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11. 发明申请

US20090052066A1 Actuator Device 有权
标题翻译：执行机构
公开(公告)号：US20090052066A1
公开(公告)日：2009-02-26
申请号：US11844232
申请日：2007-08-23
申请人： Yim-Bun Patrick Kwan , Stefan Xalter
发明人： Yim-Bun Patrick Kwan , Stefan Xalter
IPC分类号： G02B7/09
CPC分类号： G02B7/005 , G02B7/08 , G03F7/70258 , G03F7/70266 , G03F7/70825
摘要： Actuator devices, as well as related systems and methods, are disclosed. In some embodiments, the devices, systems and methods are within the field of microlithography.
摘要翻译：致动器装置以及相关系统和方法被公开。在一些实施例中，装置，系统和方法在微光刻领域内。

12. 发明申请

US20080193201A1 Optical Assembly Structure Comprising a Connecting Body with Thermal Expansion Compensations Means 审中-公开
标题翻译：包括具有热膨胀补偿的连接体的光学组件结构
公开(公告)号：US20080193201A1
公开(公告)日：2008-08-14
申请号：US11579458
申请日：2004-08-22
申请人： Yim-Bun Patrick Kwan , Stefan Xalter , Fraser Morrison , Maurice Wijckmans , David Kendall
发明人： Yim-Bun Patrick Kwan , Stefan Xalter , Fraser Morrison , Maurice Wijckmans , David Kendall
IPC分类号： F16L13/00
CPC分类号： G02B7/008 , Y10T403/217 , Y10T403/47
摘要： An optical assembly comprises a connecting body (1) consisting of at least a first and a second part (3, 4), the body (1) being connected to an assembly means (2) of a ceramic material wherein the assembly means (2) consists of at least a first and a second part (17, 18) separated by a gap (19).
摘要翻译：光学组件包括由至少第一和第二部分（3,4）组成的连接体（1），所述主体（1）连接到陶瓷材料的组装装置（2），其中组装装置（2））由至少由间隙（19）分开的第一部分（17,18）组成。

13. 发明授权

US09383544B2 Optical system for semiconductor lithography 有权
标题翻译：用于半导体光刻的光学系统
公开(公告)号：US09383544B2
公开(公告)日：2016-07-05
申请号：US13590509
申请日：2012-08-21
申请人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
发明人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
IPC分类号： G03B27/54 , G02B7/14 , G02B7/02 , G02B7/10 , G03F7/20
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译：公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸仪器。该装置还可以包括构造成引导光学部件的引导单元。该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用在导向单元上相互补偿，小于10％。

14. 发明授权

US09366976B2 Optical element with low surface figure deformation 有权
标题翻译：具有低表面图形变形的光学元件
公开(公告)号：US09366976B2
公开(公告)日：2016-06-14
申请号：US13366593
申请日：2012-02-06
申请人： Yim-Bun Patrick Kwan
发明人： Yim-Bun Patrick Kwan
IPC分类号： G02B5/18 , G03F7/20
CPC分类号： G03F7/70858 , G03F7/70825
摘要： A reflective optical element includes a body with a first reflective surface of a high precision geometrical form, which can be used for reflecting light in a wavelength range less than 50 nm in an EUV-lithographic projection exposure system. The body includes first and a second non-reflecting surfaces. Further, the body includes a single connection area formed on the first non-reflecting surface with at least one fixation surface inside the connection area for fixing the entire optical element directly or indirectly to at least one bearing surface of a bearing element. The second non-reflecting surface is different from the single connection area formed on the first non-reflective surface. The second non-reflecting surface at least partly surrounds the single connection area. At least one stress relief recess is formed into the body. The stress relief recess at least partly separates the first non-reflective surface from the second non-reflecting surface.
摘要翻译：反射光学元件包括具有高精度几何形状的第一反射表面的主体，其可以用于在EUV光刻投影曝光系统中反射在小于50nm的波长范围内的光。主体包括第一和第二非反射表面。此外，主体包括形成在第一非反射表面上的单个连接区域，其具有连接区域内的至少一个固定表面，用于将整个光学元件直接或间接地固定到轴承元件的至少一个支承表面。第二非反射表面不同于形成在第一非反射表面上的单个连接区域。第二非反射表面至少部分地围绕单个连接区域。至少一个应力释放凹陷形成在身体内。应力消除凹槽至少部分地将第一非反射表面与第二非反射表面分开。

15. 发明申请

US20120327385A1 OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY 有权
标题翻译：用于半导体光刻的光学系统
公开(公告)号：US20120327385A1
公开(公告)日：2012-12-27
申请号：US13590509
申请日：2012-08-21
申请人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
发明人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译：半导体光刻系统包括多个光学部件，包括在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸仪器。该装置还可以包括构造成引导光学部件的引导单元。该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用在导向单元上相互补偿，小于10％。

