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11. 发明申请

US20120327386A1 LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD 有权
标题翻译：光刻装置，基板的变形方法及装置的制造方法
公开(公告)号：US20120327386A1
公开(公告)日：2012-12-27
申请号：US13494638
申请日：2012-06-12
申请人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
发明人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
IPC分类号： G03B27/58
CPC分类号： G03F7/7085 , G03F7/70783
摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
摘要翻译：光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。投影系统被配置为将图案化的辐射束投射到衬底上。衬底台被配置为支撑衬底并相对于投影系统移动。多个传感器被配置成测量衬底台的变形。致动器构造成使基板台变形。控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。多个传感器相对于投影系统基本上是静止的。

12. 发明申请

US20120153543A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20120153543A1
公开(公告)日：2012-06-21
申请号：US13296571
申请日：2011-11-15
申请人： Johannes Petrus Martinus Bernardus Vermeulen , Antonius Franciscus Johannes De Groot , Theodorus Petrus Maria Cadee , Jeroen De Boeij
发明人： Johannes Petrus Martinus Bernardus Vermeulen , Antonius Franciscus Johannes De Groot , Theodorus Petrus Maria Cadee , Jeroen De Boeij
IPC分类号： B29C67/00 , B23K26/36
CPC分类号： G03F7/70758 , G03F7/70691
摘要： A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle moving parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier, the shuttle connector allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver for driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis and it is desirable if only one of the shuttle is connected to the carrier.
摘要翻译：光刻设备包括投影系统，其被布置成将图案从图案形成装置传送到基板，载体和驱动系统，用于在参考正交轴线X和Y限定的平面中相对于投影系统移动载体。驱动系统包括平行于Y轴移动的梭子，将梭子连接到托架的穿梭连接器，穿梭连接器允许托架在平行于X轴的方向上相对于梭子运动;以及穿梭驱动器，梭子平行于Y轴的驱动运动。梭子在平行于X轴的方向上位于载体的一侧，并且希望只有梭子之一连接到载体上。

13. 发明申请

US20110299057A1 STAGE APPARATUS AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE APPARATUS 失效
标题翻译：包含这种装置的阶段装置和平面设备
公开(公告)号：US20110299057A1
公开(公告)日：2011-12-08
申请号：US13100740
申请日：2011-05-04
申请人： Johannes Antonius Gerardus AKKERMANS , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
发明人： Johannes Antonius Gerardus AKKERMANS , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
IPC分类号： G03B27/58
CPC分类号： G03F7/70725 , G03F7/70991
摘要： A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.
摘要翻译：一种用于定位物体的舞台装置，舞台装置包括被配置为保持对象的桌子，被配置为支撑桌子的支撑结构，桌子可相对于支撑结构移动，支撑结构包括第一数据时钟和第二数据时钟和包括第一数据时钟和第二数据时钟中的另一个的表; 以及电路，被配置为使所述第一和第二数据时钟同步，所述电路包括发射机和接收机，所述发射机被配置为将时钟信号数据从所述第一数据时钟无线传输到所述第二数据时钟;以及同步电路，数据时钟具有来自接收机接收的无线传输时钟信号数据的第一个数据时钟。

14. 发明授权

US07696492B2 Radiation system and lithographic apparatus 失效
标题翻译：辐射系统和光刻设备
公开(公告)号：US07696492B2
公开(公告)日：2010-04-13
申请号：US11637936
申请日：2006-12-13
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译：提供了一种用于产生限定光轴的辐射束的辐射系统。辐射系统包括用于产生EUV辐射的等离子体产生的放电源。放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。

15. 发明授权

US07304715B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07304715B2
公开(公告)日：2007-12-04
申请号：US10917535
申请日：2004-08-13
申请人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
发明人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译：公开了一种光刻设备。该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。

