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11. 发明申请

US20100243922A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100243922A1
公开(公告)日：2010-09-30
申请号：US12705287
申请日：2010-02-12
申请人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
发明人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
摘要翻译：一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动，极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面与离子收集器装置中的离子相撞。

12. 发明申请

US20100078579A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光超光源光源装置
公开(公告)号：US20100078579A1
公开(公告)日：2010-04-01
申请号：US12566170
申请日：2009-09-24
申请人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
发明人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/001 , H05G2/008
摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.
摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

13. 发明授权

US08586954B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08586954B2
公开(公告)日：2013-11-19
申请号：US13419177
申请日：2012-03-13
申请人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
发明人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
IPC分类号： G01N21/00 , G01N21/33 , H05G2/00
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
摘要翻译：一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动，极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面与离子收集器装置中的离子相撞。

14. 发明授权

US08399867B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08399867B2
公开(公告)日：2013-03-19
申请号：US12566170
申请日：2009-09-24
申请人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
发明人： Akira Endo , Shinji Nagai , Kouji Kakizaki , Osamu Wakabayashi , Yoshifumi Ueno
IPC分类号： H04H1/04
CPC分类号： H05G2/003 , H05G2/001 , H05G2/008
摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.
摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

15. 发明授权

US08513630B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08513630B2
公开(公告)日：2013-08-20
申请号：US13274991
申请日：2011-10-17
申请人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
发明人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , H05G2/008
摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.
摘要翻译：在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率相对于离子小于一个原子/离子。

16. 发明授权

US08067756B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08067756B2
公开(公告)日：2011-11-29
申请号：US12646075
申请日：2009-12-23
申请人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
发明人： Yoshifumi Ueno , Georg Soumagne , Shinji Nagai , Akira Endo , Tatsuya Yanagida
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , H05G2/008
摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.
摘要翻译：在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率相对于离子小于一个原子/离子。

17. 发明授权

US08471226B2 Extreme ultraviolet light source device and method for producing extreme ultraviolet light 有权
标题翻译：极紫外光源装置及其制造方法
公开(公告)号：US08471226B2
公开(公告)日：2013-06-25
申请号：US12547896
申请日：2009-08-26
申请人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
发明人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
IPC分类号： A61N5/06
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。这减少了碎片的产生。离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

18. 发明申请

US20110101863A1 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET LIGHT 有权
标题翻译：极光紫外线光源装置及生产超极紫外线灯的方法
公开(公告)号：US20110101863A1
公开(公告)日：2011-05-05
申请号：US12547896
申请日：2009-08-26
申请人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
发明人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
IPC分类号： H01J7/00
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。这减少了碎片的产生。离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

19. 发明申请

US20110057126A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光紫外线光源设备
公开(公告)号：US20110057126A1
公开(公告)日：2011-03-10
申请号：US12943090
申请日：2010-11-10
申请人： HIDEO HOSHINO , Tamotsu Abe , Akira Endo
发明人： HIDEO HOSHINO , Tamotsu Abe , Akira Endo
IPC分类号： H01J27/24
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

20. 发明授权

US08324601B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08324601B2
公开(公告)日：2012-12-04
申请号：US12943090
申请日：2010-11-10
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： H05H1/00 , G01J3/10
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

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