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11. 发明申请

US20190101530A1 ANTIBODY DISPERSION FOR MEASUREMENT, PRODUCTION METHOD THEREOF, KIT FOR PREPARING ANTIBODY DISPERSION FOR MEASUREMENT, AND METHOD FOR MEASURING BIOLOGICAL SUBSTANCE 审中-公开
公开(公告)号：US20190101530A1
公开(公告)日：2019-04-04
申请号：US16139201
申请日：2018-09-24
申请人： Konica Minolta, Inc.
发明人： Chie INUI , Akihiro MAEZAWA
IPC分类号： G01N33/533 , G01N21/64
摘要： An object of the invention is to provide an antibody dispersion for measurement, in which an antibody is favorably dispersed when used for a measurement, a production method thereof, a kit for preparing an antibody dispersion for measurement, and a measuring method of a biological substance.An antibody dispersion for measurement of the invention includes a monovalent metal salt and a divalent metal salt, in which the concentration of the monovalent metal salt is from 50 to 500 mM and the concentration of the divalent metal salt is from 1.0 to 50 mM.

12. 发明申请

US20160376468A1 Method For Preparing Recycled Abrasive Slurry 审中-公开
标题翻译：制备循环磨料浆料的方法
公开(公告)号：US20160376468A1
公开(公告)日：2016-12-29
申请号：US15189833
申请日：2016-06-22
申请人： KONICA MINOLTA, INC.
发明人： Chie INUI , Akihiro MAEZAWA , Yuuki NAGAI , Natsumi HIRAYAMA
IPC分类号： C09G1/02
CPC分类号： C09G1/02 , B24B57/02 , Y02P70/605
摘要： A method for preparing a recycled abrasive slurry includes: polishing a material to be polished, which includes silicon as a main component, with an abrasive slurry including a plurality of kinds of additives added for different purposes; and preparing a recycled abrasive slurry from a collected abrasive slurry collected after the polishing, wherein the recycled abrasive slurry is prepared through: step 1 of removing, from the collected abrasive slurry, at least an additive B capable of decreasing a polishing rate among the plurality of additives, and step 2 of replenishing at least an additive A capable of increasing a polishing rate among the plurality of additives, to the abrasive slurry from which an additive has been removed, which has been prepared in step 1.
摘要翻译：一种制备再循环磨料浆料的方法包括：用包含硅作为主要成分的抛光材料，研磨含有多种添加剂的磨料浆料，用于不同目的; 以及从抛光后收集的收集的磨料浆料制备回收的磨料浆料，其中通过以下步骤制备回收的磨料浆料：步骤1，从收集的磨料浆料中除去至少一种能够降低多个磨料浆料中的抛光速率的添加剂B 的添加剂，以及步骤2，其至少补充了能够将多种添加剂中的抛光速率提高到在步骤1中制备的已除去添加剂的研磨浆料的添加剂A.

13. 发明申请

US20180339399A1 ABRASIVE SLURRY REGENERATION METHOD 审中-公开
公开(公告)号：US20180339399A1
公开(公告)日：2018-11-29
申请号：US15775128
申请日：2016-12-01
申请人： Konica Minolta, Inc.
发明人： Chie INUI , Akihiro MAEZAWA , Yuuki NAGAI , Natsumi HIRAYAMA
IPC分类号： B24B57/02
摘要： An object of the present invention is to provide an abrasive slurry regeneration method capable of efficiently regenerating an abrasive slurry having a high polishing rate. The abrasive slurry regeneration method is an abrasive slurry regeneration method for polishing a polishing target containing silicon oxide as a main component using an abrasive slurry containing abrasive particles and a plurality of kinds of additives and then regenerating a collected abrasive slurry, characterized by including a regeneration step of collecting an additive having a molecular weight of 500 or more and an additive adsorbed by the abrasive particles among additives contained in the collected abrasive slurry together with the abrasive particles while an abrasive concentration (% by mass) is maintained within a range of 0.2 to 3000% with respect to an abrasive concentration (% by mass) of an unused abrasive slurry when being used for polishing a polishing target.

14. 发明申请

US20160194538A1 Polishing Material Particles, Method For Producing Polishing Material, And Polishing Processing Method 有权
标题翻译：抛光材料颗粒，抛光材料的制造方法和抛光加工方法
公开(公告)号：US20160194538A1
公开(公告)日：2016-07-07
申请号：US14910986
申请日：2014-07-28
申请人： KONICA MINOLTA, INC.
发明人： Keisuke MIZOGUCHI , Akihiro MAEZAWA , Natsuki ITO , Atsushi TAKAHASHI , Hideaki WAKAMATSU , Yuuki NAGAI , Chie INUI
IPC分类号： C09K3/14 , B24C11/00 , C09G1/02
CPC分类号： C09K3/1409 , B24C11/00 , C01F17/0043 , C01P2004/03 , C01P2004/32 , C01P2004/52 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C09G1/02 , C09K3/1463
摘要： Disclosed are polishing material particles which have polishing performance suitable for precision polishing and also have a high polishing speed and high monodispersibility; a polishing material containing the polishing material particles; and a polishing processing method using the polishing material. The polishing material particles are spherical particles having an average aspect ratio of 1.00 to 1.15, wherein the particle diameter (D50 (nm)) of the polishing material particles as determined from a particle diameter cumulative distribution curve falls within the range from 50 to 1500 nm. The average content of cerium or the total content of cerium and at least one element selected from lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm) and europium (Eu) in the polishing material particles is 81 mol % or more relative to the total content of all of rare earth elements that constitute the polishing material particles.
摘要翻译：公开了具有适合于精密抛光的抛光性能并且还具有高抛光速度和高单分散性的抛光材料颗粒; 包含抛光材料颗粒的抛光材料; 以及使用研磨材料的研磨处理方法。抛光材料颗粒是平均纵横比为1.00至1.15的球形颗粒，其中由粒径累积分布曲线确定的抛光材料颗粒的粒径（D50（nm））落在50至1500nm的范围内。在研磨材料颗粒中，铈的平均含量或铈和至少一种选自镧（La），镨（Pr），钕（Nd），钐（Sm）和铕（Eu）的元素的含量为81mol 相对于构成抛光材料颗粒的所有稀土元素的总含量为％以上。

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