会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 24. 发明授权
    • Selective etching of substrates with control of the etch profile
    • 通过控制蚀刻轮廓选择性蚀刻衬底
    • US07041232B2
    • 2006-05-09
    • US10081860
    • 2002-02-22
    • Alexander BietschEmmanuel DelamarcheBruno MichelHeinz SchmidMatthias Geisler
    • Alexander BietschEmmanuel DelamarcheBruno MichelHeinz SchmidMatthias Geisler
    • C09K13/00C09K13/06H01L21/306
    • H01L21/76838C23F1/02C23F1/34C23F1/40
    • A wet etching system for selectively patterning substrates having regions covered with self-assembled monolayers (SAM) thereby controlling the etch profile. The system contains a) a liquid etching solution; and b) at least one additive to the liquid etching solution having a higher affinity to the regions of the substrate covered with the SAMs than to the other regions of the substrate. Also provided is a method of selectively patterning substrates having regions covered with self-assembled monolayers (SAMs), thereby controlling the etch profile, the method consisting of the steps of a) providing a liquid etching solution; b) adding at least one additive to said etching solution having a higher affinity to the regions of the substrate covered with the SAMs than to the other regions of the substrate; and c) etching said substrate with said liquid etching solution containing at least one additive.
    • 一种湿蚀刻系统,用于选择性地图案化具有被自组装单层(SAM)覆盖的区域的衬底,从而控制蚀刻轮廓。 该系统包含a)液体蚀刻溶液; 和b)液体蚀刻溶液中至少一种添加剂对于被SAM覆盖的衬底的区域比对衬底的其它区域具有更高的亲和力。 还提供了一种选择性地图案化具有被自组装单层(SAM)覆盖的区域的衬底的方法,从而控制蚀刻轮廓,该方法包括以下步骤:a)提供液体蚀刻溶液; b)向所述衬底覆盖的所述衬底的所述区域具有比所述衬底的其它区域更高亲和力的所述蚀刻溶液中的至少一种添加剂; 和c)用含有至少一种添加剂的液体蚀刻溶液蚀刻所述基材。