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    • 22. 发明授权
    • Plasma treatment apparatus and plasma treatment method
    • 等离子体处理装置和等离子体处理方法
    • US06670766B2
    • 2003-12-30
    • US09863474
    • 2001-05-24
    • Keiichi YamazakiYukiko InookaYasushi SawadaNoriyuki TaguchiYoshiyuki NakazonoAkio Nakano
    • Keiichi YamazakiYukiko InookaYasushi SawadaNoriyuki TaguchiYoshiyuki NakazonoAkio Nakano
    • H01J724
    • H01J37/32357
    • A plasma treatment apparatus and a plasma treatment method having the capability of uniformly treating an object with plasma at a high treatment speed. This apparatus includes a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniformity mechanism for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel.
    • 一种等离子体处理装置和等离子体处理方法,其具有以高处理速度等离子体均匀地处理物体的能力。 该装置包括具有横向细长横截面的管状容器,一对电极被布置为使得当在电极之间施加AC电压和脉冲电压之一时,电流线基本上沿管状容器的轴向方向显影,a 用于向管状容器供应流光产生气体的气体供给源,用于在电极之间施加电压的电源,以在管状容器中产生多个气流拖缆;以及等离子体均匀性机构,用于使多个拖缆在横向方向上均匀 的管状容器的横向细长的横截面以从管状容器的一端提供等离子体。
    • 24. 发明授权
    • Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus
    • 使用相同的装置进行等离子体处理装置和等离子体处理方法
    • US06424091B1
    • 2002-07-23
    • US09421291
    • 1999-10-20
    • Yasushi SawadaKosuke NakamuraHiroaki KitamuraYoshitami Inoue
    • Yasushi SawadaKosuke NakamuraHiroaki KitamuraYoshitami Inoue
    • H01J724
    • H01J37/32009H01J37/32348H01J37/32541H01J37/32559H01J37/32724H05H1/2406
    • A plasma treatment apparatus capable of efficiently performing a plasma treatment to a large area of an object while preventing the occurrence of streamer discharge is provided. The apparatus includes at least one pair of electrodes, gas supply unit for supplying a gas for plasma generation to a discharge space defined between the electrodes, and an electric power supply for applying an AC voltage between the electrodes to generate plasma of the gas for plasma generation in the discharge space. At least one of the pair of electrodes has a dielectric layer at an outer surface thereof. At least one of the pair of electrodes has a curved surface jutting into the discharge space. It is preferred that the electrodes are of a cylindrical structure. In this case, it is particularly preferred that the plasma treatment apparatus further includes a coolant supply unit for supplying a coolant to the interior of the electrodes to reduce an electrode temperature during the plasma treatment.
    • 提供能够有效地对物体的大面积进行等离子体处理的等离子体处理装置,同时防止流光放电的发生。 该装置包括至少一对电极,用于将等离子体产生的气体供应到在电极之间限定的放电空间的气体供给单元和用于在电极之间施加AC电压的电源,以产生等离子体气体的等离子体 一代在放电空间。 该对电极中的至少一个在其外表面具有介电层。 所述一对电极中的至少一个具有突出到放电空间的弯曲表面。 电极优选为圆柱形结构。 在这种情况下,特别优选的是,等离子体处理装置还包括用于向电极内部供应冷却剂以在等离子体处理期间降低电极温度的冷却剂供应单元。
    • 27. 发明授权
    • Heterojunction FET with doubly-doped channel
    • 具有双掺杂沟道的异质结FET
    • US4673959A
    • 1987-06-16
    • US686661
    • 1984-12-27
    • Yasuhiro ShirakiYoshifumi KatayamaYoshimasa MurayamaMakoto MoriokaYasushi SawadaTomoyoshi MishimaTakao KurodaEiichi Maruyama
    • Yasuhiro ShirakiYoshifumi KatayamaYoshimasa MurayamaMakoto MoriokaYasushi SawadaTomoyoshi MishimaTakao KurodaEiichi Maruyama
    • H01L29/812H01L21/338H01L29/205H01L29/423H01L29/778H01L29/80
    • H01L29/42316H01L29/7781H01L29/7786
    • There is disclosed a semiconductor device comprising at least first and second semiconductor layers positioned to form a hetero-junction therebetween, such a hetero-junction being adapted to form a channel, means for controlling carriers, and source and drain areas on opposite edges of the channel, wherein the first and second semiconductor layers formed between the source and drain regions have an area containing only 10.sup.16 cm.sup.-3 or less of an impurity; the first semiconductor layer has a wider forbidden band than that of the second semiconductor layer; and further including at least one semiconductor layer having a higher activation efficiency of impurities than that of the first semiconductor layer, with such at least one semiconductor layer being located on the side of the first semiconductor layer not in contact with the second semiconductor layer. A multi-quantum well structure may be used as the higher impurity activation efficiency semiconductor layer. The electrical resistance in the semiconductor area constituting the source and drain regions can be lowered by utilizing such a higher impurity activation efficiency semiconductor layer.
    • 公开了一种半导体器件,其至少包括第一和第二半导体层,该第一和第二半导体层被定位以在它们之间形成异质结,这样的异质结适于形成沟道,用于控制载流子的装置,以及在其的相对边缘上的源极和漏极区域 沟道,其中形成在源区和漏区之间的第一和第二半导体层具有仅含有1016cm-3或更小的杂质的面积; 第一半导体层具有比第二半导体层更宽的禁带; 并且还包括至少一个具有比第一半导体层高的杂质活化效率的半导体层,这样的至少一个半导体层位于不与第二半导体层接触的第一半导体层的一侧。 可以使用多量子阱结构作为较高的杂质活化效率半导体层。 通过利用这种较高的杂质活化效率的半导体层,可以降低构成源区和漏区的半导体区的电阻。