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11. 发明授权

US09110087B2 Polymer for filler for preprocessing column 有权
标题翻译：预处理柱填料用聚合物
公开(公告)号：US09110087B2
公开(公告)日：2015-08-18
申请号：US13950013
申请日：2013-07-24
申请人： Wako Pure Chemical Industries, Ltd. , Nippon Filcon Co., Ltd.
发明人： Yoshinori Inoue , Kimiko Yoshida , Mamoru Kubota , Hitoshi Uemori
IPC分类号： C08F236/20 , G01N30/96 , C08F236/22 , C08F224/00 , B01J41/14 , B01J41/20 , C08F8/30 , C08F8/32 , C08F220/32 , C08F220/36 , G01N30/02
CPC分类号： G01N30/96 , B01J41/14 , B01J41/20 , B01J2220/54 , C08F8/30 , C08F8/32 , C08F220/32 , C08F220/36 , C08F224/00 , C08F236/20 , C08F236/22 , G01N30/02 , Y10T436/141111 , Y10T436/145555 , Y10T436/147777 , Y10T436/173845 , Y10T436/182 , Y10T436/193333 , Y10T436/201666 , B01D15/363
摘要： The present invention provides a polymer of the compound represented by formula [1]: and the compound represented by formula [2]: to a glycidyl group of which an anion exchanging group is introduced; a filler for measuring an acidic group binding to a perfluoro compound at a terminal, which comprises the polymer; a column filled with the filler; a method for measuring said perfluoro compound having an acidic group at a terminal by using the column; a filler or a column filled with the filler comprising the polymer for measuring a drug; and a method for measuring a drug by using the column.
摘要翻译：本发明提供由式[1]表示的化合物的聚合物和由式[2]表示的化合物：引入阴离子交换基团的缩水甘油基; 用于测量末端具有与全氟化合物结合的酸性基团的填料，所述填料包含所述聚合物; 填充填料的柱; 通过使用该柱测定末端具有酸性基团的全氟化合物的方法; 填充剂或填充有包含用于测量药物的聚合物的填料的柱; 以及使用该柱测定药物的方法。

12. 发明授权

US09034810B2 Processing agent composition for semiconductor surface and method for processing semiconductor surface using same 有权
标题翻译：用于半导体表面的加工剂组合物和使用其的半导体表面的处理方法
公开(公告)号：US09034810B2
公开(公告)日：2015-05-19
申请号：US13393981
申请日：2010-09-01
申请人： Hironori Mizuta , Takuhiro Kimura
发明人： Hironori Mizuta , Takuhiro Kimura
IPC分类号： C11D3/60 , G03F7/42 , H01L21/311 , C11D11/00
CPC分类号： G03F7/425 , C11D11/0047 , G03F7/423 , G03F7/426 , H01L21/31133
摘要： The present invention is directed to provide a semiconductor surface treating agent; composition which is capable of stripping an anti-reflection coating layer, a resist layer, and a cured resist layer in the production process of a semiconductor device and the like easily and in a short time, as well as a method for treating a semiconductor surface, comprising that the composition is used. The present invention relates to a semiconductor surface treating agent; composition, comprising [I] a compound generating a fluorine ion in water, [II] a carbon radical generating agent; , [III] water, [IV] an organic solvent, and [V] at least one kind of compound selected from a group consisting of hydroxylamine and a hydroxylamine derivative represented by the general formula [1], as well as a method for treating the semiconductor surface, comprising that the composition is used: (wherein R1 represents a linear, branched or cyclic C1-6 alkyl group, or a linear or branched C1-4 substituted alkyl group having 1 to 3 hydroxyl groups; R2 represents a hydrogen atom, a linear, branched or cyclic C1-6 alkyl group, or a linear or branched C1-4 substituted alkyl group having 1 to 3 hydroxyl groups).
摘要翻译：本发明旨在提供一种半导体表面处理剂; 能够容易且短时间地在半导体装置等的制造工序中剥离防反射涂层，抗蚀剂层和固化的抗蚀剂层的组合物以及半导体表面的处理方法包括使用该组合物。本发明涉及半导体表面处理剂; 组合物，其包含[I]在水中产生氟离子的化合物，[II]碳自由基发生剂; ，[III]水，[IV]有机溶剂和[V]至少一种选自羟胺和由通式[1]表示的羟胺衍生物的化合物，以及一种治疗方法该半导体表面包括使用该组合物：（其中R1表示直链，支链或环状C 1-6烷基或具有1-3个羟基的直链或支链C 1-4取代的烷基; R 2表示氢原子直链，支链或环状C 1-6烷基，或具有1-3个羟基的直链或支链C 1-4取代的烷基）。

