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11. 发明授权

US11986750B2 Reducing surface and bulk contamination in plastic 有权
公开(公告)号：US11986750B2
公开(公告)日：2024-05-21
申请号：US18114412
申请日：2023-02-27
申请人： The Procter & Gamble Company
发明人： Norman Scott Broyles , Dimitris Ioannis Collias , Anthony Frederick Cappel
IPC分类号： C08J11/08 , B01D11/02 , B08B3/04 , B29B17/00 , B29B17/02 , B29K105/26 , C08J7/02
CPC分类号： B01D11/0288 , B01D11/0203 , B08B3/04 , B29B17/00 , C08J11/08 , B01D11/0292 , B08B2220/00 , B08B2240/00 , B29B2017/0015 , B29B2017/0289 , B29B2017/0293 , B29K2105/26 , C08J7/02 , C08J2300/30
摘要： The present invention generally relates to a method of reducing contamination from plastics. The resulting purer plastic can be used in demanding applications.

12. 发明授权

US11938521B2 Method and apparatus for semiconductor wafer cleaning 有权
公开(公告)号：US11938521B2
公开(公告)日：2024-03-26
申请号：US17591080
申请日：2022-02-02
申请人： Taiwan Semiconductor Manufacturing Company
发明人： Kuang-Wei Cheng , Cheng-Lung Wu , Chyi-Tsong Ni
IPC分类号： B08B3/02 , B08B3/04
CPC分类号： B08B3/02 , B08B3/04 , B08B2240/00
摘要： A method of cleaning a semiconductor wafer includes: loading a semiconductor wafer into a cell having an annular trough; moving a plurality of nozzles into operational orientations for spraying a cleaning solution onto a top surface of the loaded semiconductor wafer; spraying the cleaning solution from each nozzle onto the top surface of the loaded semiconductor wafer in a direction defined by each nozzle's operational orientation such that a patterned flow of cleaning solution is formed on the top surface of the loaded semiconductor wafer; and collecting the cleaning solution in the annular trough of the cell as it flows off the top surface of the loaded semiconductor wafer.

13. 发明申请

US20180222012A1 Method for Cleaning Using Solid Carbon Dioxide 审中-公开
公开(公告)号：US20180222012A1
公开(公告)日：2018-08-09
申请号：US15947300
申请日：2018-04-06
申请人： Bayerische Motoren Werke Aktiengesellschaft
发明人： Bernd HELD , Lukas LANGGAERTNER
IPC分类号： B24C1/00 , B08B5/02 , B24C3/32 , B24C3/12
CPC分类号： B24C1/003 , B08B5/02 , B08B2240/00 , B24C3/12 , B24C3/32 , B32B2262/106
摘要： A method for cleaning using solid carbon dioxide is provided. Adhesive surfaces of the vehicle components are cleaned automatically in an assembly line including several work stations. The adhesive surfaces of the vehicle components may be adhesive surfaces of coated or painted vehicle components. The vehicle components may be composed of a metal alloy such as a steel or aluminum alloy, and/or composed of a fiber composite material such as carbon-fiber-reinforced plastic. The adhesive surfaces of the vehicle components may be cleaned with specifically adapted cleaning parameters.

14. 发明申请

US20170165719A1 MASK-CLEANING APPARATUS 审中-公开
公开(公告)号：US20170165719A1
公开(公告)日：2017-06-15
申请号：US14966277
申请日：2015-12-11
申请人： Ming-Sheng Chen
发明人： Ming-Sheng Chen
IPC分类号： B08B1/00
CPC分类号： B08B1/006 , B08B1/00 , B08B1/008 , B08B1/02 , B08B1/04 , B08B2240/00 , G03F1/0092 , G03F1/82
摘要： A mask-cleaning apparatus includes a frame, a wet cleaning mechanism supported on the frame, and a dry cleaning mechanism supported on the frame and located after the wet cleaning mechanism in a direction of feeding a clean-room wiper. The wet cleaning mechanism wipes a mask before the dry cleaning mechanism wipes the mask. Each of the wet and dry cleaning mechanisms includes a wiping module that includes a vertical plate, a feeder reel, a retriever reel, direction-changing rollers and a pushing roller. The wiping module of the wet cleaning mechanism includes a sprayer mechanism adapted for spraying cleaning liquid onto a portion of the clean-room wiper on the pushing roller.

