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11. 发明申请

US20130082972A1 METHOD AND DEVICE FOR CONTROLLING CONTENTS USING TOUCH, RECORDING MEDIUM THEREFOR, AND USER TERMINAL HAVING SAME 有权
标题翻译：用于通过触摸控制内容的方法和设备，记录介质以及具有相同的用户终端
公开(公告)号：US20130082972A1
公开(公告)日：2013-04-04
申请号：US13702837
申请日：2011-12-20
申请人： Jae-Jeung Kim , Sang-Tae Kim , Ho-Won Lee , Dong-Ho Cho
发明人： Jae-Jeung Kim , Sang-Tae Kim , Ho-Won Lee , Dong-Ho Cho
IPC分类号： G06F3/0488
CPC分类号： G06F3/0488 , G06F3/0484 , G06F3/04886
摘要： The present invention provides a method and a device for controlling contents of a user terminal having a touch screen, a recording medium therefor, and a user terminal having the same. The present invention relates to a method for controlling the contents of a user terminal having a touch screen, wherein, when a touch is detected on the touch screen while executing contents conversion, a part of the contents gets fixed on the basis of the detected location of the touch. Therefore, two or more contents can be easily compared using the fixed contents region as reference contents.
摘要翻译：本发明提供一种用于控制具有触摸屏的用户终端的内容的方法和装置，其记录介质以及具有该触摸屏的用户终端的用户终端。本发明涉及一种用于控制具有触摸屏的用户终端的内容的方法，其中，当在执行内容转换的同时在触摸屏上检测到触摸时，内容的一部分基于检测到的位置而被固定的触摸。因此，可以使用固定内容区域作为参考内容容易地比较两个或更多个内容。

12. 发明申请

US20120208310A1 NON-HALOGENATED ETCHANT AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE NON-HALOGENATED ETCHANT 有权
标题翻译：非对位蚀刻剂和使用非底物蚀刻剂制造显示基板的方法
公开(公告)号：US20120208310A1
公开(公告)日：2012-08-16
申请号：US13330657
申请日：2011-12-19
申请人： Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
发明人： Seon-Il KIM , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun JIN
IPC分类号： H01L33/08
CPC分类号： H01L51/0023 , H01L2251/308
摘要： Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
摘要翻译：本发明的示例性实施方案公开了用于蚀刻氧化铟层的非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法，非卤化蚀刻剂包括硝酸，硫酸，包括铵的腐蚀抑制剂，环胺类化合物和水。

13. 发明申请

US20110236825A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME 审中-公开
标题翻译：光刻胶组合物和使用其形成光刻胶图案的方法
公开(公告)号：US20110236825A1
公开(公告)日：2011-09-29
申请号：US13010688
申请日：2011-01-20
申请人： Jung-In PARK , Hi-Kuk Lee , Sang-Hyun Yun , Cha-Dong Kim , Shi-Jin Sung , Sung-Yeol Jin , Sang-Tae Kim , Yong-Il Kim , Eun-Sang Lee
发明人： Jung-In PARK , Hi-Kuk Lee , Sang-Hyun Yun , Cha-Dong Kim , Shi-Jin Sung , Sung-Yeol Jin , Sang-Tae Kim , Yong-Il Kim , Eun-Sang Lee
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0226
摘要： In a photoresist composition suitable for forming a photoresist pattern having a high profile angle, and a method of forming a photoresist pattern using the same, the photoresist composition includes an alkali-soluble resin, a quinone diazide containing compound, a compound represented by Formula 1, and a solvent: wherein R1, R2 and R3 are independently H, C1-4 alkyl, C2-4 alkenyl, C3-8 cycloalkyl, or C6-12 aryl.
摘要翻译：在适于形成具有高轮廓角的光致抗蚀剂图案的光致抗蚀剂组合物中，以及使用其形成光致抗蚀剂图案的方法，光致抗蚀剂组合物包括碱溶性树脂，含醌二化合物，由式1表示的化合物和溶剂：其中R 1，R 2和R 3独立地为H，C 1-4烷基，C 2-4烯基，C 3-8环烷基或C 6-12芳基。