13. 发明申请

US20140142324A1 METHOD FOR PRODUCING CYCLIC SULFONIC ACID ESTER AND INTERMEDIATE THEREOF 有权
标题翻译：生产环磷酸酯及其中间体的方法
公开(公告)号：US20140142324A1
公开(公告)日：2014-05-22
申请号：US14163682
申请日：2014-01-24
申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD.
发明人： Ayako KURAMOTO , Kuniaki OKAMOTO , Tsutomu WATAHIKI , Motoshige SUMINO
IPC分类号： C07D327/04
CPC分类号： C07D327/04 , C07D327/10
摘要： The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.
摘要翻译：本发明的目的在于提供一种能够以低成本，高收率地获得环状磺酸酯（磺内酯），而且能够以工业规模稳定地获得磺酸酯（磺内酯）的有效的制造方法。本发明涉及一种生产羟基培养基的方法，包括第一步骤，其中具有特定结构的二醇和亚硫酰卤反应得到具有特定结构的环状亚硫酸盐，第二步是将环状亚硫酸盐与水或 /和酒精; 一种具有特定结构的不饱和磺内酯的制造方法，其特征在于，具有将具有规定结构的羟基磺内酯与酰卤或酸酐反应得到中间体的第3工序，接着用碱处理中间体; 以及具有特定结构的环状亚硫酸盐。

14. 发明申请

US20130309775A1 POLYMER FOR FILLER FOR PREPROCESSING COLUMN 有权
标题翻译：用于预处理柱的填料用聚合物
公开(公告)号：US20130309775A1
公开(公告)日：2013-11-21
申请号：US13950013
申请日：2013-07-24
申请人： Nippon Filcon Co., Ltd. , Wako Pure Chemical Industries, Ltd.
发明人： Yoshinori Inoue , Kimiko Yoshida , Mamoru Kubota , Hitoshi Uemori
IPC分类号： G01N30/96
CPC分类号： G01N30/96 , B01J41/14 , B01J41/20 , B01J2220/54 , C08F8/30 , C08F8/32 , C08F220/32 , C08F220/36 , C08F224/00 , C08F236/20 , C08F236/22 , G01N30/02 , Y10T436/141111 , Y10T436/145555 , Y10T436/147777 , Y10T436/173845 , Y10T436/182 , Y10T436/193333 , Y10T436/201666 , B01D15/363
摘要： It is a subject of the present invention to provide a novel polymer; a filler for measuring a perfluoro compound having an acidic group at terminal which comprises said polymer; a column filled with said filler; and a measuring method for a perfluoro compound having an acidic group at terminal by using said column; as well as a filler for measuring a drug comprising the above-described polymer; a column filled with said filler; and a measuring method for a drug by using said column.The present invention relates to a polymer obtained by introducing an anion exchanging group to a glycidyl group in a polymer obtained by polymerizing the compound represented by the following general formula [1]: and the compound represented by the following general formula [2]: a filler (column) for measuring an acidic group binding perfluoro compound at terminal which comprises said polymer; a method for measuring said perfluoro compound by using said column; a filler (column) for measuring a drug which comprises the above-described polymer; and a method for measuring a drug by using said column.
摘要翻译：本发明的主题是提供一种新的聚合物; 用于测量在包含所述聚合物的末端具有酸性基团的全氟化合物的填料; 填充有所述填料的柱; 以及通过使用所述柱在末端具有酸性基团的全氟化合物的测定方法; 以及用于测量包含上述聚合物的药物的填充剂; 填充有所述填料的柱; 以及使用该柱的药物的测定方法。本发明涉及通过将由下列通式[1]表示的化合物聚合而获得的聚合物中的缩水甘油基引入阴离子交换基团和由以下通式[2]表示的化合物获得的聚合物：a 用于测量包含所述聚合物的末端的结合全氟化合物的酸性基团的填料（柱）通过使用所述柱测量所述全氟化合物的方法; 用于测量包含上述聚合物的药物的填料（柱）; 以及通过使用所述柱来测定药物的方法。

