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    • 11. 发明申请
    • ION IMPLANTATION APPARATUS, FINAL ENERGY FILTER, AND ION IMPLANTATION METHOD
    • 离子植入装置,最终能量过滤器和离子植入方法
    • US20150279612A1
    • 2015-10-01
    • US14670173
    • 2015-03-26
    • SEN Corporation
    • Takanori Yagita
    • H01J37/147H01J37/30H01J37/317
    • H01J37/147H01J37/05H01J37/3007H01J37/3171H01J2237/057
    • A final energy filter includes a first adjustment electrode portion, an intermediate electrode portion, and a second adjustment electrode portion. The final energy filter further includes a power supply unit. The power supply unit is configured such that it applies the voltages separately to the first adjustment electrode portion, the intermediate electrode portion, and the second adjustment electrode portion. The power supply unit applies voltages to an upstream auxiliary electrode portion, a deflection electrode portion and a downstream auxiliary electrode portion, respectively, such that the energy range of ion beam in a first region between the upstream auxiliary electrode portion and the deflection electrode portion is approximately equal to that in a second region between the deflection electrode portion and the downstream auxiliary electrode portion.
    • 最终能量过滤器包括第一调整电极部分,中间电极部分和第二调节电极部分。 最终能量过滤器还包括电源单元。 电源单元被构造成使得其分别施加电压到第一调整电极部分,中间电极部分和第二调节电极部分。 电源单元分别向上游辅助电极部分,偏转电极部分和下游辅助电极部分施加电压,使得上游辅助电极部分和偏转电极部分之间的第一区域中的离子束的能量范围为 大致等于偏转电极部分和下游辅助电极部分之间的第二区域中的位置。
    • 15. 发明授权
    • Mass selector, and ion gun, ion irradiation apparatus and mass microscope
    • 质量选择器和离子枪,离子照射装置和质量显微镜
    • US08963081B2
    • 2015-02-24
    • US14190289
    • 2014-02-26
    • Canon Kabushiki Kaisha
    • Kota Iwasaki
    • H01J49/40H01J49/06
    • H01J49/061H01J37/05H01J49/40H01J2237/043H01J2237/057
    • When a time-of-flight mass selector having a chopper using a deflector selects the masses of the ions, an ion beam is deflected. As a result, at least a part of the ion beams diagonally pass through an aperture electrode with respect to the axis. Accordingly, there has been a problem that a position on an object irradiated with a cluster ion beam, results in moving. This mass selector includes: a flight tube having an equipotential space that makes a charged substance fly therein; a deflector that is installed in a downstream side with respect to the flight tube in a direction in which the charged substance flies; a first aperture electrode that is installed in a downstream side with respect to the deflector in a direction in which the charged substance flies; and a second aperture electrode that is installed in between the deflector and the first aperture electrode.
    • 当具有使用偏转器的斩波器的飞行时间质量选择器选择离子的质量时,离子束被偏转。 结果,至少一部分离子束相对于轴线对角地穿过孔电极。 因此,存在用聚簇离子束照射的物体上的位置导致移动的问题。 该质量选择器包括:具有使带电物质在其中飞行的等电位空间的飞行管; 偏转器,其安装在相对于所述飞行管的下游侧,所述偏转器沿所述带电物质飞行的方向; 第一孔电极,其安装在相对于所述偏转器的下游侧,所述第一孔电极沿所述带电物质飞行的方向; 以及安装在偏转器和第一孔径电极之间的第二孔径电极。
    • 18. 发明授权
    • Methods and systems for plasma deposition and treatment
    • 用于等离子体沉积和处理的方法和系统
    • US08800483B2
    • 2014-08-12
    • US12776132
    • 2010-05-07
    • Peter F. Vandermeulen
    • Peter F. Vandermeulen
    • C23C16/00C23F1/00H01L21/306
    • H01J37/32229C23C16/511C23C16/513H01J37/05H01J37/08H01J37/32192H01J37/32201H01J37/3244H01J37/32669H01J2237/057H01J2237/0817H01J2237/3323H01P3/12H01P3/127H01Q21/0043
    • A plasma deposition apparatus includes a waveguide conduit having a plurality of slots therein. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of slots. One or more pipes have an outlet end positioned at each of the plurality of slots for transporting material from one or more material sources to the plurality of slots. The apparatus also includes a plasma chamber in communication with the waveguide tube through the plurality of slots. The plasma chamber receives through said plurality of slots microwaves from the waveguide tube and material to be melted or evaporated from the one or more pipes. The plasma chamber includes a plurality of magnets disposed in an outer wall of the plasma chamber for forming a magnetic field in the plasma chamber. The plasma chamber further includes one or more outlet openings for discharging plasma containing material to be deposited on a substrate.
