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    • 20. 发明授权
    • Defect examination apparatus
    • 缺陷检查仪
    • US06584420B1
    • 2003-06-24
    • US09722994
    • 2000-11-27
    • Takeshi Minami
    • Takeshi Minami
    • G06K900
    • G06K9/3275G06T7/70G06T2207/30152
    • A defect examination apparatus detects defect locations for a plurality of to-be-inspected objects vertically and horizontally arranged according to a prescribed rule. A blob analysis section finds location coordinates for the plurality of to-be-inspected objects. Based on location coordinates found by this blob analysis section, a rotation angle calculation section finds a rotation angle for a horizontal series of the to-be-inspected objects against a horizontal line. The rotation angle calculation section also finds a rotation angle for a vertical series of the to-be-inspected objects against a vertical line. A pitch size calculation section finds vertical and horizontal pitch sizes for the plurality of to-be-inspected objects. A matrix number analysis section finds a matrix number for each to-be-inspected object based on a rotation angle found by the rotation angle calculation section and a pitch size found by the pitch size calculation section.
    • 缺陷检查装置根据规定的规则垂直和水平布置检测多个被检查对象的缺陷位置。 斑点分析部分找到多个待检查对象的位置坐标。 基于由该斑点分析部分找到的位置坐标,旋转角度计算部分针对水平线找到要被检查对象的水平系列的旋转角度。 旋转角度计算部分还针对垂直线找到待检查对象的垂直系列的旋转角度。 俯仰尺寸计算部分针对多个被检查对象找到垂直和水平俯仰尺寸。 矩阵数分析部基于由旋转角度计算部求出的旋转角度和俯仰尺寸计算部求出的俯仰大小,求出每个被检查物体的矩阵数。