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11. 发明授权

US06916641B2 (R)-2-hydroxy-3-phenylpropionate (d-phenyllactate) dehydrogenase and gene encoding the same 失效
标题翻译：（R）-2-羟基-3-苯基丙酸酯（d-苯基乳酸）脱氢酶及其编码基因
公开(公告)号：US06916641B2
公开(公告)日：2005-07-12
申请号：US10258472
申请日：2001-04-26
申请人： Koichi Miyamoto , Naomi Sumida , Naoki Midoh , Takeshi Murakami , Rainer Zocher , Horst Kleinkauf
发明人： Koichi Miyamoto , Naomi Sumida , Naoki Midoh , Takeshi Murakami , Rainer Zocher , Horst Kleinkauf
IPC分类号： C12N1/21 , C12N9/02 , C12P7/42 , C12N9/04 , C07H21/04 , C12N1/20 , C12N15/00 , C12P21/04
CPC分类号： C12N9/0008 , C12P7/42
摘要： An objective of the present invention is to provide a D-phenyllactic acid dehydrogenase. Another objective of the present invention is to provide a gene which encodes the D-phenyllactic acid dehydrogenase. A D-phenyllactic acid dehydrogenase according to the present invention is a protein comprising an amino acid sequence of the amino acid sequence of SEQ ID NO: 2 or a modified amino acid sequence of the amino acid sequence of SEQ ID NO: 2 that has one or more modifications selected from a substitution, a deletion, an addition and an insertion and has D-phenyllactic acid dehydrogenase activity. A D-phenyllactic acid dehydrogenase gene according to the present invention comprises a nucleotide sequence which encodes the D-phenyllactic acid dehydrogenase, for example the nucleotide sequence of SEQ ID NO: 1.
摘要翻译：本发明的目的是提供D-苯基乳酸脱氢酶。本发明的另一个目的是提供编码D-苯基乳酸脱氢酶的基因。根据本发明的D-苯基乳酸脱氢酶是包含SEQ ID NO：2的氨基酸序列的氨基酸序列或SEQ ID NO：2的氨基酸序列的修饰的氨基酸序列的蛋白质，其具有一个或更多选自取代，缺失，添加和插入的修饰，并具有D-苯基乳酸脱氢酶活性。根据本发明的D-苯基乳酸脱氢酶基因包含编码D-苯基乳酸脱氢酶的核苷酸序列，例如SEQ ID NO：1的核苷酸序列。

12. 发明授权

US07285404B1 Cyclic depsipeptide synthetase and method for recombinant production 失效
标题翻译：循环depipipeptide合成酶和重组生产方法
公开(公告)号：US07285404B1
公开(公告)日：2007-10-23
申请号：US10070387
申请日：2000-09-07
申请人： Naoki Midoh , Kaoru Okakura , Koichi Miyamoto , Manabu Watanabe , Koji Yanai , Tetsuya Yasutake , Sato Aihara , Takafumi Futamura , Horst Kleinkauf , Takeshi Murakami
发明人： Naoki Midoh , Kaoru Okakura , Koichi Miyamoto , Manabu Watanabe , Koji Yanai , Tetsuya Yasutake , Sato Aihara , Takafumi Futamura , Horst Kleinkauf , Takeshi Murakami
IPC分类号： C12N9/00
CPC分类号： C12N9/00 , C12P21/00
摘要： The present invention provides an enzyme that synthesizes a cyclic depsipeptide, particularly the substance 1022, and a gene thereof. A cyclic depsipeptide synthetase according to the present invention comprises (a) an amino acid sequence of SEQ ID NO: 2 or (b) a modified amino acid sequence of the amino acid sequence of SEQ ID NO: 2 that have one or more modifications selected from a substitution, a deletion, an addition and an insertion and has cyclic depsipeptide synthetase activity. A cyclic depsipeptide synthetase gene according to the present invention comprises a nucleotide sequence encoding a cyclic depsipeptide synthetase. The present invention also provides a recombinant vector and a transformant for expressing the cyclic depsipeptide synthetase, and a mass production system for the cyclic depsipeptide. The present invention further provides a method for producing the cyclic depsipeptide synthetase.
摘要翻译：本发明提供合成环状缩肽，特别是物质1022及其基因的酶。根据本发明的循环倍肽合成酶包含（a）SEQ ID NO：2的氨基酸序列或（b）SEQ ID NO：2的氨基酸序列的修饰的氨基酸序列，其具有一个或多个修饰选择从取代，缺失，添加和插入，并具有循环衰老肽合成酶活性。根据本发明的环状缩肽酶合成酶基因包含编码环状倍肽合成酶的核苷酸序列。本发明还提供了用于表达环状缩酚酸肽合成酶的重组载体和转化体，以及用于环状缩酚酸肽的批量生产系统。本发明还提供了一种用于制备环状缩酚酸肽合成酶的方法。

