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    • 11. 发明申请
    • CUSTOMIZED POLISHING PADS FOR CMP AND METHODS OF FABRICATION AND USE THEREOF
    • 用于CMP的定制抛光垫及其制造方法及其使用方法
    • US20150065020A1
    • 2015-03-05
    • US14489177
    • 2014-09-17
    • Pradip K. RoyManish DeopuraSudhanshu Misra
    • Pradip K. RoyManish DeopuraSudhanshu Misra
    • B24B37/26B24D11/04
    • B24B37/26B24D7/14B24D11/04
    • The present application relates to polishing pads for chemical mechanical planarization (CMP) of substrates, and methods of fabrication and use thereof. The pads described in this invention are customized to polishing specifications where specifications include (but not limited to) to the material being polished, chip design and architecture, chip density and pattern density, equipment platform and type of slurry used. These pads can be designed with a specialized polymeric nano-structure with a long or short range order which allows for molecular level tuning achieving superior themo-mechanical characteristics. More particularly, the pads can be designed and fabricated so that there is both uniform and nonuniform spatial distribution of chemical and physical properties within the pads. In addition, these pads can be designed to tune the coefficient of friction by surface engineering, through the addition of solid lubricants, and creating low shear integral pads having multiple layers of polymeric material which form an interface parallel to the polishing surface. The pads can also have controlled porosity, embedded abrasive, novel grooves on the polishing surface, for slurry transport, which are produced in situ, and a transparent region for endpoint detection.
    • 本申请涉及用于基板的化学机械平面化(CMP)的抛光垫及其制造和使用方法。 本发明中描述的焊盘定制为抛光规格,其中规格包括(但不限于)被抛光材料,芯片设计和结构,芯片密度和图案密度,设备平台和使用的浆料类型。 这些焊盘可以设计成具有长或短范围顺序的专门的聚合物纳米结构,其允许分子水平调谐实现优异的机械特性。 更具体地,可以设计和制造焊盘,使得焊盘内的化学和物理性质均匀和不均匀的空间分布。 此外,这些垫可以被设计成通过表面工程,通过添加固体润滑剂来调节摩擦系数,并且产生具有形成与抛光表面平行的界面的多层聚合材料的低剪切整体垫。 焊盘还可以具有受控的孔隙率,嵌入式研磨剂,抛光表面上的新型凹槽,用于原位生产的浆料输送,以及用于端点检测的透明区域。
    • 12. 发明申请
    • Multi Grit Anti Chatter Sand Paper
    • 多砂砾砂纸
    • US20140113534A1
    • 2014-04-24
    • US13694055
    • 2012-10-24
    • Clyde Alan Pritchett
    • Clyde Alan Pritchett
    • B24D11/04
    • B24D11/04B24B7/188B24D11/02
    • A sanding paper for use with a floor sander having one direction sanding comprising a paper sleeve or belt having a length and a width and a first surface and a second surface joined together and running parallel along the length of the sand paper wherein the first surface is disposed on the sander to apply to the floor first and the second to follow immediately thereafter and wherein the first surface has a grit which is more coarse than the second surface. The sanding paper first grit is a grit between 24-60 and the second grit is between 80 and 120 grit. In place of a middle grit, The intermediate surface between the first surface and second surface and wherein the first surface is between 24 and 40 grit, the intermediate surface between 41 and 80 grit and the third surface between 80 and 120 grit.
    • 一种用于具有单向磨砂的地板砂光机的砂纸,包括具有长度和宽度的纸套或带,第一表面和第二表面连接在一起并沿着砂纸的长度平行延伸,其中第一表面是 设置在砂光机上以首先施加到地板上,第二表面紧随其后,其中第一表面具有比第二表面更粗糙的砂粒。 砂纸第一粒砂砾是24-60之间的砂砾,第二颗砂粒在80和120粒度之间。 代替中间砂粒,第一表面和第二表面之间的中间表面,其中第一表面在24和40砂粒之间,中间表面在41和80砂粒之间,第三表面在80和120砂粒之间。
    • 13. 发明申请
    • Grinding Lamella and Grinding Wheel Holding Same
    • 磨砂板和砂轮保持相同
    • US20090068938A1
    • 2009-03-12
    • US12224703
    • 2007-02-28
    • Georg Klug
    • Georg Klug
    • B24D13/16B24D11/00B24D11/04
    • B24D13/08B24D11/008B24D13/16B24D18/0045
    • A grinding lamella (1) for being arranged on a rotatingly drivable grinding wheel (8), has at least two annular portions (4, 5, 6, 7, 24, 25, 26, 27, 34, 35, 36, 37, 44, 45, 46, 47) arranged at an angle (α) relative to one another. At least partially, the grinding lamellae (1) have a shape that deviates from the shape of a circular wheel with a central aperture. The grinding wheel (8) containing the grinding lamellae has at least one carrier element (2) and a least two such grinding lamellae (1) that partially overlap and, together, form an annular shape. If use is made of a pattern (14, 32) for a piece of material or a strip of material for producing the grinding lamellae (1), the grinding lamellae (1) are arranged side by side in the same direction so as to adjoin one another and offset relative to one another by 180°.
