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21. 发明申请

US20050167852A1 Method of manufacturing a structure having a projection 失效
标题翻译：制造具有突起的结构的方法
公开(公告)号：US20050167852A1
公开(公告)日：2005-08-04
申请号：US11068765
申请日：2005-03-02
申请人： Aya Imada , Tohru Den
发明人： Aya Imada , Tohru Den
IPC分类号： B81C1/00 , G03F7/00 , H01L23/48 , H01L23/52
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017
摘要： A method of manufacturing a structure is provided. This method include a steps of preparing a first substrate having a projection, forming a first layer on the projection, transferring the first layer to a second substrate, and removing at least apart of the second substrate.
摘要翻译：提供一种制造结构的方法。该方法包括制备具有突起的第一基板的步骤，在突起上形成第一层，将第一层转移到第二基板，以及去除第二基板的至少一部分。

22. 发明授权

US06878634B2 Structure having recesses and projections, method of manufacturing structure, and functional device 失效
标题翻译：具有凹凸的结构，制造结构的方法以及功能元件
公开(公告)号：US06878634B2
公开(公告)日：2005-04-12
申请号：US10396397
申请日：2003-03-26
申请人： Aya Imada , Tohru Den
发明人： Aya Imada , Tohru Den
IPC分类号： B81C1/00 , G03F7/00 , H01L21/311 , H01L21/302
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017
摘要： A structure having recesses and projections is provided. A method of manufacturing the structure comprises the steps of preparing a first substrate having a projection, forming a first layer on the projection, transferring the first layer to a second substrate, and forming a recessed/projected surface structure in the second substrate by using the first layer.
摘要翻译：提供具有凹凸的结构。一种制造该结构的方法包括以下步骤：制备具有突起的第一基底，在该突起上形成第一层，将该第一层转移到第二基底，以及通过使用该第二基底在第二基底中形成凹入/ 第一层

23. 发明授权

US07517554B2 Process for producing nanostructure of mixed film of Al, Si, and/or Ge 失效
标题翻译：制备Al，Si和/或Ge混合膜的纳米结构的方法
公开(公告)号：US07517554B2
公开(公告)日：2009-04-14
申请号：US11339627
申请日：2006-01-26
申请人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
发明人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
IPC分类号： C23C8/00
CPC分类号： C23C14/5873 , B82Y30/00 , C23C14/165
摘要： A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an aluminum-silicon-germanium mixed film containing silicon and germanium at a content of 20 to 70 atom % relative to aluminum, the mixed film being constituted of a matrix composed mainly of silicon and germanium in a composition ratio of SixGe1-x (0≦X≦1), and cylindrical portions mainly composed of aluminum having a diameter of not larger 30 nm in the matrix. In the process, the mixed film is formed at a film-forming rate of not higher than 150 nm/min.
摘要翻译：提供一种制造纳米结构的方法，其能够通过成膜条件控制孔径和孔间隔。该方法产生相对于铝含有20〜70原子％含有硅和锗的铝 - 硅 - 锗混合膜的纳米结构，该混合膜由组成为主要由硅和锗组成的基体构成 SixGe1-x（0 <= X <= 1）的比例，以及主要由直径不大于30nm的铝构成的圆筒部。在该过程中，以不高于150nm / min的成膜速度形成混合膜。

24. 发明申请

US20060144812A1 Process for producing structure, structure thereof, and magnetic recording medium 失效
公开(公告)号：US20060144812A1
公开(公告)日：2006-07-06
申请号：US10559966
申请日：2003-12-05
申请人： Aya Imada , Tohru Den
发明人： Aya Imada , Tohru Den
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C59/022 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： The present invention relates to a process for producing a structure having holes at prescribed positions. The structure is produced through steps of (A) providing an impressing member having protrusions, and a substrate, (B) forming a layer, on the substrate, from a material having a less strength than the impressing member, (C) forming depressions by impressing the impressing member on the layer corresponding to protrusions of the impressing member, (D) etching the layer to bare at least a part of the surface of the substrate, and (E) anodizing the substrate to form holes on the substrate.