13. 发明授权

US07109018B1 Transformant producing secondary metabolite modified with functional group and novel biosynthesis genes 失效
标题翻译：用功能组和新生物合成基因修饰的转化体产生次级代谢产物
公开(公告)号：US07109018B1
公开(公告)日：2006-09-19
申请号：US10089514
申请日：2000-09-29
申请人： Koji Yanai , Kaoru Okakura , Shohei Yasuda , Manabu Watanabe , Koichi Miyamoto , Naoki Midoh , Takeshi Murakami
发明人： Koji Yanai , Kaoru Okakura , Shohei Yasuda , Manabu Watanabe , Koichi Miyamoto , Naoki Midoh , Takeshi Murakami
IPC分类号： C12N1/20 , C12N5/10 , C07H21/04
CPC分类号： C12N9/0004 , C12N9/88 , C12N9/90 , C12N15/52 , C12P13/001 , C12P13/02
摘要： An objective of the present invention is to provide a transformant altered so as to produce a secondary metabolite in which a benzene ring of the secondary product is modified at the para-position with a functional group containing a nitrogen atom. A transformant according to the present invention is a transformant of an organism producing a secondary metabolite having a benzene ring skeleton without substitution at the para-position with a functional group containing a nitrogen atom, said transformant being transformed by introducing genes involved in a biosynthetic pathway from chorismic acid to p-aminophenylpyruvic acid, including a gene encoding an amino acid sequence (SEQ ID NO: 2) having 4-amino-4-deoxychorismic acid synthase activity, a gene encoding an amino acid sequence (SEQ ID NO: 4) having 4-amino-4-deoxychorismic acid mutase activity and a gene encoding an amino acid sequence (SEQ ID NO: 6) having 4-amino-4-deoxyprephenic acid dehydrogenase activity, so as to produce a secondary metabolite having a benzene ring skeleton substituted at the para-position with a functional group containing a nitrogen atom. Another objective of the present invention is to provide a novel gene involved in the biosynthetic pathway from chorismic acid to p-aminophenylpyruvic acid. A novel gene according to the present invention comprises genes encoding the amino acid sequences of SEQ ID NOs: 2, 4 and 6 or modified sequences thereof.
摘要翻译：本发明的目的是提供改性的转化体，以便产生次级代谢物，其中次级产物的苯环在对位上用含氮原子的官能团改性。根据本发明的转化体是产生具有苯环骨架的次级代谢物的生物体的转化体，其在具有含氮原子的官能团的对位没有取代，所述转化体通过引入参与生物合成途径的基因而转化包括编码氨基酸序列（SEQ ID NO：4）的氨基酸序列（SEQ ID NO：2）的编码氨基酸序列（SEQ ID NO：4）的氨基酸序列（SEQ ID NO：2）的基因的氨基苯基丙酮酸，具有4-氨基-4-脱氧酸性变位酶活性的基因，以及编码具有4-氨基-4-脱氧蝶呤酸脱氢酶活性的氨基酸序列（SEQ ID NO：6）的基因，以产生具有苯环骨架的次级代谢物在对位上用含有氮原子的官能团取代。本发明的另一个目的是提供一种涉及从氯酸到对氨基苯基丙酮酸生物合成途径的新基因。根据本发明的新基因包含编码SEQ ID NO：2,4和6的氨基酸序列的基因或其修饰序列。

14. 发明授权

US08822919B2 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former 有权
标题翻译：用于电子束检查的装置，其操作方法以及使用前者制造半导体器件的方法
公开(公告)号：US08822919B2
公开(公告)日：2014-09-02
申请号：US12985827
申请日：2011-01-06
申请人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
发明人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
IPC分类号： G01N23/00
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.
摘要翻译：本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

