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    • 22. 发明授权
    • Liquid crystal display device and method of fabricating the same
    • 液晶显示装置及其制造方法
    • US07342631B2
    • 2008-03-11
    • US10863235
    • 2004-06-09
    • Sang Hyun Kim
    • Sang Hyun Kim
    • G02F1/1343
    • G02F1/136227
    • A method of fabricating a liquid crystal display device includes forming a data bus line on a substrate, forming a preliminary interlayer insulating layer having a first thickness on the substrate including the data bus line, forming an interlayer insulating layer by etching the preliminary interlayer insulating layer to a second thickness less than the first thickness, the interlayer insulating layer having a planarized surface, sequentially forming a semiconductor layer, a gate insulating layer, and a gate electrode on the interlayer insulating layer, forming a passivation layer on the substrate, forming a plurality of contact holes exposing portions of the data bus line and the semiconductor layer by etching portions of the passivation layer, and forming a pixel electrode on the passivation layer.
    • 一种液晶显示装置的制造方法,其特征在于,在基板上形成数据总线,在包括所述数据总线的基板上形成具有第一厚度的预备层间绝缘层,通过蚀刻所述初始层间绝缘层 所述层间绝缘层具有平坦化表面,在所述层间绝缘层上依次形成半导体层,栅极绝缘层和栅电极,在所述基板上形成钝化层,形成所述第一厚度, 多个接触孔通过蚀刻钝化层的部分而暴露数据总线和半导体层的部分,以及在钝化层上形成像素电极。
    • 23. 发明申请
    • Plasma display panel having electrodes covered by a dielectric layer
    • 等离子体显示面板,其电极由电介质层覆盖
    • US20070228966A1
    • 2007-10-04
    • US11727475
    • 2007-03-27
    • Jung-Suk SongKi-Dong KimSeong-Hun ChooJoon-Hyeong KimSang-Hyun KimBo-Won Lee
    • Jung-Suk SongKi-Dong KimSeong-Hun ChooJoon-Hyeong KimSang-Hyun KimBo-Won Lee
    • H01J17/49
    • H01J11/38H01J9/02H01J11/12H01J2211/245H01J2211/326
    • A plasma display panel having a uniformly distributed firing voltage despite of irregular discharge gaps, the plasma display panel including a first substrate, a second substrate facing the first substrate, barrier ribs between the first and second substrates to define discharge cells, address electrodes corresponding to the discharge cells and extending in a first direction, first and second electrodes respectively extending in a second direction crossing the first direction and formed on any one of the first and second substrates, corresponding to the discharge cells, and a dielectric layer covering the first and second electrodes, where the first and second electrodes are spaced apart from each other to form a discharge gap having distances, the dielectric layer having varied permittivities according to distances of the discharge gaps to improve discharge uniformity according to the distances of the discharge gaps.
    • 一种具有均匀分布的点火电压的等离子体显示面板,尽管有不规则的放电间隙,等离子体显示面板包括第一衬底,面对第一衬底的第二衬底,第一和第二衬底之间的阻挡肋,以限定放电单元,对应于 放电单元并且沿第一方向延伸,第一和第二电极分别沿与第一方向交叉的第二方向延伸并形成在对应于放电单元的第一和第二基板中的任何一个上,以及覆盖第一和 第二电极,其中第一和第二电极彼此间隔开以形成具有距离的放电间隙,介电层根据放电间隙的距离具有不同的介电常数,以根据放电间隙的距离改善放电均匀性。
    • 26. 发明申请
    • Mask for crystallizing and method of crystallizing amorphous silicon using the same
    • 用于结晶的掩模和使用其的结晶非晶硅的方法
    • US20050095762A1
    • 2005-05-05
    • US11004102
    • 2004-12-06
    • Sang-Hyun Kim
    • Sang-Hyun Kim
    • G02F1/13H01L21/20H01L21/84
    • H01L21/0268H01L21/2026
    • A method of crystallizing amorphous silicon using a mask having a transmitting portion including a plurality of stripes, wherein end lines of at least two stripes are not collinear; and a blocking portion enclosing the plurality of stripes includes the steps of setting the mask over a substrate having an amorphous silicon layer, applying a first laser beam to a first area of the amorphous silicon layer through the mask, thereby forming a first crystallization region, moving the substrate in a first direction, thereby disposing the blocking portion of the mask over the first crystallization region, and applying a second laser beam to the first area of the amorphous silicon layer through the mask, thereby forming a second crystallization region.