15. 发明授权

US08580925B2 Method for examining carcinoma and adenoma 失效
标题翻译：检查癌和腺瘤的方法
公开(公告)号：US08580925B2
公开(公告)日：2013-11-12
申请号：US11795328
申请日：2005-12-15
申请人： Reiji Kannagi , Mineko Izawa , Naoko Kimura , Shunsuke Kurei , Kazue Watanabe
发明人： Reiji Kannagi , Mineko Izawa , Naoko Kimura , Shunsuke Kurei , Kazue Watanabe
IPC分类号： C07K16/00
CPC分类号： C07K16/40 , C07K16/3076 , G01N33/57407 , G01N2333/91194 , G01N2400/02
摘要： [PROBLEMS] To provide examination methods and reagents able to detect efficiently cancer patients and patients at high risk of cancer.[MEANS FOR SOLVING PROBLEMS] Significant differences in the distribution of GlcNAc-6-sulfotransferase isozymes, sulfation enzymes of sugar residues, between non-carcinoma tissues and carcinoma tissues or adenoma tissues were discovered. The discovery is evidently applicable to detect carcinomas and adenomas (except colorectal carcinomas and colorectal adenomas) specifically by assaying a certain range of GlcNAc-6-sulfated sugar residue groups in tissues of patients and in fecal samples. Examination of carcinomas and adenomas is possible by the use of antibodies reacting specifically with GlcNAc-6-sulfated sugar residues specifically synthesized by enzymes present in carcinoma and adenoma tissues.
摘要翻译： [问题]提供能够有效检测癌症患者和癌症高危患者的检查方法和试剂。 [解决问题的方法]发现了GlcNAc-6-磺基转移酶同工酶，糖残基硫酸化酶，非癌组织和癌组织或腺瘤组织分布的显着差异。该发现显然适用于通过测定患者组织和粪便样品中的一定范围的GlcNAc-6-硫酸化糖残基来检测癌和腺瘤（结肠直肠癌和结肠直肠腺癌除外）。可以通过使用特异性地与存在于癌和腺瘤组织中的酶特异性合成的GlcNAc-6硫酸化糖残基的抗体来检查癌和腺瘤。

16. 发明申请

US20130261040A1 SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：用于铜线的衬底清洁器和用于清洁铜线接线半导体衬底的方法
公开(公告)号：US20130261040A1
公开(公告)日：2013-10-03
申请号：US13990328
申请日：2011-11-28
申请人： Hiromi Kawada , Satoshi Shirahata , Hironori Mizuta , Masahiko Kakizawa , Kazuo Shiraki
发明人： Hiromi Kawada , Satoshi Shirahata , Hironori Mizuta , Masahiko Kakizawa , Kazuo Shiraki
IPC分类号： C11D7/32
CPC分类号： C11D7/3245 , C11D7/3209 , C11D7/3218 , C11D11/0047 , H01L21/02074
摘要： A cleaning agent for a substrate having a copper wiring consisting of an aqueous solution comprising [I] an amino acid represented by the following general formula [1], and [II] an alkylhydroxylamine; and a method for cleaning a semiconductor substrate having a copper wiring characterized by using the relevant cleaning agent for a substrate having a copper wiring; (wherein R1 represents a hydrogen atom, a carboxymethyl group or a carboxyethyl group; and R2 and R3 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, which may have a hydroxyl group, provided that those where R1 to R3 are all hydrogen atoms are excluded.).
摘要翻译：一种基底用清洁剂，其具有由包含[I]由以下通式[1]表示的氨基酸的水溶液和[II]烷基羟胺组成的铜布线; 以及一种用于清洗具有铜布线的半导体衬底的方法，其特征在于使用具有铜布线的衬底的相关清洁剂; （其中R1表示氢原子，羧甲基或羧乙基; R2和R3各自独立地表示氢原子或可具有羟基的具有1至4个碳原子的烷基，条件是其中R1至 R3都是氢原子被排除。