15. 发明申请

US20130225618A1 AGENT FOR INHIBITING EXPRESSION OF LIPID METABOLISM RELATED MRNA 审中-公开
公开(公告)号：US20130225618A1
公开(公告)日：2013-08-29
申请号：US13824782
申请日：2011-10-03
申请人： Kimiyuki Shibuya , Tadaaki Ohgiya , Takeshi Murakami
发明人： Kimiyuki Shibuya , Tadaaki Ohgiya , Takeshi Murakami
IPC分类号： A61K31/505
CPC分类号： A61K31/505 , C07D239/47
摘要： The present invention is intended to provide a pharmaceutical product for inhibiting expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, the present invention is also intended to provide a preventive and/or therapeutic agent for various diseases based on inhibition of expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, and the present invention relates to an agent for inhibiting expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, and relates also to a preventive and/or therapeutic agent for various diseases based on the inhibition of the expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, the agent comprising a compound represented by Formula (I), its salt, or a solvate of any of them as an active ingredient: wherein the symbols are the same as those given in the description.

16. 发明授权

US08390121B2 Semiconductor device and method of manufacture thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08390121B2
公开(公告)日：2013-03-05
申请号：US13025633
申请日：2011-02-11
申请人： Mika Okumura , Yasuo Yamaguchi , Takeshi Murakami
发明人： Mika Okumura , Yasuo Yamaguchi , Takeshi Murakami
IPC分类号： H01L23/482
CPC分类号： B81B7/0051 , B81B2201/0235 , B81C2203/0154 , G01P1/023 , G01P15/0802 , G01P15/125 , H01L21/56 , H01L23/3107 , H01L23/562 , H01L24/05 , H01L24/06 , H01L2924/01019
摘要： A semiconductor device includes a substrate, an element formed on the substrate, a nitride film formed on the substrate, a anti-peel film formed on the nitride film, and a molded resin covering the anti-peel film and the element. The anti-peel film has residual compressive stress.
摘要翻译：半导体器件包括基板，形成在基板上的元件，在基板上形成的氮化物膜，形成在氮化物膜上的抗剥离膜，以及覆盖抗剥离膜和元件的模制树脂。抗剥离膜具有残余压应力。

17. 发明授权

US08218646B2 Moving image encoding apparatus, moving image encoding method, and program 有权
标题翻译：运动图像编码装置，运动图像编码方法和程序
公开(公告)号：US08218646B2
公开(公告)日：2012-07-10
申请号：US12192275
申请日：2008-08-15
申请人： Takeshi Murakami , Ryuichi Kanda
发明人： Takeshi Murakami , Ryuichi Kanda
IPC分类号： H04N11/02
CPC分类号： H04N19/124 , H04N19/149 , H04N19/15 , H04N19/159 , H04N19/172 , H04N19/194 , H04N19/61
摘要： A moving image encoding apparatus includes a first-step encoding section for executing a plurality of times first-step encoding by use of different quantization control variables; a code-amount estimation section for estimating, for all the quantization control variables, an amount of codes generated for each frame by making use of a plurality of results of the encoding; a code-amount allocation section for allocating an amount of codes for each frame on the basis of results of the estimation; and a second-step encoding section for executing second-step encoding on the basis of the amount of codes allocated to each frame. The first-step encoding section changes the number of times of execution of the encoding in accordance with the attribute of each frame, and omits a portion of processes contained in the coding process in the second and subsequent executions of the encoding process.
摘要翻译：运动图像编码装置包括：第一步编码部分，用于通过使用不同的量化控制变量执行多次第一步编码; 码量估计部分，用于通过利用所述编码的多个结果，针对所有的量化控制变量来估计针对每一帧产生的代码量; 码量分配部分，用于根据估计结果分配每帧的码量; 以及第二步编码部分，用于基于分配给每个帧的代码量来执行第二步编码。第一步编码单元根据每帧的属性改变编码的执行次数，并且在编码处理的第二次和随后的执行中省略包含在编码处理中的处理的一部分。