    • 一种使用具有包括多个条纹的透射部分的掩模使非晶硅结晶的方法,其中至少两条条纹的端行不共线; 并且封闭多个条纹的阻挡部分包括将掩模设置在具有非晶硅层的衬底上的步骤,通过掩模将第一激光束施加到非晶硅层的第一区域,从而形成第一结晶区域, 在第一方向移动衬底,从而将掩模的阻挡部分设置在第一结晶区域上,并且通过掩模将第二激光束施加到非晶硅层的第一区域,从而形成第二结晶区域。
    • 27. 发明授权
    • Method for fabricating MOS transistor having dual gate
    • 制造具有双栅极的MOS晶体管的方法
    • US06326252B1
    • 2001-12-04
    • US09481321
    • 2000-01-11
    • Sang Hyun KimNam Hoon ChoJae Sung RohJeong Mo Hwang
    • Sang Hyun KimNam Hoon ChoJae Sung RohJeong Mo Hwang
    • H01L218238
    • H01L21/76218H01L21/823842
    • Methods of forming a MOS transistor having dual gates minimizes impurity channeling and diffusion that can occur during impurity injection and activating processes. A method of fabricating the transistor includes the steps of forming a first conduction type well and a second conduction type well in a semiconductor substrate having an isolation region and an active region formed therein. Then, a gate oxide film is formed on an entire surface of the substrate, and a polysilicon layer is deposited on the gate oxide film preferably at a temperature of about 660° C. to about 700° C. and a pressure of about 10 to about 300 Torr. Next, portions of the polysilicon layer and the gate oxide film are selectively removed to form a gate electrode on each of the wells. Impurity ions are injected, having a conduction type opposite a conduction type of the corresponding well, into an exposed surface of each of the wells, to form lightly doped impurity regions. Insulating film sidewalls are formed at sides of each of the gates. Then, first conduction type impurity ions are heavily injected into a surface of the exposed first conduction type well and into the gate electrode formed on the first conduction type well. Also, second conduction type impurity ions are heavily injected into a surface of the exposed second conduction type well and into the gate electrode formed on the second conduction type well. Next, a first heat treatment is conducted in an oxygen ambient and a second heat treatment is conducted in a nitrogen ambient, to diffuse the impurities.
    • 形成具有双栅极的MOS晶体管的方法使杂质注入和激活过程中可能发生的杂质沟道和扩散最小化。 制造晶体管的方法包括以下步骤:在其中形成有隔离区域和有源区域的半导体衬底中形成第一导电类型阱和第二导电类型阱。 然后,在基板的整个表面上形成栅极氧化膜,优选在约660℃〜约700℃的温度和约10〜10℃的压力下,在栅极氧化膜上沉积多晶硅层 约300乇。 接下来,选择性地去除多晶硅层和栅极氧化物膜的部分以在每个阱上形成栅电极。 将具有与相应的阱的导电类型相反的导电类型的杂质离子注入每个阱的暴露表面,以形成轻掺杂杂质区。 绝缘膜侧壁形成在每个栅极的侧面。 然后,第一导电型杂质离子被重度地注入到暴露的第一导电类型阱的表面中并进入形成在第一导电类型阱上的栅电极中。 此外,第二导电型杂质离子被严重地注入到暴露的第二导电类型阱的表面中并进入形成在第二导电类型阱上的栅电极中。 接下来,在氧环境中进行第一热处理,并且在氮气环境中进行第二热处理以扩散杂质。
    • 30. 发明申请
    • METHOD AND APPARATUS FOR ESTIMATING 3D POSITION AND ORIENTATION THROUGH SENSOR FUSION
    • 通过传感器融合估算3D位置和方位的方法和装置
    • US20120330594A1
    • 2012-12-27
    • US13465428
    • 2012-05-07
    • Hyong Euk LEESang Hyun KIMWon Chul BangChang Kyu CHOI
    • Hyong Euk LEESang Hyun KIMWon Chul BangChang Kyu CHOI
    • G06F15/00
    • G01S5/163G01S5/16
    • An apparatus and method for estimating a three-dimensional (3D) position and orientation based on a sensor fusion process is provided. The method of estimating the 3D position and orientation may include estimating a strength-based position and a strength-based orientation of a remote apparatus when a plurality of strength information is received, based on an attenuation characteristic of a strength that varies based on a distance and orientation, estimating an inertia-based position and an inertia-based orientation of the remote apparatus by receiving a plurality of inertial information, and estimating a fused position based on a weighted-sum of the strength-based position and the inertia-based position, and to estimate a fused orientation based on a weighted-sum of the strength-based orientation and the inertia-based orientation. The strength-based position and the strength-based orientation may be estimated based on a plurality of adjusted strength information from which noise is removed using a plurality of previous strength information.
    • 提供了一种用于基于传感器融合处理来估计三维(3D)位置和取向的装置和方法。 估计3D位置和取向的方法可以包括基于基于距离变化的强度的衰减特性来估计接收到多个强度信息时的远程装置的基于强度的位置和基于强度的取向 和取向,通过接收多个惯性信息来估计远程装置的基于惯量的位置和基于惯量的取向,并且基于基于强度的位置和基于惯量的位置的加权和来估计融合位置 并且基于基于强度的取向和基于惯性的取向的加权和来估计融合取向。 基于强度的位置和基于强度的取向可以基于使用多个先前的强度信息从其中去除噪声的多个调整的强度信息来估计。