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    • 11. 发明申请
    • Method and apparatus for coating of substrates
    • 用于涂布基材的方法和装置
    • US20050158449A1
    • 2005-07-21
    • US10976348
    • 2004-10-27
    • Ralph Chappa
    • Ralph Chappa
    • B05B13/02B05B13/04B05D3/00B05C5/00
    • B05D1/02B05B7/0807B05B7/0861B05B7/0869B05B13/0207B05B13/0228B05B13/0436B05B13/0442B05C13/025B05D1/002Y10S118/11
    • The invention relates to methods and apparatuses that reduce problems encountered during coating of a device, such as a medical device having a cylindrical shape. In an embodiment, the invention includes an apparatus including a bi-directional rotation member. In an embodiment, the invention includes a method with a bi-directional indexing movement. In an embodiment, the invention includes a coating solution supply member having a major axis oriented parallel to a gap between rollers on a coating apparatus. In an embodiment, the invention includes a device retaining member. In an embodiment, the invention includes an air nozzle or an air knife. In an embodiment, the invention includes a method including removing a static charge from a small diameter medical device.
    • 本发明涉及减少装置涂覆期间遇到的问题的方法和装置,例如具有圆柱形形状的医疗装置。 在一个实施例中,本发明包括一种包括双向旋转构件的装置。 在一个实施例中,本发明包括具有双向分度运动的方法。 在一个实施方案中,本发明包括具有平行于涂覆设备上的辊之间的间隙定向的长轴的涂布溶液供应构件。 在一个实施例中,本发明包括装置保持构件。 在一个实施例中,本发明包括空气喷嘴或气刀。 在一个实施例中,本发明包括一种包括从小直径医疗装置中去除静电荷的方法。
    • 15. 发明申请
    • Methods, devices, and coatings for controlled active agent release
    • 用于控制活性剂释放的方法,装置和涂层
    • US20060057277A1
    • 2006-03-16
    • US11223811
    • 2005-09-09
    • Ralph Chappa
    • Ralph Chappa
    • A61K6/083A61L33/00
    • A61L27/54A61L27/34A61L31/10A61L31/16A61L2300/602
    • The present invention relates to methods, devices, and coatings, wherein active agent release is determined by deposition rate of a coating or material. In an embodiment, the invention includes a method for coating a medical device, including identifying active agent elution rates for a coating composition applied to substrates at a plurality of coating deposition rates, selecting one of the coating deposition rates, and applying the coating composition to the medical device at the selected deposition rate. In an embodiment, the invention includes a combination including a medical device and a composition for coating the surface of a medical device with an active agent in a manner that permits the coated surface to release the active agent over time when implanted in vivo.
    • 本发明涉及方法,装置和涂层,其中通过涂层或材料的沉积速率确定活性剂释放。 在一个实施方案中,本发明包括用于涂覆医疗装置的方法,包括鉴定以多种涂布沉积速率施加到基材上的涂料组合物的活性剂洗脱速率,选择一种涂布沉积速率,以及将涂料组合物施用于 医疗器械以选定的沉积速率。 在一个实施方案中,本发明包括一种组合,其包括医疗装置和用于用活性剂涂覆医疗装置的表面的组合物,使得当植入体内时涂覆表面随时间推移释放活性剂。
    • 17. 发明申请
    • Method and Apparatus for Coating of Substrates
    • 基材涂层方法及装置
    • US20070101933A1
    • 2007-05-10
    • US11539443
    • 2006-10-06
    • Ralph Chappa
    • Ralph Chappa
    • B05B5/025
    • B05D1/02B05B7/0807B05B7/0861B05B7/0869B05B13/0207B05B13/0228B05B13/0436B05B13/0442B05C13/025B05D1/002Y10S118/11
    • The invention relates to methods and apparatuses that reduce problems encountered during coating of a device, such as a medical device having a cylindrical shape. In an embodiment, the invention includes an apparatus including a bidirectional rotation member. In an embodiment, the invention includes a method with a bidirectional indexing movement. In an embodiment, the invention includes a coating solution supply member having a major axis oriented parallel to a gap between rollers on a coating apparatus. In an embodiment, the invention includes a device retaining member. In an embodiment, the invention includes an air nozzle or an air knife. In an embodiment, the invention includes a method including removing a static charge from a small diameter medical device.
    • 本发明涉及减少装置涂覆期间遇到的问题的方法和装置,例如具有圆柱形形状的医疗装置。 在一个实施例中,本发明包括一种包括双向旋转构件的装置。 在一个实施例中,本发明包括具有双向分度运动的方法。 在一个实施方案中,本发明包括具有平行于涂覆设备上的辊之间的间隙定向的长轴的涂布溶液供应构件。 在一个实施例中,本发明包括装置保持构件。 在一个实施例中,本发明包括空气喷嘴或气刀。 在一个实施例中,本发明包括一种包括从小直径医疗装置中去除静电荷的方法。
    • 18. 发明申请
    • Linear Rail Coating Apparatus and Method
    • 直线导轨涂布装置及方法
    • US20060210701A1
    • 2006-09-21
    • US11421637
    • 2006-06-01
    • Ralph ChappaSteven Porter
    • Ralph ChappaSteven Porter
    • A61L33/00B05B13/02
    • B05D1/002A61L31/10B05B13/0242B05B13/0442B05B16/40
    • The invention provides an apparatus for coating a device comprising a coating chamber and a device rotator having at least one device mount wherein the apparatus allows insertion and retraction of the device on the device mount into and out of the coating chamber. In another aspect, the invention provides a method of applying a substantially uniform coating on a device comprising the steps of providing an apparatus for coating a device, mounting the device onto the device mount, purging the coating chamber to reduce humidity in the coating chamber, maintaining a reduced humidity content in the coating chamber, inserting the device into the coating chamber, disposing a coating material on the device and rotating the device mounts about the device axis.
    • 本发明提供了一种用于涂覆装置的装置,该装置包括涂覆室和具有至少一个装置安装件的装置旋转器,其中装置允许装置在装置安装件上进出涂层室的插入和缩回。 另一方面,本发明提供了一种在装置上施加基本上均匀的涂层的方法,包括以下步骤:提供用于涂覆装置的装置,将装置安装到装置安装件上,清洗涂布室以减少涂覆室中的湿度, 保持涂布室中的湿度降低,将装置插入涂覆室中,将涂层材料设置在装置上并使装置围绕装置轴线旋转。