17. 发明授权

US08546609B2 Ionic liquid containing allylsulfonate anion 有权
标题翻译：含有烯丙基磺酸盐阴离子的离子液体
公开(公告)号：US08546609B2
公开(公告)日：2013-10-01
申请号：US13393144
申请日：2010-08-30
申请人： Tsutomu Watahiki , Kuniaki Okamoto , Motoshige Sumino
发明人： Tsutomu Watahiki , Kuniaki Okamoto , Motoshige Sumino
IPC分类号： C07C313/00
CPC分类号： C07C309/20 , C07D213/06 , C07D213/20 , C07D213/68 , C07D233/58 , C07D295/04 , C07D295/08
摘要： Problem:Providing a novel ionic liquid, which is low-cost, environment-friendly, and has low viscosity and melting point.Means for Solving the Problem:The present invention is the invention of the ionic liquid represented by the general formula [1]: {wherein, R1 to R3 and n pieces of R4 each independently represent hydrogen atom or alkyl group having 1 to 4 carbon atoms, R5 to R7 each independently represent alkyl group, aralkyl group, or aryl group, R8 represents alkyl group, aralkyl group, aryl group, or the one represented by the general formula [2]: (wherein T represents alkylene chain having 1 to 8 carbon atoms, n represents 1 or 2, and R1 to R7 are the same as the above-described), X represents nitrogen atom or phosphorus atom, n represents 1 or 2. When n is 1, R3 and R4 are bound and may form cyclohexene ring together with the adjacent carbon atoms. In addition, when X is nitrogen atom, R5 to R7 or R5 to R6 may form hetero ring with nitrogen atom binding thereto}.
摘要翻译：问题：提供一种低成本，环保的新型离子液体，具有低粘度和熔点。解决问题的手段：本发明是由通式[1]表示的离子液体的发明：{其中，R 1〜R 3和n个R 4各自独立地表示氢原子或碳原子数1〜4的烷基 R 5〜R 7各自独立地表示烷基，芳烷基或芳基，R 8表示烷基，芳烷基，芳基或由通式[2]表示的基团：（其中，T表示1〜8的亚烷基链碳原子，n表示1或2，并且R 1至R 7与上述相同），X表示氮原子或磷原子，n表示1或2.当n为1时，R 3和R 4结合并形成环己烯环与相邻的碳原子一起环。此外，当X是氮原子时，R 5至R 7或R 5至R 6可以与与其结合的氮原子形成杂环}。

18. 发明申请

US20130171835A1 COMPOSITION FOR WATER-REPELLENT TREATMENT OF SURFACE, AND METHOD FOR WATER-REPELLENT TREATMENT OF SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAME 审中-公开
标题翻译：用于水表面处理的组合物，以及使用相同方法水分处理半导体基材表面的方法
公开(公告)号：US20130171835A1
公开(公告)日：2013-07-04
申请号：US13821815
申请日：2011-09-07
申请人： Hironori Mizuta , Yoji Urano , Masahiko Kakizawa
发明人： Hironori Mizuta , Yoji Urano , Masahiko Kakizawa
IPC分类号： C09D5/00 , H01L21/02
CPC分类号： C09D5/00 , H01L21/0206 , H01L21/02068 , H01L21/022 , H01L21/3105 , H01L21/321
摘要： The purpose of the present invention to provide: a composition which can be used for water-repellent treating of the entire surface of a semiconductor substrate having a pattern formed by laminating a Si-containing insulating layer and a metal layer, at one time; and a method for water-repellent treatment of the semiconductor substrate surface using the composition.The present invention relates to: (1) a composition for water-repellent treatment of a semiconductor substrate surface comprising a) at least one kind of a compound selected from the group consisting of a long-chain alkyl tertiary amine and a long-chain alkyl ammonium salt, b) a base or an acid generating agent, having a condensed ring structure or forming a condensed ring structure by generating a base or an acid and c) a polar organic solvent, and (2) a method for water-repellent treatment of the semiconductor substrate surface having the pattern formed by laminating the Si-containing insulating layer and the metal layer, using the composition.
摘要翻译：本发明的目的是提供一种组合物，其可以一次用于通过层压含Si绝缘层和金属层而形成的图案的半导体衬底的整个表面的防水处理; 以及使用该组合物对半导体衬底表面进行防水处理的方法。本发明涉及：（1）一种半导体衬底表面的疏水处理用组合物，其特征在于：a）至少一种选自长链烷基叔胺和长链烷基铵盐，b）具有稠环结构或通过产生碱或酸形成稠环结构的碱或酸发生剂，和c）极性有机溶剂，和（2）防水处理方法的半导体衬底表面具有通过使用该组合物层压含Si绝缘层和金属层形成的图案。

