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    • 26. 发明申请
    • Poly(hydroxystyrene) stain resist
    • 聚(羟基苯乙烯)防污
    • US20070096052A1
    • 2007-05-03
    • US11261312
    • 2005-10-28
    • Steven ShueyStephen JacobsonMelea LangleyPeter MurphyMukesh Shah
    • Steven ShueyStephen JacobsonMelea LangleyPeter MurphyMukesh Shah
    • D06M15/643
    • D06M15/227C08F8/36C08F8/44D06M15/233D06M15/263D06M15/285D06M15/31C08F112/14C08F212/14C08F2220/1825
    • A composition for use as a stain blocker and a method of treating substrates therewith, said composition comprising a polymer of Formula 1 having the following repeating units in random sequence wherein R1 is H, methyl or ethyl; R2 and R3 are each independently H, C1 to about C10 alkyl, —COOR4, CONR5R6, or —CN; R4 is M, C1 to about C20 alkyl, or C6 to C10 aryl; R5 and R6 are each independently H, C1 to C10 alkyl, C6 to C10 aryl, or R5 and R6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring; R7 is a C4 to C8 alkyl group; M is H, an alkali metal or alkali earth metal; h is about 10 to 100 mole %; i is 0 to about 80 mole %; j is 0 to about 60 mole %; k and n are each independently 0 to about 40 mole %; and m is 0.01 to about 0.5; provided that h+i+j+k+n equals 100, and provided that i+j+k+n is greater than zero, except when h is 100%.
    • 用作污渍阻滞剂的组合物及其处理底物的方法,所述组合物包含具有以下无规顺序的重复单元的式1的聚合物,其中R 1是H,甲基或乙基; R 2和R 3各自独立地为H,C 1〜C 10烷基,-COOR 4 ,CONR< 5< 6< 6>或-CN; R 4是M,C 1〜C 20 C 20烷基,或C 6〜C 10 芳基; R 5和R 6各自独立地为H,C 1至C 10烷基,C 6 C 10芳基或R 5和R 6与氮原子一起形成吗啉,吡咯烷或哌啶环 ; R 7是C 8-14烷基的C 4-14烷基; M是H,碱金属或碱土金属; h为约10至100摩尔%; i为0至约80摩尔%; j为0至约60摩尔%; k和n各自独立地为0至约40摩尔%; m为0.01〜0.5; 只要h + i + j + k + n等于100,并且除了当h为100%时,i + j + k + n大于零。