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    • 21. 发明授权
    • Formation of masks/reticles having dummy features
    • 形成具有虚拟特征的掩模/掩模版
    • US07739648B2
    • 2010-06-15
    • US11673611
    • 2007-02-12
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • G06F17/50
    • G03F1/36
    • Structures and methods for forming the same. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.
    • 用于形成它的结构和方法。 该方法包括提供设计层的设计信息。 设计层包括M原始设计特征和N个原始虚拟特征。 该方法还包括(i)创建P代表虚拟特征的聚类,P是小于N的正整数,(ii)对于P代表虚拟特征的簇执行OPC,而不对N个原始伪特征执行OPC,导致 P OPC应用的代表虚拟特征,以及(iii)形成包括N个掩模虚拟特征的掩模。 N个掩码虚拟特征是相同的。 掩模的N个掩模虚拟特征的每个掩码虚拟特征具有至少是应用于P OPC的代表虚拟特征的OPC应用的代表性虚拟特征的区域的函数的面积。 N个掩模虚拟特征具有与N个原始虚拟特征相同的相对位置。
    • 24. 发明申请
    • Formation Of Dummy Features And Inductors In Semiconductor Fabrication
    • 半导体制造中的虚拟特征和电感器的形成
    • US20080272457A1
    • 2008-11-06
    • US11744248
    • 2007-05-04
    • Brent Alan AndersonHoward Smith LandisEdward Joseph Nowak
    • Brent Alan AndersonHoward Smith LandisEdward Joseph Nowak
    • H01L29/76H01L21/8234
    • H01L21/84H01L21/823481H01L27/0207H01L27/0617H01L27/08H01L27/1203
    • A structure and a method for forming the same. The structure includes (a) a substrate which includes a top substrate surface which defines a reference direction perpendicular to the top substrate surface, (b) N semiconductor regions on the substrate, and (c) P semiconductor regions on the substrate, N and P being positive integers. The N semiconductor regions comprise dopants. The P semiconductor regions do not comprise dopants. The structure further includes M interconnect layers on top of the substrate, the N semiconductor regions, and the P semiconductor regions, M being a positive integer. The M interconnect layers include an inductor. (i) The N semiconductor regions do not overlap and (ii) the P semiconductor regions overlap the inductor in the reference direction. A plane perpendicular to the reference direction and intersecting a semiconductor region of the N semiconductor regions intersects a semiconductor region of the P semiconductor regions.
    • 一种结构及其形成方法。 该结构包括(a)包括限定垂直于顶部衬底表面的参考方向的顶部衬底表面的衬底,(b)衬底上的N个半导体区域,以及(c)衬底上的P个半导体区域,N和P 正整数。 N个半导体区域包括掺杂剂。 P半导体区域不包含掺杂剂。 该结构还包括在衬底的顶部上的M个互连层,N个半导体区域和P个半导体区域,M是正整数。 M互连层包括电感器。 (i)N个半导体区域不重叠,(ii)P个半导体区域在参考方向上与电感器重叠。 垂直于基准方向并且与N个半导体区域的半导体区域交叉的平面与P半导体区域的半导体区域相交。
    • 25. 发明申请
    • FORMATION OF MASKS/RETICLES HAVING DUMMY FEATURES
    • 形成具有不同特征的掩蔽物/反应物
    • US20080195995A1
    • 2008-08-14
    • US11673611
    • 2007-02-12
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • Amit KumarHoward Smith LandisJeanne-Tania Sucharitaves
    • G06F17/50
    • G03F1/36
    • Structures and methods for forming the same. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.
    • 用于形成它的结构和方法。 该方法包括提供设计层的设计信息。 设计层包括M原始设计特征和N个原始虚拟特征。 该方法还包括(i)创建P代表虚拟特征的聚类,P是小于N的正整数,(ii)对P代表虚拟特征的簇进行OPC,而不对N个原始伪特征执行OPC,导致 P OPC应用的代表虚拟特征,以及(iii)形成包括N个掩模虚拟特征的掩模。 N个掩码虚拟特征是相同的。 掩模的N个掩模虚拟特征的每个掩码虚拟特征具有至少是应用于P OPC应用的代表虚拟特征的OPC应用的代表性虚拟特征的区域的函数的区域。 N个掩模虚拟特征具有与N个原始虚拟特征相同的相对位置。
    • 30. 发明授权
    • Lift tube for an agricultural implement frame
    • 用于农用车架的提升管
    • US06378621B1
    • 2002-04-30
    • US09649319
    • 2000-08-28
    • William Douglas GrahamScott Charles McCartneyWilliam Howard SmithPatrick M. BuckleyRobert Edwin Bennett
    • William Douglas GrahamScott Charles McCartneyWilliam Howard SmithPatrick M. BuckleyRobert Edwin Bennett
    • A01B4900
    • A01B73/005
    • A lift and rotate agricultural implement frame comprises a main frame having a lift tube and a carrier frame slidably mounted to the lift tube. The lift tube comprises a vertically extending main support tube having planar surfaces and a corrosion resistant exterior sleeve. The corrosion resistant exterior sleeve comprises corrosion resistant plates corresponding to the planar surfaces of the main support tube. Each of the plates has an interior surface and an exterior surface. At least one of the corrosion resistant plates adjoins another plate. One of the adjoining plates is provided with an overhang that extends past the exterior surface of the other plate of the pair. The plates are fillet welded to one another between the overhang and the other plate. The plates are also provided with oblong openings having oblong edges. The oblong edges are fillet welded to the main support tube to couple the sleeve to the main support tube.
    • 提升和旋转农具框架包括具有提升管和可滑动地安装在提升管上的托架的主框架。 提升管包括具有平坦表面的垂直延伸的主支撑管和耐腐蚀的外部套筒。 耐腐蚀的外部套筒包括对应于主支撑管的平面表面的耐腐蚀板。 每个板具有内表面和外表面。 至少一个耐腐蚀板毗邻另一个板。 邻接板中的一个设置有延伸穿过该对的另一个板的外表面的突出端。 板在悬垂和另一个板之间彼此焊接。 板还设有长方形的开口,具有长方形边缘。 长方形边缘被焊接到主支撑管上,以将套筒连接到主支撑管。