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21. 发明授权

US06468718B1 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating 有权
标题翻译：辐射吸收聚合物，用于辐射吸收涂层的组合物，辐射吸收涂层及其作为抗反射涂层的应用
公开(公告)号：US06468718B1
公开(公告)日：2002-10-22
申请号：US09244358
申请日：1999-02-04
申请人： Wen-Bing Kang , Munirathna Padmanaban , Hatsuyuki Tanaka , Ken Kimura , Takanori Kudo , Georg Pawlowski
发明人： Wen-Bing Kang , Munirathna Padmanaban , Hatsuyuki Tanaka , Ken Kimura , Takanori Kudo , Georg Pawlowski
IPC分类号： G03C173
CPC分类号： C09D4/00 , C08F246/00 , G03F7/091 , C08F220/26 , C08F220/58 , C08F212/00
摘要： A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc., and the resulting solution is applied to a wafer and baked to form a radiation absorbing coating such as an anti-reflective coating. On this coating is coated, for example, a chemically amplified resist. This coated substrate is then exposed to deep UV rays and is developed to form a fine resist pattern excluding the influence of standing wave.
摘要翻译：一种辐射吸收聚合物，其化学键合有辐射吸收染料，该辐射吸收染料在预定波长辐射下具有高吸收性，其对基底具有良好的粘附性，并且与溶于溶剂的抗蚀剂无关的良好的薄膜形成用于光致抗蚀剂，但在烘烤后变得不溶; 公开了含有这种聚合物的辐射吸收涂层用组合物和由该组合物形成的抗反射涂层等吸收辐射涂层。辐射吸收聚合物包括共聚物，其至少包含由侧链中含有酮基和二价基团（优选亚甲基）的单体构成的重复单元，以及由含有直接键合的有机发色团的单体构成的重复单元或通过连接组到主链。将这种辐射吸收聚合物溶于醇，芳族烃，酮，酯等溶剂中，将所得溶液施加到晶片上并烘烤以形成抗辐射涂层等吸收辐射的涂层。在该涂层上涂覆例如化学放大抗蚀剂。然后将该涂覆的基材暴露于深紫外线，并显影以形成除了驻波的影响之外的精细抗蚀剂图案。

22. 发明授权

US5691100A Pattern forming material including photoacid and photobase generators for large exposure latitude 失效
标题翻译：图案形成材料包括光致酸和光碱发生器，用于大曝光宽容度
公开(公告)号：US5691100A
公开(公告)日：1997-11-25
申请号：US623735
申请日：1996-03-29
申请人： Takanori Kudo , Seiya Masuda , Yoshiaki Kinoshita , Klaus Przybilla , Natsumi Endo , Natsumi Suehiro , Hiroshi Okazaki
发明人： Takanori Kudo , Seiya Masuda , Yoshiaki Kinoshita , Klaus Przybilla , Natsumi Endo , Natsumi Suehiro , Hiroshi Okazaki
IPC分类号： G03F7/004 , G03C1/54 , G03C1/56 , G03C1/685
CPC分类号： G03F7/0045 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.
摘要翻译：提供了用于形成图案的材料，其具有宽的曝光宽容度，并且不太可能导致图案的尺寸变化随着曝光的变化。该材料包含（A）具有在活性束照射时产生酸的能力的化合物，（B）能够产生碱或增加其碱度的化合物，（C）具有至少一个键的化合物可以与酸和/或（D）不溶于水但可溶于碱性水溶液的化合物。

23. 发明授权

US5663035A Radiation-sensitive mixture comprising a basic iodonium compound 失效
标题翻译：包含碱性碘鎓化合物的辐射敏感性混合物
公开(公告)号：US5663035A
公开(公告)日：1997-09-02
申请号：US420787
申请日：1995-04-12
申请人： Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
发明人： Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045
摘要： A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.
摘要翻译：用于生产半导体元件的辐射敏感性混合物，其具有高灵敏度和高分辨率，其可以通过碱性水溶液开发，并且其基于新的概念，其中稳定的酸潜像由使用辐射分解碱。该混合物的特征在于包含作为必需组分的a）不溶于水但可溶于碱性水溶液的粘合剂; b1）具有至少一个可被酸切割的键的化合物，或b2）具有至少一个键的化合物，其通过酸与化合物a）交联; c）当照射时产生酸的化合物; 和d）碱性碘鎓化合物。

