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11. 发明授权

US06707529B1 Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US06707529B1
公开(公告)日：2004-03-16
申请号：US09913328
申请日：2001-10-15
申请人： Takashi Aoki , Naomasa Shiraishi , Soichi Owa
发明人： Takashi Aoki , Naomasa Shiraishi , Soichi Owa
IPC分类号： G03B2752
CPC分类号： G03F7/70883 , G02B3/0056 , G02B3/0068 , G03F7/70941
摘要： An exposure apparatus having an illumination system which applies an exposure energy beam to a mask on which a pattern for transfer is formed, and a stage system for positioning a substrate to which the pattern of the mask is transferred, is characterized in that: a gas supply apparatus for supplying a gas of a high transmittivity with respect to the exposure energy beam, and having good thermal conductivity, to at least a portion of an optical path of the exposure energy blam, and a gas recovery apparatus for recovering at least a portion of the gas after the gas is supplied to the optical path of the exposure energy beam from the gas supply apparatus, are provided.
摘要翻译：一种曝光装置，具有对形成有转印图案的掩模施加曝光能量束的照明系统，以及用于定位掩模图案的基板的定位用台系统，其特征在于：气体供给装置，用于向暴露能量束的光路的至少一部分提供相对于曝光能量射线的高透射率的气体，并且具有良好的导热性;以及气体回收装置，用于回收至少一部分气体被供给到来自气体供给装置的曝光能量束的光路之后的气体。

12. 发明授权

US06653024B1 Photomask, aberration correction plate, exposure apparatus, and process of production of microdevice 失效
标题翻译：光掩模，像差校正板，曝光装置和微型装置的生产工艺
公开(公告)号：US06653024B1
公开(公告)日：2003-11-25
申请号：US09569849
申请日：2000-05-10
申请人： Naomasa Shiraishi , Hitoshi Takeuchi , Soichi Owa
发明人： Naomasa Shiraishi , Hitoshi Takeuchi , Soichi Owa
IPC分类号： G03F900
CPC分类号： G03F7/707 , G03F1/48 , G03F1/50 , G03F7/70866
摘要： A photomask including a substrate comprised of fluorite (calcium fluoride (CaF2)) and protective films comprised of chrome (Cr), chromium oxide (Cro), silicon oxide (SiO2 or SiO), etc. and formed at regions, other than the pattern region where the pattern to be transferred is formed, which contact other members when transporting the photomask or using it for exposure.
摘要翻译：包括由萤石（氟化钙（CaF 2））构成的基板和由铬（Cr），氧化铬（Cro），氧化硅（SiO 2或SiO）等构成的保护膜的光掩模，并形成在图案以外的区域形成要转印的图案的区域，其在运送光掩模时使用其它构件或将其用于曝光。

13. 发明授权

US06582978B2 Position detection mark and position detection method 失效
标题翻译：位置检测标记和位置检测方法
公开(公告)号：US06582978B2
公开(公告)日：2003-06-24
申请号：US09977989
申请日：2001-10-17
申请人： Naomasa Shiraishi
发明人： Naomasa Shiraishi
IPC分类号： H01L2166
CPC分类号： G03F9/7049 , G03F9/70 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： An exposure substrate includes a position detection mark having a recessed or projecting portion formed on the substrate with a difference h in depth. The difference h in depth of the recessed or projecting portion is set to (2m+1)&lgr;/4−0.05&lgr;≦h≦(2m+1)&lgr;/4+0.05&lgr; where &lgr; is the wavelength or center wavelength,-in a photoresist, of a monochromatic or quasimonochromatic detection beam to be irradiated on the position detection mark, and m is an integer not less than 0.
摘要翻译：曝光基板包括位置检测标记，该位置检测标记具有形成在基板上的凹入或突出部分，其深度差异为h。将凹入或突出部分的深度差h设定为要照射在位置检测标记上的单色或准三色检测光束的光致抗蚀剂中的波长或中心波长，m是不小于比0。

14. 发明授权

US06356343B1 Mark for position detection and mark detecting method and apparatus 失效
标题翻译：标记位置检测和标记检测方法和装置
公开(公告)号：US06356343B1
公开(公告)日：2002-03-12
申请号：US09366565
申请日：1999-08-04
申请人： Naomasa Shiraishi , Nobutaka Magome
发明人： Naomasa Shiraishi , Nobutaka Magome
IPC分类号： G03B2742
CPC分类号： G03F9/70 , G03F9/00
摘要： A mark for position detection formed on a substrate has a first pattern disposed near the center of the mark and having periodicity in a Y-axis direction, and second patterns respectively disposed near both sides of the first pattern in an X-axis direction and each having periodicity in the X-axis direction. The position of the first pattern is detected by aligning the detection center of a detecting optical system, that is, the minimal aberration point of the detecting optical system, with the center of the first pattern. The positions of the second patterns are detected at respective points symmetric with respect to the minimal aberration point, and the detected values for the positions of the second patterns are averaged. An apparatus for detecting the mark for position detection detects the first and second patterns by image processing when the mark is in a stationary state.
摘要翻译：在基板上形成的用于位置检测的标记具有设置在标记中心附近并具有Y轴方向的周期性的第一图案，以及分别设置在X轴方向上的第一图案的两侧附近的第二图案，具有X轴方向的周期性。通过将检测光学系统的检测中心即检测光学系统的最小像差点与第一图案的中心对准来检测第一图案的位置。在相对于最小像差点对称的各个点处检测第二图案的位置，并且对第二图案的位置的检测值进行平均。用于检测位置检测标记的装置在标记处于静止状态时通过图像处理检测第一和第二图案。

