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    • 11. 发明授权
    • Cleaning agent and cleaning process for harmful gas
    • 清洁剂和有害气体的清洗工艺
    • US5882615A
    • 1999-03-16
    • US677978
    • 1996-07-10
    • Hideki FukudaKenji OtsukaSatoshi Arakawa
    • Hideki FukudaKenji OtsukaSatoshi Arakawa
    • B01D53/68B01J20/04
    • B01D53/68B01D2251/406
    • There are disclosed a cleaning agent for removing a fluorine-compound gas such as hydrogen fluoride, fluorine, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride which agent comprises a molded article produced by using strontium hydroxide as a principal component, an organic binding agent as a molding agent and the hydroxide of an alkaline earth metal other than strontium as a molding aid; and a process for cleaning a harmful gas which comprises feeding a harmful gas containing a fluorine-compound gas into a column packed inside with the above cleaning agent to remove the fluorine-compound gas; and exhausting a gas substantially free from the fluorine-compound gas. The above cleaning agent is capable of removing the fluorine-compound gas in high efficiency without causing any danger, thereby making itself well suited to the cleaning of the gases exhausted, for example, from semiconductor manufacturing industries.
    • 公开了一种用于除去氟化氢,氟,六氟化钨,四氟化硅和三氟化硼等氟化合物气体的清洗剂,该清洗剂包括通过使用氢氧化锶作为主要成分制备的模制品,有机粘合剂作为 成型剂和除锶之外的碱土金属的氢氧化物作为模塑助剂; 以及清洗有害气体的方法,包括将含有氟化合物气体的有害气体进料到填充有上述清洗剂的内部的塔中以除去氟化合物气体; 并排出基本上不含氟化合物气体的气体。 上述清洗剂能够高效率地除去氟化合物气体,而不会产生任何危险,从而使其非常适用于例如从半导体制造业排出的气体的清洗。