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11. 发明授权

US08538131B2 Defect inspection apparatus and method of defect inspection 有权
标题翻译：缺陷检查装置及缺陷检查方法
公开(公告)号：US08538131B2
公开(公告)日：2013-09-17
申请号：US11511398
申请日：2006-08-29
申请人： Tamihide Yasumoto , Naohiro Takahashi
发明人： Tamihide Yasumoto , Naohiro Takahashi
IPC分类号： G06K9/00
CPC分类号： G06K9/68
摘要： A first defect classification section uses a pre-inspection test target as the inspected piece, and classifies the defects, based on results of the defect inspection executed a plurality of times by the defect detection system, into first defects detected constantly in each of the plurality of times of inspection, and into second defects detected only in a part of, but not in the residual part of the plurality of times of inspection.
摘要翻译：第一缺陷分类部使用预检测试对象作为被检查部，并且基于缺陷检测系统多次执行的缺陷检查的结果，将缺陷分类为在多个检测对象中不断检测到的第一缺陷的检查次数，并且检测到仅在多次检查的一部分但不在剩余部分中检测到的第二缺陷。

12. 发明申请

US20110181545A1 SENSOR ELEMENT AND DISPLAY APPARATUS 审中-公开
标题翻译：传感器元件和显示设备
公开(公告)号：US20110181545A1
公开(公告)日：2011-07-28
申请号：US13009434
申请日：2011-01-19
申请人： Naohiro Takahashi , Satoshi Terui , Masato Ishigaki , Katsunori Sato , Hidetoshi Honda
发明人： Naohiro Takahashi , Satoshi Terui , Masato Ishigaki , Katsunori Sato , Hidetoshi Honda
IPC分类号： G06F3/044
CPC分类号： G06F3/041 , G06F3/044 , G06F2203/04103
摘要： A sensor element is provided that includes a flexible transparent base material, a first conductive pattern, and a second conductive pattern. The flexible transparent base material has a first surface and a second surface opposite to the first surface. The first conductive pattern is configured to electrostatically detect an operation position of an input operator in a first direction, the first conductive pattern being formed on the first surface. The second conductive pattern is configured to electrostatically detect an operation position of the input operator in a second direction different from the first direction, the second conductive pattern being formed on the second surface.
摘要翻译：提供了一种传感器元件，其包括柔性透明基材，第一导电图案和第二导电图案。柔性透明基材具有与第一表面相反的第一表面和第二表面。第一导电图案被配置为在第一方向静电地检测输入操作者的操作位置，第一导电图案形成在第一表面上。第二导电图形被配置为在与第一方向不同的第二方向上静电地检测输入操作者的操作位置，第二导电图案形成在第二表面上。

13. 发明授权

US07755753B2 Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof 有权
标题翻译：缺陷检查装置，其灵敏度校准方法，缺陷检测灵敏度校准用基板及其制造方法
公开(公告)号：US07755753B2
公开(公告)日：2010-07-13
申请号：US11501755
申请日：2006-08-10
申请人： Naohiro Takahashi , Tamihide Yasumoto
发明人： Naohiro Takahashi , Tamihide Yasumoto
IPC分类号： G01N21/88 , G01F9/00
CPC分类号： G01N21/9501 , G01N21/93 , G01N21/956
摘要： A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using the reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.
摘要翻译：用于缺陷检测灵敏度校准的参考衬底具有：具有不同尺寸的锥形缺陷的图案和编程缺陷部分，并且在硅衬底上随机形成。通过使用参考基板进行缺陷检测灵敏度校准，可以获得可用于制造管理中的用于在灯被更换在缺陷检查装置的照明部分中的灵敏度调节之后的指标。

14. 发明申请

US20070035726A1 Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof 有权
标题翻译：缺陷检查装置，其灵敏度校准方法，缺陷检测灵敏度校准用基板及其制造方法
公开(公告)号：US20070035726A1
公开(公告)日：2007-02-15
申请号：US11501755
申请日：2006-08-10
申请人： Naohiro Takahashi , Tamihide Yasumoto
发明人： Naohiro Takahashi , Tamihide Yasumoto
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/93 , G01N21/956
摘要： A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using the reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.
摘要翻译：用于缺陷检测灵敏度校准的参考衬底具有：具有不同尺寸的锥形缺陷的图案和编程缺陷部分，并且在硅衬底上随机形成。通过使用参考基板进行缺陷检测灵敏度校准，可以获得可用于制造管理中的用于在灯被更换在缺陷检查装置的照明部分中的灵敏度调节之后的指标。

