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    • 29. 发明授权
    • Alignment system for use in lithography utilizing a spherical reflector
having a centered etched-on projection object
    • 使用具有中心蚀刻投影物体的球面反射器的光刻中使用的对准系统
    • US5483345A
    • 1996-01-09
    • US300649
    • 1994-09-06
    • J. Casey DonaherDavid S. HolbrookShepard D. JohnsonJames A. Sozanski
    • J. Casey DonaherDavid S. HolbrookShepard D. JohnsonJames A. Sozanski
    • G03F9/00G01B11/00
    • G03F9/70
    • A system for aligning substrates when preparing flat panel displays by lithography. A spherical reflector (imaging mirror) is used to focus a small geometric object, such as a cross, etched at the center of the reflector. The cross is projected toward a beam splitter and is then reflected onto the mirror which, in turn, images it on the surface of the substrate being used in the lithographic process. This optical system, which has a numerical aperture of about 0.05 radians, provides maximum depth of field with essentially no aberrations, and produces a relatively large probe image on a large alignment mark.The surface of the substrate carries a grid of stepped patterns as an alignment mark. The steps diffract the light received, and the diffracted light passes through a lens system to a sensor associated with the lens system. The amount of light diffracted is dependent upon where the image strikes the steps in the grid. Thus, a correlation between position and the amount of light received by the sensor exists, and, so, the substrate can be precisely aligned.
    • 用于通过光刻制备平板显示器时用于对准衬底的系统。 球形反射镜(成像镜)用于聚焦在反射体中心蚀刻的诸如十字的小几何物体。 十字架朝向分束器投影,然后被反射到反射镜上,反射镜又将其图像在用于光刻工艺的基板的表面上。 该光学系统具有大约0.05弧度的数值孔径,基本上没有像差提供最大景深,并且在大对准标记上产生相对较大的探测图像。 基板的表面带有阶梯图案格栅作为对准标记。 这些步骤衍射所​​接收的光,并且衍射光通过透镜系统到与透镜系统相关联的传感器。 衍射的光量取决于图像撞击网格中的台阶。 因此,存在位置与传感器接收的光量之间的相关性,因此可以精确地对准衬底。