16. 发明授权

US08269947B2 Optical system for semiconductor lithography 有权
标题翻译：用于半导体光刻的光学系统
公开(公告)号：US08269947B2
公开(公告)日：2012-09-18
申请号：US12372095
申请日：2009-02-17
申请人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
发明人： Frank Melzer , Yim-Bun Patrick Kwan , Stefan Xalter , Damian Fiolka
IPC分类号： G03B27/68 , G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译：公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸仪器。该装置还可以包括构造成引导光学部件的引导单元。该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用在导向单元上相互补偿，小于10％。

17. 发明申请

US20110181857A1 OPTICAL ASSEMBLY 有权
标题翻译：光学装置
公开(公告)号：US20110181857A1
公开(公告)日：2011-07-28
申请号：US13046170
申请日：2011-03-11
申请人： Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人： Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号： G03B27/54
CPC分类号： G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要： An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译：一种光学组件，其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部，其包括至少一个光学元件，特别是透镜，反射镜或孔，其中所述至少一个元件由至少一个操纵器影响的特征在于，所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中，并且提供操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。

18. 发明授权

US07986472B2 Optical element module 有权
标题翻译：光学元件模块
公开(公告)号：US07986472B2
公开(公告)日：2011-07-26
申请号：US11444191
申请日：2006-05-31
申请人： Jens Kugler , Ulrich Weber , Bernhard Gellrich , Yim-Bun Patrick Kwan , Peter Deufel
发明人： Jens Kugler , Ulrich Weber , Bernhard Gellrich , Yim-Bun Patrick Kwan , Peter Deufel
IPC分类号： G02B7/02
CPC分类号： G02B7/028 , G02B7/008 , G03F7/70825 , G03F7/70891
摘要： There is provided an optical element module comprising a first optical element and an optical element holder. The first optical element has a first coefficient of thermal expansion. The optical element holder holds the first optical element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being adapted to the first coefficient of thermal expansion. The optical element is directly contacting the optical element holder in a wide contact area. The contact area is defined by a first contact surface of the first optical element and a second contact surface of the optical element holder, wherein the second contact surface matches the first contact surface. Thus, favorable rigidity and deformation behavior is provided.
摘要翻译：提供了一种包括第一光学元件和光学元件保持器的光学元件模块。第一光学元件具有第一热膨胀系数。光学元件保持器保持第一光学元件并具有第二热膨胀系数，第二热膨胀系数适应于第一热膨胀系数。光学元件在宽接触区域中直接接触光学元件保持器。接触区域由第一光学元件的第一接触表面和光学元件保持器的第二接触表面限定，其中第二接触表面与第一接触表面匹配。因此，提供了良好的刚性和变形行为。

19. 发明申请

US20110051110A1 LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING 有权
标题翻译：包含在房屋中排列的多个光学元件的镜头
公开(公告)号：US20110051110A1
公开(公告)日：2011-03-03
申请号：US11916470
申请日：2006-06-19
申请人： Yim-Bun Patrick Kwan
发明人： Yim-Bun Patrick Kwan
IPC分类号： G03F7/20 , G02B7/02 , G02B7/14 , G03B27/54 , G01B11/14
CPC分类号： G03F7/7015 , G01D5/20 , G01D5/24 , G02B7/003 , G02B7/02 , G02B7/021 , G02B7/023 , G02B7/028 , G02B7/14 , G02B27/62 , G03F7/70258 , G03F7/70341 , G03F7/70825 , G03F7/7085
摘要： The invention relates to a lens comprising several optical elements that are disposed in a lens housing. At least one sensor array encompassing at least one capacitive sensor unit and/or at least one inductive sensor unit is provided for determining the relative position between a first optical element and a second optical element or between a load-bearing structural element of the lens and a second optical element.
摘要翻译：本发明涉及一种包括设置在透镜壳体中的多个光学元件的透镜。提供至少一个包含至少一个电容式传感器单元和/或至少一个电感式传感器单元的传感器阵列，用于确定第一光学元件和第二光学元件之间或者在透镜的承载结构元件和第二光学元件。

20. 发明申请

US20100271607A1 OPTICAL ASSEMBLY 有权
标题翻译：光学装置
公开(公告)号：US20100271607A1
公开(公告)日：2010-10-28
申请号：US12829491
申请日：2010-07-02
申请人： Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人： Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号： G03B27/42
CPC分类号： G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要： An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译：一种光学组件，其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部，其包括至少一个光学元件，特别是透镜，反射镜或孔，其中所述至少一个元件由至少一个操纵器影响的特征在于，所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中，并且提供操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。

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