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    • 12. 发明授权
    • Cleaning by cavitation in liquefied gas
    • 液化气体气蚀清洗
    • US5316591A
    • 1994-05-31
    • US927443
    • 1992-08-10
    • Sidney C. ChaoEdna M. PurerThomas B. StanfordCarl W. Townsend
    • Sidney C. ChaoEdna M. PurerThomas B. StanfordCarl W. Townsend
    • B01D11/00B08B3/12B08B7/00D06F19/00D06F43/00D06F43/08H05K3/26C02F1/46
    • D06F19/00B08B3/12B08B7/0021D06F43/007D06F43/08H05K3/26
    • Undesired material is removed from a chosen substrate by a process comprising the steps of (a) placing the substrate containing the undesired material in a cleaning chamber provided with cavitation-producing means; (b) introducing a liquefied gas, such as liquid carbon dioxide, into the cleaning chamber and contacting the substrate containing the undesired material with the liquid carbon dioxide at a temperature below its critical temperature; and (c) exposing the liquid carbon dioxide to the cavitation-producing means for a period of time sufficient to remove the undesired material from the substrate. The substrate containing the undesired material may optionally be contacted with carbon dioxide in the dense phase prior to and/or after the cavitation treatment to aid in removal of the undesired material. Further, spent liquid carbon dioxide may be treated to regenerate fresh liquid carbon dioxide which is recycled to the cleaning chamber. Other gases besides carbon dioxide which may be used include nitrous oxide, sulfur hexafluoride, and xenon.
    • 不期望的材料通过包括以下步骤的方法从所选择的衬底中移除:(a)将含有不需要的材料的衬底放置在设置有空化产生装置的清洁室中; (b)将液化二氧化碳等液化气体引入清洗室,并将含有不需要的材料的基材与液体二氧化碳在低于其临界温度的温度下接触; 和(c)将液体二氧化碳暴露于产生气蚀的装置一段足以从衬底去除不想要的材料的时间。 在空化处理之前和/或之后,含有不想要的材料的基材可以任选地与致密相中的二氧化碳接触以帮助去除不需要的材料。 此外,废液二氧化碳可以被处理以再生再循环到清洁室的新鲜液体二氧化碳。 除二氧化碳之外的其他气体可以使用包括一氧化二氮,六氟化硫和氙。
    • 14. 发明授权
    • Method using megasonic energy in liquefied gases
    • 在液化气中使用兆声波能量的方法
    • US5456759A
    • 1995-10-10
    • US283927
    • 1994-08-01
    • Thomas B. Stanford, Jr.Sidney C. Chao
    • Thomas B. Stanford, Jr.Sidney C. Chao
    • B08B3/12B08B7/00D06F19/00D06F43/00D06F43/08H01L21/00H05K3/26B08B3/08
    • H01L21/67028B08B3/12B08B7/0021D06F19/00D06F43/007D06F43/08H05K3/26
    • A process for removing undesired sub-micrometer particulates from a chosen substrate (16) comprising the steps of: (a) placing the substrate containing the undesired particulates in a cleaning chamber (12) provided with megasonic energy-producing means (20); (b) introducing a liquefied gas (22), such as liquid carbon dioxide, into the cleaning chamber and contacting the substrate containing the undesired particulates with the liquid carbon dioxide at a temperature below its critical temperature; and (c) exposing the liquid carbon dioxide to the megasonic energy-producing means for a period of time sufficient to remove the undesired particulates from the substrate. The substrate containing the undesired particulates may optionally be contacted with carbon dioxide in the dense phase prior to and/or after the treatment with megasonic energy to aid in removal of the undesired particulates. Further, spent liquid carbon dioxide may be treated to regenerate fresh liquid carbon dioxide which is recycled to the cleaning chamber. Other gases besides carbon dioxide which may be used include nitrous oxide, sulfur hexafluoride, and xenon. Further, gas mixtures and gas mixtures with suitable modifiers may be employed.