    • 等离子体沉积设备包括其中具有多个狭槽的波导管道。 波导管道耦合到微波源,用于从微波源通过多个狭槽传送微波。 一个或多个管道具有位于多个狭槽中的每一个的出口端,用于将材料从一个或多个材料源输送到多个狭槽。 该装置还包括通过多个狭槽与波导管连通的等离子体室。 等离子体腔室通过所述多个槽从波导管接收微波,并且从一个或多个管道熔化或蒸发的材料。 等离子体室包括设置在等离子体室的外壁中的多个磁体,用于在等离子体室中形成磁场。 等离子体室还包括一个或多个出口开口,用于排放待沉积在衬底上的等离子体材料。
    • 19. 发明授权
    • Charged particle source with integrated electrostatic energy filter
    • 带集成静电能量滤波器的带电粒子源
    • US08710452B2
    • 2014-04-29
    • US13294067
    • 2011-11-10
    • Alexander Henstra
    • Alexander Henstra
    • G21K1/08H01J3/14H01J3/26H01J49/22
    • H01J37/05H01J37/06H01J37/08H01J37/09H01J37/26H01J37/28H01J2237/0453H01J2237/053H01J2237/057H01J2237/31713
    • A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.
    • 具有集成能量滤波器的带电粒子滤波器,其中带电粒子发射器,聚焦电极和偏转电极绕直线布置。 在使用大多数能量过滤器具有高度弯曲的光轴的情况下,因此使用具有难以制造的形式的部件,根据本发明的源使用围绕直线光轴的电极。 带电粒子的束可以在能量选择狭缝处偏离显示出可观的能量分散的轴线,而不引入无法校正的彗差或像散,只要其中一些形成为120°/ 60°/ 120°/ 60° °。 这样的电极可以通过陶瓷的胶合或钎焊而彼此附接,然后可以通过例如火花腐蚀形成一系列高度同心的孔。
    • 20. 发明授权
    • Mass analysis variable exit aperture
    • 质量分析变量退出光圈
    • US08669517B2
    • 2014-03-11
    • US13474186
    • 2012-05-17
    • William O. HambyJoseph Valinski
    • William O. HambyJoseph Valinski
    • H01J37/30H01J49/00
    • H01J37/3171H01J37/023H01J37/05H01J49/30H01J2237/0455H01J2237/055H01J2237/057H01J2237/24514
    • A method and apparatus is provided for reducing unwanted isotopes of an ion implantation species from an ion beamline. The apparatus herein disclosed is a mass analysis variable exit aperture that selectively reduces the size of an exit aperture as seen by an ion beam. In one embodiment, the variable mass analysis exit aperture is located within a mass analyzer at a position upstream of a resolving aperture and effectively limits the size of an exit aperture so as to allow passage of desired implantation isotope(s) while blocking the passage of unwanted implantation isotopes. In one particular embodiment, the mass analysis variable exit aperture has a mechanical drive mechanism that enables a blocking structure to be moved into the path of an ion beam in a graduated fashion as guided by a control unit that operates based upon one or more characteristics of the ion beam.
    • 提供了一种用于从离子束线减少离子注入物质的不想要的同位素的方法和装置。 本文公开的装置是质量分析可变出口孔,其选择性地减小出口孔的尺寸,如离子束所见。 在一个实施例中,可变质量分析出口孔位于质量分析器内的分辨孔径上游的位置处,并且有效地限制出口孔的尺寸,以允许期望的注入同位素通过,同时阻止 不想要的植入同位素。 在一个具体实施例中,质量分析可变出口孔具有机械驱动机构,其使阻挡结构能够以分级方式移动到离子束的路径中,该控制单元基于一个或多个 离子束。