16. 发明授权

US09513561B2 Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备，用于保持光刻设备的方法和设备制造方法
公开(公告)号：US09513561B2
公开(公告)日：2016-12-06
申请号：US14006934
申请日：2012-03-16
申请人： Arno Jan Bleeker , Martinus Hendricus Henricus Hoeks , Theodorus Petrus Maria Cadee
发明人： Arno Jan Bleeker , Martinus Hendricus Henricus Hoeks , Theodorus Petrus Maria Cadee
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70133 , G03F7/70391 , G03F7/70975
摘要： A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.
摘要翻译：一种光刻设备，具有多个可单独控制的辐射源单元，每个辐射源单元各自提供图案化辐射束的一部分，被配置为监视每个独立可控辐射源单元的性能参数的控制系统，以及配置成替换单独可控的辐射源单元之一，其具有响应于控制系统的替换单元，基于所监视的性能参数确定已经满足标准。

17. 发明授权

US08913228B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08913228B2
公开(公告)日：2014-12-16
申请号：US11730749
申请日：2007-04-03
申请人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
发明人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
IPC分类号： G03B27/58 , G03F7/20 , F16L55/053
CPC分类号： G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.
摘要翻译：公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。衬底台包括配置成保持调理流体并调节衬底台的调节系统。调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

18. 发明申请

US20140009746A1 LITHOGRAPHIC APPARATUS, METHOD FOR MAINTAINING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：平面设备，维护平板设备的方法和设备制造方法
公开(公告)号：US20140009746A1
公开(公告)日：2014-01-09
申请号：US14006934
申请日：2012-03-16
申请人： Arno Jan Bleeker , Martinus Hendricus Henricus Hoeks , Theodorus Petrus Maria Cadee
发明人： Arno Jan Bleeker , Martinus Hendricus Henricus Hoeks , Theodorus Petrus Maria Cadee
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70391 , G03F7/70975
摘要： A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.
摘要翻译：一种光刻设备，具有多个可单独控制的辐射源单元，每个辐射源单元各自提供图案化辐射束的一部分，被配置为监视每个独立可控辐射源单元的性能参数的控制系统，以及配置成替换单独可控的辐射源单元之一，其具有响应于控制系统的替换单元，基于所监视的性能参数确定已经满足标准。

19. 发明申请

US20120162621A1 LITHOGRAPHIC APPARATUS AND REMOVABLE MEMBER 有权
标题翻译：平面设备和可拆卸的会员
公开(公告)号：US20120162621A1
公开(公告)日：2012-06-28
申请号：US13333237
申请日：2011-12-21
申请人： Ruud Antonius Catharina Maria Beerens , Theodorus Petrus Maria Cadee
发明人： Ruud Antonius Catharina Maria Beerens , Theodorus Petrus Maria Cadee
IPC分类号： G03B27/52 , G03B27/58
CPC分类号： G03F7/70875 , G03F7/70716 , H01L21/683 , H01L21/6875
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object.
摘要翻译：布置成将图案从图案形成装置转印到基板上的光刻设备，所述光刻设备具有安装在第一物体上的第一物体和平面元件，以改善与第二物体的热传递。

20. 发明授权

US07180571B2 Lithographic projection apparatus and actuator 有权
标题翻译：平版印刷设备和执行机构
公开(公告)号：US07180571B2
公开(公告)日：2007-02-20
申请号：US11006821
申请日：2004-12-08
申请人： Theodorus Petrus Maria Cadee
发明人： Theodorus Petrus Maria Cadee
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , F16F6/00 , F16F15/00 , F16F15/03 , G03F7/709 , H01J37/3056
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a substrate support constructed to support a substrate, a projection system configured to project a patterned radiation beam onto a target portion of the substrate, and a frame onto which at least a part of the projection system is mounted. A fluid provider is arranged to provide a fluid between the substrate and a downstream end of the projection system. The apparatus also includes an actuator associated with the frame and with the fluid provider and arranged to position the fluid provider, and a cushion system for cushioning vibrational forces when the actuator positions the fluid provider.
摘要翻译：公开了一种光刻投影装置。该装置包括构造成支撑基板的基板支撑件，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，以及安装投影系统的至少一部分的框架。流体供应器被布置成在基板和投影系统的下游端之间提供流体。该装置还包括与框架相关联并与流体提供者相关联并且被布置成定位流体提供者的致动器，以及用于当致动器定位流体供应器时缓冲振动力的缓冲系统。

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