14. 发明申请

US20100203444A1 PHOTORESIST COMPOSITION AND PATTERNING METHOD THEREOF 有权
标题翻译：光电组合物及其方法
公开(公告)号：US20100203444A1
公开(公告)日：2010-08-12
申请号：US12376107
申请日：2007-08-02
申请人： Shi-Jin Sung , Sang-Haeng Lee , Sang-Tae Kim
发明人： Shi-Jin Sung , Sang-Haeng Lee , Sang-Tae Kim
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0236
摘要： Disclosed is a resist composition which has desirable physical properties such as sensitivity, resolution, residual film ratio and coating property, and forms a pattern having the desirable profile and depth of focus due to excellent light transmissivity during a semiconductor process and a flat panel display process using a short wavelength of 248 nm (KrF) or less, even though the resist composition is applied to a non-chemically amplified resist. The photoresist composition comprises a novolac-based resin A, a photosensitizer B, and a low molecular substance C having low absorbance. The low molecular substance having low absorbance has absorbance that is lower than absorbance of the novolac-based resin at one or more wavelengths of 248 nm, 193 nm, and 157 nm, and the photoresist composition is used at the wavelength of 248 nm or less.
摘要翻译：公开了具有理想的物理性质如光敏度，分辨率，残留膜比和涂布性能的抗蚀剂组合物，并且由于在半导体工艺和平板显示过程中由于优异的透光率而形成具有期望的轮廓和深度聚焦的图案使用248nm（KrF）的短波长，即使将抗蚀剂组合物施加到非化学放大抗蚀剂上。光致抗蚀剂组合物包含酚醛清漆基树脂A，光敏剂B和低吸光度的低分子物质C. 具有低吸光度的低分子物质的吸光度低于在248nm，193nm和157nm的一个或多个波长处的酚醛清漆基树脂的吸光度，并且光致抗蚀剂组合物在248nm或更小的波长下使用。

15. 发明授权

US08968983B2 Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate 有权
标题翻译：光刻胶组合物，使用其形成图案的方法，以及制造显示基板的方法
公开(公告)号：US08968983B2
公开(公告)日：2015-03-03
申请号：US13565589
申请日：2012-08-02
申请人： Cha-Dong Kim , Sang Hyun Yun , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Eun-Sang Lee , Sung-Yeol Jin
发明人： Cha-Dong Kim , Sang Hyun Yun , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Eun-Sang Lee , Sung-Yeol Jin
IPC分类号： G03F7/022 , G03F7/023 , G03F7/40
CPC分类号： G03F7/0226 , G03F7/023 , G03F7/40 , Y10T428/1005
摘要： A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.
摘要翻译：公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。

16. 发明授权

US08785935B2 Etchant, display device and method for manufacturing display device using the same 有权
标题翻译：蚀刻剂，显示装置及使用其的显示装置的制造方法
公开(公告)号：US08785935B2
公开(公告)日：2014-07-22
申请号：US13168408
申请日：2011-06-24
申请人： Hong-Sick Park , Wang-Woo Lee , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Young-Jin Yoon , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Dong-Ki Kim
发明人： Hong-Sick Park , Wang-Woo Lee , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Young-Jin Yoon , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Dong-Ki Kim
IPC分类号： H01L29/04 , H01L27/12
CPC分类号： H01L27/127 , H01L21/32134 , H01L27/124 , H01L27/1259 , H01L29/41733
摘要： An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.
摘要翻译：蚀刻剂包括：5〜20重量％的过硫酸盐，1〜10重量％的至少一种无机酸化合物，无机酸盐或其混合物，0.3〜5重量％的环状胺化合物，1〜 10重量％的至少一种有机酸化合物，有机酸盐或其混合物，0.1至5重量％的对甲苯磺酸和水，基于蚀刻剂的总重量。另外，铜 - 钛蚀刻剂还含有0.01〜2重量％的含氟化合物。还公开了使用蚀刻剂形成显示装置的方法和显示装置。