24. 发明授权

US5641594A Colored, photosensitive resin composition 失效
标题翻译：彩色，感光性树脂组合物
公开(公告)号：US5641594A
公开(公告)日：1997-06-24
申请号：US507301
申请日：1995-08-25
申请人： Takanori Kudo , Yuko Nozaki , Kazuya Nagao , Yuki Nanjo , Hiroshi Okazaki , Yoshiaki Kinoshita , Seiya Masuda , Munirathna Padmanaban , Natsumi Suehiro
发明人： Takanori Kudo , Yuko Nozaki , Kazuya Nagao , Yuki Nanjo , Hiroshi Okazaki , Yoshiaki Kinoshita , Seiya Masuda , Munirathna Padmanaban , Natsumi Suehiro
IPC分类号： G03F7/00 , G03F7/008 , G03F7/031 , G03C5/56 , G03F7/012 , G03F7/033
CPC分类号： G03F7/008 , G03F7/0007 , G03F7/031
摘要： A colored, photosensitive resin composition of a pigment dispersing-type is disclosed.The colored, photosensitive resin composition is characterized by containing (a) a polymer having alcohlic or phenolic hydroxyl groups, (b) a compound capable of producing a nitrene when irradiated with an actinic radiation, (c) a pigment, and (d) a solvent. Preferably, the composition further contains (e) a heat crosslinking agent and/or (f) a compound having a polymerizable double bond in addition to the above ingredients.According to the present invention, the production of a color filter need not be performed in an inert gas atmosphere, does not require an oxygen barrier film and does not require heating during the period of from the exposure step to the development step. Thus, the use of the composition permits the color filter production steps to be made significantly simple so that the composition provides a great value in industrial utilization.
摘要翻译： PCT No.PCT / JP94 / 02085 Sec。 371日期1995年8月25日 102（e）日期1995年8月25日PCT 1994年12月12日PCT PCT。公开号WO95 / 18399 日期：1995年7月6日公开了一种着色的颜料分散型感光性树脂组合物。着色的感光性树脂组合物的特征在于，含有（a）具有异羟基或酚羟基的聚合物，（b）当用光化辐射照射时能够产生硝酸的化合物，（c）颜料，（d）溶剂。优选地，除了上述成分之外，组合物还含有（e）热交联剂和/或（f）具有可聚合双键的化合物。根据本发明，滤色器的制造不需要在惰性气体气氛中进行，在从曝光步骤到显影步骤的期间，不需要氧阻隔膜，不需要加热。因此，使用该组合物可以使滤色器制造步骤显着简单，从而使组合物在工业应用中提供了巨大的价值。

25. 发明授权

US5498457A Magnetic recording medium having a lubricant layer comprising ionically interbonded fluoropolyethers with acidic and basic terminal groups 失效
标题翻译：磁记录介质具有润滑层，该润滑剂层包含具有酸性和碱性末端基团的离子键合的氟聚醚
公开(公告)号：US5498457A
公开(公告)日：1996-03-12
申请号：US270536
申请日：1994-07-05
申请人： Heigo Ishihara , Takanori Kudo
发明人： Heigo Ishihara , Takanori Kudo
IPC分类号： G11B5/72 , C09D171/02 , C10M105/54 , C10M105/58 , C10N40/18 , G11B5/725 , G11B5/82 , G11B5/00
CPC分类号： G11B5/725 , Y10S428/90 , Y10T428/265 , Y10T428/3154 , Y10T428/31544
摘要： A highly reliable rotary magnetic recording medium has a lubricating film layer on its surface, the lubricating film layer being composed of fluoropolyether having at least two acidic functional groups in one molecule as a lubricant and fluoropolyether having at least two basic functional groups in one molecule as another lubricant, where a stable network structure is formed on the surface of the magnetic recording medium by an appropriate combination of the lubricant having the acidic groups at the terminal ends of lubricant molecule and the lubricant having the basic groups at the terminal ends of lubricant molecule.
摘要翻译：高度可靠的旋转磁记录介质在其表面上具有润滑膜层，润滑膜层由在一个分子中具有至少两个酸性官能团的氟聚醚作为润滑剂和在一个分子中具有至少两个碱性官能团的氟聚醚组成另一种润滑剂，其中通过在润滑剂分子的末端具有酸性基团的润滑剂和在润滑剂分子的末端具有碱性基团的润滑剂的适当组合，在磁记录介质的表面上形成稳定的网络结构。

26. 发明授权

US08623589B2 Bottom antireflective coating compositions and processes thereof 有权
标题翻译：底部抗反射涂料组合物及其工艺
公开(公告)号：US08623589B2
公开(公告)日：2014-01-07
申请号：US13153765
申请日：2011-06-06
申请人： Takanori Kudo , Alberto Dioses , Edward Ng , Srinivasan Chakrapani , Munirathna Padmanaban
发明人： Takanori Kudo , Alberto Dioses , Edward Ng , Srinivasan Chakrapani , Munirathna Padmanaban
IPC分类号： G03F7/38 , G03F7/40 , C09D5/00 , G03F7/039 , G03F7/11
CPC分类号： C09D5/006 , G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
摘要翻译：本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。