15. 发明授权

US06310679B1 Projection exposure method and apparatus 失效
标题翻译：投影曝光方法及装置
公开(公告)号：US06310679B1
公开(公告)日：2001-10-30
申请号：US09332148
申请日：1999-06-14
申请人： Naomasa Shiraishi
发明人： Naomasa Shiraishi
IPC分类号： G03B2742
CPC分类号： G03F7/70258 , G03F7/70058 , G03F7/70308 , G03F7/70333 , G03F7/70566 , G03F7/70583
摘要： In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming beams respectively passing through a plurality of different, concentric regions around the optical axis of the projection optical system on the Fourier transform plane. The coherence reducing member may be a polarization state control member for making a difference in polarization state, a member for making a difference in optical path length, or space filters with different shapes.
摘要翻译：在诸如接触孔的隔离图案的投影曝光中，为了增加焦深，相干减少构件设置在掩模和敏化基底之间的图像形成光路中的傅里叶变换平面上，使得相干性为分别在傅立叶变换平面上通过投影光学系统的光轴周围的多个不同的同心区域的图像形成光束之间减小。相干减少构件可以是用于使偏振状态不同的偏振态控制构件，用于使光程长度差的构件或具有不同形状的空间滤光器。

16. 发明授权

US06285455B1 Mark detection method, optical system and mark position detector 有权
标题翻译：标记检测方法，光学系统和标记位置检测器
公开(公告)号：US06285455B1
公开(公告)日：2001-09-04
申请号：US09573223
申请日：2000-05-19
申请人： Naomasa Shiraishi
发明人： Naomasa Shiraishi
IPC分类号： C01B902
CPC分类号： G03F9/7065 , G03F9/70 , G03F9/7049 , G03F9/7084
摘要： A position detection method detects the position of a mark formed at the bottom of a film such as a polysilicon layer which transmits no visible light. A flattened alignment mark is formed on a wafer, onto which the pattern on a reticle is transferred. A polysilicon film is formed on the alignment mark. An alignment sensor includes a laser light source and a frequency shifter, which produce light beams having wavelengths between 800 and 1500 nm and differing slightly in frequency from each other. The beams are radiated through a projection optical system and transmitted by the polysilicon film to irradiate the alignment mark. The diffracted light from the alignment mark is received through the optical system by a photoelectric detector. On the basis of the signal detected by the photoelectric detector, the position of the alignment mark is detected.
摘要翻译：位置检测方法检测形成在诸如不透射可见光的多晶硅层的膜的底部的标记的位置。在晶片上形成平坦的对准标记，转印有掩模版上的图案。在对准标记上形成多晶硅膜。对准传感器包括激光源和频移器，其产生波长在800和1500nm之间并且频率稍微不同的光束。光束通过投影光学系统辐射并被多晶硅膜透射以照射对准标记。来自对准标记的衍射光通过光学系统由光电检测器接收。基于由光电检测器检测到的信号，检测对准标记的位置。

17. 发明授权

US5815249A Illumination optical apparatus and method having a wavefront splitter and an optical integrator 失效
标题翻译：具有波前分离器和光学积分器的照明光学装置和方法
公开(公告)号：US5815249A
公开(公告)日：1998-09-29
申请号：US940288
申请日：1997-09-30
申请人： Kenji Nishi , Naomasa Shiraishi
发明人： Kenji Nishi , Naomasa Shiraishi
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/7005 , G03F7/701 , G03F7/70108 , G03F7/70158 , G03F7/70358
摘要： A diffraction grating is set between a light source and a fly-eye lens composed of a plurality of lens elements rectangular in cross section, and using the zeroth order diffraction beam and .+-.first order diffraction beams emergent from the diffraction grating, a plurality of light source images are formed along the longitudinal direction on the exit plane of each lens element in the fly-eye lens. In a preferred mode the intensity of illumination light on a mask is increased using first and second light sources, and a first illumination beam, which is obtained by combining a beam emitted from the first light source and passing through a half prism with a beam emitted from the second light source and reflected by the half prism on a same axis, and a second illumination beam, which is obtained by combining a beam emitted from the first light source and reflected by the half prism with a beam emitted from the second light source and passing through the half prism on a same axis, are made incident into the fly-eye lens as being inclined symmetrically with each other with respect to the optical axis of illumination optical system.
摘要翻译：将衍射光栅设置在由多个透镜元件构成的光源和横截面矩形的飞眼透镜之间，并且使用从衍射光栅射出的零级衍射光束和+/-一级衍射光束，多个的光源图像沿着纵向方向形成在飞眼透镜中的每个透镜元件的出射平面上。在优选模式中，使用第一和第二光源增加了掩模上的照明光的强度，并且通过将从第一光源发射的光束并通过半棱镜而获得的第一照明光束被发射以及第二照明光束，其通过将从第一光源发射并由半棱镜反射的光束与从第二光源发射的光束组合而获得，并且穿过同一轴线上的半棱镜相对于照明光学系统的光轴彼此对称地入射到飞眼透镜中。

