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11. 发明授权

US06560530B1 Navigation system 失效
标题翻译：导航系统
公开(公告)号：US06560530B1
公开(公告)日：2003-05-06
申请号：US09692143
申请日：2000-10-20
申请人： Kunihiro Yamada , Kazuteru Maekawa , Hiroyoshi Masuda , Yumi Shibata , Kihachi Hayashida , Minoru Ootake
发明人： Kunihiro Yamada , Kazuteru Maekawa , Hiroyoshi Masuda , Yumi Shibata , Kihachi Hayashida , Minoru Ootake
IPC分类号： G06C2100
CPC分类号： G08G1/0969 , G09B29/106
摘要： A navigation system for searching coordinates of a telephone number, displaying a map and setting a point, the navigation system comprising a memory for storing information on a subscriber inclusive of coordinates corresponding to a telephone number and map data, an input device for inputting a telephone number, and a control device for searching a subscriber and coordinates based on the input of the telephone number, setting specific coordinates based on the searched coordinates and displaying a map with the specific coordinates located at the center of the map on a condition that the searched subscriber is a specific classified subscriber, wherein a map with a vague point located at the center of the map is displayed while a private home is not directly displayed thereon when the subscriber is a private subscriber of the input telephone number.
摘要翻译：一种用于搜索电话号码坐标，显示地图和设置点的导航系统，所述导航系统包括用于存储关于包括对应于电话号码和地图数据的坐标的用户信息的存储器，用于输入电话的输入装置号码和用于搜索用户并基于电话号码的输入进行坐标的控制装置，基于搜索到的坐标来设置特定坐标，并且在搜索到的条件下显示具有位于地图中心的特定坐标的地图订户是特定分类订户，其中当用户是输入电话号码的私人订户时，显示位于地图中心的具有模糊点的地图，而私人住宅不直接显示在其上。

12. 发明授权

US4273858A Resist material for micro-fabrication with unsaturated dicarboxylic moiety 失效
标题翻译：用于具有不饱和二羧基部分的微制造的抗蚀材料
公开(公告)号：US4273858A
公开(公告)日：1981-06-16
申请号：US926067
申请日：1978-07-19
申请人： Kohtaro Nagasawa , Hideo Ochi , Fujio Tanaka , Yumi Shibata
发明人： Kohtaro Nagasawa , Hideo Ochi , Fujio Tanaka , Yumi Shibata
IPC分类号： C08F299/02 , G03F7/038 , G03C5/00
CPC分类号： C08F299/02 , G03F7/0388 , Y10S430/143 , Y10S430/168
摘要： A resist material for micro-fabrication comprising a polymer in which the polymer backbone has thereon a moiety of the formula (I) ##STR1## wherein R represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group or an aralkyl group, the resist material being curable by electromagnetic radiation such as electron beams, X-rays or deep ultraviolet light with a wave length of less than about 3000A and being particularly suitable as a micro-fabrication resist material.
摘要翻译：一种用于微制造的抗蚀剂材料，其包含其中聚合物主链上具有式（I）部分的聚合物，其中R表示氢原子，烷基，烯基或芳基，或芳族烷基，抗蚀剂材料可通过诸如电子束，X射线或波长小于约3000A的深紫外光等电磁辐射固化，特别适合作为微制造抗蚀剂材料。