25. 发明申请

US20060127602A1 Nanostructure and process of production thereof 失效
标题翻译：纳米结构及其生产工艺
公开(公告)号：US20060127602A1
公开(公告)日：2006-06-15
申请号：US11339627
申请日：2006-01-26
申请人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
发明人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
IPC分类号： C23C8/00
CPC分类号： C23C14/5873 , B82Y30/00 , C23C14/165
摘要： A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an aluminum-silicon-germanium mixed film containing silicon and germanium at a content of 20 to 70 atom % relative to aluminum, the mixed film being constituted of a matrix composed mainly of silicon and germanium in a composition ratio of SixGe1-x (0≦X≦1), and cylindrical portions mainly composed of aluminum having a diameter of not larger 30 nm in the matrix. In the process, the mixed film is formed at a film-forming rate of not higher than 150 nm/min.
摘要翻译：提供一种制造纳米结构的方法，其能够通过成膜条件控制孔径和孔间隔。该方法产生相对于铝含有20〜70原子％含有硅和锗的铝 - 硅 - 锗混合膜的纳米结构，该混合膜由组成为主要由硅和锗组成的基体构成 Si x 1 x x-x x（0 <= X 1 = 1）的比例，以及主要由矩阵中直径不大于30nm的铝构成的圆筒部。在该过程中，以不高于150nm / min的成膜速度形成混合膜。

26. 发明申请

US20050211663A1 Process for producing structure, process for producing magnetic recording medium, and process for producing molded product 失效
标题翻译：制造结构的方法，磁记录介质的制造方法以及制造模制品的方法
公开(公告)号：US20050211663A1
公开(公告)日：2005-09-29
申请号：US11086423
申请日：2005-03-23
申请人： Aya Imada , Tohru Den , Tatsuya Saito
发明人： Aya Imada , Tohru Den , Tatsuya Saito
IPC分类号： B82B3/00 , B44C1/22 , C01F7/02 , C23C14/58 , C25D1/10 , C25D11/04 , C25D11/18 , G11B5/855
CPC分类号： C25D1/10 , C23C14/5853 , C23C14/5873 , C25D11/045 , C25D11/18 , G11B5/855
摘要： A process for producing a structure having a porous layer is provided. The process forms the porous layer with high thickness-controllability. The process comprises steps of preparing a layered product having, on a substrate, a first nonporous layer and a second nonporous layer different in constituting material composition from the first layer; anodizing the layered product to form pores in the first nonporous layer and the second nonporous layer; and removing the second nonporous layer having pores formed therein from the layered product.
摘要翻译：提供了具有多孔层的结构体的制造方法。该方法形成具有高厚度可控性的多孔层。该方法包括以下步骤：制备在基材上具有与第一层不同的构成材料组成的第一无孔层和第二无孔层的层叠体; 阳极氧化层状产物以在第一无孔层和第二无孔层中形成孔; 并且从层叠体中除去其中形成有孔的第二无孔层。

27. 发明授权

US06932516B2 Surface optical device apparatus, method of fabricating the same, and apparatus using the same 失效
标题翻译：表面光学器件装置及其制造方法以及使用其的装置
公开(公告)号：US06932516B2
公开(公告)日：2005-08-23
申请号：US09903709
申请日：2001-07-13
申请人： Toshihiko Ouchi , Hajime Sakata , Futoshi Hirose , Aya Imada
发明人： Toshihiko Ouchi , Hajime Sakata , Futoshi Hirose , Aya Imada
IPC分类号： G02B6/42 , G02B6/36
CPC分类号： G02B6/4249
摘要： A surface optical device apparatus includes a surface optical device capable of emitting or receiving light through a surface thereof and a thick layer formed of a radiation-curable or electron-beam-curable material, such as a polymerizable resist. In the thick layer, a guide hole for inserting an end portion of a light-transmission member, such as an optical fiber, and a plastic optical fiber with a flat end face or a lens-shaped end face, therein is formed at a position corresponding to the surface of the surface optical device such that the surface optical device can be optically coupled to the light-transmission member inserted in the guide hole. The guide hole is formed in the thick layer by performing a patterning on the thick layer using photolithography to selectively harden the thick layer and developing the thick layer.
摘要翻译：表面光学器件装置包括能够通过其表面发射或接收光的表面光学器件以及由可聚合抗蚀剂等可辐射固化或电子束固化材料形成的厚层。在厚层中，形成用于插入诸如光纤的光传输构件的端部的引导孔和具有平坦端面或透镜形端面的塑料光纤，位于对应于表面光学装置的表面，使得表面光学装置可以光学耦合到插入导向孔中的光传输构件。通过使用光刻法在厚层上进行图案化以选择性地硬化厚层并显影厚层，在厚层中形成引导孔。

