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    • 22. 发明授权
    • Forming a vertical PNP transistor
    • 形成垂直PNP晶体管
    • US5302534A
    • 1994-04-12
    • US844311
    • 1992-03-02
    • David J. MonkRobert H. ReussJenny M. Ford
    • David J. MonkRobert H. ReussJenny M. Ford
    • H01L21/331H01L21/8249H01L21/265H01L29/70
    • H01L29/66272H01L21/8249Y10S148/011
    • A transistor (10) is formed by utilizing an isolated well (18) within a thin epitaxial layer (14). A base mask (22) that has a base opening (23) is applied to expose a portion of the isolated well (18). A low resistance collector enhancement (24) is formed within the well (18) by doping a portion of the well (18) through the base opening (23). A base region (26) is formed overlying the collector enhancement (24) by doping the well (18) through the base opening (23). Forming the collector enhancement (24) through the base opening (23), facilitates providing the collector enhancement (24) with a small area thereby minimizing the transistor's (10) parasitic collector capacitance value, collector resistance, and transit time.
    • 通过利用薄外延层(14)内的隔离阱(18)形成晶体管(10)。 具有基部开口(23)的底座(22)被施加以暴露所述隔离井(18)的一部分。 通过将井(18)的一部分通过基座开口(23)掺杂,在阱(18)内形成低电阻集电极增强(24)。 通过将孔(18)掺杂穿过基座开口(23),形成覆盖集电极增强层(24)的基极区(26)。 通过基极开口(23)形成集电极增强(24),有利于使集电极增强(24)具有小的面积,从而最小化晶体管(10)的寄生集电极电容值,集电极电阻和通过时间。
    • 24. 发明授权
    • SOI polysilicon trench refill perimeter oxide anchor scheme
    • SOI多晶硅沟槽填充周边氧化物锚定方案
    • US06913941B2
    • 2005-07-05
    • US10238062
    • 2002-09-09
    • Gary J. O'BrienDavid J. Monk
    • Gary J. O'BrienDavid J. Monk
    • B81B3/00B81C1/00H01L21/00
    • B81C1/00039B81B2203/0118B81B2203/0307B81B2203/033
    • A method for creating a MEMS structure is provided. In accordance with the method, a substrate (53) is provided having a sacrificial layer (55) disposed thereon and having a layer of silicon (57) disposed over the sacrificial layer. A first trench (59) is created which extends through the silica layer and the sacrificial layer and which separates the sacrificial layer into a first region (61) enclosed by the first trench and a second region (63) exterior to the first trench. A first material (65) is deposited into the first trench such that the first material fills the first trench to a depth at least equal to the thickness of the sacrificial layer. A second trench (71) is created exterior to the first trench which extends through at least the silicon layer and exposes at least a portion of the second region of the sacrificial layer. The second region of the sacrificial layer is contacted, by way of the second trench, with a chemical etching solution adapted to etch the sacrificial layer, said etching solution being selective to the first material.
    • 提供了一种用于产生MEMS结构的方法。 根据该方法,提供了具有设置在其上的牺牲层(55)并且具有设置在牺牲层上方的硅层(57)的衬底(53)。 产生第一沟槽(59),其延伸穿过二氧化硅层和牺牲层,并且将牺牲层分离成由第一沟槽包围的第一区域(61)和第一沟槽外部的第二区域(63)。 第一材料(65)沉积到第一沟槽中,使得第一材料将第一沟槽填充到至少等于牺牲层厚度的深度。 在第一沟槽的外部产生第二沟槽(71),其延伸穿过至少硅层并暴露牺牲层的第二区域的至少一部分。 牺牲层的第二区域通过第二沟槽与适于蚀刻牺牲层的化学蚀刻溶液接触,所述蚀刻溶液对第一材料是选择性的。
    • 25. 发明授权
    • Method of manufacturing a sensor
    • 制造传感器的方法
    • US06352874B1
    • 2002-03-05
    • US09317734
    • 1999-05-24
    • Andrew C. McNeilDavid J. MonkBishnu P. Gogoi
    • Andrew C. McNeilDavid J. MonkBishnu P. Gogoi
    • H01L2128
    • G01L9/0042G01L9/0073
    • A method of manufacturing a sensor includes forming a first electrode (120, 1120), forming a sacrificial layer (520) over the first electrode, and forming a layer (130) over the sacrificial layer where a second electrode (131, 831) is located in the layer. The method further includes removing the sacrificial layer after forming the layer to form a cavity (140) between the first and second electrodes and then sealing the cavity between the first and second electrodes. The layer is supported over the first electrode by a post (133, 833) in the cavity, and the second electrode is movable relative to the first electrode and is movable in response to a pressure external to the cavity.
    • 制造传感器的方法包括:形成第一电极(120,1120),在第一电极上形成牺牲层(520),以及在牺牲层上形成层(130),其中第二电极(131,831)为 位于层。 所述方法还包括在形成所述层之后去除所述牺牲层以在所述第一和第二电极之间形成空腔(140),然后在所述第一和第二电极之间密封空腔。 该层通过腔中的柱(133,833)支撑在第一电极上,并且第二电极可相对于第一电极移动,并且可响应于空腔外部的压力而移动。
    • 28. 发明授权
    • Method for attenuating undesirable data, such as multiples, using
constrained cross-equalization
    • 使用约束交叉均衡来衰减不期望数据(如倍数)的方法
    • US5309360A
    • 1994-05-03
    • US704363
    • 1991-05-23
    • David J. MonkCameron B. Wason
    • David J. MonkCameron B. Wason
    • G01V1/36G06F15/21
    • G01V1/364G01V2210/56
    • To eliminate undesirable energy recorded during seismic surveying, a trace that models the undesirable energy on the recorded data trace is prepared. The model trace is first estimated using a suitable technique, such as wavefield extrapolation. Then, the model trace is modified using a best estimate of the amplitude, phase and time delay differences between the model trace and the data trace. The estimated amplitude, phase and time delay differences may be used to design a cross-equalization filter, which is used to cross-equalize the model trace with the data trace. Alternatively, the best estimate determination may include using a weighted sum of the model trace, its imaginary component, and their derivatives. When weighted and summed together, these components form a cross-equalized model trace that closely approximates the undesirable energy on the recorded data trace. Lastly, the cross-equalized model trace is subtracted from the data trace to substantially eliminate the undesirable energy.
    • 为了消除地震测量期间记录的不良能量,准备了对记录的数据轨迹上的不需要的能量进行建模的轨迹。 首先使用合适的技术估计模型轨迹,例如波场外推法。 然后,使用模型轨迹和数据轨迹之间的幅度,相位和时间延迟差异的最佳估计来修改模型轨迹。 估计的幅度,相位和时间延迟差异可用于设计交叉均衡滤波器,用于将模型轨迹与数据跟踪进行交叉均衡。 或者,最佳估计确定可以包括使用模型轨迹,其虚部和其导数的加权和。 当加权和相加在一起时,这些组件形成了一个十分均衡的模型轨迹,其近似于记录的数据轨迹上的不期望的能量。 最后,从数据跟踪中减去交叉均衡的模型轨迹,以基本上消除不需要的能量。