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11. 发明申请

US20140211189A1 RADIATION MODULATOR FOR A LITHOGRAPHY APPARATUS, A LITHOGRAPHY APPARATUS, A METHOD OF MODULATING RADIATION FOR USE IN LITHOGRAPHY, AND A DEVICE MANUFACTURING METHOD 有权
标题翻译：用于光刻设备的辐射调制器，光刻设备，用于在地平线中使用的调制辐射的方法和设备制造方法
公开(公告)号：US20140211189A1
公开(公告)日：2014-07-31
申请号：US14165334
申请日：2014-01-27
申请人： Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
发明人： Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
IPC分类号： G03F7/20 , G02F1/01
CPC分类号： G03F7/70191 , G03F7/70291
摘要： A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
摘要翻译：公开了一种用于光刻设备的辐射调制器，光刻设备，调制用于光刻的辐射的方法，以及器件制造方法。用于光刻设备的辐射调制器可以具有支持波长小于450nm的辐射的多个波导，以及调制部，被配置为单独地调制在每个波导中传播的辐射，以便提供调制的多个输出光束。

12. 发明申请

US20130107238A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20130107238A1
公开(公告)日：2013-05-02
申请号：US13663924
申请日：2012-10-30
申请人： Heine Melle Mulder
发明人： Heine Melle Mulder
IPC分类号： G03F7/20 , G03F7/26
CPC分类号： G03F7/2008 , G03F7/26 , G03F7/70391 , G03F7/704 , G03F7/70575
摘要： A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
摘要翻译：一种具有投影系统以将多个辐射束投影到衬底上的投影系统的装置，其中所述多个辐射束包括由第一波长范围内的辐射和第一组一个或多个辐射形成的第一组一个或多个辐射束在与第一波长范围不同的第二波长范围内的辐射形成的光束。该装置还具有一个色散元件，其配置成使得第一组的一个或多个辐射束以与第二组的一个或多个辐射束不同的角度入射在分散元件上，并且使得一个或多个辐射束从分散元件输出的第一和第二组基本上是平行的。

13. 发明授权

US08052289B2 Mirror array for lithography 有权
标题翻译：用于光刻的镜阵列
公开(公告)号：US08052289B2
公开(公告)日：2011-11-08
申请号：US11448152
申请日：2006-06-07
申请人： Marius Ravensbergen , Heine Melle Mulder
发明人： Marius Ravensbergen , Heine Melle Mulder
IPC分类号： G02B7/195 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/70116 , G03F7/70291 , G03F7/70858
摘要： A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.
摘要翻译：镜阵列装置包括被配置为支撑多个可单独调节的反射元件的载体。至少一个致动器与每个反射元件相关联，致动器被配置成调节相关联的反射元件的取向或位置。该装置还包括与至少一部分反射元件接触的液体。

14. 发明申请

US20090190197A1 Device control method and apparatus 有权
标题翻译：设备控制方法及装置
公开(公告)号：US20090190197A1
公开(公告)日：2009-07-30
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译：一种控制单独可控元件阵列的元件的方法。该方法包括改变驱动元件的驱动电压的频率。

15. 发明授权

US08885144B2 Illumination system and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：US08885144B2
公开(公告)日：2014-11-11
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
发明人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
IPC分类号： G02B5/08 , G03B27/32 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译：公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力一个或多个元素。

16. 发明授权

US08089672B2 Array element device control method and apparatus 有权
标题翻译：阵列元件装置控制方法及装置
公开(公告)号：US08089672B2
公开(公告)日：2012-01-03
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译：一种控制单独可控元件阵列的元件的方法。该方法包括改变驱动元件的驱动电压的频率。

17. 发明授权

US07508487B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07508487B2
公开(公告)日：2009-03-24
申请号：US10719065
申请日：2003-11-24
申请人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
发明人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70558 , G03F7/70883 , G03F7/70933 , G03F7/70941
摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.
摘要翻译：在光刻投影系统中，需要准确地控制传送到基板的辐射能量。通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。

18. 发明申请

US20080100816A1 Lithographic apparatus and method 审中-公开
标题翻译：平版印刷设备和方法
公开(公告)号：US20080100816A1
公开(公告)日：2008-05-01
申请号：US11589990
申请日：2006-10-31
申请人： Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
发明人： Heine Melle Mulder , Wilfred Edward Endendijk , Edwin Eduard Nicolaas Josephus Krijnen
IPC分类号： G03B27/80
CPC分类号： G03B27/522 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution of an incident illumination beam of radiation, wherein the array of individually controllable reflective elements is provided on a curved support structure, or the array of individually controllable reflective elements is arranged to serve as a curved reflective surface.
摘要翻译：公开了一种用于光刻设备的照明器，所述照明器包括能够改变入射照射光束的角度强度分布的独立可控反射元件的阵列，其中所述独立可控反射元件阵列设置在弯曲的支撑结构上，或者可单独控制的反射元件的阵列被布置成用作弯曲的反射表面。

19. 发明授权

US09116439B2 Illumination system and lithographic apparatus 有权
标题翻译：照明系统和光刻设备
公开(公告)号：US09116439B2
公开(公告)日：2015-08-25
申请号：US13051384
申请日：2011-03-18
申请人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
发明人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70116
摘要： An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
摘要翻译：公开了一种照明系统，其具有偏振构件，该偏振构件包括可移动成与辐射束至少部分交叉的第一和第二偏振修正器，使得各个偏振修正器对至少部分光束施加修改的偏振。所述照明系统还包括可独立控制的反射元件的阵列，其定位成在辐射束已经通过所述偏振构件之后接收所述辐射束;以及控制器，被配置为控制所述第一和第二偏振调节剂的运动，使得所述第一和第二偏振调节剂与辐射束的不同部分。

20. 发明授权

US08896815B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08896815B2
公开(公告)日：2014-11-25
申请号：US13663924
申请日：2012-10-30
申请人： Heine Melle Mulder
发明人： Heine Melle Mulder
IPC分类号： G03F7/26 , G03F7/20
CPC分类号： G03F7/2008 , G03F7/26 , G03F7/70391 , G03F7/704 , G03F7/70575
摘要： A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
摘要翻译：一种具有投影系统以将多个辐射束投影到衬底上的投影系统的装置，其中所述多个辐射束包括由第一波长范围内的辐射和第一组一个或多个辐射形成的第一组一个或多个辐射束在与第一波长范围不同的第二波长范围内的辐射形成的光束。该装置还具有一个色散元件，其配置成使得第一组的一个或多个辐射束以与第二组的一个或多个辐射束不同的角度入射在分散元件上，并且使得一个或多个辐射束从分散元件输出的第一和第二组基本上是平行的。

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