18. 发明申请

US20110234090A1 PLATINUM COMPLEX COMPOUND AND ORGANIC ELECTROLUMINESCENT DEVICE 有权
标题翻译：铂复合化合物和有机电致发光器件
公开(公告)号：US20110234090A1
公开(公告)日：2011-09-29
申请号：US13153687
申请日：2011-06-06
申请人： Toshihiro ISE , Tatsuya Igarashi , Ikuo Kinoshita , Takeshi Murakami
发明人： Toshihiro ISE , Tatsuya Igarashi , Ikuo Kinoshita , Takeshi Murakami
IPC分类号： H01J1/63 , C07F15/00
CPC分类号： H01L51/0087 , C07D401/14 , C07D403/14 , C07F15/0086 , C09K11/06 , C09K2211/1022 , C09K2211/1029 , C09K2211/1044 , C09K2211/1059 , C09K2211/185 , C09K2211/186 , C09K2211/188 , H01L51/0054 , H01L51/0058 , H01L51/006 , H01L51/0071 , H01L51/0078 , H01L51/0081 , H01L51/0085 , H01L51/5016 , H05B33/14 , Y10S428/917
摘要： An organic electroluminescent device is provided and has at least one organic layer between a pair of electrodes. The organic compound contains a compound represented by the following formula (I): Z1 and Z2 each represents a nitrogen-containing aromatic 6-membered ring coordinating to platinum atom at the nitrogen atom, Q represents a nitrogen-containing aromatic 5-membered ring having one or two nitrogen atoms, L1 and L2 each represents a single bond or a divalent group, and n represents 0 or 1.
摘要翻译：提供有机电致发光器件，并且在一对电极之间具有至少一个有机层。有机化合物含有下式（I）表示的化合物：Z1和Z2各自表示与氮原子上的铂原子配位的含氮芳香族6元环，Q表示含氮芳香族五元环，一个或两个氮原子，L1和L2各自表示单键或二价基团，n表示0或1。

19. 发明授权

US07952071B2 Apparatus and method for inspecting sample surface 有权
标题翻译：用于检查样品表面的装置和方法
公开(公告)号：US07952071B2
公开(公告)日：2011-05-31
申请号：US12162071
申请日：2007-01-24
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Masahiro Hatakeyama , Kenji Terao , Takeshi Murakami , Katsuya Okumura , Tatsuhiko Higashiki
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Masahiro Hatakeyama , Kenji Terao , Takeshi Murakami , Katsuya Okumura , Tatsuhiko Higashiki
IPC分类号： G01N23/00
CPC分类号： H01J37/29 , H01J37/045 , H01J2237/2446
摘要： Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device.Provided is a method for inspecting a sample surface with a projection type electron beam inspection apparatus, comprising the steps of: forming such an irradiation area on the sample surface by an electron beam generated from an electron gun 21 that has approximately a circular or elliptical shape of a size larger than a pattern on the sample surface; irradiating the electron beam substantially onto a center of the pattern on the sample surface; and forming an image on an electron detection plane of a detector from secondary electrons emanating from the sample surface in response to the irradiation of the electron beam for inspecting the sample surface.
摘要翻译：提供了在半导体器件的制造工艺中使用的缺陷检查装置中，现有技术不能提供高精度的缺陷检查装置和检查（或评价）方法。提供一种用投影型电子束检查装置检查样品表面的方法，包括以下步骤：通过由具有大致圆形或椭圆形的电子枪21产生的电子束在样品表面上形成这样的照射区域尺寸大于样品表面上的图案; 将电子束基本上照射到样品表面上的图案的中心; 以及响应于用于检查样品表面的电子束的照射，从从样品表面发射的二次电子在检测器的电子检测平面上形成图像。

20. 发明申请

US20100237243A1 Testing apparatus using charged particles and device manufacturing method using the testing apparatus 有权
公开(公告)号：US20100237243A1
公开(公告)日：2010-09-23
申请号：US12789070
申请日：2010-05-27
申请人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
发明人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
IPC分类号： G01N23/22
CPC分类号： H01J37/20 , G01N23/2204 , G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/202 , H01J2237/2441 , H01J2237/2446 , H01J2237/2801 , H01J2237/2817 , H01L21/6833 , H01L2223/54466
摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

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