27. 发明申请

US20080153032A1 Photoactive Compounds 失效
标题翻译：光活性化合物
公开(公告)号：US20080153032A1
公开(公告)日：2008-06-26
申请号：US11613403
申请日：2006-12-20
申请人： M. Dalil Rahman , Takanori Kudo
发明人： M. Dalil Rahman , Takanori Kudo
IPC分类号： G03F7/004 , G03F7/26 , C07C309/63 , C07C313/04
CPC分类号： C07C311/48 , C07C43/225 , C07C309/04 , C07C309/10 , G03F7/0045 , G03F7/0046 , G03F7/0392 , Y10S430/106 , Y10S430/111 , Y10S430/12
摘要： The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.
摘要翻译：本申请涉及下式的化合物，其中X选自CF 3，SO 3，C 4 H 9， N（SO 2 CO 2）3 N 2 SO 2， >，N（SO 2，CF 3）3，SO 3，S 3，N 3， N（SO 2）2，N（SO 2 H 2 SO 3） CF 3（CH 2）2 CF 3，CF 3 CH 2（CF 2） 2 3 3和CH 3 3 CH 2 CH 2 O（CF 3） 4 3 3。还提供了包含含有酸不稳定基团的聚合物，上述化合物和一种或多种另外的光酸产生剂的光致抗蚀剂组合物。

28. 发明申请

US20060024610A1 Photoresist compositions 有权
公开(公告)号：US20060024610A1
公开(公告)日：2006-02-02
申请号：US10909513
申请日：2004-08-02
申请人： Munirathna Padmanaban , Guanyang Lin , Takanori Kudo , Chi-Sun Hong , M. Dalil Rahman
发明人： Munirathna Padmanaban , Guanyang Lin , Takanori Kudo , Chi-Sun Hong , M. Dalil Rahman
IPC分类号： G03C1/76
CPC分类号： G03F7/0395 , Y10S430/111
摘要： The present invention provides for a photoresist composition comprising a mixture of two different copolymers.

29. 发明授权

US06991888B2 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds 有权
标题翻译：用于深紫外光刻的光致抗蚀剂组合物，其包含光活性化合物的混合物
公开(公告)号：US06991888B2
公开(公告)日：2006-01-31
申请号：US10439472
申请日：2003-05-16
申请人： Munirathna Padmanaban , Takanori Kudo , Sangho Lee , Ralph R. Dammel , M. Dalil Rahman
发明人： Munirathna Padmanaban , Takanori Kudo , Sangho Lee , Ralph R. Dammel , M. Dalil Rahman
IPC分类号： G03F7/004 , C08F2/46 , C07C53/00 , G03C5/00
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/115
摘要： The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X− is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.
摘要翻译：本发明涉及一种可用碱性水溶液显影的新型光刻胶组合物，能够在深紫外线的曝光波长下成像。本发明还涉及用于对新型光致抗蚀剂以及新型光酸产生剂进行成像的方法。新型光致抗蚀剂包含a）含有酸不稳定基团的聚合物，和b）光活性化合物的新混合物，其中该混合物包含选自结构1和2的较低吸收化合物和选自结构4和5的较高吸收化合物，其中R 1和R 2 R 5，R 6，R 7，或N R 8，R 9和R 9在本文中定义; m = 1-5; X - 是阴离子，Ar选自萘基，蒽基和结构3，其中R 30，R 31，R SUB > 32，R 33和R 34在本文中定义。

30. 发明授权

US06800416B2 Negative deep ultraviolet photoresist 失效
标题翻译：负深紫外光致抗蚀剂
公开(公告)号：US06800416B2
公开(公告)日：2004-10-05
申请号：US10042531
申请日：2002-01-09
申请人： Takanori Kudo , Munirathna Padmanaban , Ralph R. Dammel , Medhat A. Touky
发明人： Takanori Kudo , Munirathna Padmanaban , Ralph R. Dammel , Medhat A. Touky
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0046 , Y10S430/108
摘要： The present invention relates to a novel negative working deep uv photoresist that is developable in an aqueous alkaline solution, and comprises a fluorinated polymer, photoactive compound and a crosslinking agent. The photoresist composition is particularly useful for patterning with exposure wavelengths of 193 nm and 157 nm.
摘要翻译：本发明涉及一种可在碱性水溶液中显影的新型负极深紫外光致抗蚀剂，其包含氟化聚合物，光活性化合物和交联剂。光致抗蚀剂组合物特别适用于193nm和157nm的曝光波长的图形化。

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