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    • 11. 发明授权
    • Addressable fuse array for circuits and mechanical devices
    • 用于电路和机械设备的可寻址保险丝阵列
    • US06501107B1
    • 2002-12-31
    • US09452886
    • 1999-12-01
    • Michael J. SinclairJeremy A. Levitan
    • Michael J. SinclairJeremy A. Levitan
    • H01L2710
    • B81B3/0086B81B7/0012H01L23/5256H01L2924/0002H01L2924/00
    • A fuse array having a plurality of fusible links that can be addressed by two electrodes is disclosed. The fuse array includes two conductive strips having the plurality of fusible links located therebetween and electrically coupled to the conductive strips. The fusible links have different electrical resistance and each fusible link includes a fuse portion. A voltage potential applied across the conductive strips induces current flow through the fusible links in accordance with Ohm's law and ohmic heating occurs at the fuse portion in proportion to the square of the current. The voltage is increased to cause sufficient ohmic heating to occur in the most conductive fusible link (the fusible link having the lowest electrical resistance) so that the fuse portion in that fusible link fuses. Because the fusible links are connected in parallel to the conductive strips, an equivalent resistance of the plurality of fusible links increases and the current flow diminishes so that no further fuse portions are fused at the selected voltage level. Thereafter, the voltage level may be increased to fuse the most conductive fusible link remaining that is not fused. The fuse array may be incorporated into a circuit as a resistor that can be tuned to circuit requirements or as a physical structure in MEMS devices wherein the fuse array may be tuned to change physical properties of the MEMS device.
    • 公开了一种具有可由两个电极寻址的多个易熔链的熔丝阵列。 保险丝阵列包括两个导电条,其中多个易熔连接件位于它们之间并电耦合到导电条上。 熔断链路具有不同的电阻,并且每个可熔连接件包括保险丝部分。 导电片上施加的电压电压根据欧姆定律引起电流流经可熔连接点,欧姆加热与电流平方成比例地在熔丝部分发生。 增加电压以在最导电的可熔连接件(具有最低电阻的熔断管)中发生足够的欧姆加热,使得该可熔接头中的保险丝部分熔断。 因为可熔连接件与导电条平行连接,所以多个可熔连接件的等效电阻增加,并且电流流动减小,使得在所选择的电压电平下不再熔合熔丝部分。 此后,可以增加电压电平以熔断剩余的未融合的最导电的可熔断链。 保险丝阵列可以作为电阻器被并入到电路中,该电阻器可以被调谐到电路要求或作为MEMS器件中的物理结构,其中熔丝阵列可被调谐以改变MEMS器件的物理特性。
    • 16. 发明授权
    • Micromechanical component, method for fabrication and use
    • 微机械部件,制造和使用方法
    • US08063458B2
    • 2011-11-22
    • US11918189
    • 2006-03-28
    • Bernhard LoefflerFranz Schrank
    • Bernhard LoefflerFranz Schrank
    • H01L29/84
    • B81B3/0072B81B7/0012B81B2201/018B81B2201/0235B81B2201/0264B81B2203/0109
    • A micromechanical component that can be produced in an integrated thin-film method is disclosed, which component can be produced and patterned on the surface of a substrate as multilayer construction. At least two metal layers that are separated from the substrate and with respect to one another by interlayers are provided for the multilayer construction. Electrically conductive connecting structures provide for an electrical contact of the metal layers among one another and with a circuit arrangement arranged in the substrate. The freely vibrating membrane that can be used for an inertia sensor, a microphone or an electrostatic switch can be provided with matching and passivation layers on all surfaces in order to improve its mechanical properties, said layers being concomitantly deposited and patterned during the layer producing process or during the construction of the multilayer construction. Titanium nitride layers are advantageously used for this.
    • 公开了可以以集成薄膜方法制造的微机械部件,该组件可以在基板的表面上制造和图案化为多层结构。 为了多层结构,提供了至少两个从衬底分离并通过夹层彼此分开的金属层。 导电连接结构提供了彼此之间的金属层的电接触以及布置在基板中的电路装置。 可以用于惯性传感器,麦克风或静电开关的自由振动膜可以在所有表​​面上设置匹配和钝化层,以改善其机械性能,所述层在层生产过程中伴随沉积和图案化 或在多层结构的施工期间。 氮化钛层有利地用于此。
    • 17. 发明授权
    • Optical interference display panel and manufacturing method thereof
    • 光干涉显示面板及其制造方法
    • US08004736B2
    • 2011-08-23
    • US12463312
    • 2009-05-08
    • Wen-Jian LinBrian ArbuckleBrian GallyPhilip FloydLauren Palmateer
    • Wen-Jian LinBrian ArbuckleBrian GallyPhilip FloydLauren Palmateer
    • G02B26/00
    • G02B26/001B81B7/0012B81B2201/045
    • A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.
    • 第一电极和牺牲层依次形成在基板上,然后在第一电极和牺牲层中形成用于形成支撑件的第一开口。 支撑件形成在第一开口中,然后在牺牲层和支撑件上形成第二电极,从而形成微机电系统结构。 之后,使用粘合剂将保护结构粘附并固定到基底上以形成腔室以包围微机电系统结构,并且至少一个第二开口保留在腔室的侧壁上。 随后采用释放蚀刻工艺以通过第二开口去除牺牲层,以便在光学干涉反射结构中形成空腔。 最后,关闭第二个开口以密封衬底和保护结构之间的光学干涉反射结构。