15. 发明授权

US06231125B1 Seat with resilient sheet-formed seat cushion 失效
标题翻译：带有弹性片状座垫的座椅
公开(公告)号：US06231125B1
公开(公告)日：2001-05-15
申请号：US09218203
申请日：1998-12-22
申请人： Minoru Maeda , Isao Kawashima , Tomomi Shoji , Tsutomu Matsuzaki , Naohiro Takahashi , Masashi Ishii , Tsutomu Ao
发明人： Minoru Maeda , Isao Kawashima , Tomomi Shoji , Tsutomu Matsuzaki , Naohiro Takahashi , Masashi Ishii , Tsutomu Ao
IPC分类号： A47C702
CPC分类号： B60N2/449 , A47C7/282 , A47C31/02 , B60N2/5883 , B60N2/66 , B60N2/666 , B60N2/682 , B60N2/70 , B60N2/7011 , B60N2/72 , B60N2/986
摘要： A seat is provided which comprises a generally quadrilateral seat frame and a seat cushion formed from a resilient sheet and provided bridging between lateral sides of, and inside, the seat frame. A cushion member is provided opposite to the resilient sheet and bridging between lateral sides of, and inside, the seat frame. The cushion member is deflectable, under the weight of a sitting person, along with the resilient sheet which mainly receives the weight of the sitting person on the seat.
摘要翻译：提供了一种座椅，其包括大致四边形的座椅框架和由弹性片形成的座垫，并且在座椅框架的侧面和内侧之间提供桥接。缓冲构件设置成与弹性片相对并且在座椅框架的侧面和内侧之间桥接。缓冲构件在坐着的重量下可偏转，主要与弹性片一起，弹性片主要容纳座位上坐着的人的重量。

16. 发明授权

US5951084A Seat structure for a vehicle 失效
标题翻译：车辆座椅结构
公开(公告)号：US5951084A
公开(公告)日：1999-09-14
申请号：US936731
申请日：1997-09-25
申请人： Hidetsugu Okazaki , Naohiro Takahashi
发明人： Hidetsugu Okazaki , Naohiro Takahashi
IPC分类号： B60N2/06 , B60N2/20 , B60N2/22 , B60N2/32 , B60N2/75 , B60N3/00 , B60R7/04 , B60N2/12
CPC分类号： B60N2/206 , B60N2/06 , B60N2/2222 , B60N2/4646 , B60N2/4686 , B60N3/002 , B60N2205/30
摘要： A seat structure for a vehicle includes a center seat that is slidable in the front-rear direction of the vehicle along a predetermined path extending through front and rear seat rows between respective left and right seats of the seat rows separated from each other transversely to the travelling direction of the vehicle. A console box is provided rearwardly of the center seat and slidable in the front-rear direction of the vehicle. The console box includes an armrest pivotable relative to the body of the box. The console box is located in an area defined by the left and right seats of the rear seat row when these seats are inclined rearward.
摘要翻译：一种用于车辆的座椅结构，包括：中心座椅，其沿车辆前后方向可滑动的预定路径延伸，该预定路径延伸穿过座椅列的相应的左右座椅之间的前排座椅排和右后座椅横向相互离开的左右座椅排车辆行驶方向。控制箱位于中心座的后方，可沿车辆的前后方向滑动。控制台包括相对于箱体可枢转的扶手。当这些座椅向后倾斜时，控制箱位于由后座排的左右座椅所限定的区域内。

17. 发明申请

US20130004709A1 TRANSPARENT ELECTRODE DEVICE, INFORMATION INPUT DEVICE, AND ELECTRONIC EQUIPMENT 有权
标题翻译：透明电极装置，信息输入装置和电子设备
公开(公告)号：US20130004709A1
公开(公告)日：2013-01-03
申请号：US13528468
申请日：2012-06-20
申请人： Mikihisa Mizuno , Naohiro Takahashi
发明人： Mikihisa Mizuno , Naohiro Takahashi
IPC分类号： H01B7/02 , B32B3/10
CPC分类号： G06F3/044 , Y10T428/24273 , Y10T428/24322 , Y10T428/24331 , Y10T428/24802 , Y10T428/24851 , Y10T428/24917
摘要： A transparent electrode device includes: a substrate; an electrode region formed on the substrate using a transparent electroconductive film; and an insulating region disposed on the substrate and adjacent to the electrode region, in which a plurality of random island patterns including patterns having a width of 100 μm or greater, formed using the transparent electroconductive film, are disposed mutually distanced from one another.
摘要翻译：透明电极装置包括：基板; 使用透明导电膜在所述基板上形成的电极区域; 以及设置在所述基板上并且与所述电极区域相邻的绝缘区域，其中使用所述透明导电膜形成的包括具有100μm以上的宽度的图案的多个随机岛状图案彼此相距设置。

