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11. 发明申请

US20160114458A1 POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS 审中-公开
标题翻译：由添加剂制造工艺生产的抛光垫
公开(公告)号：US20160114458A1
公开(公告)日：2016-04-28
申请号：US14920801
申请日：2015-10-22
申请人： APPLIED MATERIALS, INC.
发明人： Rajeev BAJAJ , Daniel REDFIELD , Mahendra C. ORILALL , Boyi FU , Aniruddh KHANNA , Jason G. FUNG , Mario CORNEJO , Ashwin CHOCKALINGAM , Mayu YAMAMURA , Veera Raghava REDDY , Ashavani KUMAR , Venkatachalam HARIHARAN , Gregory E. MENK , Fred C. REDEKER , Nag B. PATIBANDLA , Hou T. NG , Robert E. DAVENPORT , Amritanshu SINHA
IPC分类号： B24B37/26 , B24B37/24 , B24D11/04 , B24D3/28 , B24D11/00
CPC分类号： B24B37/26 , B24B37/22 , B24B37/24 , B24D3/28 , B24D11/00 , B24D11/001 , B24D11/04 , B33Y10/00 , B33Y80/00
摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.
摘要翻译：本公开的实施例涉及具有可调节的化学，材料和结构特性的高级抛光垫及其制造方法。根据本公开的一个或多个实施例，已经发现可以通过诸如三维（3D）印刷工艺的添加剂制造工艺来生产具有改进性能的抛光垫。因此，本公开的实施例可以提供具有离散特征和几何形状的先进抛光垫，其由至少两种不同的材料形成，包括功能性聚合物，功能低聚物，反应性稀释剂和固化剂。例如，先进的抛光垫可以由多个聚合物层形成，通过至少一种树脂前体组合物的自动顺序沉积，然后至少一个固化步骤，其中各层可代表至少一种聚合物组合物和/ 或不同组成的区域。

12. 发明授权

US09321141B2 Pattern sander device, system and method 有权
标题翻译：图案砂光机，系统及方法
公开(公告)号：US09321141B2
公开(公告)日：2016-04-26
申请号：US14292194
申请日：2014-05-30
申请人： COLUMBIA INSURANCE COMPANY
发明人： Robert Bryan Boggs , Joseph Shannon Miller , Michael Scott Standridge , Jason Richard Shaw
IPC分类号： B24B21/00 , B24B21/08 , B24D11/04 , B24B19/02 , B24B21/18 , B24B51/00
CPC分类号： B24B21/006 , B24B19/02 , B24B21/08 , B24B21/18 , B24B51/00 , B24D11/04
摘要： The invention relates to a device for sanding a predetermined impression into a workpiece. The device has a pattern belt positioned inside the area formed by a sanding belt. A pad is positioned inside the area formed by the pattern belt. A raised pattern is formed on the outer surface of the pattern belt. In use, the pad contacts the pattern belt, urging the raised pattern of the pattern belt to contact the sanding belt. The portion of the sanding belt contacted by the pattern belt is urged toward the workpiece so that the predetermined impression is sanded into the workpiece.
摘要翻译：本发明涉及一种用于将预定印模打磨成工件的装置。该装置具有定位在由砂带形成的区域内的图案带。衬垫位于由图案带形成的区域内。在图案带的外表面上形成凸起图案。在使用中，垫接触图案带，促使图案带的凸起图案接触砂带。由图案带接触的砂带的部分被推向工件，使得预定的印模被砂磨入工件。

13. 发明申请

US20150126098A1 COATED ABRASIVE ARTICLE 有权
标题翻译：涂层磨砂制品
公开(公告)号：US20150126098A1
公开(公告)日：2015-05-07
申请号：US14413067
申请日：2013-06-26
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Deborah J. Eilers , Jeffrey R. Janssen
IPC分类号： B24D3/28 , B24D11/04
CPC分类号： B24D3/28 , B24D11/00 , B24D11/04
摘要： Provided are abrasive articles in which the make layer, abrasive particle layer, and size layer are coated onto a backing according to a coating pattern characterized by a pattern of discrete islands, or features, having an areal density ranging from about 30 features to about 300 features per square centimeter and an average feature diameter ranging from about 0.1 millimeters to about 1.5 millimeters. Optionally, the provided abrasive particles have an average abrasive particle size ranging from about 20 micrometers to about 250 micrometers and the average make layer thickness ranging from 33 percent to 100 percent of the average abrasive particle size. This coating pattern provides that all three components are generally in registration with each other, while also providing a pervasive uncoated area extending across the backing, thereby providing improved cut and finish performance while displaying a resistance to curl in wet environments.
摘要翻译：提供了磨料制品，其中制造层，磨料颗粒层和尺寸层根据涂层图案涂覆到背衬上，涂层图案的特征在于具有从约30特征到约300的离散岛状或特征的图案特征每平方厘米，平均特征直径约为0.1毫米至约1.5毫米。任选地，所提供的磨料颗粒的平均研磨粒度范围为约20微米至约250微米，平均成层厚度为平均磨料颗粒尺寸的33％至100％。这种涂层图案提供了所有三个部件通常彼此对准，同时还提供延伸穿过背衬的普遍的未涂覆区域，从而提供改善的切割和完成性能，同时在湿润环境中显示出抗卷曲性。