28. 发明授权

US06826329B2 Plastic optical fiber with a lens, light-emitting/receiving apparatus with the plastic optical fiber with a lens, and method of fabricating the plastic optical fiber with a lens 失效
标题翻译：具有透镜的塑料光纤，具有透镜的塑料光纤的发光/接收装置以及具有透镜的塑料光纤的制造方法
公开(公告)号：US06826329B2
公开(公告)日：2004-11-30
申请号：US09817141
申请日：2001-03-27
申请人： Aya Imada
发明人： Aya Imada
IPC分类号： G02B632
CPC分类号： G02B6/4204 , G02B6/02033 , G02B6/32
摘要： A plastic optical fiber with a lens of the present invention includes a plastic optical fiber including a core and a cladding, and a lens having a function of controlling light rays. The lens is formed of a material with a thermally-softening temperature higher than a thermally-softening temperature of the core of the plastic optical fiber, and the lens is integrated with the plastic optical fiber by heating and pressing the lens against an end face of the plastic optical fiber.
摘要翻译：具有本发明的透镜的塑料光纤包括具有芯和包层的塑料光纤，以及具有控制光线的功能的透镜。透镜由具有比软塑料光纤的芯的热软化温度高的材料形成，透镜与塑料光纤一体化，通过将透镜加热并按压到塑料光纤。

29. 发明授权

US08351570B2 Phase grating used to take X-ray phase contrast image, imaging system using the phase grating, and X-ray computer tomography system 失效
标题翻译：相位光栅用于采取X射线相位对比图像，成像系统使用相位光栅和X射线计算机断层扫描系统
公开(公告)号：US08351570B2
公开(公告)日：2013-01-08
申请号：US12891891
申请日：2010-09-28
申请人： Takashi Nakamura , Aya Imada
发明人： Takashi Nakamura , Aya Imada
IPC分类号： H05G1/60
CPC分类号： G21K1/06 , G21K2207/005
摘要： To provide a phase grating capable of acquiring, in photographing of an X-ray phase contrast image by use of X-ray with two wavelengths, an X-ray phase contrast image by a phase grating in the same size as when a single wavelength is used, provided is a phase grating used when an X-ray is directed to take an X-ray phase contrast image, the phase grating including a periodic structure for generating a phase difference between an X-ray transmitted through the structure and an X-ray not transmitted through the structure. The periodic structure has different periods in a plurality of directions in a same surface.
摘要翻译：为了提供一种能够通过使用具有两个波长的X射线来拍摄X射线相位对比图像的相位光栅，其具有与单个波长为相同尺寸的相位光栅的X射线相位对比图像使用的是提供了当X射线被引导以获取X射线相位对比图像时使用的相位光栅，所述相位光栅包括用于产生通过该结构透射的X射线与X射线之间的相位差的周期性结构，射线不透过结构。周期性结构在同一表面中在多个方向上具有不同的周期。

30. 发明授权

US08243879B2 Source grating for X-rays, imaging apparatus for X-ray phase contrast image and X-ray computed tomography system 有权
标题翻译： X射线源光栅，X射线相位图像成像装置和X射线计算机断层扫描系统
公开(公告)号：US08243879B2
公开(公告)日：2012-08-14
申请号：US12594243
申请日：2009-04-13
申请人： Hidenosuke Itoh , Yoshikatsu Ichimura , Takashi Nakamura , Aya Imada
发明人： Hidenosuke Itoh , Yoshikatsu Ichimura , Takashi Nakamura , Aya Imada
IPC分类号： G21K1/06 , G21K1/10 , G01T1/36 , G02B26/06 , G02F1/017
CPC分类号： G21K1/025 , G21K7/00 , G21K2207/005
摘要： A source grating for X-rays and the like which can enhance spatial coherence and is used for X-ray phase contrast imaging is provided. The source grating for X-rays is disposed between an X-ray source and a test object and is used for X-ray phase contrast imaging. The source grating for X-rays includes a plurality of sub-gratings formed by periodically arranging projection parts each having a thickness shielding an X-ray at constant intervals. The plurality of sub-gratings are stacked in layers by being shifted.
摘要翻译：提供了可以增强空间相干性并用于X射线相位成像的用于X射线等的源光栅。用于X射线的源光栅设置在X射线源和测试对象之间，并用于X射线相位成像。用于X射线的源光栅包括通过周期性地布置各自具有以恒定间隔屏蔽X射线的厚度的突出部分而形成的多个子光栅。多个子光栅通过移位而层叠。

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