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    • 11. 发明授权
    • Mobile automatic volume control apparatus
    • 移动自动音量控制装置
    • US4864246A
    • 1989-09-05
    • US242256
    • 1988-09-09
    • Masayuki KatoShinjiro KatoFumio Tamura
    • Masayuki KatoShinjiro KatoFumio Tamura
    • H03G3/32
    • H03G3/32
    • An automatic volume control apparatus for use in a mobile audio apparatus in which a detection output from a noise detection section is compared with a control output applied to a volume control section, and a capacitor inserted between a control signal input terminal of the volume control section and a reference voltage point is charged/discharged by a current source section with a constant current on the basis of the output of the comparator to thereby make it possible to make the change of volume constant or linear relative to the change of noise level. Also, a control signal for a volume controller is obtained by subtracting a quantity of logarithmic change of an audio signal detection signal obtained from an audio signal detection section relative to a reference value from a value obtained by amplifying, with an amplification factor in a range of 1.5 to 2.5, a quantity of logarithmic change of a noise detection signal obtained from a noise detection section relative to a reference value, whereby the correspondence between levels of low-frequency components of, for example, 10 Hz or less and audible frequency components of in-vehicle noise becomes higher so that it is possible to perform more natural volume control.
    • 一种用于移动音频装置的自动音量控制装置,其中将来自噪声检测部分的检测输出与施加到音量控制部分的控制输出进行比较,以及插入在音量控制部分的控制信号输入端子之间的电容器 并且基于比较器的输出,通过恒定电流由电流源部分对参考电压点进行充电/放电,从而使得可以使体积的变化相对于噪声电平的变化而变为恒定或线性。 此外,通过从放大系数的范围中减去从音频信号检测部分获得的音频信号检测信号相对于参考值的对数变化量,从放大获得的值中获得音量控制器的控制信号, 为1.5〜2.5,相对于参考值从噪声检测部获得的噪声检测信号的对数变化量,由此例如为10Hz以下的低频成分的电平与可听频率成分 的车载噪声变高,从而可以进行更自然的音量控制。
    • 16. 发明授权
    • Method of manufacturing a semiconductor device
    • 制造半导体器件的方法
    • US08551854B2
    • 2013-10-08
    • US13409234
    • 2012-03-01
    • Shinjiro KatoHirofumi Harada
    • Shinjiro KatoHirofumi Harada
    • H01L29/8605
    • H01L28/24
    • In a method of manufacturing a semiconductor device, a barrier metal film and an aluminum metal film are formed on an insulating film on a semiconductor substrate. Two aluminum electrodes are formed in parallel with each other by patterning the barrier metal film and the aluminum metal film. The aluminum metal film in a region of part of each of the two aluminum electrodes are selectively removed to form two single-layer barrier metal electrodes separated from each other. A resistor is formed between the two single-layer barrier metal electrodes so as to electrically connect the two single-layer barrier metal electrodes to each other.
    • 在制造半导体器件的方法中,在半导体衬底上的绝缘膜上形成阻挡金属膜和铝金属膜。 通过图案化阻挡金属膜和铝金属膜,两个铝电极彼此平行地形成。 选择性地去除两个铝电极中的每一个的一部分区域中的铝金属膜以形成彼此分离的两个单层势垒金属电极。 在两个单层阻挡金属电极之间形成电阻器,以将两个单层阻挡金属电极彼此电连接。
    • 18. 发明授权
    • Semiconductor device and method of manufacturing the same
    • 半导体装置及其制造方法
    • US08063445B2
    • 2011-11-22
    • US12462909
    • 2009-08-11
    • Shinjiro KatoNaoto Saito
    • Shinjiro KatoNaoto Saito
    • H01L29/76H01L29/788
    • H01L29/0847H01L29/42368H01L29/66659H01L29/7835
    • Provided is a semiconductor device which includes a metal oxide semiconductor (MOS) transistor having high driving performance and high withstanding voltage with a thick gate oxide film. In the local oxidation-of-silicon (LOCOS) offset MOS transistor having high withstanding voltage, in order to prevent a gate oxide film (6) formed on a channel formation region (7) from being etched at a time of removing the gate oxide film (6) with a polycrystalline silicon gate electrode (8) being used as a mask to form a second conductivity type high concentration source region (4) and a second conductivity type high concentration drain region (5), a source field oxide film (14) is formed also on a source side of the channel formation region (7), and in addition, a length of a second conductivity type high concentration source field region (13) is optimized. Accordingly, it is possible to obtain a MOS transistor having high driving performance and high withstanding voltage with a thick gate oxide film.
    • 提供一种半导体器件,其包括具有高驱动性能的金属氧化物半导体(MOS)晶体管和具有较厚栅极氧化膜的高耐压。 在具有高耐受电压的局部氧化硅(LOCOS)偏移MOS晶体管中,为了防止形成在沟道形成区域(7)上的栅极氧化膜(6)在去除栅极氧化物时被蚀刻 使用多晶硅栅电极(8)作为掩模的膜(6)形成第二导电型高浓度源区(4)和第二导电型高浓度漏区(5),源场氧化膜 14)也形成在沟道形成区域(7)的源极侧,此外,第二导电型高浓度源极场区域(13)的长度被优化。 因此,可以通过厚栅极氧化膜获得具有高驱动性能和高耐受电压的MOS晶体管。