17. 发明授权

US09513796B2 Method and device for controlling contents using touch, recording medium therefor, and user terminal having same 有权
标题翻译：用于使用触摸控制内容的方法和装置，其记录介质以及具有其的用户终端
公开(公告)号：US09513796B2
公开(公告)日：2016-12-06
申请号：US13702837
申请日：2011-12-20
申请人： Jae-Jeung Kim , Sang-Tae Kim , Ho-Won Lee , Dong-Ho Cho
发明人： Jae-Jeung Kim , Sang-Tae Kim , Ho-Won Lee , Dong-Ho Cho
IPC分类号： G06F3/041 , G06F3/048 , G06F3/0488 , G06F3/0484
CPC分类号： G06F3/0488 , G06F3/0484 , G06F3/04886
摘要： The present invention provides a method and a device for controlling contents of a user terminal having a touch screen, a recording medium therefor, and a user terminal having the same. The present invention relates to a method for controlling the contents of a user terminal having a touch screen, wherein, when a touch is detected on the touch screen while executing contents conversion, a part of the contents gets fixed on the basis of the detected location of the touch. Therefore, two or more contents can be easily compared using the fixed contents region as reference contents.
摘要翻译：本发明提供一种用于控制具有触摸屏的用户终端的内容的方法和装置，其记录介质以及具有该触摸屏的用户终端的用户终端。本发明涉及一种用于控制具有触摸屏的用户终端的内容的方法，其中，当在执行内容转换的同时在触摸屏上检测到触摸时，内容的一部分基于检测到的位置而被固定的触摸。因此，可以使用固定内容区域作为参考内容容易地比较两个或更多个内容。

18. 发明授权

US08409999B2 Etching composition for etching a transparent electrode 有权
标题翻译：用于蚀刻透明电极的蚀刻组合物
公开(公告)号：US08409999B2
公开(公告)日：2013-04-02
申请号：US12947296
申请日：2010-11-16
申请人： Byeong-Jin Lee , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
发明人： Byeong-Jin Lee , Hong-Sick Park , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Suck-Jun Lee , Seung-Jae Yang , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Hye-Ra Shin , Yu-Jin Lee
IPC分类号： H01L21/461
CPC分类号： H01L29/401 , C09K13/06 , H01L27/124 , H01L31/022475 , H01L31/022483 , H01L31/1884 , Y02E10/50
摘要： An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
摘要翻译：提供了用于蚀刻透明电极的蚀刻剂组合物，蚀刻剂组合物包括无机酸，含铵（NH 4 +）的化合物，环胺化合物和剩余量的水。

19. 发明申请

US20130040410A1 PHOTORESIST COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE 有权
标题翻译：光刻胶组合物，使用其形成图案的方法以及制造显示基板的方法
公开(公告)号：US20130040410A1
公开(公告)日：2013-02-14
申请号：US13565589
申请日：2012-08-02
申请人： Cha-Dong KIM , Sang Hyun Yun , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Eun-Sang Lee , Sung-Yeol Jin
发明人： Cha-Dong KIM , Sang Hyun Yun , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Eun-Sang Lee , Sung-Yeol Jin
IPC分类号： G03F7/022 , H01L33/08 , B44C1/22
CPC分类号： G03F7/0226 , G03F7/023 , G03F7/40 , Y10T428/1005
摘要： A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.
摘要翻译：公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。

20. 发明授权

US08227182B2 Methods of forming a photosensitive film 有权
标题翻译：形成感光膜的方法
公开(公告)号：US08227182B2
公开(公告)日：2012-07-24
申请号：US12539041
申请日：2009-08-11
申请人： Ahn-Ho Lee , Baik-Soon Choi , Seung-Hyun Ahn , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Kyong-Ho Lee
发明人： Ahn-Ho Lee , Baik-Soon Choi , Seung-Hyun Ahn , Sang-Tae Kim , Yong-Il Kim , Shi-Jin Sung , Kyong-Ho Lee
IPC分类号： G03F7/00 , G03F7/26 , G03F7/30 , G03F7/40
CPC分类号： G03F7/168
摘要： In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of γ-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.
摘要翻译：在较薄的组合物和形成感光膜的方法中，较薄的组合物包括约50至约90重量％的丙二醇单甲醚乙酸酯，约1至约20重量％的丙二醇单甲醚，约1至约 10重量％的γ-丁内酯和约1至约20重量％的乙酸正丁酯。更薄的组合物可以具有适当的挥发性和改善溶解各种感光材料的能力，因此较薄的组合物可有效地用于边缘珠漂洗工艺，返工工艺或预润湿工艺。

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