14. 发明授权

US08771037B2 Pattern sander device, system and method 有权
标题翻译：图案砂光机，系统及方法
公开(公告)号：US08771037B2
公开(公告)日：2014-07-08
申请号：US13476654
申请日：2012-05-21
申请人： Robert Bryan Boggs , Joseph Shannon Miller , Michael Scott Standridge , Jason Richard Shaw
发明人： Robert Bryan Boggs , Joseph Shannon Miller , Michael Scott Standridge , Jason Richard Shaw
IPC分类号： B24B1/00 , B24B21/00 , B24B21/08 , B24D11/04
CPC分类号： B24B21/006 , B24B19/02 , B24B21/08 , B24B21/18 , B24B51/00 , B24D11/04
摘要： The invention relates to a device for sanding a predetermined impression into a workpiece. The device has a pattern belt positioned inside the area formed by a sanding belt. A pad is positioned inside the area formed by the pattern belt. A raised pattern is formed on the outer surface of the pattern belt. In use, the pad contacts the pattern belt, urging the raised pattern of the pattern belt to contact the sanding belt. The portion of the sanding belt contacted by the pattern belt is urged toward the workpiece so that the predetermined impression is sanded into the workpiece.
摘要翻译：本发明涉及一种用于将预定印模打磨成工件的装置。该装置具有定位在由砂带形成的区域内的图案带。衬垫位于由图案带形成的区域内。在图案带的外表面上形成凸起图案。在使用中，垫接触图案带，促使图案带的凸起图案接触砂带。由图案带接触的砂带的部分被推向工件，使得预定的印模被砂磨入工件。

15. 发明申请

US20140106126A1 ABRASIVE PARTICLES HAVING PARTICULAR SHAPES AND METHODS OF FORMING SUCH PARTICLES 有权
标题翻译：具有特殊形状的磨料颗粒和形成这种颗粒的方法
公开(公告)号：US20140106126A1
公开(公告)日：2014-04-17
申请号：US14054568
申请日：2013-10-15
申请人： Anthony C. Gaeta , Anuj Seth , Christopher Arcona , Doruk O. Yener , Jennifer H. Czerepinski , Sujatha Iyengar , Frank J. Csillag , William C. Rice , Satyalakshmi Kayyar-Mahabala , Gregory Lafond , Sidath S. Wijesooriya , Adam D. Lior , Alan J. Brandes , Anil Parmar , Paul Braun , Darrel K. Everts
发明人： Anthony C. Gaeta , Anuj Seth , Christopher Arcona , Doruk O. Yener , Jennifer H. Czerepinski , Sujatha Iyengar , Frank J. Csillag , William C. Rice , Satyalakshmi Kayyar-Mahabala , Gregory Lafond , Sidath S. Wijesooriya , Adam D. Lior , Alan J. Brandes , Anil Parmar , Paul Braun , Darrel K. Everts
IPC分类号： B24D11/04 , B24D18/00
CPC分类号： B24D3/001 , B24D7/02 , B24D11/04 , B24D18/00 , B24D18/0072 , B24D2203/00 , C09K3/1409 , Y10T428/24 , Y10T428/24372 , Y10T428/24893 , Y10T428/25
摘要： An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.
摘要翻译：一种磨料制品，其包括第一组，所述第一组包括覆盖背衬的多个成形磨料颗粒，其中所述第一组的所述多个成形磨料颗粒限定相对于彼此的第一非阴影分布。