    • 一种用于从所选择的衬底(16)去除不想要的亚微米颗粒的方法,包括以下步骤:(a)将含有不需要的微粒的衬底放置在设置有兆声波能量产生装置的清洁室中; (b)将诸如液体二氧化碳的液化气体(22)引入清洁室中,并将含有不需要的颗粒的基材与液体二氧化碳在低于其临界温度的温度下接触; 和(c)将液体二氧化碳暴露于兆声波能量产生装置一段足以从衬底去除不需要的颗粒的时间。 含有不需要的颗粒的基质可以任选地在紧密处理之前和/或之后与密集相中的二氧化碳接触,以帮助除去不需要的颗粒。 此外,废液二氧化碳可以被处理以再生再循环到清洁室的新鲜液体二氧化碳。 除二氧化碳之外的其他气体可以使用包括一氧化二氮,六氟化硫和氙。 此外,可以使用具有合适的改性剂的气体混合物和气体混合物。
    • 15. 发明授权
    • Low cost equipment for cleaning using liquefiable gases
    • 使用液化气体清洁的低成本设备
    • US5339844A
    • 1994-08-23
    • US82866
    • 1993-09-07
    • Thomas B. Stanford,Jr.Sidney C. Chao
    • Thomas B. Stanford,Jr.Sidney C. Chao
    • B01D11/00B08B3/08B08B3/12B08B5/00B08B7/00D06F19/00D06F43/00D06F43/08H01L21/304H05K3/26B08B3/02B08B13/00
    • D06F43/007B08B3/12B08B7/0021D06F19/00D06F43/08H05K3/26
    • Precision cleaning of parts is performed with liquefiable gases, such as CO.sub.2, without the use of a complex and costly processor system. Rather, simplified and reliable performance for small scale and "low end" cleaning applications is accomplished without the use of pumps and condensers. The apparatus for removing undesired material from a chosen substrate comprises: (a) an enclosed cleaning chamber in a walled vessel for containing a liquid derived from a liquefiable gas and the substrate containing the undesired particulates and contaminants, the walled vessel adapted to withstand a maximum pressure of about 1,500 pounds per square inch (105.4 kg/cm.sup.2) at ambient temperature; (b) means for supporting the substrate in the cleaning chamber; (c) ultrasonic energy-producing transducer means attached to the walled vessel within the cleaning chamber; (d) inlet means attached to the walled vessel for introducing the liquefiable gas into the cleaning chamber under a pressure less than about 900 pounds per square inch (63.3 kg/cm.sup.2); (e) temperature control means connected to the cleaning chamber for controlling the temperature within the chamber up to about 50.degree. C.; (f) reservoir means for providing the liquefiable gas to the inlet means; (g) means for changing the liquefiable gas to the liquid; and (h) outlet means in the chamber for removing the liquid from the cleaning chamber. The liquid may then be further treated to remove particulates and organic contaminants and either recycled to the cleaning chamber or vented to the atmosphere. The process is especially applicable for general degreasing and particulate removal processes, when high precision cleaning is not required.
    • 零件的精密清洁是用液化气体(如二氧化碳)进行的,而不需要使用复杂且昂贵的处理器系统。 相反,小规模和“低端”清洁应用的简化和可靠的性能完成,而无需使用泵和电容器。 用于从所选择的衬底去除不需要的材料的设备包括:(a)围壁容器中的封闭清洁室,用于容纳源自可液化气体的液体,以及含有不期望的颗粒和污染物的衬底,该壁容器适于承受最大 在环境温度下约1500磅/平方英寸(105.4kg / cm 2)的压力; (b)用于将基材支撑在清洁室中的装置; (c)连接到清洁室内的有壁容器的超声能量产生换能器装置; (d)连接到有壁容器的入口装置,用于在小于约900磅/平方英寸(63.3kg / cm 2)的压力下将可液化气体引入清洁室; (e)连接到清洁室的温度控制装置,用于控制室内的温度高达约50℃; (f)用于将液化气体提供给入口装置的储存装置; (g)将可液化气体改为液体的装置; 和(h)室中的出口装置,用于从清洗室中除去液体。 然后可以进一步处理液体以除去微粒和有机污染物,并且再循环到清洁室或排放到大气中。 当不需要高精度清洗时,该方法特别适用于一般的脱脂和微粒去除过程。