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    • 29. 发明申请
    • Silicon carbide single crystals with low boron content
    • 低硼含量的碳化硅单晶
    • US20080072817A1
    • 2008-03-27
    • US11900242
    • 2007-09-11
    • Ilya ZwiebackThomas AndersonAvinash Gupta
    • Ilya ZwiebackThomas AndersonAvinash Gupta
    • C30B29/10C30B25/00
    • C30B23/00C30B29/36
    • In a crystal growth method, an enclosed growth crucible is provided inside of a growth chamber. The growth crucible has polycrystalline source material and a seed crystal disposed in spaced relation therein. The interior of the growth crucible is heated whereupon a temperature gradient forms between the source material and the seed crystal. The temperature gradient is sufficient to cause the source material to sublimate and be transported to the seed crystal where it precipitates on the seed crystal. A gas mixture is caused to flow into the growth crucible and between the polycrystalline source material and an interior surface of the growth crucible. The gas mixture reacts with an unwanted element in the body of the growth crucible to form a gaseous byproduct which then flows through the body of the growth crucible to the exterior of the growth crucible.
    • 在晶体生长方法中,在生长室的内部设置封闭的生长坩埚。 生长坩埚具有多晶源材料和间隔开设置的晶种。 加热生长坩埚的内部,由此在源材料和晶种之间形成温度梯度。 温度梯度足以使源材料升华并被输送到籽晶上,在晶种上沉淀在晶种上。 导致气体混合物流入生长坩埚中并且在多晶源材料和生长坩埚的内表面之间。 气体混合物与生长坩埚的主体中的不需要的元素反应以形成气态副产物,然后气体副产物通过生长坩埚的主体流到生长坩埚的外部。