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21. 发明授权

US5292261A Terminal retainer for connector 失效
标题翻译：连接器端子保持架
公开(公告)号：US5292261A
公开(公告)日：1994-03-08
申请号：US608586
申请日：1990-10-31
申请人： Seiji Hirano , Kenji Takenouchi , Toshihiko Makita
发明人： Seiji Hirano , Kenji Takenouchi , Toshihiko Makita
IPC分类号： H01R13/436
CPC分类号： H01R13/4368
摘要： In a connector system comprising a connector housing having a terminal chamber, a terminal member to be inserted into the terminal chamber, and a terminal retainer to be coupled to a rear portion of the connector housing in two stages, namely, in a first-step engagement and a second-step engagement, the terminal retainer comprising flexible pins extending toward the front side in the terminal chamber, the flexible retainer comprising an engaging end portion capable of being restored to an advance path of the terminal member, and the terminal chamber provided with a stopper for detecting unsatisfactory insertion of the terminal member, the stopper located on the front side of the flexible engaging end of the terminal retainer in the first-step engagement, the engaging end portion, when not restored due to unsatisfactory insertion of the terminal member, making abutting engagement with the stopper when the terminal retainer is tried to be moved to the second-step engagement.
摘要翻译：在具有连接器壳体的连接器系统中，该连接器壳体具有端子室，待插入到端子室中的端子构件和端子保持器，以两级连接到连接器壳体的后部，即第一步接合和第二阶段接合，所述端子保持器包括在端子室中朝向前侧延伸的柔性销，所述柔性保持器包括能够恢复到端子构件的前进路径的接合端部，并且提供端子室具有用于检测端子构件的不令人满意的插入的止动件，位于端子保持器的柔性接合端的前侧的止动件处于第一阶段接合中，接合端部在由于端子的不良插入而不能恢复时当终端保持器被试图移动到第二阶段接合时，与止动件邻接接合。

22. 外观设计

USD330886S Electrical connector housing 失效
公开(公告)号：USD330886S
公开(公告)日：1992-11-10
申请号：US541241
申请日：1990-06-20
申请人： Kenji Takenouchi , Makoto Yamanashi
设计人： Kenji Takenouchi , Makoto Yamanashi

23. 外观设计

USD323150S Electrical connector housing 失效
公开(公告)号：USD323150S
公开(公告)日：1992-01-14
申请号：US454863
申请日：1989-12-20
申请人： Kenji Takenouchi , Makoto Yamanashi
设计人： Kenji Takenouchi , Makoto Yamanashi

24. 外观设计

USD323149S Electrical connector housing 失效
公开(公告)号：USD323149S
公开(公告)日：1992-01-14
申请号：US452463
申请日：1989-12-20
申请人： Kenji Takenouchi , Makoto Yamanashi
设计人： Kenji Takenouchi , Makoto Yamanashi

25. 外观设计

USD322957S Electrical connector housing 失效
公开(公告)号：USD322957S
公开(公告)日：1992-01-07
申请号：US453464
申请日：1989-12-20
申请人： Kenji Takenouchi , Makoto Yamanashi
设计人： Kenji Takenouchi , Makoto Yamanashi

26. 外观设计

USD319215S Electrical connector housing 失效
公开(公告)号：USD319215S
公开(公告)日：1991-08-20
申请号：US297362
申请日：1989-01-17
申请人： Kenji Takenouchi , Toshihiko Makita , Teruhisa Norizuki
设计人： Kenji Takenouchi , Toshihiko Makita , Teruhisa Norizuki

27. 外观设计

USD318846S Electrical connector housing 失效
公开(公告)号：USD318846S
公开(公告)日：1991-08-06
申请号：US297513
申请日：1989-01-17
申请人： Kenji Takenouchi , Toshihiko Makita , Teruhisa Norizuki
设计人： Kenji Takenouchi , Toshihiko Makita , Teruhisa Norizuki

28. 发明申请

US20070186484A1 Metal-polishing liquid and chemical mechanical polishing method using the same 失效
标题翻译：金属抛光液和化学机械抛光方法使用相同
公开(公告)号：US20070186484A1
公开(公告)日：2007-08-16
申请号：US11699406
申请日：2007-01-30
申请人： Katsuhiro Yamashita , Kenji Takenouchi , Tomoo Katou , Yoshinori Nishiwaki , Mihoko Ishima
发明人： Katsuhiro Yamashita , Kenji Takenouchi , Tomoo Katou , Yoshinori Nishiwaki , Mihoko Ishima
IPC分类号： B24D3/02
CPC分类号： C09G1/02 , C09K3/1445 , C09K3/1463 , H01L21/3212
摘要： The invention provides a metal polishing liquid comprising an oxidizing agent and colloidal silica in which a part of a surface of the colloidal silica is covered with aluminum atoms, and a Chemical Mechanical Polishing method using the same. An amino acid, a compound having an isothiazoline-3-one skeleton, an organic acid, a passivated film forming agent, a cationic surfactant, a nonionic surfactant, and a water-soluble polymer may be contained. A metal polishing liquid which is used in Chemical Mechanical Polishing in manufacturing of a semiconductor device, attains low dishing of a subject to be polished, and can perform polishing excellent in in-plane uniformity of a surface to be polished.
摘要翻译：本发明提供了一种金属抛光液，其包含氧化剂和胶体二氧化硅，其中胶体二氧化硅的一部分表面被铝原子覆盖，并使用化学机械抛光方法。可以包含氨基酸，具有异噻唑啉-3-酮骨架的化合物，有机酸，钝化成膜剂，阳离子表面活性剂，非离子表面活性剂和水溶性聚合物。在半导体装置的制造中使用的化学机械抛光中使用的金属研磨液，能够使被研磨对象的低凹陷，能够进行抛光面的面内均匀性优异的抛光。