16. 发明申请

US20100221985A1 CHEMICAL-MECHANICAL PLANARIZATION PAD INCLUDING PATTERNED STRUCTURAL DOMAINS 有权
标题翻译：化学机械平面图包括图案结构域
公开(公告)号：US20100221985A1
公开(公告)日：2010-09-02
申请号：US12694593
申请日：2010-01-27
申请人： Paul LEFEVRE , Anoop MATHEW , Scott Xin QIAO , Xuechan Zhao , Guangwei WU , David Adam WELLS , Oscar K. HSU
发明人： Paul LEFEVRE , Anoop MATHEW , Scott Xin QIAO , Xuechan Zhao , Guangwei WU , David Adam WELLS , Oscar K. HSU
IPC分类号： B24B1/00 , B24D11/00 , B24D11/04
CPC分类号： B24B37/24 , B24B37/26
摘要： An aspect of the present disclosure relates to a chemical mechanical planarization pad including a first domain and a second continuous domain wherein the first domain includes discrete elements regularly spaced within the second continuous domain. The pad may be formed by forming a plurality of openings for a first domain within a second continuous domain of the pad, wherein the openings are regularly spaced within the second domain, and forming the first domain within the plurality of openings in second continuous domain. In addition, the pad may be used in polishing a substrate with a polishing slurry.
摘要翻译：本公开的一个方面涉及包括第一结构域和第二连续结构域的化学机械平面化焊盘，其中第一结构域包括在第二连续域内规则间隔开的分立元件。垫可以通过在垫的第二连续区域内形成用于第一区域的多个开口形成，其中开口在第二区域内规则地间隔开，并且在第二连续域中的多个开口内形成第一区域。此外，可以使用抛光浆料抛光衬底。

17. 发明授权

US4737163A Coated abrasive product incorporating selective mineral substitution 失效
标题翻译：包含选择性矿物替代的涂层磨料产品
公开(公告)号：US4737163A
公开(公告)日：1988-04-12
申请号：US921944
申请日：1986-10-20
申请人： Thomas W. Larkey
发明人： Thomas W. Larkey
IPC分类号： B24D3/00 , B24D3/04 , B24D11/04 , C09K3/14 , B24D3/34
CPC分类号： B24D3/00 , B24D11/04
摘要： Replacement of all or most of the coarse mineral in a coated abrasive product by a superior (and typically more expensive) mineral improves abrading performance significantly more than would be predicted. In some cases the performance is superior to that of products made with either mineral alone. The mineral is typically applied in two layers, substantially all of the coarse mineral being applied in the second layer. Superiority is defined in terms of a test that measures the comparative ability of different minerals to abrade cold rolled steel.
摘要翻译：通过优越（通常更昂贵）的矿物替代涂覆的研磨产品中的所有或大部分粗矿物质，显着地提高了研磨性能。在某些情况下，性能优于单独使用矿物制成的产品。矿物通常以两层施用，基本上所有的粗矿物都被施加在第二层中。优势是以测量不同矿物比较研磨冷轧钢的能力的方法来定义的。

18. 发明申请

US20230064962A1 POLISHING PAD AND POLISHING METHOD 有权
公开(公告)号：US20230064962A1
公开(公告)日：2023-03-02
申请号：US17982528
申请日：2022-11-08
申请人： IV Technologies CO., Ltd.
发明人： Yu-Piao Wang
IPC分类号： B24D11/04
摘要： A polishing pad is provided. The polishing pad, suitable for polishing an object, includes a polishing layer and at least one groove. The polishing layer has a central region and a peripheral region surrounding the central region. The at least one groove is disposed in the polishing layer, wherein the at least one groove has two ends both located in the peripheral region, wherein the two ends include an open end and a closed end.

19. 发明授权

US11154964B2 Abrasive particles having particular shapes and methods of forming such particles 有权
公开(公告)号：US11154964B2
公开(公告)日：2021-10-26
申请号：US15346775
申请日：2016-11-09
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： Anthony C. Gaeta , Anuj Seth , Christopher Arcona , Doruk O. Yener , Jennifer H. Czerepinski , Sujatha Iyengar , Frank J. Csillag , William C. Rice , Satyalakshmi K. Ramesh , Gregory G. Lafond , Sidath S. Wijesooriya , Adam D. Lior , Alan J. Brandes , Anil Parmar , Paul Braun , Darrell K. Everts
IPC分类号： B24D3/00 , B24D11/04 , B24D7/02 , C09K3/14 , B24D18/00
摘要： An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.

20. 发明授权

US11148254B2 Abrasive particles having particular shapes and methods of forming such particles 有权
公开(公告)号：US11148254B2
公开(公告)日：2021-10-19
申请号：US16359370
申请日：2019-03-20
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： Anthony C. Gaeta , Anuj Seth , Christopher Arcona , Doruk O. Yener , Jennifer H. Czerepinski , Sujatha K. Iyengar , Frank J. Csillag , William C. Rice , Satyalakshmi K. Ramesh , Gregory G. Lafond , Sidath S. Wijesooriya , Adam D. Lior , Alan J. Brandes , Anil Parmar , Paul Braun , Darrell K. Everts
IPC分类号： B24D3/00 , B24D11/04 , B24D18/00 , B24D7/02 , C09K3/14
摘要： An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.

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