    • 用于布置在可旋转驱动的砂轮(8)上的研磨板(1)具有至少两个环形部分(4,5,6,7,24,25,26,27,34,35,36,37,38,36,37,38,38,38,38,38,38,38,40,46) 44,45,46,47),以相对于彼此成角度(α)排列。 至少部分地,研磨片(1)具有偏离具有中心孔的圆形轮的形状的形状。 包含研磨薄片的砂轮(8)具有至少一个载体元件(2)和至少两个这样的磨削薄片(1),其部分地重叠并且一起形成环形。 如果使用用于生产研磨薄片(1)的一块材料或材料条的图案(14,32),则研磨薄片(1)沿相同方向并排布置,以便邻接 彼此相对偏移180°。
    • 15. 发明授权
    • Lapping apparatus and lapping method using abrasive sheets
    • 研磨设备和研磨方法
    • US6120352A
    • 2000-09-19
    • US812792
    • 1997-03-06
    • Wayne O. Duescher
    • Wayne O. Duescher
    • B24B37/04B24D9/10B24D11/04B24B1/00
    • B24B37/26B24B37/042B24D11/04B24D9/10
    • Lapping or polishing at high speeds with fine abrasive particles offer significant advantages in the speed of lapping, savings of time in lapping, and smoothness in the finished articles. An improved process for lapping a surface according to the present invention comprises:a) providing a work piece to be lapped, having at least one surface to be lapped,b) providing a rotating platen having i) a back surface and ii) a flat surface which can be adjusted to a position parallel to said at least one surface of said work piece, said flat surface of said platen having openings therein through which air may flow,c) providing a sheet of abrasive material on said flat surface of said platen with an abrasive face of said sheet facing said at least one surface to be lapped,d) reducing the pressure at said back surface of said platen to secure said sheet of abrasive material to said flat surface of said platen, ande) rotating said platen at a rotational velocity sufficient to generate a surface speed of at least 4,000 surface feet per minute (or even more than 20,000 surface feet per minute), which, depending upon the diameter of the rotating abrasive may be at an angular speed of at least 500 revolutions per minute (which with a 15.2 cm or 6 inch diameter platen and abrasive sheet, equates to over 700 surface feet per minute at the periphery of the abrasive surface), or even more than 3,000 revolutions per minute (which with a 15.2 cm diameter abrasive sheet equates to over 4200 surface feet per minute and with a 30.4 cm or 12 inch abrasive sheet equates to over 8400 surface feet per minute) and contacting said abrasive material with said work piece. The boundary layer of any liquid (e.g., coolant or lubricant) applied to the working surface of the abrasive sheet can be controlled to improve the uniformity of the lapped surface.
    • 用高精度研磨颗粒高速研磨或抛光提供研磨速度,研磨时间节省以及成品中平滑度方面的显着优点。 根据本发明的用于研磨表面的改进方法包括:a)提供待研磨的工件,具有至少一个要研磨的表面,b)提供旋转的压板,该压板具有i)背面和ii) 表面可以被调节到与所述工件的所述至少一个表面平行的位置,所述压板的所述平坦表面具有开口,空气可以通过该开口流动,c)在所述压板的所述平坦表面上提供一块研磨材料 其中所述片材的研磨面面向所述至少一个要被研磨的表面,d)降低所述压板的所述后表面处的压力,以将所述研磨材料片固定到所述压板的所述平坦表面,以及e)旋转所述压板 以足以产生至少4,000英尺/分钟(或甚至大于20,000表面英尺每分钟)的表面速度的旋转速度,其取决于旋转磨料的直径可以是角度螺栓 d至少500转/分钟(其具有15.2cm或6英寸直径的压板和研磨片,在磨料表面的周边相当于每分钟超过700个表面英尺),或甚至每分钟3000转 具有15.2cm直径的研磨片等于每分钟超过4200个表面脚,并且具有30.4cm或12英寸的研磨片等于每分钟超过8400个表面脚),并将所述研磨材料与所述工件接触。 可以控制施加到研磨片的工作表面的任何液体(例如冷却剂或润滑剂)的边界层,以改善研磨表面的均匀性。