13. 发明授权

US06950100B2 Map display device, a memory medium and a map display method 失效
标题翻译：地图显示装置，存储介质和地图显示方法
公开(公告)号：US06950100B2
公开(公告)日：2005-09-27
申请号：US09810609
申请日：2001-03-19
申请人： Kunihiro Yamada , Takanori Kaji , Yumi Shibata , Hiroyoshi Masuda
发明人： Kunihiro Yamada , Takanori Kaji , Yumi Shibata , Hiroyoshi Masuda
IPC分类号： G09B29/00 , G01C21/00 , G01C21/36 , G06T11/60 , G08G1/0969 , G09B29/10 , G06T17/00
CPC分类号： G01C21/32 , G01C21/3667 , G09B29/106
摘要： A map display device using an input unit for inputting a display scale, a memory for storing polygon map data, a drawing processing control unit for drawing a polygon map by loading polygon map data from the memory and a display unit for displaying an output from the drawing processing control unit, wherein the drawing processing control unit is provided with a function for determining a unit of a polygon map that should be drawn and drawing a polygon map of the determined unit.
摘要翻译：一种使用输入单元输入显示比例的地图显示装置，存储多边形地图数据的存储器，用于通过从存储器加载多边形地图数据来绘制多边形地图的绘图处理控制单元和用于显示来自绘图处理控制单元，其中所述绘制处理控制单元具有用于确定应绘制的多边形图的单位并绘制所确定单元的多边形图的功能。

14. 发明授权

US4349647A Resist material for micro-fabrication 失效
标题翻译：抗微生物材料
公开(公告)号：US4349647A
公开(公告)日：1982-09-14
申请号：US232064
申请日：1981-02-05
申请人： Kohtaro Nagasawa , Hideo Ochi , Fujio Tanaka , Yumi Shibata
发明人： Kohtaro Nagasawa , Hideo Ochi , Fujio Tanaka , Yumi Shibata
IPC分类号： C08F8/00 , C08F299/02 , G03F7/038 , C08F8/46
CPC分类号： C08F8/00 , C08F299/02 , G03F7/0388
摘要： A resist material for micro-fabrication comprising a polymer in which the polymer backbone has thereon a moiety of the formula (I) ##STR1## wherein R represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group or an aralkyl group, the resist material being curable by electromagnetic radiation such as electron beams, X-rays or deep ultraviolet light with a wave length of less than about 3000A and being particularly suitable as a micro-fabrication resist material.
摘要翻译：一种用于微制造的抗蚀剂材料，其包含其中聚合物主链上具有式（I）部分的聚合物，其中R表示氢原子，烷基，烯基或芳基，或芳族烷基，抗蚀剂材料可通过诸如电子束，X射线或波长小于约3000A的深紫外光等电磁辐射固化，特别适合作为微制造抗蚀剂材料。

15. 发明授权

US4299911A High energy radiation curable resist material and method of using the same 失效
标题翻译：高能辐射固化抗蚀剂材料及其使用方法
公开(公告)号：US4299911A
公开(公告)日：1981-11-10
申请号：US932160
申请日：1978-08-09
申请人： Hideo Ochi , Yumi Shibata , Kohtaro Nagasawa
发明人： Hideo Ochi , Yumi Shibata , Kohtaro Nagasawa
IPC分类号： C08F2/46 , C08F8/00 , C08G59/14 , G03F7/038 , H01R43/00 , B05D3/06 , G03C1/71
CPC分类号： G03F7/0388 , C08F8/00 , C08G59/1433 , H01R43/005 , Y10S430/168
摘要： A resist material curable by irradiation with high energy radiation such as electron beams, X-rays, ion beams, neutron beams, .gamma.-rays or deep ultraviolet light but substantially non-curable by irradiation with light having a wavelength of about 300 nm or more, the resist material comprising, as a main component, a solvent-soluble polymer containing an ethylenically unsaturated double bond, the polymer being obtained by reacting (a) a polymer having a plurality of oxirane rings therein and (b) a monomer containing (i) at least one ethylenically unsaturated double bond and (ii) one functional group capable of opening the oxirane rings, and then opening the unreacted oxirane rings.
摘要翻译：通过用高能量辐射例如电子束，X射线，离子束，中子束，γ射线或深紫外光照射可以固化的抗蚀剂材料，但是通过用约300nm或更大的波长的光照射而基本上不能固化所述抗蚀剂材料包含作为主要成分的含有烯属不饱和双键的溶剂可溶性聚合物，所述聚合物通过（a）具有多个环氧乙烷环的聚合物和（b）含有（i ）至少一个烯属不饱和双键和（ii）一个能够打开环氧乙烷环的官能团，然后打开未反应的环氧乙烷环。

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