专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US06514454B1 Sol-gel process using porous mold 失效
标题翻译：溶胶 - 凝胶法使用多孔模具
公开(公告)号：US06514454B1
公开(公告)日：2003-02-04
申请号：US09807109
申请日：2001-04-05
申请人： Rahul Ganguli , Fikret Kirkbir , Douglas Meyers
发明人： Rahul Ganguli , Fikret Kirkbir , Douglas Meyers
IPC分类号： C04B3514
CPC分类号： C04B35/111 , C01B33/1585 , C01B33/163 , C03C1/006 , C03C3/06 , C03C2201/31 , C03C2201/3476 , C03C2203/26 , C04B35/14 , C04B35/46 , C04B35/624 , C04B2235/3287
摘要： A sol-gel process for producing dry porous gel monoliths, e.g., silica glass monoliths, in which the successive process steps of gelling, aging and drying all occur within a mold formed of a selected porous material, e.g., graphite. The mold is inert to the gel solution and it has sufficient strength to withstand the temperatures and pressures encountered during the process. The mold and gel thereby can remain within a sealed autoclave during these process steps, and mechanical handling of the mold and the gel are minimized. This substantially enhances the process' efficiency. Alternatively, the mold can have a non-porous inner skin to enhance ease of cleaning of the mold, and of removal of the gel.
摘要翻译：用于生产干多孔凝胶整料（例如石英玻璃整料）的溶胶 - 凝胶方法，其中连续的胶凝，老化和干燥的工艺步骤全部发生在由选定的多孔材料例如石墨形成的模具内。模具对凝胶溶液是惰性的，并且其具有足够的强度以承受在该过程中遇到的温度和压力。因此，在这些工艺步骤期间，模具和凝胶可以保持在密封的高压釜内，并且模具和凝胶的机械处理最小化。这大大提高了工艺的效率。或者，模具可以具有无孔内皮，以增强模具的清洁容易性和去除凝胶。

12. 发明申请

US20060246234A1 Photomask assembly incorporating a metal/scavenger pellicle frame 审中-公开
标题翻译：包含金属/清除剂防护薄膜框架的光掩模组件
公开(公告)号：US20060246234A1
公开(公告)日：2006-11-02
申请号：US11407691
申请日：2006-04-19
申请人： Douglas Meyers , Rahul Ganguli , Troy Robinson , Robert Gump , Steven Colbern , Fikret Kirkbir
发明人： Douglas Meyers , Rahul Ganguli , Troy Robinson , Robert Gump , Steven Colbern , Fikret Kirkbir
IPC分类号： G03F1/14
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983 , Y10T428/24793 , Y10T428/3154 , Y10T428/31544
摘要： A photomask assembly is disclosed having a photomask substrate and a composite pellicle frame that includes both a metallic frame component and a scavenger component. The metallic frame component has a cross-sectional thickness of at least 100 micrometers in all directions, and the volume percentage of the scavenger component relative to the overall volume of the composite frame is in the range of 0.1 to 95%. The scavenger component has a gas permeability to oxygen or nitrogen greater than about 10 ml·mm/cm2·min·MPa, an average pore size between 0.001 and 10 micrometers, and a pore surface area greater than 10 m2/g. This configuration enables the pellicle frame to have sufficient strength to withstand stresses encountered during normal use, yet also to have the capability of scavenging impurity molecules from the space adjacent to the photomask substrate. In a separate and independent feature of the invention, the scavenger component comprises at least one metal oxide selected from the group consisting of oxides of aluminum, boron, cerium, cobalt, copper, erbium, hafnium, lanthanum, neodymium, praseodymium, scandium, silicon, titanium, yttrium, zirconium, and mixtures thereof. Preferably, the metal oxide is an oxide of zirconium, yttrium, or mixtures thereof.
摘要翻译：公开了一种光掩模组件，其具有光掩模基板和包括金属框架部件和清除部件的复合防护薄膜框架。金属框架部件在所有方向上具有至少100微米的横截面厚度，并且清除剂部件相对于复合框架的总体积的体积百分比在0.1至95％的范围内。清除剂组分对氧气或氮气的气体渗透性大于约10毫升/厘米3·秒/秒/秒·秒·分钟·MPa，平均孔径为0.001〜10微米，孔表面积大于 10微克/克。这种构造使得防护薄膜框架具有足够的强度以承受在正常使用期间遇到的应力，而且还具有从邻近光掩模基板的空间中清除杂质分子的能力。在本发明的独立和独立的特征中，清除剂组分包括选自铝，硼，铈，钴，铜，铒，铪，镧，钕，镨，钪，硅的氧化物中的至少一种金属氧化物，钛，钇，锆及其混合物。优选地，金属氧化物是锆，钇或其混合物的氧化物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式