15. 发明申请

US20160368178A1 METHOD AND DEVICE FOR CLEANING A MOLDING SURFACE OF A REUSABLE LENS MOLD 审中-公开
标题翻译：用于清洁可重复使用的镜头模具的模制表面的方法和装置
公开(公告)号：US20160368178A1
公开(公告)日：2016-12-22
申请号：US15187245
申请日：2016-06-20
申请人： Novartis AG
发明人： Halina Heidrich
IPC分类号： B29C33/72 , B08B9/00 , B08B3/02
CPC分类号： B29C33/72 , B08B3/02 , B08B3/022 , B08B9/00 , B08B2240/00 , B29D11/00125 , B29D11/00519
摘要： A method for cleaning a molding surface (51) of a reusable lens mold (5), in particular of a reusable lens mold (5) for molding ophthalmic lenses such as soft contact lenses, comprising the steps of: generating a jet (3) of deionized water, exposing the molding surface (51) of the reusable lens mold (5) to the jet (3) of deionized water, wherein the jet (3) of deionized water has a circular full cone spray pattern and impinges on the molding surface (51) of the reusable lens mold (5), and wherein the circular full cone spray pattern has a uniform distribution of the volume flow of deionized water over the base of the cone of the circular full cone spray pattern.
摘要翻译：一种用于清洁可重复使用的镜片模具（5）的成型表面（51）的方法，特别是用于模制诸如软性隐形眼镜的眼镜片的可重复使用的镜片模具（5）的方法，包括以下步骤： - 产生射流）， - 将可再利用透镜模具（5）的模制表面（51）暴露于去离子水的射流（3），其中去离子水的射流（3）具有圆形全锥喷射模式并撞击可再利用透镜模具（5）的成型表面（51），并且其中圆形全锥喷射图案具有均匀分布的去离子水的体积流量在圆形全锥形喷雾图案的锥体的基部上。

16. 发明申请

US20160270645A1 CONCENTRATION METER AND ENDOSCOPE REPROCESSOR 审中-公开
标题翻译：浓度计和内镜替代者
公开(公告)号：US20160270645A1
公开(公告)日：2016-09-22
申请号：US15166487
申请日：2016-05-27
申请人： OLYMPUS CORPORATION
发明人： Hiromasa AKAHORI
IPC分类号： A61B1/12 , B08B3/08 , G01N27/416
CPC分类号： A61B1/123 , A61B1/12 , B08B3/08 , B08B2240/00 , G01N27/404 , G01N27/4166
摘要： A concentration meter is a concentration meter that measures a concentration of a predetermined solution, and includes: a main body section including an opening portion, and an internal liquid and an electrode that are housed in the opening portion; a permeation membrane that seals the opening portion; a water-holding section that is opposed to the permeation membrane; and an inflow/outflow section which is an opening that allows a clearance between the permeation membrane and the water-holding section to communicate with an outside space of the main body section, wherein the permeation membrane and the water-holding section are separated from each other by a distance in which the solution is held in the air due to a surface tension of the solution, with the solution contacting the permeation membrane and the water-holding section.
摘要翻译：浓度计是测量预定溶液浓度的浓度计，包括：主体部分，其包括开口部分，以及容纳在开口部分中的内部液体和电极; 密封开口部的渗透膜; 与渗透膜相对的保水部; 以及作为允许渗透膜和保水部之间的间隙与主体部的外部空间连通的开口的流入流出部，其中，渗透膜和保水部与各主体部分分离另外由于溶液的表面张力将溶液保持在空气中的距离，其中溶液与渗透膜和保水部分接触。