19. 发明申请

US20130066070A1 PROCESS FOR PRODUCING ESTER COMPOUND 有权
标题翻译：生产酯化合物的方法
公开(公告)号：US20130066070A1
公开(公告)日：2013-03-14
申请号：US13658362
申请日：2012-10-23
申请人： Wako Pure Chemical Industries, Ltd.
发明人： Shigeaki IMAZEKI , Ryohiko KINOSHITA
IPC分类号： C07B41/12 , C07D315/00
CPC分类号： C07C319/20 , C07C67/08 , C07D307/68 , C07C69/708 , C07C69/612 , C07C69/716 , C07C69/653 , C07C69/017 , C07C69/63 , C07C69/14 , C07C323/52 , C07C69/157 , C07C69/72
摘要： To provide an environmentally-friendly method for producing industrially an ester compound.SOLUTIONThe present invention is a method for producing an ester compound which comprises subjecting a carboxylic acid and an alcohol to dehydration-condensation reaction using an involatile acid catalyst and then removing the residual acid catalyst by bringing a weak basic substance into contact with the residual acid catalyst.
摘要翻译：提供工业上生产酯化合物的环保方法。解决方案本发明是一种酯化合物的制备方法，其包括使用非挥发性酸催化剂使羧酸和醇进行脱水缩合反应，然后通过使弱碱性物质与残留酸接触来除去残留的酸催化剂催化剂。

20. 发明申请

US20120157368A1 PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME 有权
标题翻译：用于半导体表面的处理剂组合物和使用其处理半导体表面的方法
公开(公告)号：US20120157368A1
公开(公告)日：2012-06-21
申请号：US13393981
申请日：2010-09-01
申请人： Hironori Mizuta , Takuhiro Kimura
发明人： Hironori Mizuta , Takuhiro Kimura
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , C11D11/0047 , G03F7/423 , G03F7/426 , H01L21/31133
摘要： The present invention is directed to provide a semiconductor surface treating agent composition which is capable of stripping an anti-reflection coating layer, a resist layer, and a cured resist layer in the production process of a semiconductor device and the like easily and in a short time, as well as a method for treating a semiconductor surface, comprising that the composition is used. The present invention relates to a semiconductor surface treating agent composition, comprising [I] a compound generating a fluorine ion in water, [II] a carbon radical generating agent, [III] water, [IV] an organic solvent, and [V] at least one kind of compound selected from a group consisting of hydroxylamine and a hydroxylamine derivative represented by the general formula [1], as well as a method for treating the semiconductor surface, comprising that the composition is used: (wherein R1 represents a linear, branched or cyclic C1-6 alkyl group, or a linear or branched C1-4 substituted alkyl group having 1 to 3 hydroxyl groups; R2 represents a hydrogen atom, a linear, branched or cyclic C1-6 alkyl group, or a linear or branched C1-4 substituted alkyl group having 1 to 3 hydroxyl groups).
摘要翻译：本发明的目的在于提供一种半导体表面处理剂组合物，该半导体表面处理剂组合物能够容易且简便地在半导体器件等的制造过程中剥离抗反射涂层，抗蚀剂层和固化的抗蚀剂层时间，以及用于处理半导体表面的方法，包括使用该组合物。本发明涉及一种半导体表面处理剂组合物，其包含[I]在水中产生氟离子的化合物，[II]碳自由基产生剂，[III]水，[IV]有机溶剂和[V] 选自羟胺和由通式[1]表示的羟胺衍生物的至少一种化合物以及用于处理半导体表面的方法，包括使用该组合物：（其中R1表示直链，支链或环状C 1-6烷基，或具有1-3个羟基的直链或支链C 1-4取代的烷基; R 2表示氢原子，直链，支链或环状C 1-6烷基，或直链或支链具有1〜3个羟基的支链C 1-4取代烷基）。

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