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11. 发明授权

US08699001B2 Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method 有权
标题翻译：物体移动装置，物体处理装置，曝光装置，物体检查装置和装置的制造方法
公开(公告)号：US08699001B2
公开(公告)日：2014-04-15
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , G03F7/20 , H01L21/677 , B65G49/06
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

12. 发明授权

US07372543B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
公开(公告)号：US07372543B2
公开(公告)日：2008-05-13
申请号：US11471658
申请日：2006-06-21
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32 , G03B27/54 , G03B27/44
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

13. 发明授权

US06795169B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US06795169B2
公开(公告)日：2004-09-21
申请号：US10382874
申请日：2003-03-07
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B2742
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.
摘要翻译：一种具有多个投影光学系统的曝光装置，其中每个投影光学系统将预定图案投影到基板上并在基板上形成曝光场。曝光装置还包括保持基板并沿至少沿直线延伸的扫描方向移动的基板台。多个曝光区域沿着与扫描方向交叉的方向排列，并且投影光学系统和基板沿着扫描方向在图案投影操作期间相对移动。

14. 发明授权

US06351305B1 Exposure apparatus and exposure method for transferring pattern onto a substrate 失效
标题翻译：用于将图案转印到基板上的曝光装置和曝光方法
公开(公告)号：US06351305B1
公开(公告)日：2002-02-26
申请号：US09173530
申请日：1998-10-15
申请人： Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B2732
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure method includes first through third steps. In the first step, respective first and second illumination regions of a mask having a predetermined pattern are illuminated with an illumination light having a predetermined wavelength. In the second step, an image of the mask is formed, respectively, in first and second exposure regions (formed on a substrate) based on the illumination that passes through the first and second illumination regions. The first and second exposure regions each have a substantially polygonal shape defined by two parallel sides and two sides other than the two parallel sides. In the third step, the first and second exposure regions and the substrate are moved relatively in a first direction such that the first and second exposure regions are formed in different positions in a second direction which crosses the first direction.
摘要翻译：曝光方法包括第一至第三步骤。在第一步骤中，用具有预定波长的照明光照射具有预定图案的掩模的相应的第一和第二照明区域。在第二步骤中，基于通过第一和第二照明区域的照明，分别在第一和第二曝光区域（形成在基板上）形成掩模的图像。第一曝光区域和第二曝光区域各自具有由两个平行侧和除了两个平行侧之外的两个侧面限定的大致多边形形状。在第三步骤中，第一和第二曝光区域和衬底相对于第一方向移动，使得第一和第二曝光区域在与第一方向交叉的第二方向上形成在不同的位置。

15. 发明授权

US5581075A Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area 失效
标题翻译：多光束扫描投影曝光装置和方法，具有大面积均匀曝光的光束监视和控制
公开(公告)号：US5581075A
公开(公告)日：1996-12-03
申请号：US446509
申请日：1995-05-22
申请人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
发明人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/7005 , G03F7/70091 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
摘要翻译：曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化光束达到基本上固定的水平。

16. 发明授权

US4368383A System for focus detection utilizing a photoelectric sensor array 失效
标题翻译：利用光电传感器阵列进行焦点检测的系统
公开(公告)号：US4368383A
公开(公告)日：1983-01-11
申请号：US294724
申请日：1981-08-20
申请人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
发明人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
IPC分类号： G03B3/10 , G01J1/16 , G03B3/00
CPC分类号： G03B3/10
摘要： A light measuring device capable of amplifying the difference of the time-sequential pulse output signals from the photoelectric sensor array regardless of the magnitude of said pulse output signals, comprises optical system means; means comprising a photoelectric sensor array having a plurality of photoelectric sensors for receiving the light passing through said optical system means and generating electric signals respectively corresponding to the intensity of light received by said photoelectric sensors as time-sequential signals of a determined interval; means for generating a comparison signal of a determined magnitude related to the output level of said electric signals; and processing means adapted to receive said electric signals and said comparison signal to generate output signals related to the difference of said signals in a sequential manner.
摘要翻译：能够放大来自光电传感器阵列的时序脉冲输出信号的差异而不管所述脉冲输出信号的幅度的光测量装置包括光学系统装置; 包括具有多个光电传感器的光电传感器阵列的装置，所述光电传感器用于接收通过所述光学系统装置的光，并且产生分别对应于由所述光电传感器接收的光的强度的电信号作为确定间隔的时间序列信号; 用于产生与所述电信号的输出电平有关的确定幅度的比较信号的装置; 以及适于接收所述电信号和所述比较信号的处理装置，以顺序方式产生与所述信号的差相关的输出信号。