17. 发明公开

US20240299863A1 REDUCING SURFACE AND BULK CONTAMINATION IN PLASTIC 审中-公开
公开(公告)号：US20240299863A1
公开(公告)日：2024-09-12
申请号：US18643339
申请日：2024-04-23
申请人： The Procter & Gamble Company
发明人： Norman Scott BROYLES , Dimitris Ioannis COLLIAS , Anthony Frederick CAPPEL
IPC分类号： B01D11/02 , B08B3/04 , B29B17/00 , B29B17/02 , B29K105/26 , C08J7/02 , C08J11/08
CPC分类号： B01D11/0288 , B01D11/0203 , B08B3/04 , B29B17/00 , C08J11/08 , B01D11/0292 , B08B2220/00 , B08B2240/00 , B29B2017/0015 , B29B2017/0289 , B29B2017/0293 , B29K2105/26 , C08J7/02 , C08J2300/30
摘要： The present invention generally relates to a method of reducing contamination from plastics. The resulting purer plastic can be used in demanding applications.

18. 发明授权

US11955328B2 Method and apparatus for cleaning semiconductor wafer 有权
公开(公告)号：US11955328B2
公开(公告)日：2024-04-09
申请号：US17724948
申请日：2022-04-20
申请人： ACM Research (Shanghai) Inc.
发明人： Hui Wang , Xi Wang , Fuping Chen
IPC分类号： H01L21/02 , B08B3/12 , H01L21/673
CPC分类号： H01L21/0206 , B08B3/12 , H01L21/02101 , B08B2240/00 , H01L21/673
摘要： A method for cleaning semiconductor wafer includes putting at least one wafer on a cassette bracket in a first cleaning tank filled with chemical solution; after said wafers have been processed in the first cleaning tank, transferring the wafers from the first cleaning tank to a second cleaning tank with the wafers immersing in the chemical solution; and after said wafers have been processed in the second cleaning tank, taking the wafers out of the second cleaning tank.

19. 发明公开

US20240075491A1 Cavity Cleaning and Coating System 审中-公开
公开(公告)号：US20240075491A1
公开(公告)日：2024-03-07
申请号：US18507750
申请日：2023-11-13
申请人： Russell R. Gohl
发明人： Russell R. Gohl
IPC分类号： B05B13/04 , B05B12/14 , B08B9/093
CPC分类号： B05B13/0431 , B05B12/14 , B08B9/0936 , B08B2240/00
摘要： A cavity cleaning and coating system for safely and efficiently cleaning and coating the interior of a cavity without requiring entry of any workers. The cavity cleaning and coating system generally includes a mount which is coupled with a movable arm of a vehicle. The mount includes an inner plate, which is coupled to the arm, and an outer plate. A shaft is coupled to the outer plate. The mount is adjustable independently of the arm of the vehicle, including outwardly, inwardly, and rotatably. A spray head is connected to the shaft. The spray head is rotatable and includes a dispenser for dispensing fluids. The vehicle is positioned near a cavity to be treated. The mount is adjusted for optimal positioning of the spray head. The spray head is lowered into the cavity to dispense a cleaning fluid and, after the cleaning fluid has dried, a coating fluid.

20. 发明公开

US20230330709A1 PLANT LEAF CLEANER 审中-公开
公开(公告)号：US20230330709A1
公开(公告)日：2023-10-19
申请号：US17721825
申请日：2022-04-15
申请人： RAMON O'BRIEN HUTCHINSON , SABINA KATARZYNA MARSZAL
发明人： RAMON O'BRIEN HUTCHINSON , SABINA KATARZYNA MARSZAL
IPC分类号： B08B1/00
CPC分类号： B08B1/006 , B08B2240/00
摘要： A tool for cleaning, preserving, and applying solution to plant's leaves. The tool includes a pair of tongs accompanied by removable, washable, and durable material cleaning pads along each tong's arm. The pads cover the arms of the tongs while in use and are made of a quick-drying material allowing for the pads to be removed, washed/cleaned as desired, and reused multiple times, making the invention sustainable. The tongs are used to grasp a leaf of a plant and to clean it by running the tongs across the leaf's surface. The tool can be used on a wide variety of leafy plants, cleaning large leaves as well as those as small as 2.5 inches in size. The pad's material is delicate to plant's leaves, and a removable protective spacer placed on the lower inner arm of the tongs prevents the leaves from being damaged or squeezed too hard. The removable pads can be used dry as well as wet, using water or any other desired cleaning and shining solution.

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