18. 发明授权

US5715089A Exposure method and apparatus therefor 失效
公开(公告)号：US5715089A
公开(公告)日：1998-02-03
申请号：US590351
申请日：1996-01-23
申请人： Naomasa Shiraishi
发明人： Naomasa Shiraishi
IPC分类号： G02B27/50 , G03F7/20 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/70058 , G02B27/50 , G03F7/701 , G03F7/70191 , G03F7/70283 , Y10S359/90
摘要： In an exposure method of illuminating a pattern formed on a mask with illumination light from an illumination optical system, and projecting/exposing an image of the pattern on a photosensitive substrate through a projection optical system, the pattern includes a transmission portion having a transmittance of about 1 with respect to the illumination light and a phase shift transmission portion which provides a phase difference of about (2n+1).pi.(n is an integer) with respect to the light transmitted through the transmission portion, and has a pattern width not more than a resolving limit of the projection optical system. The illumination light passing through a predetermined plane which is substantially coincident with a Fourier transform plane of the mask in the illumination optical system or a conjugate plane thereto, is limited to at least one local region having the center at a position shifted from an optical axis of the illumination optical system, thereby inclining the illumination light radiated on the mask at an angle corresponding to fineness of the pattern in a predetermined direction.

19. 发明授权

US5504596A Exposure method and apparatus using holographic techniques 失效
标题翻译：使用全息技术的曝光方法和装置
公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
IPC分类号： G03F7/20 , G03H1/00 , G03H1/26
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译：使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。

20. 发明授权

US5448336A Apparatus and method for projection exposure 失效
标题翻译：用于投影曝光的装置和方法
公开(公告)号：US5448336A
公开(公告)日：1995-09-05
申请号：US274752
申请日：1994-07-14
申请人： Naomasa Shiraishi
发明人： Naomasa Shiraishi
IPC分类号： G03F7/20 , G03F7/207 , H01L21/027 , G03B27/72 , G03B27/42
CPC分类号： G03F7/701 , G03F7/70241 , G03F7/70308 , G03F7/70333 , G03F7/70358 , G03F7/70858 , G03F7/70883 , G03F7/70891 , G03F7/70916
摘要： A projection exposure apparatus having an illuminating system for irradiating a mask having a pattern with illuminating light and a projection optical system for taking in light emanating from the pattern of the mask and for projecting an image of the pattern on a photosensitive substrate. The projection exposure apparatus further includes a phase plate disposed on or near a Fourier transform plane in an image-forming optical path between the mask and the photosensitive substrate so that the amplitude of light passing through a circular region of radius r.sub.1 which is centered at an optical axis of the projection optical system on the Fourier transform plane or a plane near it and the amplitude of light passing through an outer region while lies outwardly of the circular region are made different in sign from each other by the phase plate, and a movable member for moving an image-forming plane of the projection optical system and the photosensitive substrate relative to each other along the optical axis of the projection optical system when the image of the mask pattern is projected on the photosensitive substrate. The radius r.sub.1 and the ratio t of the amplitude of light passing through the circular region to the amplitude light passing through the outer region are determined so as to satisfy the following condition:0.85.times.(0.34+0.12t).ltoreq.r.sub.1 /r.sub.2 .ltoreq.1.15.times.(0.34+0.12t)where r.sub.2 is the radius of a pupil plane of said projection optical system.
摘要翻译：一种投影曝光装置，具有用于照射具有照明光的图案的掩模的照明系统和用于吸收从掩模的图案发出的光并用于将图案的图像投影在感光基板上的投影光学系统。投影曝光装置还包括在掩模和感光基板之间的图像形成光路中设置在傅里叶变换平面上或附近的相位板，使得通过以一个中心的半径r1的圆形区域的光的振幅投影光学系统在傅里叶变换平面上的光轴或其附近的平面以及通过外部区域同时位于圆形区域外侧的光的振幅通过相位板彼此不同，并且可移动当掩模图案的图像投影在感光基板上时，用于沿着投影光学系统的光轴相对于投影光学系统的图像形成平面和感光基板相对移动。半径r1和通过圆形区域的光的振幅与通过外部区域的振幅光的比值t被确定为满足以下条件：0.85x（0.34 + 0.12t）

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