29. 发明授权

US5968783A Process for the preparation of sugar nucleotides 失效
标题翻译：制备糖核苷酸的方法
公开(公告)号：US5968783A
公开(公告)日：1999-10-19
申请号：US43175
申请日：1998-03-16
申请人： Kazuya Ishige , Kenji Takenouchi
发明人： Kazuya Ishige , Kenji Takenouchi
IPC分类号： C12P19/30 , C12N1/18 , C12P19/00 , C12P19/28
CPC分类号： C12P19/30
摘要： The present invention relates to a process for preparing sugar nucleotides from nucleotides and sugar derivatives by the use of yeast, characterized in that the reactions are conducted at 20.degree. C. or below. According to this process, even when the preparation is conducted on an enlarged scale, a reduction in the yield of a sugar nucleotide can be inhibited by a very simple means; lowering the reaction temperature 20.degree. C. or below. Thus, the process is an extremely practical one applicable to the mass-production of sugar nucleotides.
摘要翻译： PCT No.PCT / JP97 / 02387第 371日期：1998年3月16日 102（e）1998年3月16日PCT 1997年7月10日PCT公布。第WO98 / 02566号公报日期1998年1月22日本发明涉及通过使用酵母从核苷酸和糖衍生物制备糖核苷酸的方法，其特征在于反应在20℃以下进行。根据该方法，即使在制剂进行扩大的情况下，也可以通过非常简单的手段抑制糖核苷酸的收率降低; 降低反应温度20℃以下。因此，该方法是适用于大量生产糖核苷酸的非常实用的方法。

30. 发明授权

US5387293A Copper base alloys and terminals using the same 失效
标题翻译：铜基合金和使用其的端子
公开(公告)号：US5387293A
公开(公告)日：1995-02-07
申请号：US36489
申请日：1993-03-24
申请人： Takayoshi Endo , Kenji Takenouchi , Mikio Nishihata , Toshio Asano , Akira Sugawara
发明人： Takayoshi Endo , Kenji Takenouchi , Mikio Nishihata , Toshio Asano , Akira Sugawara
IPC分类号： C22F1/08 , C22C9/02
CPC分类号： C22F1/08 , C22C9/02 , C22C9/06
摘要： A copper base alloy for terminals that is of the Cu-Ni-Sn-P or Cu-Ni-Sn-P-Zn system and that has a tensile strength of at least 50 kgf/mm.sup.2, a spring limit of at least 40 kgf/mm.sup.2, a stress relaxation of not more than 10% and a conductivity of at least 30% IACS is provided. Terminals the spring portion or the entire part of which is produced from that copper base alloy, having an insertion/extraction force of 0.2-3 kgf and a resistance of not more than 3 m.OMEGA. at low voltage and current as initial performance, with the added characteristic that the terminals will experience not more than 20% stress relaxation are also provided. The alloy is superior to the conventional bronze, phosphor bronze and Cu-Sn-Fe-P alloys for terminals in terms of tensile strength, spring limits, stress relaxation characteristic and conductivity and, hence, the terminals manufactured from those alloys have higher performance and reliability than the terminals made of the conventional copper base alloys for terminals.
摘要翻译：用于Cu-Ni-Sn-P或Cu-Ni-Sn-P-Zn系的端子用铜基合金，其拉伸强度为至少50kgf / mm 2，弹簧极限为至少40kgf / mm2，应力松弛不大于10％，电导率至少为30％IACS。端子弹簧部分或其整个部分由该铜基合金制成，其具有0.2-3kgf的插入/拉伸力和在低电压和电流下不超过3m欧姆电阻作为初始性能，其中还提供了终端将经历不超过20％的应力松弛的特征。在拉伸强度，弹簧极限，应力松弛特性和导电性方面，该合金优于常规的青铜，磷青铜和Cu-Sn-Fe-P合金，因此，由这些合金制造的端子具有更高的性能和可靠性高于由常规铜基合金端子制成的端子。

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