倾斜层快速测量X射线衍射
公开(公告)号：US20120140889A1
公开(公告)日：2012-06-07
申请号：US12958420
申请日：2010-12-02
申请人： John Wall , David Jacques , Boris Yokhin , Alexander Krokhmal , Paul Ryan , Richard Bytheway , David Berman , Matthew Wormington
发明人： John Wall , David Jacques , Boris Yokhin , Alexander Krokhmal , Paul Ryan , Richard Bytheway , David Berman , Matthew Wormington
IPC分类号： G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having multiple single-crystal layers, including at least a first layer and a second layer that is formed over and tilted relative to the first layer. The X-rays that are diffracted from each of the first and second layers are sensed simultaneously while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including at least a first diffraction peak due to the first layer and a second diffraction peak due to the second layer. The diffraction spectrum is analyzed so as to identify a characteristic of at least the second layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束指向具有多个单晶层的样品的表面，所述样品具有至少第一层和形成在第一层上并相对于第一层倾斜的第二层。在将感测到的X射线分解为角度的同时，同时检测从第一和第二层中的每一个衍射的X射线，以便产生至少包括由于第一层的第一衍射峰的衍射光谱，以及由于第二层造成的第二衍射峰。分析衍射光谱以识别至少第二层的特征。

29. 发明申请

US20090074137A1 ACCURATE MEASUREMENT OF LAYER DIMENSIONS USING XRF 有权
标题翻译：使用XRF精确测量层数
公开(公告)号：US20090074137A1
公开(公告)日：2009-03-19
申请号：US12272050
申请日：2008-11-17
申请人： Dileep Agnihotri , Jeremy O'Dell , Isaac Mazor , Boris Yokhin
发明人： Dileep Agnihotri , Jeremy O'Dell , Isaac Mazor , Boris Yokhin
IPC分类号： G01N23/223
CPC分类号： G01B15/02 , G01N23/223 , G01N2223/076 , H01L22/12
摘要： A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.
摘要翻译：用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。

30. 发明授权

US07481579B2 Overlay metrology using X-rays 有权
标题翻译：使用X射线覆盖测量
公开(公告)号：US07481579B2
公开(公告)日：2009-01-27
申请号：US11389490
申请日：2006-03-27
申请人： Boris Yokhin , Isaac Mazor , Sean Jameson , Alex Dikopoltsev
发明人： Boris Yokhin , Isaac Mazor , Sean Jameson , Alex Dikopoltsev
IPC分类号： G01D18/00
CPC分类号： G03F7/70633
摘要： A method for inspection includes directing a beam of X-rays to impinge upon an area of a sample containing first and second features formed respectively in first and second thin film layers, which are overlaid on a surface of the sample. A pattern of the X-rays diffracted from the first and second features is detected and analyzed in order to assess an alignment of the first and second features.
摘要翻译：一种检查方法包括将X射线束引导到包含分别在第一和第二薄膜层上形成的第一和第二特征的样品的区域上，该第一和第二特征覆盖在样品的表面上。检测和分析从第一和第二特征衍射的X射线的图案，以评估第一和第二特征的对准。

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