17. 发明授权

US4339665A Apparatus for detecting displacement of optical image 失效
标题翻译：用于检测光学图像位移的装置
公开(公告)号：US4339665A
公开(公告)日：1982-07-13
申请号：US123211
申请日：1980-02-21
申请人： Ken Utagawa , Hiroshi Shirasu
发明人： Ken Utagawa , Hiroshi Shirasu
IPC分类号： G01D5/26 , G01B11/00 , G01C15/00 , G02B7/36 , H01J40/14
CPC分类号： G02B7/36
摘要： Apparatus for detecting displacement of optical image is disclosed which comprises a photosensitive element array, a first circuit, a second circuit and a phase difference measuring circuit. The photosensitive element array is composed of a number of photosensitive elements disposed on and near the focal plane of an image forming optical system through which an optical image is formed. The first circuit multiplies the electric outputs from photosensitive elements in the array by vectors whose phases sequentially increase or decrease, and then adds the products together to form an added output. The second circuit multiplies the electric outputs from photosensitive elements slightly shifted from the above elements in the same array, and then adds the products together to form a second added output. The difference in phase between the first and second added outputs is measured by the phase difference measuring circuit.
摘要翻译：公开了一种用于检测光学图像位移的装置，其包括光敏元件阵列，第一电路，第二电路和相位差测量电路。感光元件阵列由设置在形成光学图像的图像形成光学系统的焦平面上和附近的许多感光元件组成。第一个电路通过相位顺序增加或减小的矢量将阵列中的光敏元件的电输出相乘，然后将产品相加在一起形成一个附加的输出。第二电路将来自与上述元件稍微偏移的光敏元件的电输出相乘在同一阵列中，然后将产品相加在一起形成第二个附加输出。第一和第二相加输出之间的相位差由相位差测量电路测量。

18. 发明授权

US4291224A Light image space frequency component extracting device 失效
标题翻译：光图像空间频率分量提取装置
公开(公告)号：US4291224A
公开(公告)日：1981-09-22
申请号：US98153
申请日：1979-11-28
申请人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
发明人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
IPC分类号： G01J1/42 , G02B7/36 , G02B27/40 , G02B27/46
CPC分类号： G02B7/365 , G02B27/40
摘要： This invention discloses a device for extracting the space frequency component of an image formed by an optical system. The device comprises means having a photoelectric element array including a plurality of photoelectric elements on which said image is projected and time-sequentially generating, at a predetermined period, a pulse output having a magnitude corresponding to the intensity of light received by each of the photoelectric elements, means for successively storing the respective pulse outputs, means for converting each of the stored pulse outputs into an AC signal, and means for adding together the AC signals and producing the same.
摘要翻译：本发明公开了一种用于提取由光学系统形成的图像的空间频率分量的装置。该装置包括具有光电元件阵列的装置，该光电元件阵列包括多个光电元件，在该多个光电元件上投影所述图像并且以预定周期时间顺序地产生具有对应于由光电元件，用于连续存储各个脉冲输出的装置，用于将每个存储的脉冲输出转换为AC信号的装置，以及用于将AC信号相加并产生该装置的装置。

19. 发明申请

US20110085152A1 Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method 审中-公开
标题翻译：振动控制装置，振动控制方法，曝光装置和装置的制造方法
公开(公告)号：US20110085152A1
公开(公告)日：2011-04-14
申请号：US12775022
申请日：2010-05-06
申请人： Hideaki Nishino , Hiroshi Shirasu
发明人： Hideaki Nishino , Hiroshi Shirasu
IPC分类号： G03B27/58 , F16F7/00 , G03F7/20
CPC分类号： G03F7/709 , F16F15/046
摘要： A vibration control apparatus suppresses a vibration of a structure which is vibrated. The vibration control apparatus includes: a vibration isolation apparatus that supports the structure and suppresses a transmission of a vibration to the structure, the vibration having an amplitude equal to or less than a first amplitude in a predetermined direction; and a damping apparatus that damps a vibration of the structure vibrating in the predetermined vibration direction with a second amplitude larger than the first amplitude, to thereby reduce the vibration to equal to or less than the first amplitude.
摘要翻译：振动控制装置抑制振动的结构的振动。所述振动控制装置包括：振动隔离装置，其支撑所述结构并抑制对所述结构的振动的传递，所述振动的振幅等于或小于在预定方向上的第一幅度; 以及阻尼装置，其以比第一振幅大的第二振幅来抑制在预定振动方向上振动的结构的振动，从而将振动减小到等于或小于第一振幅。

20. 发明申请

US20060238729A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20060238729A1
公开(公告)日：2006-10-26
申请号：US11471658
申请日：2006-06-21
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/42
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

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