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    • 17. 发明授权
    • Process for producing low reflection glass plate, and low reflection glass plate
    • 低反射玻璃板和低反射玻璃板的生产工艺
    • US07276263B2
    • 2007-10-02
    • US11178453
    • 2005-07-12
    • Yukio KimuraYoshiya TsutsuiKazuo Gotou
    • Yukio KimuraYoshiya TsutsuiKazuo Gotou
    • B05D5/06
    • C03C17/3417C03C1/008C03C17/007C03C17/008C03C2217/445C03C2217/479
    • The present invention provides a low reflection glass plate which has an effect of reducing reflectance against light even at an incident angle of 60° sufficiently, in high yield. A process for producing a low reflection glass plate, characterized by the use of a treating fluid (1) comprising a resin B1, fine gold particles, an organic metal compound of at least one metal (M1) selected from the group consisting of iron, titanium and zirconium, and an organic solvent, and a treating fluid (2) comprising a film-forming compound, a resin B2 having the same thermal decomposition temperature as the resin B1 or a higher thermal decomposition temperature than the resin B1, wherein said process comprises applying the treating fluid (1) on the surface of a transparent glass substrate, followed by drying at a temperature of from 50 to 250° C. to remove the organic solvent, further applying the treating fluid (2), followed by drying at from 50 to 250° C. to remove the organic solvent, and then baking the treated transparent glass substrate at a temperature of from 400 to 800° C.
    • 本发明提供了一种低反射玻璃板,其具有即使以60°的入射角充分地以高产率降低对光的反射率的效果。 一种生产低反射玻璃板的方法,其特征在于使用包含树脂B1,细金颗粒,至少一种金属(M1)的有机金属化合物(M1)的处理流体(1),其选自铁, 钛和锆和有机溶剂,以及包含成膜化合物的处理流体(2),具有与树脂B1相同的热分解温度的树脂B2或比树脂B1更高的热分解温度,其中所述方法 包括将处理流体(1)施加在透明玻璃基板的表面上,然后在50-250℃的温度下干燥以除去有机溶剂,进一步施加处理流体(2),然后在 从50至250℃,以除去有机溶剂,然后在400至800℃的温度下烘烤经处理的透明玻璃基材。
    • 18. 发明申请
    • Process for producing low reflection glass plate, and low reflection glass plate
    • 低反射玻璃板和低反射玻璃板的生产工艺
    • US20050243426A1
    • 2005-11-03
    • US11178453
    • 2005-07-12
    • Yukio KimuraYoshiya TsutsuiKazuo Gotou
    • Yukio KimuraYoshiya TsutsuiKazuo Gotou
    • C03C1/00C03C17/00C03C17/34G02B5/00G02B5/28
    • C03C17/3417C03C1/008C03C17/007C03C17/008C03C2217/445C03C2217/479
    • The present invention provides a low reflection glass plate which has an effect of reducing reflectance against light even at an incident angle of 60° sufficiently, in high yield. A process for producing a low reflection glass plate, characterized by the use of a treating fluid (1) comprising a resin B1, fine gold particles, an organic metal compound of at least one metal (M1) selected from the group consisting of iron, titanium and zirconium, and an organic solvent, and a treating fluid (2) comprising a film-forming compound, a resin B2 having the same thermal decomposition temperature as the resin B1 or a higher thermal decomposition temperature than the resin B1, wherein said process comprises applying the treating fluid (1) on the surface of a transparent glass substrate, followed by drying at a temperature of from 50 to 250° C. to remove the organic solvent, further applying the treating fluid (2), followed by drying at from 50 to 250° C. to remove the organic solvent, and then baking the treated transparent glass substrate at a temperature of from 400 to 800° C.
    • 本发明提供了一种低反射玻璃板,其具有即使以60°的入射角充分地以高产率降低对光的反射率的效果。 一种生产低反射玻璃板的方法,其特征在于使用包含树脂B1,细金颗粒,至少一种金属(M1)的有机金属化合物(M1)的处理流体(1),其选自铁, 钛和锆和有机溶剂,以及包含成膜化合物的处理流体(2),具有与树脂B1相同的热分解温度的树脂B2或比树脂B1更高的热分解温度,其中所述方法 包括将处理流体(1)施加在透明玻璃基板的表面上,然后在50-250℃的温度下干燥以除去有机溶剂,进一步施加处理流体(2),然后在 从50至250℃,以除去有机溶剂,然后在400至800℃的温度下烘烤经处理的透明玻璃基材。