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    • 11. 发明授权
    • Fluorine control system with fluorine monitor
    • 氟监控系统
    • US06240117B1
    • 2001-05-29
    • US09191446
    • 1998-11-12
    • Mengxiong GongTom A. WatsonPalash P. DasRichard L. SandstromThomas P. Duffey
    • Mengxiong GongTom A. WatsonPalash P. DasRichard L. SandstromThomas P. Duffey
    • H01S3223
    • G03F7/70558G03F7/70575H01S3/036H01S3/225
    • An excimer laser system with a real time fluorine monitor and an automatic fluorine control system to permit precise control of the fluorine concentration within the laser chamber. Cleaned laser gas is extracted from the laser chamber and directed through an F2 sample cell prior to returning to the chamber through one of the chamber window housings. A UV light beam is directed through the F2 sample cell and the amount of absorption of the light is measured. In preferred embodiments the absorption is measured by detecting with a photo detector the amount of light which passes through the cell. The photo detector provides a feedback signal which is used by a laser controller to automatically control fluorine concentration in the chamber to within desired ranges. In another preferred embodiment an acoustic detector detects acoustic signals resulting from absorbed light pulses. This invention provides a substantially real time measurement of fluorine concentration.
    • 具有实时氟监测器和自动氟控制系统的准分子激光系统,以允许精确控制激光室内的氟浓度。 清洁的激光气体在通过其中一个室窗外壳返回到室之前从激光室中提取并引导通过F2样品池。 UV光束被引导通过F2样品池,并测量光的吸收量。 在优选实施例中,通过用光电检测器检测穿过电池的光量来测量吸收。 光电检测器提供反馈信号,该信号由激光控制器用于将腔室中的氟浓度自动控制在所需范围内。 在另一优选实施例中,声检测器检测由吸收的光脉冲产生的声信号。 本发明提供氟浓度的实质实时测量。
    • 12. 发明授权
    • Closed-loop purging system for laser
    • 激光闭环清洗​​系统
    • US06798813B2
    • 2004-09-28
    • US09901857
    • 2001-07-09
    • Yang PangMatthew Perry Philpott
    • Yang PangMatthew Perry Philpott
    • H01S3223
    • H01S3/027H01S3/094038H01S3/1112H01S3/1625
    • A method of minimizing contamination of optical components of a laser resonator is disclosed. The resonator components are located in an enclosure, which may contain contaminants including water vapor and organic favor released by the optical components, mounts of the optical components, or the enclosure itself. The enclosure may also contain suspended particulate matter. In order to reduce the level of these contaminants, a purging system extracts gas from the enclosure and passes the gas through a desiccant, an organic vapor trapping material, and a particulate matter filter then returns the extracted gas to the enclosure. The purging system is particularly useful for ultrafast lasers and ultraviolet lasers where the power of the laser radiation increases the probability of destabilizing reactions between laser radiation and contaminants.
    • 公开了一种使激光谐振器的光学部件的污染最小化的方法。 谐振器部件位于外壳中,其可以包含由光学部件,光学部件的安装件或外壳本身释放的污染物,包括水蒸气和有机物。 外壳也可能含有悬浮颗粒物。 为了降低这些污染物的水平,清洗系统从外壳中提取气体并使气体通过干燥剂,有机蒸汽捕获材料和颗粒状物质过滤器,然后将提取的气体返回到外壳。 清洗系统对于超快激光和紫外激光器特别有用,其中激光辐射的功率增加了激光辐射和污染物之间的反应不稳定的可能性。
    • 13. 发明授权
    • Two chamber F2 laser system with F2 pressure based line selection
    • 双室F2激光系统采用F2压力线选择
    • US06798812B2
    • 2004-09-28
    • US10243102
    • 2002-09-13
    • German E. RylovThomas HofmannRichard L. Sandstrom
    • German E. RylovThomas HofmannRichard L. Sandstrom
    • H01S3223
    • H01S3/225H01S3/03H01S3/036H01S3/09702H01S3/1055H01S3/2258H01S3/2308
    • The present invention provides an injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The parameters chamber can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment is a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In this preferred embodiment, both of the chambers and the laser optics are mounted on a vertical optical table within a laser enclosure. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is operated with a fluorine partial pressure and total gas pressure within specified ranges in order to reduce the intensity of the weak line to less than 0.01% of the strong line. Therefore, the need for line selection optical equipment is avoided.
    • 本发明提供一种注射接种的模块化气体放电激光系统,其能够以约4,000Hz或更大的脉冲速率产生高质量的脉冲激光束,并且在约20至40瓦特的集成输出的脉冲能量为约5至10mJ或更大的脉冲能量 或更大。 提供两个单独的放电室,其中之一是主振荡器的一部分,其产生在第二放电室中放大的非常窄的带状晶体束。 可以分别控制参数室,允许在主振荡器中优化波长参数并优化放大室中的脉冲能量参数。 优选实施例是被配置为MOPA并被专门设计用作集成电路光刻的光源的F2激光系统。 在该优选实施例中,腔室和激光光学器件都安装在激光外壳内的垂直光学平台上。 在优选的MOPA实施例中,每个腔室包括单个切向风扇,其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器以氟分压和总气体压力在指定范围内运行,以将弱线的强度降低到强线的0.01%以下。 因此,避免了线路选择光学设备的需要。