18. 发明授权

US08270703B2 Defect inspection apparatus, defect inspection method, and manufacture method for semiconductor device 有权
标题翻译：缺陷检查装置，缺陷检查方法以及半导体装置的制造方法
公开(公告)号：US08270703B2
公开(公告)日：2012-09-18
申请号：US12404430
申请日：2009-03-16
申请人： Naohiro Takahashi , Isao Motomura
发明人： Naohiro Takahashi , Isao Motomura
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/9503 , G01N2021/8854 , G01N2021/8858 , G06T7/0004 , G06T2207/30148 , H01L22/12
摘要： A distinguishing size for distinguishing a pseudo defect from a defect caused by a process trouble is stored in a first storage area. Defect data are stored in a second storage area. A processing unit detects a defect on a wafer surface, and stores the defect data in the second storage area. Before a defect detection process is completed for all areas of the wafer surface, a size of a defect detected in a partial area is compared with the distinguishing size stored in the first storage area. If the detected defect has a size equal to or larger than the distinguishing size, an alarm is output through an output unit, whereas if a defect having a size equal to or larger than the distinguishing size is not detected, the defect detection process is executed for the area still not subjected to the defect detection process.
摘要翻译：用于区分伪缺陷与由工艺故障引起的缺陷的区别大小被存储在第一存储区域中。缺陷数据存储在第二存储区域中。处理单元检测晶片表面上的缺陷，并将缺陷数据存储在第二存储区域中。在对晶片表面的所有区域完成缺陷检测处理之前，将部分区域中检测到的缺陷的大小与存储在第一存储区域中的区别大小进行比较。如果检测到的缺陷的大小等于或大于识别尺寸，则通过输出单元输出警报，而如果没有检测到具有等于或大于区分大小的大小的缺陷，则执行缺陷检测处理因为该区域仍未进行缺陷检测处理。

19. 发明申请

US20100128119A1 DEFECT REVIEW APPARATUS AND METHOD FOR WAFER 有权
标题翻译：缺陷评估装置和方法
公开(公告)号：US20100128119A1
公开(公告)日：2010-05-27
申请号：US12614905
申请日：2009-11-09
申请人： Naohiro Takahashi
发明人： Naohiro Takahashi
IPC分类号： H04N7/18 , G06K9/00
CPC分类号： G06T7/001 , G06T2207/10061 , G06T2207/30148
摘要： A defect review apparatus includes a storage device which stores data about a defect of an inspection target object; a first imaging device which captures an image located in a position on a surface of the inspection target object, the position being specified by information regarding the position of the inspection target object which has been input; and a control device which controls the first imaging device. The storage device stores: first defect detection data including a defect number as which the defect of the inspection target object detected by a first defect detection process is labeled, and information regarding the position of the defect; and second defect data including a defect number as which the defect of the inspection target object detected by a second defect detection process is labeled, and information regarding its position.
摘要翻译：缺陷检查装置包括存储关于检查目标对象的缺陷的数据的存储装置; 第一成像装置，其捕获位于所述检查对象物体的表面上的位置的图像，所述位置由关于被输入的检查对象物的位置的信息指定; 以及控制第一成像装置的控制装置。存储装置存储：包括通过第一缺陷检测处理检测到的检查对象物体的缺陷被标记的缺陷数的第一缺陷检测数据和关于缺陷的位置的信息; 并且包括通过第二缺陷检测处理检测到的检查对象对象的缺陷被标记的缺陷数的第二缺陷数据以及关于其位置的信息。

20. 发明授权

US07653236B2 Surface inspection device and method 失效
标题翻译：表面检查装置及方法
公开(公告)号：US07653236B2
公开(公告)日：2010-01-26
申请号：US11058645
申请日：2005-02-16
申请人： Naohiro Takahashi
发明人： Naohiro Takahashi
IPC分类号： G06K9/00 , H04N5/253 , H04N7/18 , G01N21/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： Disclosed is a surface inspection device that performs a defect inspection throughout a surface of a wafer. In the defect detection using a defect review SEM, an X-Y coordinate system is set throughout a surface (excluding a round end face) of a product wafer to allow the inspection throughout the surface of the product wafer. Therefore, the defect detection can be performed also in an area other than an effective chip area. Further, the inspection results of the area are stored in relation to the coordinates in a position where the inspection results are acquired. Therefore, the inspection results can be effectively used for an analysis and a defect cause can be investigated with a higher degree of accuracy. As a result, the quality and yield of chips can be improved.
摘要翻译：公开了一种在晶片表面进行缺陷检查的表面检查装置。在使用缺陷检查SEM的缺陷检测中，在产品晶片的整个表面（不包括圆形端面）设置X-Y坐标系，以允许在产品晶片的整个表面上进行检查。因此，也可以在有效芯片区域以外的区域中进行缺陷检测。此外，该区域的检查结果相对于获取检查结果的位置处的坐标存储。因此，检查结果可以有效地用于分析，并且可以以更高的精度来研究缺陷原因。结果，可以提高芯片的质量和产量。

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